JP6645195B2 - 圧電駆動装置、モーター、ロボット、ならびにポンプ - Google Patents
圧電駆動装置、モーター、ロボット、ならびにポンプ Download PDFInfo
- Publication number
- JP6645195B2 JP6645195B2 JP2016003481A JP2016003481A JP6645195B2 JP 6645195 B2 JP6645195 B2 JP 6645195B2 JP 2016003481 A JP2016003481 A JP 2016003481A JP 2016003481 A JP2016003481 A JP 2016003481A JP 6645195 B2 JP6645195 B2 JP 6645195B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- piezoelectric
- insulating layer
- electrode layer
- provided above
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000007788 liquid Substances 0.000 claims description 12
- 238000005452 bending Methods 0.000 claims description 11
- 230000033001 locomotion Effects 0.000 claims description 8
- 239000000758 substrate Substances 0.000 description 38
- 238000000034 method Methods 0.000 description 21
- 239000000463 material Substances 0.000 description 19
- 238000007747 plating Methods 0.000 description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 13
- 229910052710 silicon Inorganic materials 0.000 description 13
- 239000010703 silicon Substances 0.000 description 13
- 238000006073 displacement reaction Methods 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 11
- 239000010949 copper Substances 0.000 description 10
- 229910052802 copper Inorganic materials 0.000 description 8
- 238000010586 diagram Methods 0.000 description 8
- 230000004048 modification Effects 0.000 description 8
- 238000012986 modification Methods 0.000 description 8
- 210000000707 wrist Anatomy 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- 239000000853 adhesive Substances 0.000 description 7
- 230000001070 adhesive effect Effects 0.000 description 7
- 230000005540 biological transmission Effects 0.000 description 7
- 238000000059 patterning Methods 0.000 description 7
- 239000010936 titanium Substances 0.000 description 7
- 229910052719 titanium Inorganic materials 0.000 description 6
- 239000004593 Epoxy Substances 0.000 description 5
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 239000010931 gold Substances 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 229940079593 drug Drugs 0.000 description 3
- 239000003814 drug Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 229910052726 zirconium Inorganic materials 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000000277 atomic layer chemical vapour deposition Methods 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000005764 inhibitory process Effects 0.000 description 2
- NOESYZHRGYRDHS-UHFFFAOYSA-N insulin Chemical compound N1C(=O)C(NC(=O)C(CCC(N)=O)NC(=O)C(CCC(O)=O)NC(=O)C(C(C)C)NC(=O)C(NC(=O)CN)C(C)CC)CSSCC(C(NC(CO)C(=O)NC(CC(C)C)C(=O)NC(CC=2C=CC(O)=CC=2)C(=O)NC(CCC(N)=O)C(=O)NC(CC(C)C)C(=O)NC(CCC(O)=O)C(=O)NC(CC(N)=O)C(=O)NC(CC=2C=CC(O)=CC=2)C(=O)NC(CSSCC(NC(=O)C(C(C)C)NC(=O)C(CC(C)C)NC(=O)C(CC=2C=CC(O)=CC=2)NC(=O)C(CC(C)C)NC(=O)C(C)NC(=O)C(CCC(O)=O)NC(=O)C(C(C)C)NC(=O)C(CC(C)C)NC(=O)C(CC=2NC=NC=2)NC(=O)C(CO)NC(=O)CNC2=O)C(=O)NCC(=O)NC(CCC(O)=O)C(=O)NC(CCCNC(N)=N)C(=O)NCC(=O)NC(CC=3C=CC=CC=3)C(=O)NC(CC=3C=CC=CC=3)C(=O)NC(CC=3C=CC(O)=CC=3)C(=O)NC(C(C)O)C(=O)N3C(CCC3)C(=O)NC(CCCCN)C(=O)NC(C)C(O)=O)C(=O)NC(CC(N)=O)C(O)=O)=O)NC(=O)C(C(C)CC)NC(=O)C(CO)NC(=O)C(C(C)O)NC(=O)C1CSSCC2NC(=O)C(CC(C)C)NC(=O)C(NC(=O)C(CCC(N)=O)NC(=O)C(CC(N)=O)NC(=O)C(NC(=O)C(N)CC=1C=CC=CC=1)C(C)C)CC1=CN=CN1 NOESYZHRGYRDHS-UHFFFAOYSA-N 0.000 description 2
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 230000036211 photosensitivity Effects 0.000 description 2
- 239000011120 plywood Substances 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- MAKDTFFYCIMFQP-UHFFFAOYSA-N titanium tungsten Chemical compound [Ti].[W] MAKDTFFYCIMFQP-UHFFFAOYSA-N 0.000 description 2
- 210000003857 wrist joint Anatomy 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 241001050985 Disco Species 0.000 description 1
- 102000004877 Insulin Human genes 0.000 description 1
- 108090001061 Insulin Proteins 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 229940125396 insulin Drugs 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- -1 or the like Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Images
Landscapes
- General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016003481A JP6645195B2 (ja) | 2016-01-12 | 2016-01-12 | 圧電駆動装置、モーター、ロボット、ならびにポンプ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016003481A JP6645195B2 (ja) | 2016-01-12 | 2016-01-12 | 圧電駆動装置、モーター、ロボット、ならびにポンプ |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017127057A JP2017127057A (ja) | 2017-07-20 |
| JP2017127057A5 JP2017127057A5 (enExample) | 2019-02-14 |
| JP6645195B2 true JP6645195B2 (ja) | 2020-02-14 |
Family
ID=59364255
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016003481A Expired - Fee Related JP6645195B2 (ja) | 2016-01-12 | 2016-01-12 | 圧電駆動装置、モーター、ロボット、ならびにポンプ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6645195B2 (enExample) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006005433A (ja) * | 2004-06-15 | 2006-01-05 | Seiko Epson Corp | 集積回路素子の製造方法および集積回路素子 |
| JP4033204B2 (ja) * | 2004-12-01 | 2008-01-16 | セイコーエプソン株式会社 | 弾性表面波素子の製造方法 |
| JP5298999B2 (ja) * | 2009-03-19 | 2013-09-25 | Tdk株式会社 | 積層型圧電素子 |
| JP2011029239A (ja) * | 2009-07-21 | 2011-02-10 | Fujitsu Ltd | 圧電発電モジュール、圧電発電モジュールの製造方法及び圧電発電装置 |
-
2016
- 2016-01-12 JP JP2016003481A patent/JP6645195B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2017127057A (ja) | 2017-07-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6398454B2 (ja) | 圧電駆動装置、ロボット、及び、それらの駆動方法 | |
| JP6405785B2 (ja) | 圧電駆動装置、ロボット、及び、それらの駆動方法 | |
| JP6641944B2 (ja) | モーター用圧電駆動装置およびその製造方法、モーター、ロボット、ならびにポンプ | |
| JP6543951B2 (ja) | 圧電駆動装置、ロボット、及び、それらの駆動方法 | |
| JP2017017916A (ja) | 圧電駆動装置、ロボット及び圧電駆動装置の駆動方法 | |
| CN107017334A (zh) | 压电驱动装置及其制造方法、马达、机器人以及泵 | |
| JP2017069998A (ja) | 圧電駆動装置およびその製造方法、モーター、ロボット、ならびにポンプ | |
| JP6601174B2 (ja) | 圧電アクチュエーター、積層アクチュエーター、圧電モーター、ロボット、ハンド及び送液ポンプ | |
| JP6766328B2 (ja) | 圧電駆動装置、ロボット、及び圧電駆動装置の駆動方法 | |
| JP6503764B2 (ja) | 圧電素子駆動回路、及び、ロボット | |
| JP6485118B2 (ja) | 圧電駆動装置及びロボット | |
| CN106877733A (zh) | 压电驱动装置、马达、机器人、以及泵 | |
| JP6645195B2 (ja) | 圧電駆動装置、モーター、ロボット、ならびにポンプ | |
| JP6662007B2 (ja) | 圧電駆動装置、モーター、ロボット、およびポンプ | |
| JP6641910B2 (ja) | 圧電駆動装置およびその製造方法、モーター、ロボット、ならびにポンプ | |
| JP6693118B2 (ja) | 圧電駆動装置およびその製造方法、モーター、ロボット、ならびにポンプ | |
| JP6641943B2 (ja) | モーター用圧電駆動装置およびその製造方法、モーター、ロボット、ならびにポンプ | |
| JP6693120B2 (ja) | 圧電駆動装置およびその製造方法、モーター、ロボット、ならびにポンプ | |
| JP6531909B2 (ja) | 圧電駆動装置、モーター、ロボット及びポンプ | |
| JP6657902B2 (ja) | 圧電アクチュエーターおよびロボット | |
| JP6641911B2 (ja) | 圧電駆動装置およびその製造方法、モーター、ロボット、ならびにポンプ | |
| JP6702482B2 (ja) | 圧電駆動装置及びその駆動方法、ロボット及びその駆動方法 | |
| JP2017103954A (ja) | 圧電駆動装置、モーター、ロボット、およびポンプ | |
| JP2017135935A (ja) | 圧電アクチュエーター、圧電モーター、ロボット、ハンドおよび送液ポンプ | |
| JP2017005925A (ja) | モーター用圧電駆動装置、モーター、ロボット、およびポンプ |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20181225 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20181225 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20190924 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20190925 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20191018 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20191210 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20191223 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 6645195 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| LAPS | Cancellation because of no payment of annual fees |