JP6603416B2 - 水溶性量子ドットの作製方法 - Google Patents
水溶性量子ドットの作製方法 Download PDFInfo
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- 239000002096 quantum dot Substances 0.000 title claims description 138
- 238000004519 manufacturing process Methods 0.000 title claims description 20
- 229920000642 polymer Polymers 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 23
- 238000006243 chemical reaction Methods 0.000 claims description 21
- 239000003446 ligand Substances 0.000 claims description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 15
- 239000007864 aqueous solution Substances 0.000 claims description 14
- 239000011261 inert gas Substances 0.000 claims description 13
- 239000012298 atmosphere Substances 0.000 claims description 11
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims description 10
- -1 alkene sulfide Chemical class 0.000 claims description 9
- 125000003277 amino group Chemical group 0.000 claims description 9
- VHJLVAABSRFDPM-QWWZWVQMSA-N dithiothreitol Chemical compound SC[C@@H](O)[C@H](O)CS VHJLVAABSRFDPM-QWWZWVQMSA-N 0.000 claims description 5
- 229920001661 Chitosan Polymers 0.000 claims description 4
- 229920002873 Polyethylenimine Polymers 0.000 claims description 4
- 108010039918 Polylysine Proteins 0.000 claims description 4
- 238000003760 magnetic stirring Methods 0.000 claims description 4
- 229920001690 polydopamine Polymers 0.000 claims description 4
- 229920000656 polylysine Polymers 0.000 claims description 4
- VOVUARRWDCVURC-UHFFFAOYSA-N thiirane Chemical group C1CS1 VOVUARRWDCVURC-UHFFFAOYSA-N 0.000 claims description 4
- 239000010408 film Substances 0.000 description 60
- 229920000620 organic polymer Polymers 0.000 description 21
- 239000010410 layer Substances 0.000 description 19
- 239000000758 substrate Substances 0.000 description 16
- 125000003396 thiol group Chemical group [H]S* 0.000 description 16
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- 230000003287 optical effect Effects 0.000 description 7
- 239000012074 organic phase Substances 0.000 description 7
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 7
- 238000001308 synthesis method Methods 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 230000008901 benefit Effects 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 229910001873 dinitrogen Inorganic materials 0.000 description 5
- 239000008346 aqueous phase Substances 0.000 description 4
- 239000002131 composite material Substances 0.000 description 4
- 238000003475 lamination Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229940006186 sodium polystyrene sulfonate Drugs 0.000 description 4
- 229910021642 ultra pure water Inorganic materials 0.000 description 4
- 239000012498 ultrapure water Substances 0.000 description 4
- 101100063942 Neurospora crassa (strain ATCC 24698 / 74-OR23-1A / CBS 708.71 / DSM 1257 / FGSC 987) dot-1 gene Proteins 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000011258 core-shell material Substances 0.000 description 3
- 238000003912 environmental pollution Methods 0.000 description 3
- 230000002209 hydrophobic effect Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 238000006862 quantum yield reaction Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000008520 organization Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000003223 protective agent Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 229920003169 water-soluble polymer Polymers 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000005285 chemical preparation method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000002059 diagnostic imaging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005562 fading Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229920006295 polythiol Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- XFTALRAZSCGSKN-UHFFFAOYSA-M sodium;4-ethenylbenzenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=C(C=C)C=C1 XFTALRAZSCGSKN-UHFFFAOYSA-M 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000000844 transformation Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/06—Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
- C09K11/07—Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials having chemically interreactive components, e.g. reactive chemiluminescent compositions
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/02—Polyamines
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/02—Polyamines
- C08G73/0206—Polyalkylene(poly)amines
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/02—Polythioethers
- C08G75/06—Polythioethers from cyclic thioethers
- C08G75/08—Polythioethers from cyclic thioethers from thiiranes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L25/00—Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
- C08L25/02—Homopolymers or copolymers of hydrocarbons
- C08L25/04—Homopolymers or copolymers of styrene
- C08L25/06—Polystyrene
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/02—Use of particular materials as binders, particle coatings or suspension media therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2219/00—Aspects relating to the form of the liquid crystal [LC] material, or by the technical area in which LC material are used
- C09K2219/03—Aspects relating to the form of the liquid crystal [LC] material, or by the technical area in which LC material are used in the form of films, e.g. films after polymerisation of LC precursor
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Chemical & Material Sciences (AREA)
- Luminescent Compositions (AREA)
- Optical Filters (AREA)
- Laminated Bodies (AREA)
Description
ステップS101:油溶性量子ドット及びポリメルカプトポリマーをそれぞれ提供する。
まず、アルケンスルフィドを開環させてメルカプトアルカンを生成する。次に、アミノ基を有するポリマーとメルカプトアルカンを反応させ、ポリマーの複数のアミノ基をメルカプト基に置換してポリメルカプトポリマーを生成する。
ステップS201:電荷を帯びた有機ポリマーフィルムを基板上に一層コーティングする。
Claims (5)
- 水溶性量子ドットの作製方法であって、
油溶性量子ドット及びポリメルカプトポリマーをそれぞれ提供するステップと、
不活性ガス雰囲気下において、前記ポリメルカプトポリマーと前記油溶性量子ドットを混合反応させてリガンド交換させるステップと、
水を適量加え、反応後の上層の水溶液を回収し、前記水溶性量子ドットを作製し得るステップと、を含み、
ポリメルカプトポリマーを提供する前記ステップは、アミノ基を有するポリマー及びアルケンスルフィドを無水クロロホルムに溶解させ、第1の所定条件で反応させて前記ポリメルカプトポリマーを得るステップを含み、
不活性ガス雰囲気下において、前記ポリメルカプトポリマーと前記油溶性量子ドットを混合反応させてリガンド交換させる前記ステップは、不活性ガス雰囲気下において、前記ポリメルカプトポリマーを前記油溶性量子ドットにゆっくり滴下し、第1温度で第1の所定時間反応させた後、水を適量加えるとともに第2温度まで昇温させてから第2の所定時間反応させるステップを含み、
反応後の上層の水溶液を回収して前記水溶性量子ドットを作製し得る前記ステップは、降温後に微量のジチオトレイトールを加え、抽出を行って上層の水溶液を回収し、前記水溶性量子ドットを作製し得るステップを含むことを特徴とする水溶性量子ドットの作製方法。 - 前記アルケンスルフィドは、エチレンスルフィドであることを特徴とする請求項1に記載の方法。
- 前記第1の所定条件は、60℃で磁気撹拌しながら10時間反応させることであることを特徴とする請求項2に記載の方法。
- 前記アミノ基を有するポリマーは、キトサン、ポリドーパミン、ポリエチレンイミン及びポリリジンのうちの少なくとも1種であることを特徴とする請求項1に記載の方法。
- 前記第1温度は50℃であり、
前記第1の所定時間は2時間であり、
前記第2温度は90℃であり、
前記第2の所定時間は2時間であることを特徴とする請求項1に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610414905.2A CN106085417A (zh) | 2016-06-14 | 2016-06-14 | 水溶性量子点、制备方法及量子点薄膜制备方法 |
CN201610414905.2 | 2016-06-14 | ||
PCT/CN2016/093021 WO2017215093A1 (zh) | 2016-06-14 | 2016-08-03 | 水溶性量子点、制备方法及量子点薄膜制备方法 |
Publications (2)
Publication Number | Publication Date |
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JP2018538578A JP2018538578A (ja) | 2018-12-27 |
JP6603416B2 true JP6603416B2 (ja) | 2019-11-06 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2018530070A Active JP6603416B2 (ja) | 2016-06-14 | 2016-08-03 | 水溶性量子ドットの作製方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US10457865B2 (ja) |
JP (1) | JP6603416B2 (ja) |
KR (1) | KR102093569B1 (ja) |
CN (1) | CN106085417A (ja) |
DE (1) | DE112016004761T5 (ja) |
GB (1) | GB2557816A (ja) |
WO (1) | WO2017215093A1 (ja) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
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CN106601925B (zh) * | 2016-12-22 | 2020-10-27 | Tcl科技集团股份有限公司 | 一种量子点发光层、量子点发光二极管及其制备方法 |
CN107099288B (zh) * | 2017-04-01 | 2019-11-26 | 深圳市华星光电半导体显示技术有限公司 | 碳点复合薄膜的制备方法及碳点复合薄膜 |
WO2019114829A1 (zh) * | 2017-12-15 | 2019-06-20 | Tcl集团股份有限公司 | 量子点薄膜及其制备方法和量子点发光二极管的制备方法 |
CN108129661B (zh) | 2018-01-03 | 2021-01-22 | 京东方科技集团股份有限公司 | 一种聚合物、量子点膜层及其制备方法 |
CN108264895B (zh) * | 2018-03-09 | 2021-03-12 | 京东方科技集团股份有限公司 | 量子点配体交换的方法及其装置 |
CN110713755B (zh) * | 2018-07-11 | 2022-06-14 | Tcl科技集团股份有限公司 | 嵌段共聚物、复合颗粒、油墨及其制备方法和应用 |
CN110643346A (zh) * | 2019-09-05 | 2020-01-03 | 深圳市华星光电半导体显示技术有限公司 | 量子点的配位方法、量子点以及显示装置 |
CN112831222B (zh) * | 2019-11-22 | 2023-05-02 | Tcl科技集团股份有限公司 | 油墨及量子点薄膜和量子点发光二极管 |
CN113539069B (zh) * | 2020-04-13 | 2023-10-17 | Tcl华星光电技术有限公司 | 粒子薄膜的制造方法和显示面板 |
US11884858B2 (en) | 2020-06-18 | 2024-01-30 | Samsung Electronics Co., Ltd. | Semiconductor nanocrystal, light-emitting film, production method of the light-emitting film, light emitting device, and display device |
CN111690164A (zh) * | 2020-06-19 | 2020-09-22 | 京东方科技集团股份有限公司 | 一种发光薄膜及其制备方法、发光器件、显示基板 |
CN114806539A (zh) * | 2021-01-27 | 2022-07-29 | 中国科学院化学研究所 | 一种半导体纳米晶的表面生物相容性修饰方法 |
CN114481351B (zh) * | 2022-02-21 | 2023-07-21 | 青岛大学 | 一种共聚物原位包埋CdSe量子点纳米膜及其制备方法和应用 |
Family Cites Families (13)
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CN100395306C (zh) | 2004-06-22 | 2008-06-18 | 武汉大学 | 一种油溶性量子点水溶性化的方法 |
JP4565153B2 (ja) * | 2004-11-19 | 2010-10-20 | 独立行政法人産業技術総合研究所 | ナノ粒子の低温合成法 |
JP2007178239A (ja) * | 2005-12-27 | 2007-07-12 | Kenji Yamamoto | 親水性量子ドット |
CN100485011C (zh) * | 2006-12-22 | 2009-05-06 | 华中师范大学 | 一种相转移条件下的水溶性量子点的制备方法 |
CN101012373A (zh) | 2007-01-30 | 2007-08-08 | 天津大学 | 油溶性量子点水溶性改性方法 |
WO2010051325A1 (en) * | 2008-10-28 | 2010-05-06 | Ohio University | A hybrid nanostructure composed of a natural photosystem and semiconductor nanoparticles |
US8187676B2 (en) * | 2009-05-27 | 2012-05-29 | Essilor International (Compagnie Generale D'optique) | Process for preparing articles having anti-fog layer by layer coating and coated articles having enhanced anti-fog and durability properties |
US8822955B2 (en) * | 2011-03-21 | 2014-09-02 | East China University Of Science And Technology | Polymer-conjugated quantum dots and methods of making the same |
CN103074051A (zh) * | 2012-12-18 | 2013-05-01 | 上海纳米技术及应用国家工程研究中心有限公司 | 双巯基化合物修饰的水溶性量子点及其制备方法 |
CN103030784B (zh) * | 2012-12-24 | 2014-10-15 | 中南民族大学 | 一种含硫超支化环氧树脂及其制备方法 |
CN103203022B (zh) * | 2013-04-07 | 2014-10-29 | 浙江大学 | 一种纳米粒子与多巯基共聚物复合物及其制备方法 |
CN103772872B (zh) * | 2013-12-27 | 2016-06-01 | Tcl集团股份有限公司 | 量子点/丙烯酸酯聚合物纳米晶体复合物及制备方法和彩色转化膜 |
KR102214829B1 (ko) * | 2014-02-27 | 2021-02-10 | 삼성전자주식회사 | 나노입자 다층 박막 |
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2016
- 2016-06-14 CN CN201610414905.2A patent/CN106085417A/zh active Pending
- 2016-08-03 KR KR1020187013707A patent/KR102093569B1/ko active IP Right Grant
- 2016-08-03 WO PCT/CN2016/093021 patent/WO2017215093A1/zh active Application Filing
- 2016-08-03 DE DE112016004761.4T patent/DE112016004761T5/de not_active Ceased
- 2016-08-03 GB GB1805414.8A patent/GB2557816A/en not_active Withdrawn
- 2016-08-03 JP JP2018530070A patent/JP6603416B2/ja active Active
- 2016-08-03 US US15/119,375 patent/US10457865B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
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CN106085417A (zh) | 2016-11-09 |
WO2017215093A1 (zh) | 2017-12-21 |
GB2557816A (en) | 2018-06-27 |
KR102093569B1 (ko) | 2020-04-23 |
US20180171219A1 (en) | 2018-06-21 |
KR20180069875A (ko) | 2018-06-25 |
US10457865B2 (en) | 2019-10-29 |
DE112016004761T5 (de) | 2018-07-05 |
JP2018538578A (ja) | 2018-12-27 |
GB201805414D0 (en) | 2018-05-16 |
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