JP6687656B2 - 検査装置およびその検査方法 - Google Patents

検査装置およびその検査方法 Download PDF

Info

Publication number
JP6687656B2
JP6687656B2 JP2018051179A JP2018051179A JP6687656B2 JP 6687656 B2 JP6687656 B2 JP 6687656B2 JP 2018051179 A JP2018051179 A JP 2018051179A JP 2018051179 A JP2018051179 A JP 2018051179A JP 6687656 B2 JP6687656 B2 JP 6687656B2
Authority
JP
Japan
Prior art keywords
unit
coating layer
inspection
thickness
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2018051179A
Other languages
English (en)
Japanese (ja)
Other versions
JP2019163985A (ja
Inventor
淑雄 本脇
淑雄 本脇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FANUC Corp
Original Assignee
FANUC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FANUC Corp filed Critical FANUC Corp
Priority to JP2018051179A priority Critical patent/JP6687656B2/ja
Priority to DE102019106555.0A priority patent/DE102019106555B4/de
Priority to US16/353,203 priority patent/US10739273B2/en
Priority to CN202110697365.4A priority patent/CN113432542B/zh
Priority to CN201910208555.8A priority patent/CN110285765B/zh
Publication of JP2019163985A publication Critical patent/JP2019163985A/ja
Application granted granted Critical
Publication of JP6687656B2 publication Critical patent/JP6687656B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/60—Analysis of geometric attributes
    • G06T7/62—Analysis of geometric attributes of area, perimeter, diameter or volume
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G01N2021/8427—Coatings
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/10—Image acquisition modality
    • G06T2207/10141—Special mode during image acquisition
    • G06T2207/10152—Varying illumination
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Pathology (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Quality & Reliability (AREA)
  • Signal Processing (AREA)
  • Mathematical Physics (AREA)
  • Geometry (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP2018051179A 2018-03-19 2018-03-19 検査装置およびその検査方法 Active JP6687656B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2018051179A JP6687656B2 (ja) 2018-03-19 2018-03-19 検査装置およびその検査方法
DE102019106555.0A DE102019106555B4 (de) 2018-03-19 2019-03-14 Untersuchungsvorrichtung und Untersuchungsverfahren
US16/353,203 US10739273B2 (en) 2018-03-19 2019-03-14 Inspection apparatus and inspection method
CN202110697365.4A CN113432542B (zh) 2018-03-19 2019-03-19 检查装置及其检查方法
CN201910208555.8A CN110285765B (zh) 2018-03-19 2019-03-19 检查装置及其检查方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018051179A JP6687656B2 (ja) 2018-03-19 2018-03-19 検査装置およびその検査方法

Publications (2)

Publication Number Publication Date
JP2019163985A JP2019163985A (ja) 2019-09-26
JP6687656B2 true JP6687656B2 (ja) 2020-04-28

Family

ID=67774693

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018051179A Active JP6687656B2 (ja) 2018-03-19 2018-03-19 検査装置およびその検査方法

Country Status (4)

Country Link
US (1) US10739273B2 (zh)
JP (1) JP6687656B2 (zh)
CN (2) CN113432542B (zh)
DE (1) DE102019106555B4 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20210272269A1 (en) * 2018-07-13 2021-09-02 Sony Corporation Control device, control method, and program
CN215574705U (zh) * 2021-05-19 2022-01-18 富泰华工业（深圳）有限公司 检测装置

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0370527B1 (en) 1988-11-24 1994-02-02 Omron Tateisi Electronics Co. Method of and apparatus for inspecting substrate
US6573984B2 (en) * 1998-06-30 2003-06-03 Lj Laboratories Llc Apparatus and method for measuring optical characteristics of teeth
JP2000121338A (ja) * 1998-10-13 2000-04-28 Yamagata Casio Co Ltd 電子部品検査装置
JP4141328B2 (ja) * 2002-08-01 2008-08-27 株式会社リコー 光ディスク検査装置、光ディスク検査方法、光ディスクの製造方法及び光ディスク
CN1318839C (zh) * 2002-11-28 2007-05-30 威光机械工程股份有限公司 印刷电路板上瑕疵组件的自动光学检测方法
US7307736B2 (en) * 2004-03-31 2007-12-11 Mitutoyo Corporation Scale for use with a translation and orientation sensing system
JP2006313147A (ja) 2005-04-08 2006-11-16 Omron Corp 欠陥検査方法およびその方法を用いた欠陥検査装置
US7666259B2 (en) * 2005-08-08 2010-02-23 Cornell Research Foundation, Inc. Screening and crystallization plates for manual and high-throughput protein crystal growth
JP4814187B2 (ja) * 2007-09-11 2011-11-16 株式会社ディスコ チャックテーブルに保持された被加工物の高さ位置検出装置
JP4719284B2 (ja) * 2008-10-10 2011-07-06 トヨタ自動車株式会社 表面検査装置
CN101706450A (zh) * 2009-10-16 2010-05-12 苏州明富自动化设备有限公司 一种光学自动检测设备
CN101706415A (zh) * 2009-10-16 2010-05-12 苏州明富自动化设备有限公司 一种环形光源自动检测设备
JP5421763B2 (ja) * 2009-12-24 2014-02-19 ヤマハ発動機株式会社 検査装置および検査方法
JP5546292B2 (ja) * 2010-03-04 2014-07-09 ヤマハ発動機株式会社 検査装置および検査方法
CN101832941B (zh) * 2010-03-19 2013-03-13 天津大学 一种基于多光谱图像的水果品质评价装置
JP5457384B2 (ja) * 2010-05-21 2014-04-02 東京エレクトロン株式会社 液処理装置及び液処理方法
JP2013531787A (ja) * 2010-05-25 2013-08-08 アリックス インコーポレイテッド 粒子の運動度および／または細胞の分散を求めるためのホログラフィック変動顕微鏡装置および方法
JP2012083211A (ja) * 2010-10-12 2012-04-26 Canon Inc 表面状態検査装置、表面状態検査方法及びプログラム
JP5769572B2 (ja) * 2011-03-30 2015-08-26 株式会社Ｓｃｒｅｅｎホールディングス 基板検査装置および基板検査方法
JP5483629B2 (ja) * 2012-02-29 2014-05-07 東芝テック株式会社 情報処理装置、店舗システム及びプログラム
BR112015001592B1 (pt) * 2012-07-25 2022-07-26 Labrador Diagnostics Llc Método para analisar uma amostra
JP2014083791A (ja) 2012-10-25 2014-05-12 Komori Corp コーティング装置
CN104089582B (zh) * 2014-07-07 2017-03-15 深圳市华星光电技术有限公司 金属膜光学检测装置和检测方法
CN104359861A (zh) * 2014-09-26 2015-02-18 中国石油大学(华东) 一种光干涉气体检测报警装置
CN104501720B (zh) * 2014-12-24 2017-07-14 河海大学常州校区 非接触式物体大小及距离图像测量仪
CN104765042B (zh) * 2015-03-24 2017-09-15 中设设计集团股份有限公司 一种水面目标检测识别系统
JP6531579B2 (ja) * 2015-09-10 2019-06-19 株式会社Sumco ウェーハ検査方法およびウェーハ検査装置
US10753728B2 (en) * 2016-01-07 2020-08-25 Arkema Inc. Optical method to measure the thickness of coatings deposited on substrates
JP6831649B2 (ja) * 2016-06-22 2021-02-17 ライオンエンジニアリング株式会社 外観検査方法および表面検査装置
CN106949830A (zh) * 2016-06-24 2017-07-14 广州市九州旗建筑科技有限公司 一种成像系统内置标尺的测试技术及其计算方法与应用
US10222200B2 (en) * 2017-05-12 2019-03-05 Siemens Energy, Inc. Contactless, blade-tip clearance measurement for turbines
CN107246841A (zh) * 2017-05-27 2017-10-13 武汉理工大学 一种汽车零部件的多视点检测分选装置

Also Published As

Publication number Publication date
DE102019106555A1 (de) 2019-09-19
US10739273B2 (en) 2020-08-11
US20190285553A1 (en) 2019-09-19
CN113432542A (zh) 2021-09-24
CN110285765A (zh) 2019-09-27
CN113432542B (zh) 2023-10-31
CN110285765B (zh) 2021-10-29
DE102019106555B4 (de) 2023-07-20
JP2019163985A (ja) 2019-09-26

Similar Documents

Publication Publication Date Title
JP6042402B2 (ja) 照明モジュール及びこれを用いる外観検査システム
US20170307544A1 (en) Inspection apparatus and inspection method
JP6322335B2 (ja) 外観検査装置
TWI773032B (zh) 一種拱形照明裝置、具有其之成像系統及成像方法
JP6687656B2 (ja) 検査装置およびその検査方法
JP6908123B2 (ja) 外観検査装置及び外観検査方法
JP2001266127A (ja) プリント配線板の検査装置
CN1576831A (zh) 布线图形检查装置
US11244842B2 (en) Processing apparatus for detecting defects inside electronic component including illumination portion and imaging portion
JP3632449B2 (ja) クリーム半田の塗布状態検査装置および塗布状態検査方法
KR101079686B1 (ko) 영상인식장치 및 영상인식방법
JP6824716B2 (ja) 対基板作業装置
JP2004264026A (ja) 画像認識装置および画像認識方法
JP2014225712A (ja) 部品実装機の吸着ノズル検査装置
KR20190134102A (ko) 검사 대상물 에지 결함 검사 시스템 및 그 방법
JP3340114B2 (ja) 半導体装置用検査装置と部品実装機
JP7293046B2 (ja) ウエーハ外観検査装置および方法
JP3933042B2 (ja) 撮像方法
JP2023158834A (ja) ウエハ検査装置
JP6733039B2 (ja) 外観検査装置、外観検査方法
CN112924455A (zh) 检测系统
JP2023137316A (ja) 半導体チップの外観検査方法および半導体チップの外観検査装置
TWM597390U (zh) 定位檢測裝置
JP2022134200A (ja) 検査装置および検査方法
CN115901808A (zh) 检查装置、检查系统及检查方法

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20190808

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20191021

A975 Report on accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A971005

Effective date: 20191127

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20200114

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20200217

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20200303

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20200402

R150 Certificate of patent or registration of utility model

Ref document number: 6687656

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150