JP6761306B2 - 照明光学系、リソグラフィ装置、及び物品製造方法 - Google Patents

照明光学系、リソグラフィ装置、及び物品製造方法 Download PDF

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Publication number
JP6761306B2
JP6761306B2 JP2016168546A JP2016168546A JP6761306B2 JP 6761306 B2 JP6761306 B2 JP 6761306B2 JP 2016168546 A JP2016168546 A JP 2016168546A JP 2016168546 A JP2016168546 A JP 2016168546A JP 6761306 B2 JP6761306 B2 JP 6761306B2
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Japan
Prior art keywords
optical
light
regions
optical integrator
optical system
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JP2016168546A
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English (en)
Japanese (ja)
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JP2018036425A (ja
JP2018036425A5 (ko
Inventor
広美 須田
広美 須田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2016168546A priority Critical patent/JP6761306B2/ja
Priority to KR1020197008164A priority patent/KR102212855B1/ko
Priority to PCT/JP2017/030779 priority patent/WO2018043423A1/ja
Priority to TW106129100A priority patent/TWI645261B/zh
Priority to CN201780051936.9A priority patent/CN109643069B/zh
Publication of JP2018036425A publication Critical patent/JP2018036425A/ja
Publication of JP2018036425A5 publication Critical patent/JP2018036425A5/ja
Application granted granted Critical
Publication of JP6761306B2 publication Critical patent/JP6761306B2/ja
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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2016168546A 2016-08-30 2016-08-30 照明光学系、リソグラフィ装置、及び物品製造方法 Active JP6761306B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2016168546A JP6761306B2 (ja) 2016-08-30 2016-08-30 照明光学系、リソグラフィ装置、及び物品製造方法
KR1020197008164A KR102212855B1 (ko) 2016-08-30 2017-08-28 조명 광학계, 리소그래피 장치, 및 물품 제조 방법
PCT/JP2017/030779 WO2018043423A1 (ja) 2016-08-30 2017-08-28 照明光学系、リソグラフィ装置、及び物品製造方法
TW106129100A TWI645261B (zh) 2016-08-30 2017-08-28 Illumination optical system, lithography apparatus, and article manufacturing method
CN201780051936.9A CN109643069B (zh) 2016-08-30 2017-08-28 照明光学系统、光刻装置以及物品制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016168546A JP6761306B2 (ja) 2016-08-30 2016-08-30 照明光学系、リソグラフィ装置、及び物品製造方法

Publications (3)

Publication Number Publication Date
JP2018036425A JP2018036425A (ja) 2018-03-08
JP2018036425A5 JP2018036425A5 (ko) 2019-10-10
JP6761306B2 true JP6761306B2 (ja) 2020-09-23

Family

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JP2016168546A Active JP6761306B2 (ja) 2016-08-30 2016-08-30 照明光学系、リソグラフィ装置、及び物品製造方法

Country Status (5)

Country Link
JP (1) JP6761306B2 (ko)
KR (1) KR102212855B1 (ko)
CN (1) CN109643069B (ko)
TW (1) TWI645261B (ko)
WO (1) WO2018043423A1 (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7148268B2 (ja) * 2018-05-01 2022-10-05 キヤノン株式会社 制御装置、リソグラフィ装置、および物品の製造方法
TWI700960B (zh) * 2019-05-29 2020-08-01 財團法人國家實驗研究院 光源調控方法、光源系統以及電腦程式產品
JP7446096B2 (ja) * 2019-12-04 2024-03-08 キヤノン株式会社 照明光学系、および物品製造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3440458B2 (ja) * 1993-06-18 2003-08-25 株式会社ニコン 照明装置、パターン投影方法及び半導体素子の製造方法
JP4310816B2 (ja) * 1997-03-14 2009-08-12 株式会社ニコン 照明装置、投影露光装置、デバイスの製造方法、及び投影露光装置の調整方法
JP3259657B2 (ja) * 1997-04-30 2002-02-25 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法
WO1999036832A1 (fr) * 1998-01-19 1999-07-22 Nikon Corporation Dispositif d'eclairement et appareil de sensibilisation
JP2000269114A (ja) 1999-03-16 2000-09-29 Nikon Corp 照明装置、露光装置及び露光方法
US6281967B1 (en) * 2000-03-15 2001-08-28 Nikon Corporation Illumination apparatus, exposure apparatus and exposure method
AU2940600A (en) * 1999-03-24 2000-10-09 Nikon Corporation Exposure method and apparatus
JP2001135560A (ja) * 1999-11-04 2001-05-18 Nikon Corp 照明光学装置、該照明光学装置を備えた露光装置、および該露光装置を用いたマイクロデバイス製造方法
JP4545854B2 (ja) * 1999-11-05 2010-09-15 キヤノン株式会社 投影露光装置
US6919951B2 (en) * 2001-07-27 2005-07-19 Canon Kabushiki Kaisha Illumination system, projection exposure apparatus and device manufacturing method
TW200625027A (en) * 2005-01-14 2006-07-16 Zeiss Carl Smt Ag Illumination system for a microlithographic projection exposure apparatus
JP2010097975A (ja) * 2008-10-14 2010-04-30 Nikon Corp 補正ユニット、照明光学系、露光装置、およびデバイス製造方法

Also Published As

Publication number Publication date
CN109643069B (zh) 2021-07-27
KR20190040294A (ko) 2019-04-17
JP2018036425A (ja) 2018-03-08
CN109643069A (zh) 2019-04-16
TW201820045A (zh) 2018-06-01
WO2018043423A1 (ja) 2018-03-08
KR102212855B1 (ko) 2021-02-05
TWI645261B (zh) 2018-12-21

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