JP6854638B2 - 光学装置、露光装置、および物品の製造方法 - Google Patents

光学装置、露光装置、および物品の製造方法 Download PDF

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Publication number
JP6854638B2
JP6854638B2 JP2016248395A JP2016248395A JP6854638B2 JP 6854638 B2 JP6854638 B2 JP 6854638B2 JP 2016248395 A JP2016248395 A JP 2016248395A JP 2016248395 A JP2016248395 A JP 2016248395A JP 6854638 B2 JP6854638 B2 JP 6854638B2
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Japan
Prior art keywords
mirror
magnet
optical device
actuator
area
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Active
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JP2016248395A
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English (en)
Japanese (ja)
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JP2018101112A (ja
JP2018101112A5 (zh
Inventor
春見　和之
和之 春見
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2016248395A priority Critical patent/JP6854638B2/ja
Priority to KR1020170169969A priority patent/KR102266120B1/ko
Priority to CN201711361028.8A priority patent/CN108227401B/zh
Publication of JP2018101112A publication Critical patent/JP2018101112A/ja
Publication of JP2018101112A5 publication Critical patent/JP2018101112A5/ja
Application granted granted Critical
Publication of JP6854638B2 publication Critical patent/JP6854638B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
JP2016248395A 2016-12-21 2016-12-21 光学装置、露光装置、および物品の製造方法 Active JP6854638B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2016248395A JP6854638B2 (ja) 2016-12-21 2016-12-21 光学装置、露光装置、および物品の製造方法
KR1020170169969A KR102266120B1 (ko) 2016-12-21 2017-12-12 광학 장치, 노광 장치 및 물품의 제조 방법
CN201711361028.8A CN108227401B (zh) 2016-12-21 2017-12-18 光学装置、曝光装置以及物品的制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016248395A JP6854638B2 (ja) 2016-12-21 2016-12-21 光学装置、露光装置、および物品の製造方法

Publications (3)

Publication Number Publication Date
JP2018101112A JP2018101112A (ja) 2018-06-28
JP2018101112A5 JP2018101112A5 (zh) 2019-12-19
JP6854638B2 true JP6854638B2 (ja) 2021-04-07

Family

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Family Applications (1)

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JP2016248395A Active JP6854638B2 (ja) 2016-12-21 2016-12-21 光学装置、露光装置、および物品の製造方法

Country Status (3)

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JP (1) JP6854638B2 (zh)
KR (1) KR102266120B1 (zh)
CN (1) CN108227401B (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102020211691A1 (de) * 2020-09-17 2022-03-17 Carl Zeiss Smt Gmbh Optisches system und lithographieanlage

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10253872A (ja) * 1997-03-13 1998-09-25 Nikon Corp 反射光学部材の保持装置及び露光装置
FR2935054B1 (fr) * 2008-08-14 2011-01-28 Alpao Miroir deformable a actionneurs de force et raideur repartie
JP4994341B2 (ja) * 2008-10-29 2012-08-08 三菱電機株式会社 可変形ミラー装置
JP6309765B2 (ja) * 2010-12-20 2018-04-11 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学素子を取り付ける配置構成
FR2985320B1 (fr) * 2011-12-29 2014-02-14 Alpao Systeme a etalonnage commun et procede correspondant
DE102012221831A1 (de) * 2012-11-29 2014-06-05 Carl Zeiss Smt Gmbh Anordnung zur Aktuierung wenigstens eines optischen Elementes in einem optischen System
DE102013211310A1 (de) * 2013-06-17 2014-12-18 Carl Zeiss Smt Gmbh EUV-Abbildungsvorrichtung
JP2015050353A (ja) * 2013-09-02 2015-03-16 キヤノン株式会社 光学装置、投影光学系、露光装置、並びに物品の製造方法
JP2015065246A (ja) * 2013-09-24 2015-04-09 キヤノン株式会社 光学装置、光学系、露光装置及び物品の製造方法
JP6336274B2 (ja) * 2013-12-25 2018-06-06 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品の製造方法

Also Published As

Publication number Publication date
KR20180072550A (ko) 2018-06-29
JP2018101112A (ja) 2018-06-28
CN108227401A (zh) 2018-06-29
CN108227401B (zh) 2021-03-09
KR102266120B1 (ko) 2021-06-17

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