JP6665182B2 - モノハイドロジェントリハロシランの調製方法 - Google Patents
モノハイドロジェントリハロシランの調製方法 Download PDFInfo
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- 238000002360 preparation method Methods 0.000 title 1
- 229910052710 silicon Inorganic materials 0.000 claims description 118
- 239000010703 silicon Substances 0.000 claims description 118
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 106
- 238000000034 method Methods 0.000 claims description 84
- -1 polysiloxane Polymers 0.000 claims description 26
- 229910000039 hydrogen halide Inorganic materials 0.000 claims description 25
- 239000012433 hydrogen halide Substances 0.000 claims description 25
- 239000002699 waste material Substances 0.000 claims description 23
- 238000004519 manufacturing process Methods 0.000 claims description 21
- 238000006243 chemical reaction Methods 0.000 claims description 13
- 230000007423 decrease Effects 0.000 claims description 13
- 239000000376 reactant Substances 0.000 claims description 7
- 239000005046 Chlorosilane Substances 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 125000005843 halogen group Chemical group 0.000 claims description 5
- 229920001296 polysiloxane Polymers 0.000 claims description 4
- 239000000460 chlorine Substances 0.000 claims description 3
- 229910021485 fumed silica Inorganic materials 0.000 claims description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 3
- 239000011347 resin Substances 0.000 claims description 3
- 229920005989 resin Polymers 0.000 claims description 3
- 229910052801 chlorine Inorganic materials 0.000 claims description 2
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 2
- 230000008569 process Effects 0.000 description 48
- 239000000178 monomer Substances 0.000 description 29
- 150000001875 compounds Chemical class 0.000 description 20
- 239000003054 catalyst Substances 0.000 description 13
- 239000012535 impurity Substances 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 11
- 239000000203 mixture Substances 0.000 description 8
- 239000002245 particle Substances 0.000 description 7
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 6
- 230000015556 catabolic process Effects 0.000 description 5
- 238000006731 degradation reaction Methods 0.000 description 5
- 230000009467 reduction Effects 0.000 description 5
- 230000002829 reductive effect Effects 0.000 description 5
- 239000011856 silicon-based particle Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 229910003902 SiCl 4 Inorganic materials 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 4
- 238000007130 inorganic reaction Methods 0.000 description 4
- 238000010926 purge Methods 0.000 description 4
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 3
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000005049 silicon tetrachloride Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 238000011946 reduction process Methods 0.000 description 2
- 239000002210 silicon-based material Substances 0.000 description 2
- 239000011863 silicon-based powder Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- YZCKVEUIGOORGS-UHFFFAOYSA-N Hydrogen atom Chemical class [H] YZCKVEUIGOORGS-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 125000002837 carbocyclic group Chemical group 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000013068 control sample Substances 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 238000005243 fluidization Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 229920002493 poly(chlorotrifluoroethylene) Chemical class 0.000 description 1
- 229920000548 poly(silane) polymer Polymers 0.000 description 1
- 239000005023 polychlorotrifluoroethylene (PCTFE) polymer Chemical class 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 238000006557 surface reaction Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- CIXGGXXZVDVBBY-UHFFFAOYSA-N trichloro(chlorosilyloxy)silane Chemical compound Cl[SiH2]O[Si](Cl)(Cl)Cl CIXGGXXZVDVBBY-UHFFFAOYSA-N 0.000 description 1
- IMYGMRDBUAOCFV-UHFFFAOYSA-N trichloro(dichlorosilyloxy)silane Chemical compound Cl[SiH](Cl)O[Si](Cl)(Cl)Cl IMYGMRDBUAOCFV-UHFFFAOYSA-N 0.000 description 1
- LXEXBJXDGVGRAR-UHFFFAOYSA-N trichloro(trichlorosilyl)silane Chemical compound Cl[Si](Cl)(Cl)[Si](Cl)(Cl)Cl LXEXBJXDGVGRAR-UHFFFAOYSA-N 0.000 description 1
- QHAHOIWVGZZELU-UHFFFAOYSA-N trichloro(trichlorosilyloxy)silane Chemical compound Cl[Si](Cl)(Cl)O[Si](Cl)(Cl)Cl QHAHOIWVGZZELU-UHFFFAOYSA-N 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/72—Copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/0015—Feeding of the particles in the reactor; Evacuation of the particles out of the reactor
- B01J8/002—Feeding of the particles in the reactor; Evacuation of the particles out of the reactor with a moving instrument
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
- B01J8/24—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
- C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
- C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
- C01B33/10763—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane from silicon
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/16—Preparation thereof from silicon and halogenated hydrocarbons direct synthesis
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Description
1)反応器に新たなケイ素触体及び再利用触体を投入する工程であって、再利用触体が、モノハイドロジェントリハロシランを生成するための無機直接法反応の生成段階の途中又は後に得られる工程と、その後、
2)反応器に、ハロゲン化水素及び追加の新たなケイ素を供給し、それにより生成物を形成する工程と、を含む。
より詳細には、第2の実施形態で、プロセスは、
1)反応器に新たなケイ素触体及び廃ケイ素を投入する工程であって、廃ケイ素が、モノハイドロジェントリハロシランを生成するための無機直接法反応において全体の選択性の低下が起こった後に得られる、工程と、その後、
2)反応器に、ハロゲン化水素及び追加の新たなケイ素を供給し、それにより生成物を形成する工程と、を含み得る。
流動層反応器に新たなケイ素粉末の触体を投入した。新たなケイ素を不活性ガスで流動化させ、240℃に加熱した。塩化水素ガスを添加することにより反応を開始し、サイクルの間、280℃〜320℃の範囲の温度に維持した。更なる新たなケイ素を連続的に添加して、クロロシラン合成反応において反応したケイ素、及び流出によって生成物とともに反応器を出たケイ素を置き換えることによって、反応器中の触体の残量を維持した。対照として、合計4回のサイクルとなるよう、同じ条件を使用してこのプロセスを更に3回繰り返した。これら4回のサイクルの結果を平均し、平均の結果を下記の表1に示す。0〜1の正規化劣化度は、「モノマー選択性の低下」及びそれに続く、各サイクルの所望のレベルまでの「モノマー選択性の増加」に該当する。モノマー選択性はまた、4つの対照サイクルでの0〜1の正規化劣化度に対する平均モノマー選択性を1として正規化した。
比較例1において前述のとおり実施されたサイクルの生成段階の後、反応器を運転停止し、再利用触体は反応器中に残留させた。この再利用触体の一部を反応器から取り出した。しかしながら、比較例1において記載されたサイクル後に残留する再利用触体の35%は反応器中に残した。次いで反応器に、比較例1で前述されたものと同じ新たなケイ素粉末の追加量を投入した。結果として、反応器には2:1の量の新たなケイ素:再利用触体が入っていた。次いで、比較例1で前述されたサイクルと同じ条件を使用して、反応器中でサイクルを実施した。このサイクルは、目標の選択性に達することができ、比較例1に記載の対照サイクルに必要とされた時間の10%未満で生成段階を開始することができた。試験を再度繰り返したが、今度は、前サイクルの再利用触体の13%を反応器中に残した。次いで、反応器に、新たなケイ素:再利用触体の比を8:1とするために十分な量の新たなケイ素を入れた。このサイクルは同様の結果を示し、やはり、比較例1における対照サンプルの正規化劣化度の100%未満の正規化劣化度で生成段階を開始するのに十分な選択性に達した。これらの2つの試験の平均された結果を下記の表2に示す。
比較例1から、平均サイクルは、この期間を通して64%までベースラインを超える選択性を達成できないことが容易に分かる。しかしながら、実施例1では、本明細書に記載のプロセスはこの期間中、1より大きい平均選択性を示し、比較例1のプロセスが改良されたことを示す。
Claims (11)
- 式HSiX3のモノハイドロジェントリハロシラン(式中、各Xは独立にハロゲン原子である)を含む生成物を調製する方法であって、
1)反応器に新たなケイ素触体及び再利用触体を初期投入する工程であって、前記再利用触体が、無機直接法反応の生成段階の途中又は後に得られる、工程と、その後、
2)前記反応器に、式HXのハロゲン化水素及び追加の新たなケイ素を供給し、それにより前記生成物を形成する工程と、 を含む方法。 - 前記再利用触体が廃ケイ素である、請求項1に記載の方法。
- 式HSiX3のモノハイドロジェントリハロシラン(式中、各Xは独立にハロゲン原子である)を含む生成物を調製するための方法であって、
1)反応器に新たなケイ素触体及び廃ケイ素を初期投入する工程であって、前記廃ケイ素が、無機直接法反応サイクルの全体の選択性の低下開始以降に得られる、工程と、その後、
2)前記反応器に、式HXのハロゲン化水素及び追加の新たなケイ素を供給し、それにより前記生成物を形成する工程と、 を含む方法。 - 工程1)の前記ケイ素触体及び再利用触体が50重量%〜95重量%のケイ素を含有する、請求項1又は3に記載の方法。
- 工程2)の後に、新たなケイ素は供給せずに追加のハロゲン化水素を前記反応器に供給する工程3)を更に含む、請求項1〜3のいずれか一項に記載の方法。
- 前記反応器が流動層反応器である、請求項1〜3のいずれか一項に記載の方法。
- 前記生成物を使用してヒュームドシリカを製造することを更に含む、請求項1〜3のいずれか一項に記載の方法。
- 前記生成物から前記モノハイドロジェントリハロシランを回収することを更に含む、請求項1〜3のいずれか一項に記載の方法。
- 各Xが塩素である、請求項1〜3のいずれか一項に記載の方法。
- 前記モノハイドロジェントリハロシランを、多結晶シリコンを生成するための反応体として使用することを更に含む、請求項8に記載の方法。
- 前記モノハイドロジェントリハロシランを、ポリシロキサン樹脂を生成するための反応体として使用することを更に含む、請求項8に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201462094431P | 2014-12-19 | 2014-12-19 | |
US62/094,431 | 2014-12-19 | ||
PCT/US2015/062569 WO2016099833A1 (en) | 2014-12-19 | 2015-11-25 | Process for preparing monohydrogentrihalosilanes |
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Publication Number | Publication Date |
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JP2018504346A JP2018504346A (ja) | 2018-02-15 |
JP6665182B2 true JP6665182B2 (ja) | 2020-03-13 |
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JP (1) | JP6665182B2 (ja) |
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US20170283268A1 (en) | 2017-10-05 |
KR102507061B1 (ko) | 2023-03-07 |
EP3233732A1 (en) | 2017-10-25 |
EP3233732B1 (en) | 2019-12-25 |
EP3233732B8 (en) | 2020-06-17 |
CN107001054B (zh) | 2019-09-03 |
KR20170095935A (ko) | 2017-08-23 |
EP3233732A4 (en) | 2018-06-20 |
WO2016099833A1 (en) | 2016-06-23 |
CN107001054A (zh) | 2017-08-01 |
US10040689B2 (en) | 2018-08-07 |
JP2018504346A (ja) | 2018-02-15 |
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