JP6691075B2 - オプトエレクトロニクス半導体チップおよびその製造方法 - Google Patents
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- 239000004065 semiconductor Substances 0.000 title claims description 192
- 230000005693 optoelectronics Effects 0.000 title claims description 96
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- 239000000463 material Substances 0.000 claims description 29
- 230000015556 catabolic process Effects 0.000 claims description 25
- -1 nitride compound Chemical class 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 10
- 229910052594 sapphire Inorganic materials 0.000 claims description 7
- 239000010980 sapphire Substances 0.000 claims description 7
- 239000012159 carrier gas Substances 0.000 claims description 5
- 239000002243 precursor Substances 0.000 claims description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 3
- RGGPNXQUMRMPRA-UHFFFAOYSA-N triethylgallium Chemical compound CC[Ga](CC)CC RGGPNXQUMRMPRA-UHFFFAOYSA-N 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 229910002601 GaN Inorganic materials 0.000 description 9
- 230000006378 damage Effects 0.000 description 8
- 230000006399 behavior Effects 0.000 description 7
- 230000005855 radiation Effects 0.000 description 5
- 230000005670 electromagnetic radiation Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000002800 charge carrier Substances 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- 230000006798 recombination Effects 0.000 description 2
- 238000005215 recombination Methods 0.000 description 2
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 2
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000013139 quantization Methods 0.000 description 1
- 239000002096 quantum dot Substances 0.000 description 1
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Description
本特許出願は、独国特許出願第102009060750.1号の優先権を主張し、この文書の開示内容は参照によって本出願に組み込まれている。
Claims (11)
- オプトエレクトロニクス半導体チップ(100)であって、
− 多数のマイクロダイオード(11)を有する第1の半導体積層体(1)と、
− 活性領域(12)を有する第2の半導体積層体(2)と、
を備えており、
− 前記第1の半導体積層体(1)および前記第2の半導体積層体(2)が、窒化物化合物半導体材料をベースとしており、
− 前記第1の半導体積層体(1)が、成長方向において前記第2の半導体積層体(2)の前に配置されており、
− 前記マイクロダイオード(11)が、前記活性領域(12)のためのESD保護部を形成しており、
− 前記マイクロダイオード(11)の少なくとも1つがpn接合を備えており、
− 前記活性領域(12)が少なくとも1つのpn接合を備えており、
− 前記マイクロダイオード(11)の前記pn接合と、前記活性領域(12)の前記pn接合とが、同じ方向にバイアスされており、
− 前記マイクロダイオード(11)の前記pn接合が、前記活性領域(12)の前記pn接合よりも高い順方向しきい値電圧(UF)、を有する、
オプトエレクトロニクス半導体チップ(100)。 - 前記マイクロダイオード(11)はそれぞれV字凹部によって形成され、
前記マイクロダイオード(11)の少なくとも50%の降伏電圧は、前記マイクロダイオード(11)の降伏電圧の平均値から±25%の範囲内にある、
請求項1に記載のオプトエレクトロニクス半導体チップ(100)。 - − 前記マイクロダイオード(11)の密度が、少なくとも5×107/cm2である、
請求項1または2に記載のオプトエレクトロニクス半導体チップ(100)。 - − ESD層(9)が、前記活性領域(12)の厚さの少なくとも1/2、最大で3倍の厚さを有する、
請求項1〜3の何れか1項に記載のオプトエレクトロニクス半導体チップ(100)。 - − ESD電圧パルス(4)が、前記マイクロダイオード(11)の逆方向において、前記マイクロダイオード(11)の少なくとも50%を流れる、
請求項1〜4の何れか1項に記載のオプトエレクトロニクス半導体チップ(100)。 - − 前記マイクロダイオード(11)の少なくとも75%が、それぞれ、貫通転位(3)の領域に配置されている、
請求項1〜5の何れか1項に記載のオプトエレクトロニクス半導体チップ(100)。 - − 前記第2の半導体積層体(2)が、前記第1の半導体積層体(1)に直接続いている、
請求項1〜6の何れか1項に記載のオプトエレクトロニクス半導体チップ(100)。 - 動作時に青色光もしくは緑色光またはその両方を放出する、
請求項1〜7の何れか1項に記載のオプトエレクトロニクス半導体チップ(100)。 - オプトエレクトロニクス半導体チップ(100)の製造方法であって、
− 成長基板(7)を形成するステップと、
− 第1の半導体積層体(1)をエピタキシャルに堆積させるステップと、
− 前記第1の半導体積層体(1)の上に第2の半導体積層体(2)をエピタキシャルに堆積させるステップと、
を含んでおり、
− 前記第1の半導体積層体(1)がESD層(9)を備えており、前記ESD層(9)が、前記ESD層(9)内にV字凹部が形成される成長温度、において堆積され、
− 前記第2の半導体積層体(2)が活性領域(12)を備えており、
− 前記ESD層(9)がGaNをベースとしており、
− 前記ESD層(9)は、キャリアガスとして窒素を用いトリエチルガリウム前駆体を使用することによって、900℃以下の成長温度で成長させられる、
方法。 - 前記成長基板(7)が、サファイアを含んでいる、またはサファイアからなる、
請求項9に記載の方法。 - 請求項1から請求項8のいずれかに記載のオプトエレクトロニクス半導体チップ(100)が製造される、
請求項9または10に記載の方法。
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DE102009060750A DE102009060750A1 (de) | 2009-12-30 | 2009-12-30 | Optoelektronischer Halbleiterchip und Verfahren zu dessen Herstellung |
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KR (2) | KR101913631B1 (ja) |
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DE102009060750A1 (de) | 2009-12-30 | 2011-07-07 | OSRAM Opto Semiconductors GmbH, 93055 | Optoelektronischer Halbleiterchip und Verfahren zu dessen Herstellung |
DE102011012928A1 (de) * | 2011-03-03 | 2012-09-06 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung eines Dünnfilm-Halbleiterkörpers und Dünnfilm-Halbleiterkörper |
DE102011100037A1 (de) | 2011-04-29 | 2012-10-31 | Osram Opto Semiconductors Gmbh | Strahlung emittierender Halbleiterchip mit integriertem ESD-Schutz |
DE102012101718A1 (de) * | 2012-03-01 | 2013-09-05 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip |
DE102012217640B4 (de) | 2012-09-27 | 2020-02-20 | Osram Opto Semiconductors Gmbh | Optoelektronisches Bauelement und Verfahren zu seiner Herstellung |
WO2014065019A1 (ja) * | 2012-10-22 | 2014-05-01 | シャープ株式会社 | 窒化物半導体発光素子 |
DE102013103601A1 (de) * | 2013-04-10 | 2014-10-16 | Osram Opto Semiconductors Gmbh | Optoelektronisches Bauelement und Verfahren zur Herstellung eines optoelektronischen Bauelements |
DE102013103602A1 (de) | 2013-04-10 | 2014-10-16 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip und Verfahren zu seiner Herstellung |
DE102013104272A1 (de) | 2013-04-26 | 2014-10-30 | Osram Opto Semiconductors Gmbh | Optoelektronisches Bauelement und Verfahren zu seiner Herstellung |
DE102013110041B4 (de) | 2013-09-12 | 2023-09-07 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Optoelektronischer Halbleiterchip und optoelektronisches Bauelement |
DE102013112881A1 (de) | 2013-11-21 | 2015-05-21 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip |
KR102142709B1 (ko) * | 2013-12-05 | 2020-08-07 | 엘지이노텍 주식회사 | 발광 소자 및 이를 구비한 조명 장치 |
DE102013226575B4 (de) | 2013-12-19 | 2021-06-24 | Evonik Operations Gmbh | Zusammensetzung, geeignet zur Herstellung von Polyurethanschäumen, enthaltend mindestens einen ungesättigten Fluorkohlenwasserstoff oder ungesättigten Fluorkohlenwasserstoff als Treibmittel, Polyurethanschäume, Verfahren zu deren Herstellung und deren Verwendung |
DE102014102292A1 (de) * | 2014-02-21 | 2015-08-27 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung eines optoelektronischen Bauelements |
CN105161577A (zh) * | 2015-08-11 | 2015-12-16 | 厦门市三安光电科技有限公司 | 发光二极管制作方法 |
CN105742423B (zh) * | 2015-11-30 | 2018-08-31 | 厦门市三安光电科技有限公司 | 发光二极管及其制作方法 |
DE102016101442A1 (de) | 2016-01-27 | 2017-07-27 | Osram Opto Semiconductors Gmbh | Konversionselement und strahlungsemittierendes Halbleiterbauelement mit einem solchen Konversionselement |
DE102016103346A1 (de) * | 2016-02-25 | 2017-08-31 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung eines strahlungsemittierenden Halbleiterchips und strahlungsemittierender Halbleiterchip |
CN106025009B (zh) * | 2016-07-19 | 2018-06-26 | 安徽三安光电有限公司 | 一种发光二极管及其制备方法 |
US10971649B2 (en) | 2017-01-04 | 2021-04-06 | Lg Innotek Co., Ltd. | Semiconductor device and light emitting device package comprising same |
DE102017104370A1 (de) | 2017-03-02 | 2018-09-06 | Osram Opto Semiconductors Gmbh | Halbleiterkörper |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5684309A (en) | 1996-07-11 | 1997-11-04 | North Carolina State University | Stacked quantum well aluminum indium gallium nitride light emitting diodes |
KR100644933B1 (ko) * | 1997-01-09 | 2006-11-15 | 니치아 카가쿠 고교 가부시키가이샤 | 질화물반도체소자 |
US5831277A (en) | 1997-03-19 | 1998-11-03 | Northwestern University | III-nitride superlattice structures |
JP3594826B2 (ja) * | 1999-02-09 | 2004-12-02 | パイオニア株式会社 | 窒化物半導体発光素子及びその製造方法 |
DE19955747A1 (de) | 1999-11-19 | 2001-05-23 | Osram Opto Semiconductors Gmbh | Optische Halbleitervorrichtung mit Mehrfach-Quantentopf-Struktur |
JP3988018B2 (ja) | 2001-01-18 | 2007-10-10 | ソニー株式会社 | 結晶膜、結晶基板および半導体装置 |
JP3616020B2 (ja) | 2001-03-06 | 2005-02-02 | 士郎 酒井 | 窒化ガリウム系半導体装置及びその製造方法 |
JP3909811B2 (ja) * | 2001-06-12 | 2007-04-25 | パイオニア株式会社 | 窒化物半導体素子及びその製造方法 |
US7001791B2 (en) * | 2003-04-14 | 2006-02-21 | University Of Florida | GaN growth on Si using ZnO buffer layer |
JP2008504698A (ja) | 2004-06-30 | 2008-02-14 | オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツング | 発光ダイオード装置、光学式記録装置および少なくとも1つの発光ダイオードをパルス状に作動させる方法 |
US7446345B2 (en) | 2005-04-29 | 2008-11-04 | Cree, Inc. | Light emitting devices with active layers that extend into opened pits |
DE102005025416A1 (de) | 2005-06-02 | 2006-12-14 | Osram Opto Semiconductors Gmbh | Lumineszenzdiodenchip mit einer Kontaktstruktur |
US7535031B2 (en) | 2005-09-13 | 2009-05-19 | Philips Lumiled Lighting, Co. Llc | Semiconductor light emitting device with lateral current injection in the light emitting region |
TWI257186B (en) * | 2005-09-29 | 2006-06-21 | Formosa Epitaxy Inc | Light-emitting diode chip |
JP4895587B2 (ja) | 2005-11-29 | 2012-03-14 | ローム株式会社 | 窒化物半導体発光素子 |
KR100674708B1 (ko) * | 2006-01-12 | 2007-01-25 | 삼성전기주식회사 | 수직구조 질화갈륨계 발광 다이오드 소자 및 그 제조방법 |
JP4882618B2 (ja) * | 2006-09-11 | 2012-02-22 | 三菱化学株式会社 | GaN系半導体発光ダイオードの製造方法 |
JP5050574B2 (ja) | 2007-03-05 | 2012-10-17 | 住友電気工業株式会社 | Iii族窒化物系半導体発光素子 |
TWI377703B (en) * | 2007-05-02 | 2012-11-21 | Showa Denko Kk | Production method of group iii nitride semiconductor light-emitting device |
KR101164026B1 (ko) | 2007-07-12 | 2012-07-18 | 삼성전자주식회사 | 질화물계 반도체 발광소자 및 그 제조방법 |
KR20090030652A (ko) * | 2007-09-20 | 2009-03-25 | 서울옵토디바이스주식회사 | 질화물계 발광소자 |
TWI413279B (zh) * | 2008-06-20 | 2013-10-21 | Toyoda Gosei Kk | Iii族氮化物半導體發光元件及其製造方法、以及燈 |
DE102009060750A1 (de) | 2009-12-30 | 2011-07-07 | OSRAM Opto Semiconductors GmbH, 93055 | Optoelektronischer Halbleiterchip und Verfahren zu dessen Herstellung |
JP2012009695A (ja) * | 2010-06-25 | 2012-01-12 | Showa Denko Kk | 半導体発光素子の製造方法、半導体発光素子、電子機器及び機械装置 |
KR101734558B1 (ko) * | 2011-02-28 | 2017-05-11 | 엘지이노텍 주식회사 | 발광 소자 |
KR20120100056A (ko) * | 2011-03-02 | 2012-09-12 | 엘지이노텍 주식회사 | 발광 소자 |
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EP2519981A1 (de) | 2012-11-07 |
KR101913631B1 (ko) | 2018-11-01 |
KR101798461B1 (ko) | 2017-11-16 |
US20170338217A1 (en) | 2017-11-23 |
CN102687291B (zh) | 2016-03-09 |
JP2013516750A (ja) | 2013-05-13 |
EP2519981B1 (de) | 2017-08-23 |
JP2015181176A (ja) | 2015-10-15 |
US20160020201A1 (en) | 2016-01-21 |
KR20120118027A (ko) | 2012-10-25 |
CN105655356A (zh) | 2016-06-08 |
EP3240049A1 (de) | 2017-11-01 |
KR20170091769A (ko) | 2017-08-09 |
DE102009060750A1 (de) | 2011-07-07 |
CN105655356B (zh) | 2019-03-12 |
TWI443799B (zh) | 2014-07-01 |
TW201133767A (en) | 2011-10-01 |
US10418355B2 (en) | 2019-09-17 |
US9761576B2 (en) | 2017-09-12 |
JP2017224833A (ja) | 2017-12-21 |
US20120319126A1 (en) | 2012-12-20 |
WO2011080219A1 (de) | 2011-07-07 |
EP3240049B1 (de) | 2023-04-12 |
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