JP6786372B2 - 配線基板、配線基板の製造方法 - Google Patents
配線基板、配線基板の製造方法 Download PDFInfo
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- JP6786372B2 JP6786372B2 JP2016239399A JP2016239399A JP6786372B2 JP 6786372 B2 JP6786372 B2 JP 6786372B2 JP 2016239399 A JP2016239399 A JP 2016239399A JP 2016239399 A JP2016239399 A JP 2016239399A JP 6786372 B2 JP6786372 B2 JP 6786372B2
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- wiring
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- wiring layer
- hole
- insulating substrate
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- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
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- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
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- H—ELECTRICITY
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- H05K1/118—Printed elements for providing electric connections to or between printed circuits specially for flexible printed circuits, e.g. using folded portions
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
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- H05K1/18—Printed circuits structurally associated with non-printed electric components
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
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- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
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- H05K3/00—Apparatus or processes for manufacturing printed circuits
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- H05K3/00—Apparatus or processes for manufacturing printed circuits
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
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- H05K1/02—Details
- H05K1/0277—Bendability or stretchability details
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- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Geometry (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Description
なお、添付図面は、理解を容易にするために構成要素を拡大して示している場合がある。構成要素の寸法比率は実際のものと、または別の図面中のものと異なる場合がある。また、断面図では、理解を容易にするために、一部の構成要素のハッチングを省略している場合がある。
絶縁基板11は、可撓性と絶縁性とを有する材料により形成されている。絶縁基板11としては、例えば、ポリイミド樹脂やポリエステル樹脂等の樹脂、液晶ポリマ、等を用いたフレキシブルなフィルム状基板を用いることができる。
絶縁基板11には、スプロケットホール12が形成されている。スプロケットホール12は、絶縁基板11をその厚さ方向に貫通して形成されている。
貫通部42の上端は、配線層21に形成された貫通孔10Xの上端と一致している。そして、貫通部42の上面42aは、平面である。更に、貫通部42の上面42aは、配線層21の上面21aと面一である。貫通部42の上端の外周面42bは、貫通孔10Xにおいて、配線層21の内面部分21cと直接接合されている。
配線基板10の上面には電子部品71が実装される。電子部品71は、はんだボール72を介して配線基板10の外部接続端子P1に接続される。はんだボール72としては、例えば、導電性コアボール(銅コアボールなど)や樹脂コアボールの周囲をはんだで覆った構造を有するはんだボールを用いることができる。なお、はんだボール72としては、導電性コアボールや樹脂コアボールを省略したはんだボールを用いることもできる。また、配線基板10の下面には電子部品81が実装される。電子部品81は、はんだ82を介して配線基板10の外部接続端子P2に接続される。
なお、説明の便宜上、最終的に配線基板10の各構成要素となる部分には、最終的な構成要素の符号を付して説明する場合がある。また、工程の説明に係わらない部材の符号を省略することがある。
図4(a)に示す工程では、レジスト層121が形成されていない側の銅箔101に、マスク材としてのマスキングテープ131を貼り付ける。マスキングテープ131の材料としては、例えば塩化ビニルやPET等の樹脂フィルムにアクリル系の接着剤が塗布されたものを用いることができる。なお、マスキングテープ131を絶縁基板11に貼り付けることにより、銅箔101の側面(図4(a)において左右方向の端面)もマスキングテープ131により覆われる。
配線基板10は、可撓性を有する絶縁基板11と、絶縁基板11の上面に形成された配線層21と、絶縁基板11の下面に形成された配線層31とを有している。配線基板10には、配線層21と絶縁基板11と配線層31とを貫通する貫通孔が形成され、その貫通孔10Xには貫通配線41が形成されている。貫通配線41は、貫通孔10Xにより形成される配線層21の内面部分21cと、配線層31の内面部分31cとに接続されている。
(1)配線基板10は、可撓性を有する絶縁基板11と、絶縁基板11の上面11aに形成された配線層21と、絶縁基板11の下面11bに形成された配線層31と、を有している。また、配線基板10は、配線層21と絶縁基板11と配線層31とを貫通する貫通孔10Xを有している。貫通孔10Xには、貫通配線41が形成されている。貫通配線41は、貫通孔10Xの内部に充填された貫通部42と、配線層31の下面31bより下方向に突出する突出部43とを有している。貫通配線41の貫通部42は、配線層21と配線層31とに接続されている。貫通配線41において、貫通部42の上面42aは、配線層21の上面21aと面一である。
尚、上記各実施形態は、以下の態様で実施してもよい。
・上記実施形態の図2(d)に示す工程において、銅箔101,102を液状のフォトレジストにより整面コートしてレジスト層111,112を形成した。銅箔101をエッチングしない側のレジスト層111を、他のレジストを用いて形成するようにしてもよい。エッチングしないため、レジスト層は厚くでもよく、銅箔101に密着していることが好ましい。例えば、ドライレジストフィルムのように、密着性の良いレジストを用いることができる。
10X 貫通孔
11 絶縁基板
11c 内面部分
21 配線層(第1配線層)
21a 上面
21c 内面部分
31 配線層(第2配線層)
31b 下面
31c 内面部分
22 保護層(第1保護層)
32 保護層(第2保護層)
23 表面処理層(第1表面処理層)
33 表面処理層(第2表面処理層)
41 貫通配線
42 貫通部
42a 上面
42b〜42d 外周面
43 突出部
43a 上面
Claims (10)
- 可撓性を有する絶縁基板と、
前記絶縁基板の上面に形成された第1配線層と、
前記絶縁基板の下面に形成された第2配線層と、
前記第1配線層と前記絶縁基板と前記第2配線層とを貫通する貫通孔に形成され、前記第1配線層と前記第2配線層とに接続された貫通配線と、を有し、
前記貫通配線は、めっき金属よりなり、
前記貫通配線は、前記貫通孔の外周側に位置する前記第2配線層の下面に延在する突出部を有し、
前記貫通配線の上面は、前記第1配線層の上面と面一であること、
を特徴とする配線基板。 - 前記第1配線層の一部を覆い、前記貫通配線の上面と、前記貫通配線の外側に位置する前記第1配線層の上面とを露出する開口部を有する第1保護層と、
前記第2配線層の一部と前記貫通配線を覆い、前記第2配線層の下面の一部を露出する開口部を有する第2保護層と、を有すること、を特徴とする請求項1に記載の配線基板。 - 前記第1保護層から露出する前記第1配線層と前記貫通配線との表面を覆う第1表面処理層と、
前記第2保護層から露出する前記第2配線層の表面を覆う第2表面処理層と、
を有すること、
を特徴とする請求項2に記載の配線基板。 - 前記突出部の上面と前記第2配線層の下面とが直接接合されていることを特徴とする請求項1から請求項3のいずれか一項に記載の配線基板。
- 前記貫通配線は、前記貫通孔の内部に充填された貫通部を有し、
前記貫通孔内において、
前記貫通部の上端の外周面と前記第1配線層の内面部分とが直接接合され、
前記貫通部の下端の外周面と前記第2配線層の内面部分とが直接接合され、
前記貫通部の他の部分が、前記絶縁基板の内面部分と接していること、
を特徴とする請求項1から請求項4のいずれか一項に記載の配線基板。 - 可撓性を有する絶縁基板と前記絶縁基板の上面に接続された第1金属箔と前記絶縁基板の下面に接続された第2金属箔とを有する積層板を用い、前記第2金属箔を被覆して開口部を有する第2のエッチングマスクを形成し、前記第2のエッチングマスクを用いて前記第2金属箔をパターニングして第2配線層を形成する工程と、
前記第2のエッチングマスクを除去する工程と、
前記第2配線層を覆うめっきマスクを形成する工程と、
打ち抜き加工により前記第1金属箔と前記絶縁基板と前記第2配線層とを貫通する貫通孔を形成する工程と、
前記第1金属箔の上面にマスク材を貼付し、前記貫通孔を閉塞する工程と、
前記第1金属箔を給電電極とする電解めっき法により、前記貫通孔に充填されためっき金属よりなる貫通配線を形成する工程と、
前記めっきマスクと前記マスク材とを除去する工程と、
前記第1金属箔を被覆して開口部を有する第1のエッチングマスクを形成し、前記第1のエッチングマスクを用いて前記第1金属箔をパターニングして第1配線層を形成する工程と、
前記第1のエッチングマスクを除去する工程と、
を有する、配線基板の製造方法。 - 前記第1のエッチングマスク及び前記第2のエッチングマスクの少なくともいずれか1つを、感光性を有する液状のレジスト材により形成することを特徴とする請求項6に記載の配線基板の製造方法。
- 前記第2配線層を覆うめっきマスクは、前記貫通孔を形成する位置に前記貫通孔より大きな開口部を有し、
前記貫通孔を形成する工程において、前記めっきマスクの開口部の内側に前記貫通孔を形成し、
前記貫通配線を形成する工程において、前記第2配線層の下面より突出し前記第2配線層の下面に延在する突出部を形成する、ことを特徴とする請求項6又は7に記載の配線基板の製造方法。 - 前記第1配線層の一部を覆い、前記貫通配線の上面と、前記貫通配線の外側に位置する前記第1配線層の上面とを露出する開口部を有する第1保護層と、前記第2配線層の一部と前記貫通配線を覆い、前記第2配線層の下面の一部を露出する開口部を有する第2保護層と、を形成する工程を有すること、を特徴とする請求項8に記載の配線基板の製造方法。
- 前記第1保護層から露出する前記第1配線層と前記貫通配線との表面を覆う第1表面処理層と、前記第2保護層から露出する前記第2配線層の表面を覆う第2表面処理層と、を形成する工程を有すること、を特徴とする請求項9に記載の配線基板の製造方法。
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