JP6703287B2 - シリルアセタール、オリゴシロキサン、及びそれらの製造方法 - Google Patents

シリルアセタール、オリゴシロキサン、及びそれらの製造方法 Download PDF

Info

Publication number
JP6703287B2
JP6703287B2 JP2018504480A JP2018504480A JP6703287B2 JP 6703287 B2 JP6703287 B2 JP 6703287B2 JP 2018504480 A JP2018504480 A JP 2018504480A JP 2018504480 A JP2018504480 A JP 2018504480A JP 6703287 B2 JP6703287 B2 JP 6703287B2
Authority
JP
Japan
Prior art keywords
carbon atoms
group
hydrocarbon group
oligosiloxane
structure represented
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2018504480A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2017154848A1 (ja
Inventor
松本　和弘
和弘 松本
島田　茂
茂 島田
佐藤　一彦
一彦 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
National Institute of Advanced Industrial Science and Technology AIST
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Institute of Advanced Industrial Science and Technology AIST filed Critical National Institute of Advanced Industrial Science and Technology AIST
Publication of JPWO2017154848A1 publication Critical patent/JPWO2017154848A1/ja
Priority to JP2019195624A priority Critical patent/JP6938048B2/ja
Application granted granted Critical
Publication of JP6703287B2 publication Critical patent/JP6703287B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
    • C07B61/00—Other general methods

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
JP2018504480A 2016-03-09 2017-03-06 シリルアセタール、オリゴシロキサン、及びそれらの製造方法 Active JP6703287B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2019195624A JP6938048B2 (ja) 2016-03-09 2019-10-28 オリゴシロキサン、及びシリルアセタールからのオリゴシロキサンの製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016045337 2016-03-09
JP2016045337 2016-03-09
PCT/JP2017/008836 WO2017154848A1 (ja) 2016-03-09 2017-03-06 シリルアセタール、オリゴシロキサン、及びそれらの製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2019195624A Division JP6938048B2 (ja) 2016-03-09 2019-10-28 オリゴシロキサン、及びシリルアセタールからのオリゴシロキサンの製造方法

Publications (2)

Publication Number Publication Date
JPWO2017154848A1 JPWO2017154848A1 (ja) 2019-02-21
JP6703287B2 true JP6703287B2 (ja) 2020-06-03

Family

ID=59790575

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2018504480A Active JP6703287B2 (ja) 2016-03-09 2017-03-06 シリルアセタール、オリゴシロキサン、及びそれらの製造方法
JP2019195624A Active JP6938048B2 (ja) 2016-03-09 2019-10-28 オリゴシロキサン、及びシリルアセタールからのオリゴシロキサンの製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2019195624A Active JP6938048B2 (ja) 2016-03-09 2019-10-28 オリゴシロキサン、及びシリルアセタールからのオリゴシロキサンの製造方法

Country Status (2)

Country Link
JP (2) JP6703287B2 (https=)
WO (1) WO2017154848A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE112018001105B4 (de) * 2017-03-02 2024-12-05 National Institute Of Advanced Industrial Science And Technology Herstellungsverfahren für ein Oligosiloxan
JP7190770B2 (ja) * 2017-12-04 2022-12-16 国立研究開発法人産業技術総合研究所 シロキサンの製造方法
CN113150025B (zh) * 2021-03-09 2023-01-03 南方科技大学 一种硅中心手性硅氧化合物及其制备方法
JP7486907B2 (ja) 2021-07-09 2024-05-20 信越化学工業株式会社 オルガノポリシロキサン及びその製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2731485A (en) * 1949-07-26 1956-01-17 Union Carbide & Carbon Corp Polysiloxanes produced by the reaction of dialkyldialkoxysilanes in the presence of aluminum or boron halides
JPS51137798A (en) * 1975-05-23 1976-11-27 Shin Etsu Chem Co Ltd Foam controller for preparing polyurethane foams
US4077993A (en) * 1977-04-27 1978-03-07 Olin Corporation Method for the preparation of alkoxysilane cluster compounds
JPS5622712A (en) * 1979-07-31 1981-03-03 Shin Etsu Chem Co Ltd Hair cosmetic
JPS5747764A (en) * 1980-08-30 1982-03-18 Dainichi Nippon Cables Ltd Composition changeable to ceramic at high temperature
JP3206384B2 (ja) * 1995-08-01 2001-09-10 信越化学工業株式会社 アルコキシシロキサンの製造方法
JP4180417B2 (ja) * 2003-03-27 2008-11-12 信越化学工業株式会社 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜、及び半導体装置
JP2010052986A (ja) * 2008-08-28 2010-03-11 Chromanik Technologies Inc 表面処理されたシリカ及びその製造方法
DE102009002075A1 (de) * 2009-04-01 2010-10-07 Wacker Chemie Ag Verfahren zur Herstellung von Kohlenwasserstoffoxysiliciumverbindungen
JP6015949B2 (ja) * 2013-05-02 2016-10-26 国立研究開発法人産業技術総合研究所 シロキサン製造法

Also Published As

Publication number Publication date
JP6938048B2 (ja) 2021-09-22
JP2020012007A (ja) 2020-01-23
WO2017154848A1 (ja) 2017-09-14
JPWO2017154848A1 (ja) 2019-02-21

Similar Documents

Publication Publication Date Title
JP6938048B2 (ja) オリゴシロキサン、及びシリルアセタールからのオリゴシロキサンの製造方法
KR101710043B1 (ko) 하이드로실릴화 촉매
JP6621226B2 (ja) シロキサン及びその製造方法
CN107922442B (zh) 具有(甲基)丙烯酸酯基团的有机硅化合物及用于制备其的方法
JP2018165261A (ja) ボロシロキサンの製造方法
CN104470935B (zh) 氧杂环硅烷及其制备方法
JP6167936B2 (ja) 環状シラザン化合物の製造方法
JP6264309B2 (ja) シロキシ基を有するビスシリルエタン化合物及びその製造方法
EP3015471A1 (en) Novel bisalkoxysilane compound and its production method
JP6598406B2 (ja) イリジウム錯体等を用いたアリル化合物のヒドロシリル化によるシリル化合物の製造方法
JP7178105B2 (ja) オルガノシロキサン及びオルガノシロキサンの製造方法
JP2016040233A (ja) ビシクロアミノオルガノキシシラン化合物及びその製造方法
JP6842621B2 (ja) 反応性置換基を有するシルセスキオキサンの製造方法
JP3137439B2 (ja) １−アザ−２−シラシクロブタン化合物及びその製造法
JP7190770B2 (ja) シロキサンの製造方法
JP4801135B2 (ja) アミノアルキルシランの製造方法
JP2002012597A (ja) 有機ケイ素化合物
JP7016149B2 (ja) シロキサンの製造方法
JPWO2018101416A1 (ja) イオウ含有有機ケイ素化合物の製造方法
JP2019073473A (ja) 錯体化合物及びシロキサンの製造方法
JP6720913B2 (ja) 不飽和結合含有ビスシリル化合物およびその製造方法
US9139603B2 (en) [3-(2-norbornyl)-2-norbornyl]silane compound and making method
JP2016138086A (ja) 第３級アルキルシラン及び第３級アルキルアルコキシシランの製造方法
JP2020083825A (ja) 含窒素環状オルガノキシシラン化合物およびその製造方法
JP2016084314A (ja) Ｎ−シリルピペラジンの製造方法

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20180723

AA64 Notification of invalidation of claim of internal priority (with term)

Free format text: JAPANESE INTERMEDIATE CODE: A241764

Effective date: 20181009

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20181106

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20181207

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20181207

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20181207

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20180725

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20190716

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20190912

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20191028

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20200324

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20200420

R150 Certificate of patent or registration of utility model

Ref document number: 6703287

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250