JP6882053B2 - カタディオプトリック光学系、照明光学系、露光装置および物品製造方法 - Google Patents
カタディオプトリック光学系、照明光学系、露光装置および物品製造方法 Download PDFInfo
- Publication number
- JP6882053B2 JP6882053B2 JP2017090239A JP2017090239A JP6882053B2 JP 6882053 B2 JP6882053 B2 JP 6882053B2 JP 2017090239 A JP2017090239 A JP 2017090239A JP 2017090239 A JP2017090239 A JP 2017090239A JP 6882053 B2 JP6882053 B2 JP 6882053B2
- Authority
- JP
- Japan
- Prior art keywords
- optical system
- catadioptric optical
- reflecting surface
- catadioptric
- design example
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW106140227A TWI657260B (zh) | 2016-12-05 | 2017-11-21 | 反射折射光學系統、照明光學系統、曝光裝置及物品製造方法 |
TW108102550A TWI701458B (zh) | 2016-12-05 | 2017-11-21 | 反射折射光學系統、照明光學系統、曝光裝置及物品製造方法 |
KR1020170165029A KR102239056B1 (ko) | 2016-12-05 | 2017-12-04 | 카타디옵트릭 광학계, 조명 광학계, 노광 장치 및 물품 제조 방법 |
CN201711263241.5A CN108152940B (zh) | 2016-12-05 | 2017-12-05 | 反射折射光学系统、照明光学系统、曝光装置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016236244 | 2016-12-05 | ||
JP2016236244 | 2016-12-05 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021075357A Division JP7029564B2 (ja) | 2016-12-05 | 2021-04-27 | カタディオプトリック光学系、照明光学系、露光装置および物品製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2018092116A JP2018092116A (ja) | 2018-06-14 |
JP2018092116A5 JP2018092116A5 (zh) | 2020-06-18 |
JP6882053B2 true JP6882053B2 (ja) | 2021-06-02 |
Family
ID=62566004
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017090239A Active JP6882053B2 (ja) | 2016-12-05 | 2017-04-28 | カタディオプトリック光学系、照明光学系、露光装置および物品製造方法 |
JP2021075357A Active JP7029564B2 (ja) | 2016-12-05 | 2021-04-27 | カタディオプトリック光学系、照明光学系、露光装置および物品製造方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021075357A Active JP7029564B2 (ja) | 2016-12-05 | 2021-04-27 | カタディオプトリック光学系、照明光学系、露光装置および物品製造方法 |
Country Status (3)
Country | Link |
---|---|
JP (2) | JP6882053B2 (zh) |
KR (1) | KR102239056B1 (zh) |
TW (2) | TWI657260B (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6820717B2 (ja) | 2016-10-28 | 2021-01-27 | 株式会社日立ハイテク | プラズマ処理装置 |
WO2021192210A1 (ja) | 2020-03-27 | 2021-09-30 | 株式会社日立ハイテク | 半導体製造方法 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61203419A (ja) | 1985-03-06 | 1986-09-09 | Nippon Kogaku Kk <Nikon> | 反射縮小投影光学系 |
JPH0478002A (ja) | 1990-07-13 | 1992-03-12 | Toshiba Corp | 磁気記録再生装置 |
JPH07146442A (ja) | 1994-08-04 | 1995-06-06 | Canon Inc | 反射光学系 |
JPH11326767A (ja) * | 1998-05-07 | 1999-11-26 | Nikon Corp | 反射屈折縮小光学系 |
JP2000227555A (ja) * | 1998-07-16 | 2000-08-15 | Olympus Optical Co Ltd | 結像光学系 |
JP2000098228A (ja) * | 1998-09-21 | 2000-04-07 | Nikon Corp | 投影露光装置及び露光方法、並びに反射縮小投影光学系 |
TW538256B (en) * | 2000-01-14 | 2003-06-21 | Zeiss Stiftung | Microlithographic reduction projection catadioptric objective |
JP2004514943A (ja) * | 2000-11-28 | 2004-05-20 | カール・ツアイス・エスエムテイ・アーゲー | 157nmリソグラフィ用の反射屈折投影系 |
JP2003215458A (ja) * | 2002-01-23 | 2003-07-30 | Nikon Corp | 反射屈折光学系 |
US7085075B2 (en) * | 2003-08-12 | 2006-08-01 | Carl Zeiss Smt Ag | Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 |
US7511798B2 (en) * | 2004-07-30 | 2009-03-31 | Asml Holding N.V. | Off-axis catadioptric projection optical system for lithography |
JP5196869B2 (ja) * | 2007-05-15 | 2013-05-15 | キヤノン株式会社 | 投影光学系、露光装置及びデバイス製造方法 |
JP2009025737A (ja) | 2007-07-23 | 2009-02-05 | Canon Inc | 反射屈折型投影光学系、露光装置及びデバイス製造方法 |
JP5654735B2 (ja) * | 2008-05-15 | 2015-01-14 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 結像光学器械及びその結像光学器械を含む投影露光装置 |
JP5398185B2 (ja) | 2008-07-09 | 2014-01-29 | キヤノン株式会社 | 投影光学系、露光装置およびデバイス製造方法 |
JP2011107594A (ja) * | 2009-11-20 | 2011-06-02 | Nidec Copal Corp | 撮像光学系及び撮像装置 |
DE102010040030B4 (de) * | 2010-08-31 | 2017-02-02 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Objektiv und Bildaufnahmesystem |
CN105372799B (zh) * | 2015-12-14 | 2018-04-03 | 中国科学院光电技术研究所 | 一种离轴反射型广角光学镜头 |
-
2017
- 2017-04-28 JP JP2017090239A patent/JP6882053B2/ja active Active
- 2017-11-21 TW TW106140227A patent/TWI657260B/zh active
- 2017-11-21 TW TW108102550A patent/TWI701458B/zh active
- 2017-12-04 KR KR1020170165029A patent/KR102239056B1/ko active IP Right Grant
-
2021
- 2021-04-27 JP JP2021075357A patent/JP7029564B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP2018092116A (ja) | 2018-06-14 |
TWI657260B (zh) | 2019-04-21 |
TW201921024A (zh) | 2019-06-01 |
TW201821857A (zh) | 2018-06-16 |
JP7029564B2 (ja) | 2022-03-03 |
KR20180064306A (ko) | 2018-06-14 |
KR102239056B1 (ko) | 2021-04-12 |
JP2021113998A (ja) | 2021-08-05 |
TWI701458B (zh) | 2020-08-11 |
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