TWI667682B - Platform device and charged particle beam device - Google Patents

Platform device and charged particle beam device Download PDF

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Publication number
TWI667682B
TWI667682B TW107105959A TW107105959A TWI667682B TW I667682 B TWI667682 B TW I667682B TW 107105959 A TW107105959 A TW 107105959A TW 107105959 A TW107105959 A TW 107105959A TW I667682 B TWI667682 B TW I667682B
Authority
TW
Taiwan
Prior art keywords
moving
stator
moving mechanism
platform
motor
Prior art date
Application number
TW107105959A
Other languages
English (en)
Chinese (zh)
Other versions
TW201842525A (zh
Inventor
高橋宗大
水落真樹
中川周一
渡部成夫
小川博紀
加藤孝宜
西岡明
Original Assignee
日商日立全球先端科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日立全球先端科技股份有限公司 filed Critical 日商日立全球先端科技股份有限公司
Publication of TW201842525A publication Critical patent/TW201842525A/zh
Application granted granted Critical
Publication of TWI667682B publication Critical patent/TWI667682B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20278—Motorised movement

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW107105959A 2017-02-27 2018-02-22 Platform device and charged particle beam device TWI667682B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017034274A JP6735693B2 (ja) 2017-02-27 2017-02-27 ステージ装置、及び荷電粒子線装置
JP2017-034274 2017-02-27

Publications (2)

Publication Number Publication Date
TW201842525A TW201842525A (zh) 2018-12-01
TWI667682B true TWI667682B (zh) 2019-08-01

Family

ID=63246502

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107105959A TWI667682B (zh) 2017-02-27 2018-02-22 Platform device and charged particle beam device

Country Status (3)

Country Link
US (1) US10366912B2 (enExample)
JP (1) JP6735693B2 (enExample)
TW (1) TWI667682B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10600614B2 (en) * 2017-09-29 2020-03-24 Hitachi High-Technologies Corporation Stage device and charged particle beam device
JP7114450B2 (ja) * 2018-12-04 2022-08-08 株式会社日立ハイテク ステージ装置、及び荷電粒子線装置
KR102409486B1 (ko) * 2020-04-21 2022-06-16 (주)하드램 마이크로 엘이디 제조 장치
JP2023159700A (ja) * 2022-04-20 2023-11-01 株式会社日立ハイテク ステージ装置、荷電粒子線装置、及び光学式検査装置

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1422571A2 (en) * 2002-11-22 2004-05-26 Canon Kabushiki Kaisha Stage apparatus and method of controlling the same
EP1610362A1 (en) * 2003-04-01 2005-12-28 Nikon Corporation Stage device, exposure deice, and method of producing device
US7081950B2 (en) * 2003-05-27 2006-07-25 Canon Kabushiki Kaisha Stage device and control method therefor, exposure apparatus, and device manufacturing method
US20070103660A1 (en) * 2005-01-11 2007-05-10 Nikon Corporation Stage unit and exposure apparatus
TW201120581A (en) * 2009-06-19 2011-06-16 Nikon Corp Exposure apparatus and device manufacturing method
WO2012032768A1 (ja) * 2010-09-07 2012-03-15 株式会社ニコン 移動体装置、露光装置、露光方法、フラットパネルディスプレイの製造方法、及びデバイス製造方法
TW201216014A (en) * 2010-09-07 2012-04-16 Nikon Corp Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003045785A (ja) 2001-08-01 2003-02-14 Nikon Corp ステージ装置及び露光装置、並びにデバイス製造方法
KR101119814B1 (ko) * 2004-06-07 2012-03-06 가부시키가이샤 니콘 스테이지 장치, 노광 장치 및 노광 방법
JP2013214028A (ja) * 2012-04-04 2013-10-17 Nikon Corp 露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
JP2013244691A (ja) * 2012-05-28 2013-12-09 Asahi Glass Co Ltd 防曇性物品
US10802407B2 (en) * 2015-09-30 2020-10-13 Nikon Corporation Exposure apparatus, exposure method, manufacturing method of flat-panel display, and device manufacturing method

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1422571A2 (en) * 2002-11-22 2004-05-26 Canon Kabushiki Kaisha Stage apparatus and method of controlling the same
EP1610362A1 (en) * 2003-04-01 2005-12-28 Nikon Corporation Stage device, exposure deice, and method of producing device
US7081950B2 (en) * 2003-05-27 2006-07-25 Canon Kabushiki Kaisha Stage device and control method therefor, exposure apparatus, and device manufacturing method
US20070103660A1 (en) * 2005-01-11 2007-05-10 Nikon Corporation Stage unit and exposure apparatus
TW201120581A (en) * 2009-06-19 2011-06-16 Nikon Corp Exposure apparatus and device manufacturing method
WO2012032768A1 (ja) * 2010-09-07 2012-03-15 株式会社ニコン 移動体装置、露光装置、露光方法、フラットパネルディスプレイの製造方法、及びデバイス製造方法
TW201216014A (en) * 2010-09-07 2012-04-16 Nikon Corp Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method

Also Published As

Publication number Publication date
JP6735693B2 (ja) 2020-08-05
TW201842525A (zh) 2018-12-01
JP2018142405A (ja) 2018-09-13
US10366912B2 (en) 2019-07-30
US20180247855A1 (en) 2018-08-30

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