JP6751437B2 - 物体を保持し、位置付け、かつ/又は動かすための装置、及び、物体を保持し、位置付け、かつ/又は動かすための装置を動作させる方法 - Google Patents
物体を保持し、位置付け、かつ/又は動かすための装置、及び、物体を保持し、位置付け、かつ/又は動かすための装置を動作させる方法 Download PDFInfo
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- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
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- F16C32/00—Bearings not otherwise provided for
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- H01L21/67011—Apparatus for manufacture or treatment
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- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67736—Loading to or unloading from a conveyor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67784—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations using air tracks
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
- H02K41/02—Linear motors; Sectional motors
- H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
- H02K41/031—Synchronous motors; Motors moving step by step; Reluctance motors of the permanent magnet type
- H02K41/033—Synchronous motors; Motors moving step by step; Reluctance motors of the permanent magnet type with armature and magnets on one member, the other member being a flux distributor
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K7/00—Arrangements for handling mechanical energy structurally associated with dynamo-electric machines, e.g. structural association with mechanical driving motors or auxiliary dynamo-electric machines
- H02K7/08—Structural association with bearings
- H02K7/09—Structural association with bearings with magnetic bearings
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K2201/00—Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
- H02K2201/18—Machines moving with multiple degrees of freedom
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Description
Claims (13)
- 物体を保持すること、位置付けること、及び動かすことのうちの少なくとも1つのための装置であって、
ベース(30)、及び、前記ベース(30)に対して移動可能なキャリア(50)と、
少なくとも3つの磁気軸受であって、前記キャリアが少なくとも1つの所定の方向(2)に関して変位しうるように、前記キャリア(50)が、前記磁気軸受によって前記ベース(30)のところで非接触で保持され、前記磁気軸受(10)のうちの少なくとも2つが、能動的に制御可能な磁気軸受として構成され、前記キャリア(50)が、少なくとも、基本振動数(f0)での振動を生じさせられうる、少なくとも3つの磁気軸受と、
少なくとも1つの機械的制振ユニットであって、前記キャリア(50)に固定され、前記能動的に制御可能な磁気軸受によって昂進された、前記キャリアの振動を減衰するように構成され、かつ、少なくとも0.1の減衰比Dを有する、少なくとも1つの機械的制振ユニットとを有し、
前記少なくとも1つの機械的制振ユニットが、可動に搭載された制振質量を有し、かつ前記キャリア(50)の基本振動数(f0)の2倍から8倍の吸収装置固有振動数(Tf0)を有する、振動吸収装置である装置。 - 物体を保持すること、位置付けること、及び動かすことのうちの少なくとも1つのための装置であって、
ベース(30)、及び、前記ベース(30)に対して移動可能なキャリア(50)と、
前記キャリアが搬送方向に変位しうるように、前記ベース(30)のところで前記キャリアを(50)非接触で保持するための磁気軸受(10)であって、前記磁気軸受(10)のうちの少なくとも2つは、能動的に制御可能な磁気軸受として構成される、磁気軸受(10)と、
前記キャリア(50)に固定され、前記能動的に制御可能な磁気軸受によって昂進された、前記キャリアの振動を減衰するように構成された少なくとも1つの制震ユニット(100)、又は前記ベース(30)に固定され、前記能動的に制御可能な磁気軸受によって昂進された、前記ベースの振動を減衰するように構成された、少なくとも1つの制振ユニット(100)とを有し、
前記少なくとも1つの制振ユニット(100)が可動に搭載された制振質量(112)を有し、かつ前記キャリア(50)の基本振動数(f0)の2倍から8倍の吸収装置固有振動数(Tf0)を有する振動吸収装置である、装置。 - 前記制振ユニット(100)が、前記ベース(30)に、特に、能動的に制御可能な磁気軸受から50cm以下の距離のところで固定される、請求項2に記載の装置。
- 前記制振ユニット(100)がハウジング(102)を有し、前記ハウジングの内部(104)に前記制振質量(112)が配置される、請求項1から3のいずれか一項に記載の装置。
- 前記制振質量(112)が前記ハウジング(102)に対して移動可能に装着される、請求項4に記載の装置。
- 前記制振質量(112)の前記ハウジング(102)への装着が、弾性圧縮可能な制振要素(130)と弾性変形可能な装着要素(140)の少なくとも一方を有する、請求項4または5に記載の装置。
- 前記制振質量(112)が、前記ハウジング(102)の内側壁から距離を保って配置され、前記制振質量(112)と前記内側壁との間の空間に、弾性圧縮可能な制振要素(130)が配置され、前記弾性圧縮可能な制振要素(130)が、非圧縮の初期状態では、前記内側壁と前記制振質量(112)との間の前記距離を上回るか又は前記距離に等しい、外法寸法を有する、請求項4から6のいずれか一項に記載の装置。
- 複数の制振ユニット(100)が、前記キャリア(50)と前記ベース(30)の少なくとも一方に空間的に分布している、請求項1から7のいずれか一項に記載の装置。
- 前記能動的に制御可能な磁気軸受は各々、電気的に制御可能であり、かつ相対部品(18)と磁気的に相互作用する、電磁アクチュエータ(12)を有し、前記電磁アクチュエータ(12)が、前記ベース(30)と前記キャリア(50)との間に特定の距離(26)を維持するよう、電子部品ユニット(15)によって能動的に制御されることが可能である、請求項1から8のいずれか一項に記載の装置。
- 物体を保持すること、位置付けること、及び動かすことのうちの少なくとも1つのための装置のベースであって、
ベース本体と、
キャリアが前記ベース本体に対して搬送方向に変位可能であるように前記ベース本体のところで前記キャリア(50)を非接触で保持するために、前記ベース本体に配置された、能動的に制御可能な磁気軸受の少なくとも2つの電磁アクチュエータと、
前記ベース本体に固定され、前記能動的に制御可能な磁気軸受によって昂進された、前記ベースの振動を減衰するように構成された少なくとも1つの制振ユニット(100)とを備え、
前記少なくとも1つの制振ユニット(100)が、可動に搭載された制振質量(112)を有し、かつ前記キャリア(50)の基本振動数(f0)の2倍から8倍の吸収装置固有振動数(Tf0)を有する、振動吸収装置である、装置。 - 回転モジュールであって、
真空チャンバと、
前記真空チャンバ内に回転可能に装着されるロータであって、ベースを備えるロータとを備え、前記ベースは、
ベース本体と、
キャリアが前記ベース本体に対して搬送方向に変位可能であるように前記ベース本体のところで前記キャリア(50)を非接触で保持するために、前記ベース本体に配置された、能動的に制御可能な磁気軸受の少なくとも2つの電磁アクチュエータと、
前記ベース本体に固定された少なくとも1つの制振ユニット(100)とを含む、
回転モジュール。 - 物体を保持すること、位置付けること、及び動かすことのうちの少なくとも1つのための装置を動作させる方法であって、
ベースのところでキャリアを非接触で保持するよう、少なくとも2つの磁気軸受を能動的に制御することと、
前記キャリアに固定された少なくとも1つの制振ユニットを用いて、前記能動的に制御可能な磁気軸受によって昂進された前記キャリアの振動を減衰させることとを含み、
前記少なくとも1つの制振ユニットが、可動に搭載された制振質量を有し、かつ前記キャリア(50)の基本振動数(f0)の2倍から8倍の吸収装置固有振動数(Tf0)を有する、振動吸収装置である
方法。 - 物体を保持すること、位置付けること、及び動かすことのうちの少なくとも1つのための装置を動作させる方法であって、
ベースのところでキャリアを非接触で保持するよう、少なくとも2つの磁気軸受を能動的に制御することと、
前記ベースに固定された少なくとも1つの制振ユニットを用いて、前記能動的に制御可能な磁気軸受によって昂進された前記ベースの振動を減衰させることとを含み、
前記少なくとも1つの制振ユニットが、可動に搭載された制振質量を有し、かつ前記キャリア(50)の基本振動数(f0)の2倍から8倍の吸収装置固有振動数(Tf0)を有する、振動吸収装置である
方法。
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DE102017002542.8 | 2017-03-16 | ||
DE102017002542.8A DE102017002542A1 (de) | 2017-03-16 | 2017-03-16 | Vorrichtung zum Halten, Positionieren und/oder Bewegen eines Objekts |
PCT/EP2017/071651 WO2018166640A1 (en) | 2017-03-16 | 2017-08-29 | Apparatus for holding, positioning and/or moving an object and method of operating an apparatus for holding, positioning and/or moving an object |
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KR (1) | KR102126341B1 (ja) |
CN (1) | CN108886008B (ja) |
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KR102519583B1 (ko) * | 2018-10-18 | 2023-04-10 | 어플라이드 머티어리얼스, 인코포레이티드 | 평면형 대상물을 운반하기 위한 캐리어, 캐리어를 이송하기 위한 이송 시스템, 캐리어를 비접촉식으로 이송하는 방법, 및 코팅된 기판을 생산하는 방법 |
CN113169105A (zh) * | 2018-12-21 | 2021-07-23 | 应用材料公司 | 磁悬浮系统、用于磁悬浮系统的载体、真空系统以及运输载体的方法 |
WO2020177842A1 (en) * | 2019-03-01 | 2020-09-10 | Applied Materials, Inc. | Magnetic levitation system, carrier for a magnetic levitation system, and method of operating a magnetic levitation system |
CN113053714B (zh) * | 2019-12-27 | 2024-03-08 | 中微半导体设备(上海)股份有限公司 | 真空处理系统、基台的驱动装置及其控制方法 |
WO2021223840A1 (en) * | 2020-05-04 | 2021-11-11 | Applied Materials, Inc. | Transport system for moving a device in a vacuum processing system, substrate processing system comprising the same, and method of operating a transport system |
CN112267593A (zh) * | 2020-11-24 | 2021-01-26 | 金陵科技学院 | 一种永磁悬浮主动驱动质量装置 |
CN112943849A (zh) * | 2021-02-03 | 2021-06-11 | 中国人民解放军国防科技大学 | 一种复合隔振装置及振动试验平台 |
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US2977043A (en) * | 1958-12-11 | 1961-03-28 | Gen Electric | Hermetic compressor unit mounting means |
FR2379732A1 (fr) * | 1977-02-04 | 1978-09-01 | Europ Propulsion | Dispositif de stabilisation horizontale d'une masse a support inertiel vertical |
AT382299B (de) * | 1983-08-01 | 1987-02-10 | Haas Franz Waffelmasch | Vorrichtung zur herstellung von waffelbloecken |
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2017
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- 2017-08-29 JP JP2018516839A patent/JP6751437B2/ja active Active
- 2017-08-29 WO PCT/EP2017/071651 patent/WO2018166640A1/en active Application Filing
- 2017-08-29 CN CN201780005260.XA patent/CN108886008B/zh active Active
- 2017-08-29 US US15/762,052 patent/US11139759B2/en active Active
- 2017-08-29 KR KR1020187010754A patent/KR102126341B1/ko active IP Right Grant
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2018
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WO2018166640A1 (en) | 2018-09-20 |
CN108886008B (zh) | 2022-02-22 |
JP2020186815A (ja) | 2020-11-19 |
DE102017002542A1 (de) | 2018-09-20 |
US20200244192A1 (en) | 2020-07-30 |
TW201835465A (zh) | 2018-10-01 |
US11139759B2 (en) | 2021-10-05 |
JP2019512064A (ja) | 2019-05-09 |
KR102126341B1 (ko) | 2020-06-24 |
CN108886008A (zh) | 2018-11-23 |
KR20180116222A (ko) | 2018-10-24 |
TWI672444B (zh) | 2019-09-21 |
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