JP6685126B2 - 半導体製造装置および半導体装置の製造方法 - Google Patents

半導体製造装置および半導体装置の製造方法 Download PDF

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Publication number
JP6685126B2
JP6685126B2 JP2015251207A JP2015251207A JP6685126B2 JP 6685126 B2 JP6685126 B2 JP 6685126B2 JP 2015251207 A JP2015251207 A JP 2015251207A JP 2015251207 A JP2015251207 A JP 2015251207A JP 6685126 B2 JP6685126 B2 JP 6685126B2
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Prior art keywords
die
wafer
unit
illumination
manufacturing apparatus
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JP2015251207A
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Japanese (ja)
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JP2017117916A5 (enExample
JP2017117916A (ja
Inventor
英晴 小橋
英晴 小橋
光央 依田
光央 依田
僚 大森
僚 大森
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Fasford Technology Co Ltd
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Fasford Technology Co Ltd
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Priority to JP2015251207A priority Critical patent/JP6685126B2/ja
Priority to TW105135961A priority patent/TWI624887B/zh
Priority to KR1020160153608A priority patent/KR20170076545A/ko
Priority to CN201611028994.3A priority patent/CN106920762B/zh
Publication of JP2017117916A publication Critical patent/JP2017117916A/ja
Publication of JP2017117916A5 publication Critical patent/JP2017117916A5/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/14—Beam splitting or combining systems operating by reflection only
    • G02B27/141—Beam splitting or combining systems operating by reflection only using dichroic mirrors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
    • H01L21/52—Mounting semiconductor bodies in containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67712—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge clamping, e.g. clamping ring
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Optics & Photonics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Die Bonding (AREA)
JP2015251207A 2015-12-24 2015-12-24 半導体製造装置および半導体装置の製造方法 Active JP6685126B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2015251207A JP6685126B2 (ja) 2015-12-24 2015-12-24 半導体製造装置および半導体装置の製造方法
TW105135961A TWI624887B (zh) 2015-12-24 2016-11-04 半導體製造裝置及半導體裝置的製造方法
KR1020160153608A KR20170076545A (ko) 2015-12-24 2016-11-17 반도체 제조 장치 및 반도체 장치의 제조 방법
CN201611028994.3A CN106920762B (zh) 2015-12-24 2016-11-18 半导体制造装置、半导体器件的制造方法及芯片贴装机

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015251207A JP6685126B2 (ja) 2015-12-24 2015-12-24 半導体製造装置および半導体装置の製造方法

Publications (3)

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JP2017117916A JP2017117916A (ja) 2017-06-29
JP2017117916A5 JP2017117916A5 (enExample) 2019-01-24
JP6685126B2 true JP6685126B2 (ja) 2020-04-22

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JP (1) JP6685126B2 (enExample)
KR (1) KR20170076545A (enExample)
CN (1) CN106920762B (enExample)
TW (1) TWI624887B (enExample)

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JP7082862B2 (ja) * 2017-07-27 2022-06-09 ファスフォードテクノロジ株式会社 ダイボンディング装置、半導体装置の製造方法および半導体製造システム
JP7029900B2 (ja) * 2017-08-03 2022-03-04 ファスフォードテクノロジ株式会社 ダイボンディング装置および半導体装置の製造方法
JP7010633B2 (ja) * 2017-09-19 2022-01-26 ファスフォードテクノロジ株式会社 半導体製造装置および半導体装置の製造方法
JP7010638B2 (ja) * 2017-09-26 2022-01-26 ファスフォードテクノロジ株式会社 ダイボンディング装置および半導体装置の製造方法
JP6886379B2 (ja) * 2017-09-28 2021-06-16 Ｔｏｗａ株式会社 保持部材、保持部材の製造方法、検査装置及び切断装置
WO2019111394A1 (ja) * 2017-12-07 2019-06-13 株式会社Ｆｕｊｉ 情報管理装置及び情報管理方法
JP7102271B2 (ja) * 2018-07-17 2022-07-19 ファスフォードテクノロジ株式会社 半導体製造装置および半導体装置の製造方法
JP7146352B2 (ja) * 2018-12-10 2022-10-04 株式会社ディスコ 試験装置
EP3920677B1 (en) * 2019-02-01 2023-04-05 Fuji Corporation Work machine
JP7299728B2 (ja) * 2019-03-22 2023-06-28 ファスフォードテクノロジ株式会社 半導体製造装置および半導体装置の製造方法
JP7300353B2 (ja) * 2019-09-13 2023-06-29 ファスフォードテクノロジ株式会社 ダイボンディング装置および半導体装置の製造方法
JP7377655B2 (ja) * 2019-09-19 2023-11-10 ファスフォードテクノロジ株式会社 ダイボンディング装置および半導体装置の製造方法
JP7437987B2 (ja) * 2020-03-23 2024-02-26 ファスフォードテクノロジ株式会社 ダイボンディング装置および半導体装置の製造方法
JP7502108B2 (ja) 2020-07-31 2024-06-18 ファスフォードテクノロジ株式会社 ダイボンディング装置および半導体装置の製造方法
KR102792628B1 (ko) * 2020-11-03 2025-04-07 세메스 주식회사 다이 이송 장치 및 방법
JP7575937B2 (ja) * 2020-12-21 2024-10-30 ファスフォードテクノロジ株式会社 ダイボンディング装置および半導体装置の製造方法
JP7635075B2 (ja) * 2021-05-28 2025-02-25 ファスフォードテクノロジ株式会社 ダイボンディング装置および半導体装置の製造方法
DE102022118873B4 (de) * 2022-07-27 2024-02-08 ASMPT GmbH & Co. KG Verfahren und Vorrichtung zum Entnehmen von Chips von einem Waferfilmframe, Bestücksystem und Computerprogramm
JP2024017960A (ja) * 2022-07-28 2024-02-08 ファスフォードテクノロジ株式会社 ダイボンディング装置、ダイボンディング方法および半導体装置の製造方法

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KR20170076545A (ko) 2017-07-04
JP2017117916A (ja) 2017-06-29
TWI624887B (zh) 2018-05-21
TW201735209A (zh) 2017-10-01
CN106920762A (zh) 2017-07-04
CN106920762B (zh) 2020-03-10

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