JP6735693B2 - ステージ装置、及び荷電粒子線装置 - Google Patents

ステージ装置、及び荷電粒子線装置 Download PDF

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Publication number
JP6735693B2
JP6735693B2 JP2017034274A JP2017034274A JP6735693B2 JP 6735693 B2 JP6735693 B2 JP 6735693B2 JP 2017034274 A JP2017034274 A JP 2017034274A JP 2017034274 A JP2017034274 A JP 2017034274A JP 6735693 B2 JP6735693 B2 JP 6735693B2
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Japan
Prior art keywords
moving
stage
stator
moving mechanism
motor
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JP2017034274A
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English (en)
Japanese (ja)
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JP2018142405A (ja
JP2018142405A5 (enExample
Inventor
宗大 高橋
宗大 高橋
水落　真樹
真樹 水落
中川　周一
周一 中川
渡部　成夫
成夫 渡部
博紀 小川
博紀 小川
孝宜 加藤
孝宜 加藤
西岡　明
明 西岡
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Hitachi High Tech Corp
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Hitachi High Tech Corp
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Publication date
Application filed by Hitachi High Tech Corp filed Critical Hitachi High Tech Corp
Priority to JP2017034274A priority Critical patent/JP6735693B2/ja
Priority to US15/902,639 priority patent/US10366912B2/en
Priority to TW107105959A priority patent/TWI667682B/zh
Publication of JP2018142405A publication Critical patent/JP2018142405A/ja
Publication of JP2018142405A5 publication Critical patent/JP2018142405A5/ja
Application granted granted Critical
Publication of JP6735693B2 publication Critical patent/JP6735693B2/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20278—Motorised movement

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2017034274A 2017-02-27 2017-02-27 ステージ装置、及び荷電粒子線装置 Active JP6735693B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2017034274A JP6735693B2 (ja) 2017-02-27 2017-02-27 ステージ装置、及び荷電粒子線装置
US15/902,639 US10366912B2 (en) 2017-02-27 2018-02-22 Stage apparatus and charged particle beam apparatus
TW107105959A TWI667682B (zh) 2017-02-27 2018-02-22 Platform device and charged particle beam device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017034274A JP6735693B2 (ja) 2017-02-27 2017-02-27 ステージ装置、及び荷電粒子線装置

Publications (3)

Publication Number Publication Date
JP2018142405A JP2018142405A (ja) 2018-09-13
JP2018142405A5 JP2018142405A5 (enExample) 2019-08-22
JP6735693B2 true JP6735693B2 (ja) 2020-08-05

Family

ID=63246502

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017034274A Active JP6735693B2 (ja) 2017-02-27 2017-02-27 ステージ装置、及び荷電粒子線装置

Country Status (3)

Country Link
US (1) US10366912B2 (enExample)
JP (1) JP6735693B2 (enExample)
TW (1) TWI667682B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10600614B2 (en) * 2017-09-29 2020-03-24 Hitachi High-Technologies Corporation Stage device and charged particle beam device
JP7114450B2 (ja) * 2018-12-04 2022-08-08 株式会社日立ハイテク ステージ装置、及び荷電粒子線装置
KR102409486B1 (ko) * 2020-04-21 2022-06-16 (주)하드램 마이크로 엘이디 제조 장치
JP2023159700A (ja) * 2022-04-20 2023-11-01 株式会社日立ハイテク ステージ装置、荷電粒子線装置、及び光学式検査装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003045785A (ja) 2001-08-01 2003-02-14 Nikon Corp ステージ装置及び露光装置、並びにデバイス製造方法
JP2004172557A (ja) * 2002-11-22 2004-06-17 Canon Inc ステージ装置及びその制御方法
JP4362862B2 (ja) * 2003-04-01 2009-11-11 株式会社ニコン ステージ装置及び露光装置
JP2004356222A (ja) * 2003-05-27 2004-12-16 Canon Inc ステージ装置及びその制御方法、露光装置、並びにデバイス製造方法
KR101119814B1 (ko) * 2004-06-07 2012-03-06 가부시키가이샤 니콘 스테이지 장치, 노광 장치 및 노광 방법
US7557529B2 (en) * 2005-01-11 2009-07-07 Nikon Corporation Stage unit and exposure apparatus
US8355114B2 (en) 2009-06-19 2013-01-15 Nikon Corporation Exposure apparatus and device manufacturing method
JP5849955B2 (ja) * 2010-09-07 2016-02-03 株式会社ニコン 移動体装置、露光装置、露光方法、フラットパネルディスプレイの製造方法、及びデバイス製造方法
US8988655B2 (en) 2010-09-07 2015-03-24 Nikon Corporation Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method
JP2013214028A (ja) * 2012-04-04 2013-10-17 Nikon Corp 露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
JP2013244691A (ja) * 2012-05-28 2013-12-09 Asahi Glass Co Ltd 防曇性物品
US10802407B2 (en) * 2015-09-30 2020-10-13 Nikon Corporation Exposure apparatus, exposure method, manufacturing method of flat-panel display, and device manufacturing method

Also Published As

Publication number Publication date
TW201842525A (zh) 2018-12-01
JP2018142405A (ja) 2018-09-13
TWI667682B (zh) 2019-08-01
US10366912B2 (en) 2019-07-30
US20180247855A1 (en) 2018-08-30

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