JP6498037B2 - Xyテーブル - Google Patents
Xyテーブル Download PDFInfo
- Publication number
- JP6498037B2 JP6498037B2 JP2015106004A JP2015106004A JP6498037B2 JP 6498037 B2 JP6498037 B2 JP 6498037B2 JP 2015106004 A JP2015106004 A JP 2015106004A JP 2015106004 A JP2015106004 A JP 2015106004A JP 6498037 B2 JP6498037 B2 JP 6498037B2
- Authority
- JP
- Japan
- Prior art keywords
- yoke
- rib portion
- coil
- magnetic
- force
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000005291 magnetic effect Effects 0.000 claims description 49
- 230000004907 flux Effects 0.000 claims description 17
- 230000005294 ferromagnetic effect Effects 0.000 claims description 9
- 238000000034 method Methods 0.000 description 7
- 238000012545 processing Methods 0.000 description 6
- 238000003754 machining Methods 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 230000001133 acceleration Effects 0.000 description 3
- 238000012937 correction Methods 0.000 description 3
- 230000005484 gravity Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000003990 capacitor Substances 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- BGPVFRJUHWVFKM-UHFFFAOYSA-N N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] Chemical compound N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] BGPVFRJUHWVFKM-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 239000010438 granite Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000009191 jumping Effects 0.000 description 1
- 238000005339 levitation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
- H02K41/02—Linear motors; Sectional motors
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
- H02K41/02—Linear motors; Sectional motors
- H02K41/035—DC motors; Unipolar motors
- H02K41/0352—Unipolar motors
- H02K41/0354—Lorentz force motors, e.g. voice coil motors
- H02K41/0356—Lorentz force motors, e.g. voice coil motors moving along a straight path
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K2201/00—Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
- H02K2201/18—Machines moving with multiple degrees of freedom
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Electromagnetism (AREA)
- Linear Motors (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Mechanical Engineering (AREA)
- Bearings For Parts Moving Linearly (AREA)
- Electromagnets (AREA)
Description
1.1 ヨーク1の第一の腕部分
1.2 ヨーク1の第二の腕部分
1.3 ヨーク1の閉じた端部
2 棒
3 磁石
4 第一のコイル
5 第二のコイル
6 テーブル
7 ウェーハ
7.1 処理行程
8 ツール
10 磁気ヨーク
10.1 磁極片
10.2 空隙
11 反転用コイル
12 電源
13 スイッチ
14 リブ部
14.1 突起部
15 別個の駆動部の移動行程
FL 反力
X 腕部分1.1,1.2の延伸方向/ウェーハ7の一方の移動方向
Y ウェーハ7の他方の移動方向
Z X及びYに対して直角な方向(垂直方向)
Φ 磁束
Claims (5)
- テーブル(6)の移動方向(X)を反転させる別個の駆動部を有するXYテーブルにおいて、
強磁性のリブ部(14)が、テーブル(6)の端部から突き出て、反転すべきテーブル(6)の移動方向(X)に対して直角に延びており、テーブル(6)が反転地点に近付いた時にリブ部(14)を受け入れる磁気ヨーク(10)が配備され、この磁気ヨーク(10)の自由端が、このヨーク(10)の空隙(10.2)内に磁束を集束させる、反転用コイル(11)により切換可能な磁極片(10.1)を有し、この空隙を通過して、リブ部(14)がヨーク(10)の内部に到達し、
リブ部(14)が少なくとも部分的に磁気ヨーク(10)の外に位置する時に、磁気ヨーク(10)内の磁束が停止状態とされるとともに、リブ部(14)が少なくとも部分的に磁気ヨーク(10)の内部に位置する時に、この磁束が作動状態とされる、
ことを特徴とするXYテーブル。 - リブ部(14)がテーブル(6)の非強磁性の突起部(14.1)上に配置されていることを特徴とする請求項1に記載のXYテーブル。
- リブ部(14)が空隙(10.2)から磁気ヨーク(10)の内部に進行している間に、磁極片(10.1)を介してリブ部(14)を通過する磁束が、リブ部(14)及びリブ部と共にテーブル(6)の方向を反転させる磁気抵抗力を発生させることを特徴とする請求項1又は2に記載のXYテーブル。
- リブ部(14)と、反転用コイル(11)及び磁極片(10.1)を有する磁気ヨーク(10)とが、テーブル(6)の移動方向(X)に関して両側に配置されており、その結果、テーブル(6)が移動方向(X)に対して前方及び後方に動くことができることを特徴とする請求項1から3までのいずれか一つに記載のXYテーブル。
- 二つの磁気ヨーク(10)の間の間隔が、そのため、テーブル(6)の反転地点の間の間隔が調整可能であることを特徴とする請求項4に記載のXYテーブル。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP14174981.2 | 2014-06-30 | ||
EP14174981.2A EP2963790B1 (en) | 2014-06-30 | 2014-06-30 | XY-Table |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016015873A JP2016015873A (ja) | 2016-01-28 |
JP6498037B2 true JP6498037B2 (ja) | 2019-04-10 |
Family
ID=51176916
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015106004A Active JP6498037B2 (ja) | 2014-06-30 | 2015-05-26 | Xyテーブル |
Country Status (5)
Country | Link |
---|---|
US (1) | US9671701B2 (ja) |
EP (1) | EP2963790B1 (ja) |
JP (1) | JP6498037B2 (ja) |
KR (1) | KR102352502B1 (ja) |
CN (1) | CN105322754B (ja) |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5544694A (en) * | 1978-09-27 | 1980-03-29 | Nec Corp | X/y table |
JPH0699327A (ja) * | 1992-09-18 | 1994-04-12 | Yaskawa Electric Corp | X−yテーブルの駆動装置 |
NL1005344C2 (nl) | 1997-02-21 | 1998-08-24 | Stichting Tech Wetenschapp | Aangedreven magneetlager. |
GB2335796B (en) * | 1998-03-12 | 2002-04-10 | Poramaste Jinupun | Variable reluctance solenoid |
TWI248718B (en) | 1999-09-02 | 2006-02-01 | Koninkl Philips Electronics Nv | Displacement device |
US6351201B1 (en) * | 2001-01-17 | 2002-02-26 | Innovative Micro Technology | Microelectromechanical switch with braking algorithm |
JP3849932B2 (ja) * | 2002-08-12 | 2006-11-22 | キヤノン株式会社 | 移動ステージ装置 |
JP2006320166A (ja) * | 2005-05-16 | 2006-11-24 | Suruga Seiki Kk | 二次元移動装置 |
EP1927180B1 (en) * | 2005-08-29 | 2015-11-04 | Koninklijke Philips N.V. | Ironless magnetic linear motors having levitating and transversal force capacities |
JP2007258356A (ja) * | 2006-03-22 | 2007-10-04 | Canon Inc | ステージ装置 |
JP2008010643A (ja) * | 2006-06-29 | 2008-01-17 | Canon Inc | ステージ装置 |
JP2008182210A (ja) * | 2006-12-27 | 2008-08-07 | Canon Inc | ステージ装置、露光装置及びデバイス製造方法 |
US7880864B2 (en) * | 2006-12-27 | 2011-02-01 | Canon Kabusiki Kaisha | Stage apparatus, exposure apparatus, and device manufacturing method |
JP2008193056A (ja) * | 2007-01-12 | 2008-08-21 | Canon Inc | ステージ装置、露光装置及びデバイス製造方法 |
US20080170213A1 (en) * | 2007-01-12 | 2008-07-17 | Canon Kabushiki Kaisha | Stage apparatus, exposure apparatus, and device manufacturing method |
-
2014
- 2014-06-30 EP EP14174981.2A patent/EP2963790B1/en active Active
-
2015
- 2015-05-26 JP JP2015106004A patent/JP6498037B2/ja active Active
- 2015-06-10 KR KR1020150081789A patent/KR102352502B1/ko active IP Right Grant
- 2015-06-29 CN CN201510369745.XA patent/CN105322754B/zh active Active
- 2015-06-30 US US14/755,544 patent/US9671701B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
EP2963790B1 (en) | 2019-06-26 |
US20150378266A1 (en) | 2015-12-31 |
CN105322754A (zh) | 2016-02-10 |
JP2016015873A (ja) | 2016-01-28 |
CN105322754B (zh) | 2019-03-01 |
EP2963790A1 (en) | 2016-01-06 |
US9671701B2 (en) | 2017-06-06 |
KR102352502B1 (ko) | 2022-01-19 |
KR20160002348A (ko) | 2016-01-07 |
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