JP6566628B2 - 炭素からなるナノ構造の製造装置および方法 - Google Patents
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Description
a)基板または基板上に堆積された層を酸化するために、酸素原子または酸素イオンが本発明によるガス入口機構により形成される酸化ステップ、
b)基板または基板上に堆積された層を還元するために、水素またはアンモニアのような還元剤が原子、イオンまたは基に変換される還元ステップ、
c)炭素ナノ材料を堆積させるために、ガス混合物、炭素含有成分例えばメタン、エチレンまたはアセチレンが、原子、イオン、芳香族基またはポリマー基に変換される成長ステップ、
d)還元性ガスまたはドーピングガスが使用される後処理ステップ、を有してもよい。
以下に本発明の実施例が添付図面により説明される。
ガス状出発物質が連続的にまたはパルス状にガス入口機構2内に供給されること、を特徴とする方法。
2 ガス入口機構/シャワヘッド
3、3′、3′′ 壁
4 ガス流出面
5 ハウジング空洞
6 ガス供給ライン
7 ガス流出開口
8 プレート
8′ 開口
9 プラズマ電極/プレート
10 プレート
10′ 開口
11 加熱要素、プレート、蛇行またはコイル
12 接点
13 接点
14 高圧電源
15 加熱電源
16 基板
17 サセプタ
18 絶縁板
19 プレート
19′ 開口
20 保持棒
21 保持棒
22 保持棒
23 プレート
23′ 開口
24 保持棒
Claims (15)
- ハウジング壁(3、3′、3′′)により包囲されたハウジング空洞(5)であって、ハウジング空洞(5)内にガス供給ライン(6)が入り込み、ガス供給ライン(6)を介して、ガス状の、特に炭素を含有する出発物質をハウジング空洞(5)内に供給可能な、該ハウジング空洞(5)を備え、少なくとも一部がハウジング空洞(5)内に配置された構成要素(8、9、10)を有するプラズマ発生器であって、プラズマの点火によりガス状出発物質にエネルギーを与え且つこのようにしてガス状出発物質をガス状中間生成物に変換するために、電圧を印加可能な少なくとも1つのプラズマ電極(9)を有する該プラズマ発生器を備え、および多数のガス流出開口(7)を有するガス流出面(4)であって、ガス流出面(4)を介して、ガス状中間生成物がハウジング空洞(5)から流出可能な、該ガス流出面(4)を備えたガス入口機構(2)を有する、単分子層、多層構造、チューブまたは繊維のような、炭素からなるナノ構造の製造装置において、
構成要素(8、9、10)の下流側に配置された、変換を支援するためのガス加熱装置(11)を備え、
前記ガス加熱装置(11)が、ガス流出面(4)とサセプタ(17)の間に配置された、絶縁材料からなるプレート(23)の上流側に配置されている、
ことを特徴とする炭素からなるナノ構造の製造装置。 - ガス入口機構(2)がCVDリアクタ(1)のプロセスチャンバ内に配置され、CVDリアクタ(1)は加熱可能なサセプタ(17)を有し、サセプタ(17)は1つまたは複数の基板(16)を受け入れるための支持台であり、この場合、サセプタ(17)はプロセスチャンバの底部に付属されおよびガス流出面(4)はプロセスチャンバの天井に付属され、該プロセスチャンバは、ガス流出面(4)から流出するガス状中間生成物が少なくとも1つの基板(16)に搬送されて、基板(16)上にナノ構造が堆積されるように形成されていることを特徴とする請求項1に記載の装置。
- プラズマ電極(9)が格子またはプレートの形を有し、プラズマ電極(9)が、ガス状出発物質の流動経路内にまたはガス入口機構(2)の上部壁(3)に配置されていることを特徴とする請求項1または2に記載の装置。
- ガス状出発物質の流動経路内に配置された格子の形の、または貫通開口(10′、19′)を有するプレート(10、19)の形の1つまたは複数の遮へい電極(10、19)であって、この場合、少なくとも1つの遮へい電極(8)がプラズマ電極(9)の上流側に、および/またはこの場合、少なくとも1つの遮へい電極(10、19)がプラズマ電極(9)の下流側に配置されている、1つまたは複数の該遮へい電極(10、19)を特徴とする請求項1ないし3のいずれかに記載の装置。
- 加熱装置(11)が、プレート、格子、蛇行またはコイルの形を有し、該加熱装置は、ガス状出発物質の流動経路内において、特に流動に直角に伸長する面内に配置され、この場合、ガス加熱装置(11)が、ガス加熱装置(11)内に電流を通すために接続電極(12、13)を有することを特徴とする請求項1ないし4のいずれかに記載の装置。
- 遮へい電極(8、10)、プラズマ電極(9)および/またはガス加熱器(11)がプレートから形成され、これらはそれぞれ多数の開口を有し、この場合、隣接するプレートの開口は、ガス混合のために、相互にオフセットされて配置されていることを特徴とする請求項1ないし5のいずれかに記載の装置。
- 電極(8、9、10)を形成する1つまたは複数のプレート、および/またはガス入口機構(2)の、ガス流出開口(7)を有する壁の内側が、熱反射特性を有することを特徴とする請求項1ないし6のいずれかに記載の装置。
- 1つの面内に配置されたガス加熱装置(11)がガスの流動方向においてガス流出面(4)の直後に配置され、および/または遮へい電極(8)が基板(16)に直接向かい合って位置し、この場合、遮へい電極(8)がガスを通過させるための開口(8′)を有することを特徴とする請求項1ないし7のいずれかに記載の装置。
- ガス入口機構(2)の上部壁(3)が絶縁板(18)であり、絶縁板(18)に沿ってプラズマ電極(9)が伸長することを特徴とする請求項1ないし8のいずれかに記載の装置。
- 相互に間隔をなしてハウジング空洞(5)の内部に配置された2つの遮へい電極(10、19)であって、導電性保持棒(20、21)により接地電極(8)と結合されている2つの該遮へい電極(10、19)を特徴とする請求項1ないし9のいずれかに記載の装置。
- 場合によりキャリヤガスと共に、酸化性の、または還元性の、または炭素を含有する、少なくとも1つのガス状出発物質を含む混合物、または洗浄ガスが、ガス供給ライン(6)を介してハウジング空洞(5)内に供給され、この場合、ガス混合物がプラズマ発生器(8、9、10)によってのみならずガス加熱器(11)によってもまたエネルギーが与えられることを特徴とする、請求項1ないし10のいずれかに記載の装置内における、単分子層、多層構造、チューブまたは繊維のような炭素からなるナノ構造の製造方法。
- ハウジング空洞内のガス状出発物質が、加熱装置(11)によって発生された熱の供給により、および同時にプラズマ発生器(8、9、10)によって発生されたプラズマにより活性化され且つ解離され、これにより、原子基またはイオン化基、特に基の形のガス状のポリマーまたは芳香族中間生成物が形成されることを特徴とする請求項11に記載の方法。
- プラズマが連続的に発生されるかまたはパルス状に発生されること、および/または
ガス状出発物質が連続的にまたはパルス状にガス入口機構(2)内に供給されること、を特徴とする請求項11および12に記載の方法。 - プロセスチャンバ内に配置された基板(16)上に炭素からなるナノ構造が堆積される方法ステップの前または後に洗浄ステップが実行され、洗浄ステップにおいて、ハウジング空洞(5)内に供給された洗浄ガスが、プラズマの供給により、および/または加熱により活性化され、この場合、洗浄ステップが堆積ステップの前または後に特に周期的に実行されることを特徴とする請求項11ないし13に記載の方法。
- プラズマ電極(9)および/または加熱装置(11)の下流側に配置された、遮へい電極(10)のような特に接地された要素および/または接地されたガス流出面(4)により、変換反応において形成された粒子が捕獲されることを特徴とする請求項11ないし14に記載の方法。
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- 2014-11-19 US US14/547,720 patent/US9822451B2/en active Active
- 2014-11-20 TW TW103140305A patent/TWI652223B/zh active
- 2014-11-20 KR KR1020140162908A patent/KR102241447B1/ko active IP Right Grant
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JP2015101790A (ja) | 2015-06-04 |
TWI652223B (zh) | 2019-03-01 |
US20150140234A1 (en) | 2015-05-21 |
KR102241447B1 (ko) | 2021-04-15 |
KR20150059123A (ko) | 2015-05-29 |
CN104651801B (zh) | 2019-05-28 |
DE102013112855A1 (de) | 2015-05-21 |
EP2876083B1 (de) | 2019-09-11 |
CN104651801A (zh) | 2015-05-27 |
TW201540663A (zh) | 2015-11-01 |
US9822451B2 (en) | 2017-11-21 |
EP2876083A1 (de) | 2015-05-27 |
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