JP6785735B2 - 切断装置及び半導体パッケージの搬送方法 - Google Patents
切断装置及び半導体パッケージの搬送方法 Download PDFInfo
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- JP6785735B2 JP6785735B2 JP2017171960A JP2017171960A JP6785735B2 JP 6785735 B2 JP6785735 B2 JP 6785735B2 JP 2017171960 A JP2017171960 A JP 2017171960A JP 2017171960 A JP2017171960 A JP 2017171960A JP 6785735 B2 JP6785735 B2 JP 6785735B2
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- semiconductor package
- cutting
- transport mechanism
- semiconductor
- suction
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- 239000004065 semiconductor Substances 0.000 title claims description 241
- 238000005520 cutting process Methods 0.000 title claims description 154
- 238000000034 method Methods 0.000 title claims description 41
- 230000007723 transport mechanism Effects 0.000 claims description 114
- 230000007246 mechanism Effects 0.000 claims description 92
- 238000000926 separation method Methods 0.000 claims description 40
- 239000011347 resin Substances 0.000 claims description 22
- 229920005989 resin Polymers 0.000 claims description 22
- 230000008569 process Effects 0.000 claims description 18
- 238000003825 pressing Methods 0.000 claims description 5
- 239000000758 substrate Substances 0.000 description 77
- 239000007789 gas Substances 0.000 description 44
- 230000032258 transport Effects 0.000 description 28
- 239000002184 metal Substances 0.000 description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 238000002347 injection Methods 0.000 description 11
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 230000002950 deficient Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 239000002699 waste material Substances 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 238000010276 construction Methods 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 244000309466 calf Species 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
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- 238000009751 slip forming Methods 0.000 description 1
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- 239000007921 spray Substances 0.000 description 1
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67121—Apparatus for making assemblies not otherwise provided for, e.g. package constructions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67144—Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67712—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Dicing (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Life Sciences & Earth Sciences (AREA)
- Forests & Forestry (AREA)
- Mechanical Engineering (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017171960A JP6785735B2 (ja) | 2017-09-07 | 2017-09-07 | 切断装置及び半導体パッケージの搬送方法 |
KR1020180080966A KR102182956B1 (ko) | 2017-09-07 | 2018-07-12 | 절단 장치 및 반도체 패키지의 반송 방법 |
TW107129430A TWI697042B (zh) | 2017-09-07 | 2018-08-23 | 切斷裝置以及半導體封裝的搬送方法 |
CN201810980250.4A CN109473376B (zh) | 2017-09-07 | 2018-08-27 | 切断装置以及半导体封装的搬送方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017171960A JP6785735B2 (ja) | 2017-09-07 | 2017-09-07 | 切断装置及び半導体パッケージの搬送方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2019047078A JP2019047078A (ja) | 2019-03-22 |
JP6785735B2 true JP6785735B2 (ja) | 2020-11-18 |
Family
ID=65659944
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017171960A Active JP6785735B2 (ja) | 2017-09-07 | 2017-09-07 | 切断装置及び半導体パッケージの搬送方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6785735B2 (zh) |
KR (1) | KR102182956B1 (zh) |
CN (1) | CN109473376B (zh) |
TW (1) | TWI697042B (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7154195B2 (ja) * | 2019-07-26 | 2022-10-17 | Towa株式会社 | 切断装置及び切断品の製造方法 |
JP7149249B2 (ja) * | 2019-10-31 | 2022-10-06 | Towa株式会社 | 搬送モジュール、切断装置及び切断品の製造方法 |
KR102610004B1 (ko) * | 2020-11-19 | 2023-12-05 | 세메스 주식회사 | 반도체 스트립 절단 및 분류 설비에서 패키지 건조 장치 |
JP7456399B2 (ja) * | 2021-02-12 | 2024-03-27 | 株式会社村田製作所 | シート搬送装置 |
CN114571615B (zh) * | 2022-01-21 | 2023-10-20 | 江西红板科技股份有限公司 | 一种芯片封装装置及其封装系统 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4309084B2 (ja) * | 2001-11-26 | 2009-08-05 | アピックヤマダ株式会社 | ダイシング装置 |
US6746022B2 (en) | 2001-12-26 | 2004-06-08 | Asm Assembly Automation Ltd. | Chuck for holding a workpiece |
TW201001566A (en) * | 2008-06-24 | 2010-01-01 | Powertech Technology Inc | Jig and method for picking up a die |
JP5202493B2 (ja) * | 2009-10-21 | 2013-06-05 | シャープ株式会社 | 半導体装置の製造装置および半導体装置の製造方法 |
WO2011128981A1 (ja) * | 2010-04-13 | 2011-10-20 | パイオニア株式会社 | 部品移送装置及び方法 |
KR101322531B1 (ko) * | 2012-05-21 | 2013-10-28 | 세메스 주식회사 | 반도체 소자들을 픽업하기 위한 장치 |
JP6257266B2 (ja) * | 2013-10-29 | 2018-01-10 | Towa株式会社 | 電子部品の製造装置及び製造方法 |
JP6235391B2 (ja) * | 2014-03-27 | 2017-11-22 | Towa株式会社 | 検査用治具、切断装置及び切断方法 |
JP6312554B2 (ja) * | 2014-08-13 | 2018-04-18 | 株式会社ディスコ | パッケージ基板の加工方法 |
KR102267946B1 (ko) * | 2014-11-04 | 2021-06-22 | 세메스 주식회사 | 반도체 패키지 및 반도체 스트립 이송 장치 |
JP2017054956A (ja) * | 2015-09-10 | 2017-03-16 | 株式会社ディスコ | 被加工物の支持治具 |
-
2017
- 2017-09-07 JP JP2017171960A patent/JP6785735B2/ja active Active
-
2018
- 2018-07-12 KR KR1020180080966A patent/KR102182956B1/ko active IP Right Grant
- 2018-08-23 TW TW107129430A patent/TWI697042B/zh active
- 2018-08-27 CN CN201810980250.4A patent/CN109473376B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
KR102182956B1 (ko) | 2020-11-25 |
CN109473376A (zh) | 2019-03-15 |
CN109473376B (zh) | 2022-02-11 |
TWI697042B (zh) | 2020-06-21 |
JP2019047078A (ja) | 2019-03-22 |
TW201913772A (zh) | 2019-04-01 |
KR20190027706A (ko) | 2019-03-15 |
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