JP6608172B2 - Xyテーブル用駆動部及びxyテーブル - Google Patents
Xyテーブル用駆動部及びxyテーブル Download PDFInfo
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- JP6608172B2 JP6608172B2 JP2015106005A JP2015106005A JP6608172B2 JP 6608172 B2 JP6608172 B2 JP 6608172B2 JP 2015106005 A JP2015106005 A JP 2015106005A JP 2015106005 A JP2015106005 A JP 2015106005A JP 6608172 B2 JP6608172 B2 JP 6608172B2
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- 230000005291 magnetic effect Effects 0.000 claims description 45
- 230000004907 flux Effects 0.000 claims description 17
- 230000005294 ferromagnetic effect Effects 0.000 claims description 10
- 230000005484 gravity Effects 0.000 claims description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000001133 acceleration Effects 0.000 description 3
- 238000012937 correction Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000003990 capacitor Substances 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- BGPVFRJUHWVFKM-UHFFFAOYSA-N N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] Chemical compound N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] BGPVFRJUHWVFKM-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 239000010438 granite Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000009191 jumping Effects 0.000 description 1
- 238000005339 levitation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
- H02K41/02—Linear motors; Sectional motors
- H02K41/035—DC motors; Unipolar motors
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C32/00—Bearings not otherwise provided for
- F16C32/04—Bearings not otherwise provided for using magnetic or electric supporting means
- F16C32/0406—Magnetic bearings
- F16C32/044—Active magnetic bearings
- F16C32/0472—Active magnetic bearings for linear movement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70816—Bearings
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
- H02K41/02—Linear motors; Sectional motors
- H02K41/035—DC motors; Unipolar motors
- H02K41/0352—Unipolar motors
- H02K41/0354—Lorentz force motors, e.g. voice coil motors
- H02K41/0356—Lorentz force motors, e.g. voice coil motors moving along a straight path
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K2201/00—Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
- H02K2201/18—Machines moving with multiple degrees of freedom
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Electromagnetism (AREA)
- General Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Mechanical Engineering (AREA)
- Linear Motors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Bearings For Parts Moving Linearly (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electromagnets (AREA)
Description
1.1 ヨーク1の第一の腕部分
1.2 ヨーク1の第二の腕部分
1.3 ヨーク1の閉じた端部
2 棒
3 磁石
4 第一のコイル
5 第二のコイル
6 テーブル
7 ウェーハ
7.1 処理行程
8 ツール
10 磁気ヨーク
10.1 磁極片
10.2 空隙
11 反転用コイル
12 電源
13 スイッチ
14 リブ部
14.1 突起部
15 別個の駆動部の移動行程
FL 反力
X 腕部分1.1,1.2の延伸方向/ウェーハ7の一方の移動方向
Y ウェーハ7の他方の移動方向
Z X及びYに対して直角な方向(垂直方向)
Φ 磁束
Claims (10)
- 第一の腕部分(1.1)と、第二の腕部分(1.2)と、第一の腕部分と第二の腕部分とを連結する閉じた端部とが共に一つの平面(XY)内に有る固定位置の強磁性のU字形状のヨーク(1)と、移動可能な強磁性の棒(2)とを備え、ヨーク(1)と棒(2)とで形成する磁気回路の磁束(Φ)が、第一の腕部分と、第二の腕部分と、棒(2)との間の空隙を横切る行路を通って、棒(2)の重力に対抗する垂直方向の磁気抵抗力を発生させる、XYテーブル用の駆動部であって、
前記閉じた端部は、磁束を生じる磁石(3)と、磁気抵抗力を調整する電流を流す第一のコイルとの少なくとも一方を備え、
棒(2)は、平面(XY)に対して平行に、前記平面の下にあって、
第一の腕部分と第二の腕部分との少なくとも一方に第二のコイル(5)が巻き付けられてあって、第二のコイルにエネルギーを供給することによって、棒(2)に加える、強さ及び向きを調整可能な、第一の腕部分と第二の腕部分とに沿った方向の力を作り出すことを特徴とする駆動部。 - 閉じた端部は磁石(3)及び第一のコイル(4)を備え、第一のコイル(4)を流れる電流を制御するためのコントローラ構成が配備され、前記空隙を目標値に調整できることを特徴とする請求項1に記載の駆動部。
- 第二のコイル(5)の長さが、ヨーク(1)に対して相対的な棒(2)の最大行程範囲を決定することを特徴とする請求項1又は2に記載の駆動部。
- 請求項1から3までのいずれか一つに記載の複数の駆動部を有するXYテーブルにおいて、
これらの駆動部の棒(2)が前記ヨークとテーブル(6)との間に配置されていて、このテーブル(6)は、これらの棒(2)に作用する前記垂直方向及び前記第一の腕部分と前記第二の腕部分とに沿った方向の力によって全ての自由度における動きが可能となるように保持されていることを特徴とするXYテーブル。 - テーブル(6)が、前記駆動部の第一の腕部分と第二の腕部分と(1.1,1.2)の平面(XY)に対して平行な面を規定することを特徴とする請求項4に記載のXYテーブル。
- 全ての前記駆動部の前記第一の腕部分と前記第二の腕部分と(1.1,1.2)が同じ方向(X)を向いていることと、
各前記駆動部の棒(2)が、それに対応する第一の腕部分と第二の腕部分と(1.1,1.2)と90°と異なる角度で交差することと、
を特徴とする請求項4又は5に記載のXYテーブル。 - テーブル(6)の方向反転用の別個の駆動部を有し、
別個の駆動部が、テーブル(6)の端部から突き出て、反転すべきテーブル(6)の移動方向(X)に対して直角に延びる強磁性のリブ部(14)と、テーブル(6)が反転地点に近付いた時にリブ部(14)を受け入れる磁気ヨーク(10)とを備えていて、磁気ヨーク(10)の自由端が、ヨーク(10)の空隙(10.2)内に磁束を集束させる、反転用コイル(11)により切換可能な磁極片(10.1)を有し、前記空隙を通過して、リブ部(14)がヨーク(10)の内部に到達することを特徴とする請求項4から6のいずれか一つに記載のXYテーブル。 - リブ部(14)が、テーブル(6)の非強磁性の突起部(14.1)上に配置されていることを特徴とする請求項7に記載のXYテーブル。
- リブ部(14)と、反転用コイル(11)及び磁極片(10.1)を有する磁気ヨーク(10)とが、テーブル(6)の移動方向(X)に関して両側に配置されてあって、テーブル(6)が移動方向(X)に対して前方及び後方に動くことができることを特徴とする請求項7又は8に記載のXYテーブル。
- 二つの磁気ヨーク(10)の間の間隔が、テーブル(6)の反転地点の間の間隔として調整可能であることを特徴とする請求項9に記載のXYテーブル。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP14174983.8 | 2014-06-30 | ||
EP14174983.8A EP2963497B1 (en) | 2014-06-30 | 2014-06-30 | Drive for an XY-Table and XY-Table |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016015874A JP2016015874A (ja) | 2016-01-28 |
JP6608172B2 true JP6608172B2 (ja) | 2019-11-20 |
Family
ID=51178673
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015106005A Active JP6608172B2 (ja) | 2014-06-30 | 2015-05-26 | Xyテーブル用駆動部及びxyテーブル |
Country Status (5)
Country | Link |
---|---|
US (1) | US9923445B2 (ja) |
EP (1) | EP2963497B1 (ja) |
JP (1) | JP6608172B2 (ja) |
KR (1) | KR102352503B1 (ja) |
CN (1) | CN105281536B (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2963497B1 (en) * | 2014-06-30 | 2019-10-16 | Dr. Johannes Heidenhain GmbH | Drive for an XY-Table and XY-Table |
CN109730770B (zh) * | 2018-12-25 | 2020-08-21 | 大博医疗科技股份有限公司 | 减小磁场接收单元体积、测量磁场变化率的方法、磁场接收单元、电磁跟踪系统及用途 |
CN114142692B (zh) * | 2021-11-30 | 2024-04-09 | 哈尔滨电机厂有限责任公司 | 一种水轮发电机两段式磁轭安装的工艺方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4504750A (en) * | 1982-04-21 | 1985-03-12 | Matsushita Electric Industrial Co., Ltd. | Linear motor |
US4995744A (en) * | 1988-12-16 | 1991-02-26 | International Business Machines Corporation | Impact printer actuator using magnet and electromagnetic coil and method of manufacture |
NL1005344C2 (nl) | 1997-02-21 | 1998-08-24 | Stichting Tech Wetenschapp | Aangedreven magneetlager. |
TWI248718B (en) | 1999-09-02 | 2006-02-01 | Koninkl Philips Electronics Nv | Displacement device |
DE60118669T2 (de) * | 2000-08-25 | 2007-01-11 | Asml Netherlands B.V. | Lithographischer Projektionsapparat |
FR2826504B1 (fr) * | 2001-06-25 | 2003-09-12 | Commissariat Energie Atomique | Actionneur magnetique a temps de reponse reduit |
US7683506B2 (en) * | 2005-12-16 | 2010-03-23 | Nikon Corporation | CI-core actuator for long travel in a transverse direction |
EP2492928A3 (en) * | 2011-02-22 | 2017-08-30 | ASML Netherlands BV | Electromagnetic actuator, stage apparatus and lithographic apparatus |
EP2963497B1 (en) * | 2014-06-30 | 2019-10-16 | Dr. Johannes Heidenhain GmbH | Drive for an XY-Table and XY-Table |
-
2014
- 2014-06-30 EP EP14174983.8A patent/EP2963497B1/en active Active
-
2015
- 2015-05-26 JP JP2015106005A patent/JP6608172B2/ja active Active
- 2015-06-10 KR KR1020150081764A patent/KR102352503B1/ko active IP Right Grant
- 2015-06-30 CN CN201510374007.4A patent/CN105281536B/zh active Active
- 2015-06-30 US US14/755,600 patent/US9923445B2/en active Active
Also Published As
Publication number | Publication date |
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EP2963497B1 (en) | 2019-10-16 |
KR102352503B1 (ko) | 2022-01-18 |
KR20160002347A (ko) | 2016-01-07 |
EP2963497A1 (en) | 2016-01-06 |
US20150381023A1 (en) | 2015-12-31 |
JP2016015874A (ja) | 2016-01-28 |
CN105281536B (zh) | 2019-03-19 |
US9923445B2 (en) | 2018-03-20 |
CN105281536A (zh) | 2016-01-27 |
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