JP6461833B2 - 透明焼結体の製造方法 - Google Patents
透明焼結体の製造方法 Download PDFInfo
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- JP6461833B2 JP6461833B2 JP2016013462A JP2016013462A JP6461833B2 JP 6461833 B2 JP6461833 B2 JP 6461833B2 JP 2016013462 A JP2016013462 A JP 2016013462A JP 2016013462 A JP2016013462 A JP 2016013462A JP 6461833 B2 JP6461833 B2 JP 6461833B2
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- sintered body
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Description
本発明の別の態様によれば、セラミックス成型品を得るための上記の製造方法の各工程と、得られた前記セラミックス成型品を加熱して焼結させ、透明焼結体を得る工程とを少なくとも含み、前記透明焼結体が、600nm以上2000nm以下の波長であり、且つ元素由来の特性吸収以外の波長において78%以上の直線透過率である、透明焼結体の製造方法を提供する。
本発明によれば、セラミックス成型品の出発原料(以下、セラミックス原料ともいう)としては、焼結後に所望の透明性が得られる材料であれば特に限定されるものではない。セラミックス成型品の出発原料としては、例えば、組成式RE2O3(REはSc、Y、La、Gd、Tb、Dy、Ho、Er、Tm、Yb及びLuからなる群から選ばれる1種類以上の希土類元素である。)の化合物であることが好ましい。これらの化合物は、立方晶構造を有し、第二相を含まないことが好ましい。また、例えば、酸化スカンジウム粒子、酸化イットリウム粒子、及び、ランタノイド元素からなる群から選択される1種以上の希土類元素の酸化物粒子を単独又は少なくとも2種以上の組み合わせから合成してセラミックス原料としてもよい。セラミックス原料の一次粒子径は、50nm以上1000nm以下の球状又は板状であることが好ましい。
セラミックス顆粒を成型するために、まず、上述したセラミックス原料を、例えば有機添加剤又は焼結助剤を混合して、混合材料を作製する。
次に、上述のようにして得られたスラリー状の混合材料を顆粒化させ、セラミックス顆粒を形成する。スラリー状の混合材料は、例えばエタノール、純水等の溶剤を用いて、混合材料中のセラミックス原料が20〜40質量%(セラミックス濃度)となるようにすることが好ましい。スラリーから溶剤を取り除き顆粒化させる方法としては、例えば、スプレードライ法が挙げられる。また、スプレードライ法以外の手法としては、例えば振動乾燥機によって溶媒を取り除き、その後破断式造粒機を用いて既定の大きさにふるい分けを行って、所望の大きさの顆粒を得てもよい。セラミックス顆粒は、顆粒子径分布が広い場合には分級を行うことで、目的の顆粒径のみを用いることができる。
ハウスナー比=固めかさ密度÷緩めかさ密度
次に、セラミックス顆粒を用いて加圧成型してセラミックス成型品を形成する。成型方法としては、所定の形状に成型できる方法であれば特に限定されるものではなく、例えば、一軸プレス法が挙げられる。また、一軸プレスの後に、さらにCIP処理を行って、より高密度な成型体としてもよい。加圧成形時の圧力は、特に限定されないが、100〜300MPaとすることが好ましい。
次に、必要に応じてセラミックス成型品を加熱して、セラミックス成型品から有機添加剤を除去し、脱脂成型品としてもよい。セラミックス成型品の製造において、最終製品内にバインダー等の有機添加剤を残さないようにするために、1000℃未満の温度で時間をかけてバインダー等を分解する、いわゆる脱脂が一般的に行われている。例えば、大気雰囲気下で、セラミックス成型品を加熱炉に入れて、有機添加剤等の有機物を燃焼し分解し得る温度、例えば、好ましくは250℃以上、より好ましくは400℃以上で加熱する。昇温速度は、有機添加剤の熱分解により発生する二酸化炭素が原因で発生するクラックや割れなどが起きない程度に、ゆっくり昇温させればよい。
次に、脱脂後の成型品を加熱して焼結させて、透明焼結体としてもよい。焼結における加熱方法としては、電気炉加熱、マイクロ波などの誘電加熱などが挙げられる。焼結における雰囲気としては、大気、酸素、窒素、ヘリウム、真空などが挙げられ、所望の成型品に応じて雰囲気を選択する。加熱の保持温度、時間、昇温速度などの焼結プロファイルは、セラミックス成型品が所望の透明性を有するように適宜調整することが望ましい。例えば、加熱の保持温度は、1300〜1800℃であることが好ましく、1400〜1700℃であることがより好ましい。また、加熱時間は、1〜20時間であることが好ましい。焼結後のセラミックス焼結体の相対密度、つまり真密度に対する焼結後の密度は、95%以上100%以下であることが好ましく、焼結によってなるべく高密度化させることが好ましい。
酸化イットリウム粉末(Y2O3、信越化学工業社製)を50gと焼結助剤となるZrO2を0.50gと、所定量のエタノール117gと、粉砕メディアとしてジルコニアボール(ニッカトー社製、平均粒径2mm)と、有機添加剤としてポリオキシエチレンアルキルエーテル系分散剤を0.05gと、ポリビニルアルコール系バインダーを1.0gとを樹脂製のポットに入れ、ボールミル方式で混合し、スラリー化した。この時、スラリー状の混合材料のセラミックスの濃度は約30質量%であり、バインダーの濃度は2質量%である。ボールミル処理の時間は20時間である。こうして得られたスラリー状の混合材料をスプレードライ方式で顆粒化し、さらに篩分級によって所定の大きさを得た。
得られた顆粒を用い、金型による一軸プレス成型を行い、さらにCIP成型を行って、直径7mm高さ16mmの円柱型の成型体を得た。
得られた成型体を、大気雰囲気下、500℃で20時間加熱し、脱脂処理を行った。脱脂後の成型体を、真空条件下、1500℃で2時間加熱し、焼結処理した。焼結させた成型体を、1500℃で3時間加熱してHIP処理を施し、透明焼結体を得た。得られた透明焼結体は、センタレス丸目加工機および研削・ラップ定盤研磨機を用いて、直径5mm厚さ10mmとなるように光学研磨を施した。
セラミックス成型体を形成するための顆粒は、篩分級によって所定の平均粒径のものを使用した。実施例1においては、平均顆粒径が165μmとなるように、180μmの篩を通過し、150μmの篩の上に溜まった顆粒を使用した。
ハウスナー比は、緩めかさ密度に対する固めかさ密度であり、上記で選定した顆粒10gと直径10mmのメスシリンダーを用いて各々測定した。緩めかさ密度は、メスシリンダー内に顆粒をなるべく平らになるように、スパチュラや薬方紙を用いてメスシリンダーの口に沿って回すようにして投入し、顆粒が充填している最大の目盛を読み取り、使用した顆粒の量(g)をその顆粒をメスシリンダーで測定した体積(mL)で割って算出した。一方、固めかさ密度は、まず、緩めかさ密度と同様に、メスシリンダー内に顆粒をなるべく平らになるように投入する。その後、メスシリンダーの外側にゴムホースを用いてタッピングして前後方向及び左右方向の振動を100回加え、振動を加えても体積変化が起きないことを確認し、顆粒が充填しているメスシリンダーの最大の目盛を読み取り、使用した顆粒の量(g)をその顆粒をメスシリンダーで測定した体積(mL)で割って算出した。緩めかさ密度及び固めかさ密度ともに、これらの操作を3回繰り返し、その平均値を用いて、ハウスナー比を算出した。また、透明焼結体の密度をアルキメデス法にて測定し、この値をセラミックス顆粒の真密度とした。緩めかさ密度の平均値を真密度で割って、緩めかさ密度の真密度に対する相対値(%)を算出した。同様にして、固めかさ密度の真密度に対する相対値(%)を算出した。表2に、緩めかさ密度と固めかさ密度の真密度に対する相対値(%)、及び、ハウスナー比を示す。
実施例2〜4は、顆粒径が表2に示すとおりの平均粒径となる顆粒を選定した以外は、実施例1と同様にして実施した。実施例5〜13は、酸化イットリウム粉末の代わりに表2に記載の化合物を用い、顆粒径が表2に示すとおりの平均粒径となる顆粒を選定した以外は、実施例1と同様にして実施した。使用した化合物は、いずれも信越化学工業社製である。実施例14及び15は、Tb2O3(信越化学工業社製)をY2O3とモル比6:4で加え、顆粒径が表2に示すとおりの平均粒径となる顆粒を選定した以外は、実施例1と同様にして実施した。実施例16は、ポリビニルアルコール系バインダーを3.0g(バインダー濃度6質量%)とし、顆粒径が表2に示すとおりの平均粒径となる顆粒を選定した以外は、実施例1と同様にして実施した。実施例17は、ボールミル方式を用いずにマグネチックスターラーを用いて混合して凝集スラリーとし、顆粒径が表2に示すとおりの平均粒径となる顆粒を選定した以外は、実施例1と同様にして実施した。実施例2〜17の顆粒物性を表2に示す。
比較例1〜3は、混合材料中のセラミックス濃度が各々1、3、5質量%となるように、酸化イットリウム粉末(Y2O3、信越化学工業社製)を各々1.1g、3.6g、6.2g使用し、顆粒径が表3に示すとおりの平均粒径となる顆粒を選定した以外は、実施例1と同様にして実施した。比較例4は、ポリビニルアルコール系バインダーを添加せずに、顆粒径が表3に示すとおりの平均粒径となる顆粒を選定した以外は、実施例1と同様にして実施した。比較例1〜4の顆粒物性を表3に示す。
得られた透明焼結体の直線透過率は、紫外可視近赤外吸収スペクトル測定装置を用いて測定した。希土類酸化物は、各元素によって特定の吸収波長をもつため、その特定吸収波長以外の波長で直線透過率を求める。例えば、Tbは485nm付近にf−f遷移に由来する特性吸収を持つが、485nm以上の波長では光吸収を起こさない。今般の実施例においては、600〜1350nmの波長の範囲で、且つ、元素由来の特性吸収波長となる波長以外の範囲で、直線透過率を測定した。直線透過率測定は、透明焼結体の面内において数点行われた。表4に、測定に用いた波長と、その波長での直線透過率の最大値と最小値を示す。
得られた透明焼結体の内部の気泡を、偏光顕微鏡を用いて3mm×3mmの領域について観測した。気泡の大きさ(直径)を、100μm以上と100μm未満に分類した。気泡が0.5個/mm3以上見られた場合は、多数と表現した。結果を表4に示す。
Claims (5)
- 緩めかさ密度と固めかさ密度の商の値であるハウスナー比が1.0を超えて1.2以下のセラミックス顆粒を、加圧成形して、セラミックス成型品を得る工程と、
得られた前記セラミックス成型品を加熱して焼結させ、透明焼結体を得る工程とを少なくとも含み、
前記透明焼結体が、600nm以上2000nm以下の波長であり、且つ元素由来の特性吸収以外の波長において78%以上の直線透過率である、透明焼結体の製造方法。 - 前記セラミックス成型品を得る工程の前に、前記セラミックス顆粒の前記緩めかさ密度と前記固めかさ密度を測定する工程を含む、請求項1に記載の透明焼結体の製造方法。
- 前記セラミックス顆粒の真密度に対する前記緩めかさ密度の相対値が、15%以上20%以下である、請求項1又は2に記載の透明焼結体の製造方法。
- 前記透明焼結体が、組成式RE2O3(REはSc、Y、La、Gd、Tb、Dy、Ho、Er、Tm、Yb及びLuからなる群から選ばれる1種類以上の希土類元素である。)の立方晶構造を有し、第二相を含まない、請求項1〜3のいずれか1項に記載の透明焼結体の製造方法。
- 前記透明焼結体が、蛍光体、光学レンズ又は光学磁気素子に用いられる、請求項1〜4のいずれか1項に記載の透明焼結体の製造方法。
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JP5748012B2 (ja) * | 2014-03-06 | 2015-07-15 | 東ソー株式会社 | 透光性ジルコニア焼結体及びその製造方法及びその用途 |
JP6137044B2 (ja) * | 2014-05-02 | 2017-05-31 | 信越化学工業株式会社 | 磁気光学材料及び磁気光学デバイス |
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