JP6441737B2 - 切削装置 - Google Patents
切削装置 Download PDFInfo
- Publication number
- JP6441737B2 JP6441737B2 JP2015092101A JP2015092101A JP6441737B2 JP 6441737 B2 JP6441737 B2 JP 6441737B2 JP 2015092101 A JP2015092101 A JP 2015092101A JP 2015092101 A JP2015092101 A JP 2015092101A JP 6441737 B2 JP6441737 B2 JP 6441737B2
- Authority
- JP
- Japan
- Prior art keywords
- workpiece
- cutting
- pair
- auxiliary
- temporary placement
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000005520 cutting process Methods 0.000 title claims description 137
- 230000007246 mechanism Effects 0.000 claims description 211
- 238000004140 cleaning Methods 0.000 claims description 41
- 238000003754 machining Methods 0.000 claims description 13
- 238000002347 injection Methods 0.000 claims description 12
- 239000007924 injection Substances 0.000 claims description 12
- 230000001105 regulatory effect Effects 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 11
- 239000007921 spray Substances 0.000 claims description 9
- 230000003028 elevating effect Effects 0.000 claims description 8
- 230000005484 gravity Effects 0.000 claims description 7
- 235000012431 wafers Nutrition 0.000 description 59
- 239000004065 semiconductor Substances 0.000 description 57
- 125000004122 cyclic group Chemical group 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000005406 washing Methods 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67712—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67715—Changing the direction of the conveying path
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/6773—Conveying cassettes, containers or carriers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67772—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Dicing (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015092101A JP6441737B2 (ja) | 2015-04-28 | 2015-04-28 | 切削装置 |
TW105107381A TWI674180B (zh) | 2015-04-28 | 2016-03-10 | 切削裝置 |
KR1020160048047A KR102405690B1 (ko) | 2015-04-28 | 2016-04-20 | 절삭 장치 |
CN201610274010.3A CN106098621B (zh) | 2015-04-28 | 2016-04-28 | 切削装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015092101A JP6441737B2 (ja) | 2015-04-28 | 2015-04-28 | 切削装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016207988A JP2016207988A (ja) | 2016-12-08 |
JP6441737B2 true JP6441737B2 (ja) | 2018-12-19 |
Family
ID=57486683
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015092101A Active JP6441737B2 (ja) | 2015-04-28 | 2015-04-28 | 切削装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6441737B2 (ko) |
KR (1) | KR102405690B1 (ko) |
CN (1) | CN106098621B (ko) |
TW (1) | TWI674180B (ko) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6560110B2 (ja) * | 2015-11-30 | 2019-08-14 | 株式会社ディスコ | 切削装置 |
JP6736682B2 (ja) | 2016-10-24 | 2020-08-05 | パイオニア株式会社 | センサ装置、センシング方法、プログラム及び記憶媒体 |
KR101856875B1 (ko) * | 2016-12-06 | 2018-05-10 | 에스케이실트론 주식회사 | 웨이퍼 캐리어 두께 측정장치 |
JP6762220B2 (ja) * | 2016-12-15 | 2020-09-30 | 株式会社ディスコ | 加工装置の搬送機構 |
JP6896326B2 (ja) * | 2017-03-06 | 2021-06-30 | 株式会社ディスコ | 加工装置 |
JP6909621B2 (ja) * | 2017-04-24 | 2021-07-28 | 株式会社ディスコ | ウォータージェット加工装置 |
JP6855130B2 (ja) * | 2017-06-16 | 2021-04-07 | 株式会社ディスコ | 加工装置 |
CN110892519B (zh) * | 2017-07-12 | 2024-08-06 | 东京毅力科创株式会社 | 输送装置、基板处理系统、输送方法以及基板处理方法 |
JP7032122B2 (ja) * | 2017-12-22 | 2022-03-08 | 株式会社ディスコ | 切削装置 |
JP7463032B2 (ja) | 2020-05-22 | 2024-04-08 | 株式会社ディスコ | 被加工物の保持機構及び加工装置 |
CN114043368B (zh) * | 2021-11-01 | 2024-02-06 | 宁波市易特磁业有限公司 | 一种磁性材料切割装置及加工方法 |
CN117276161B (zh) * | 2023-11-22 | 2024-02-02 | 和研半导体设备(沈阳)有限公司 | 一种晶圆加工系统及方法 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05338728A (ja) * | 1992-06-05 | 1993-12-21 | Fujitsu Ltd | ウエーハ搬送方法及び装置 |
JP3493282B2 (ja) * | 1997-07-02 | 2004-02-03 | 株式会社ディスコ | 切削方法 |
JP3203364B2 (ja) * | 1997-12-01 | 2001-08-27 | 株式会社東京精密 | アライメント方法及びその装置 |
JP3203365B2 (ja) * | 1997-12-02 | 2001-08-27 | 株式会社東京精密 | ダイシング装置におけるワーク切断方法 |
JPH11204461A (ja) * | 1998-01-09 | 1999-07-30 | Disco Abrasive Syst Ltd | フレーム位置決め装置及びフレーム位置決め方法 |
JP2000232080A (ja) * | 1999-02-10 | 2000-08-22 | Disco Abrasive Syst Ltd | 被加工物の分割システム及びペレットの移し替え装置 |
JP4447074B2 (ja) * | 1999-06-21 | 2010-04-07 | 株式会社ディスコ | 切削装置 |
JP2001053034A (ja) * | 1999-08-13 | 2001-02-23 | Tokyo Seimitsu Co Ltd | ワークテーブルの送り機構及びダイシング装置 |
JP2002299288A (ja) * | 2001-04-02 | 2002-10-11 | Tokyo Seimitsu Co Ltd | バーコードリーダ付半導体製造装置 |
JP3956643B2 (ja) * | 2001-04-27 | 2007-08-08 | 株式会社東京精密 | ダイシングマシン |
US6826986B2 (en) * | 2001-05-05 | 2004-12-07 | Ah Beng Lim | Bi-directional singulation system and method |
JP4796249B2 (ja) * | 2001-09-14 | 2011-10-19 | 株式会社ディスコ | 板状物の搬送機構および搬送機構を備えたダイシング装置 |
JP2004235250A (ja) * | 2003-01-28 | 2004-08-19 | Disco Abrasive Syst Ltd | 切削装置 |
JP4813855B2 (ja) * | 2005-09-12 | 2011-11-09 | 株式会社ディスコ | 切削装置および加工方法 |
JP2010003876A (ja) * | 2008-06-20 | 2010-01-07 | Disco Abrasive Syst Ltd | 切削装置 |
JP5373517B2 (ja) * | 2009-09-14 | 2013-12-18 | 株式会社ディスコ | 搬送機構および加工装置 |
JP5964548B2 (ja) * | 2011-02-24 | 2016-08-03 | 株式会社ディスコ | ウエーハ加工装置 |
JP5975703B2 (ja) * | 2012-04-09 | 2016-08-23 | 株式会社ディスコ | 切削装置 |
JP6214901B2 (ja) * | 2013-04-04 | 2017-10-18 | 株式会社ディスコ | 切削装置 |
-
2015
- 2015-04-28 JP JP2015092101A patent/JP6441737B2/ja active Active
-
2016
- 2016-03-10 TW TW105107381A patent/TWI674180B/zh active
- 2016-04-20 KR KR1020160048047A patent/KR102405690B1/ko active IP Right Grant
- 2016-04-28 CN CN201610274010.3A patent/CN106098621B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN106098621B (zh) | 2021-08-03 |
KR20160128224A (ko) | 2016-11-07 |
KR102405690B1 (ko) | 2022-06-03 |
TW201703957A (zh) | 2017-02-01 |
TWI674180B (zh) | 2019-10-11 |
JP2016207988A (ja) | 2016-12-08 |
CN106098621A (zh) | 2016-11-09 |
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