JP6395597B2 - ダイシング用粘着テープおよび半導体チップの製造方法 - Google Patents
ダイシング用粘着テープおよび半導体チップの製造方法 Download PDFInfo
- Publication number
- JP6395597B2 JP6395597B2 JP2014263574A JP2014263574A JP6395597B2 JP 6395597 B2 JP6395597 B2 JP 6395597B2 JP 2014263574 A JP2014263574 A JP 2014263574A JP 2014263574 A JP2014263574 A JP 2014263574A JP 6395597 B2 JP6395597 B2 JP 6395597B2
- Authority
- JP
- Japan
- Prior art keywords
- pressure
- sensitive adhesive
- adhesive tape
- element substrate
- semiconductor element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000004065 semiconductor Substances 0.000 title claims description 174
- 239000002390 adhesive tape Substances 0.000 title claims description 122
- 238000004519 manufacturing process Methods 0.000 title claims description 28
- 239000004820 Pressure-sensitive adhesive Substances 0.000 claims description 166
- 229920001296 polysiloxane Polymers 0.000 claims description 106
- 239000000758 substrate Substances 0.000 claims description 99
- 239000000463 material Substances 0.000 claims description 69
- 229920002050 silicone resin Polymers 0.000 claims description 59
- 239000010410 layer Substances 0.000 claims description 53
- 229920005989 resin Polymers 0.000 claims description 52
- 239000011347 resin Substances 0.000 claims description 52
- 238000007789 sealing Methods 0.000 claims description 47
- 238000007259 addition reaction Methods 0.000 claims description 41
- 150000002978 peroxides Chemical class 0.000 claims description 30
- 239000003795 chemical substances by application Substances 0.000 claims description 26
- 239000003431 cross linking reagent Substances 0.000 claims description 21
- 239000003999 initiator Substances 0.000 claims description 19
- 238000005520 cutting process Methods 0.000 claims description 18
- 239000003054 catalyst Substances 0.000 claims description 15
- 239000013464 silicone adhesive Substances 0.000 claims description 13
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 10
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 10
- 125000000524 functional group Chemical group 0.000 claims description 6
- 239000000853 adhesive Substances 0.000 description 41
- 230000001070 adhesive effect Effects 0.000 description 41
- 239000012790 adhesive layer Substances 0.000 description 25
- 238000000034 method Methods 0.000 description 24
- -1 polyethylene terephthalate Polymers 0.000 description 16
- 239000003607 modifier Substances 0.000 description 14
- 239000000654 additive Substances 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 12
- 230000000996 additive effect Effects 0.000 description 11
- 239000010408 film Substances 0.000 description 10
- ORQBXQOJMQIAOY-UHFFFAOYSA-N nobelium Chemical compound [No] ORQBXQOJMQIAOY-UHFFFAOYSA-N 0.000 description 10
- 229910001220 stainless steel Inorganic materials 0.000 description 10
- 239000010935 stainless steel Substances 0.000 description 10
- 238000012360 testing method Methods 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 9
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000007718 adhesive strength test Methods 0.000 description 6
- 239000004205 dimethyl polysiloxane Substances 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 6
- 238000004381 surface treatment Methods 0.000 description 6
- 229920006026 co-polymeric resin Polymers 0.000 description 5
- 239000013500 performance material Substances 0.000 description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 description 5
- 239000005020 polyethylene terephthalate Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000002131 composite material Substances 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 239000011259 mixed solution Substances 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 239000004925 Acrylic resin Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 239000003522 acrylic cement Substances 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 230000002349 favourable effect Effects 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 150000001451 organic peroxides Chemical class 0.000 description 3
- 239000000123 paper Substances 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000006459 hydrosilylation reaction Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- DMWVYCCGCQPJEA-UHFFFAOYSA-N 2,5-bis(tert-butylperoxy)-2,5-dimethylhexane Chemical compound CC(C)(C)OOC(C)(C)CCC(C)(C)OOC(C)(C)C DMWVYCCGCQPJEA-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- JGDSPOCXKKSJTF-UHFFFAOYSA-N C(C)(C)(C)OOC1=CC(=C(C=C1C(C)C)C(C)C)OOC(C)(C)C Chemical compound C(C)(C)(C)OOC1=CC(=C(C=C1C(C)C)C(C)C)OOC(C)(C)C JGDSPOCXKKSJTF-UHFFFAOYSA-N 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-M Carbamate Chemical compound NC([O-])=O KXDHJXZQYSOELW-UHFFFAOYSA-M 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 229920006378 biaxially oriented polypropylene Polymers 0.000 description 1
- 239000011127 biaxially oriented polypropylene Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- IZYBEMGNIUSSAX-UHFFFAOYSA-N methyl benzenecarboperoxoate Chemical compound COOC(=O)C1=CC=CC=C1 IZYBEMGNIUSSAX-UHFFFAOYSA-N 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920003050 poly-cycloolefin Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000007665 sagging Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- 238000010023 transfer printing Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/06—Non-macromolecular additives organic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/08—Macromolecular additives
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J183/00—Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
- C09J183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2205/00—Polymer mixtures characterised by other features
- C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
- C08L2205/025—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group containing two or more polymers of the same hierarchy C08L, and differing only in parameters such as density, comonomer content, molecular weight, structure
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Dicing (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014263574A JP6395597B2 (ja) | 2014-12-25 | 2014-12-25 | ダイシング用粘着テープおよび半導体チップの製造方法 |
TW104139182A TWI655682B (zh) | 2014-12-25 | 2015-11-25 | 切割用黏著膠帶及半導體晶片的製造方法 |
KR1020150184810A KR102440961B1 (ko) | 2014-12-25 | 2015-12-23 | 다이싱용 점착 테이프 및 반도체칩의 제조 방법 |
CN201510977427.1A CN105733462A (zh) | 2014-12-25 | 2015-12-23 | 切割用粘着胶带和半导体芯片的制造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014263574A JP6395597B2 (ja) | 2014-12-25 | 2014-12-25 | ダイシング用粘着テープおよび半導体チップの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016122812A JP2016122812A (ja) | 2016-07-07 |
JP6395597B2 true JP6395597B2 (ja) | 2018-09-26 |
Family
ID=56296024
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014263574A Active JP6395597B2 (ja) | 2014-12-25 | 2014-12-25 | ダイシング用粘着テープおよび半導体チップの製造方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6395597B2 (ko) |
KR (1) | KR102440961B1 (ko) |
CN (1) | CN105733462A (ko) |
TW (1) | TWI655682B (ko) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI799618B (zh) | 2018-09-03 | 2023-04-21 | 日商麥克賽爾股份有限公司 | 切割用黏著帶及半導體晶片之製造方法 |
KR20220116184A (ko) | 2019-12-19 | 2022-08-22 | 맥셀 주식회사 | 다이싱용 점착 테이프 및 반도체칩의 제조 방법 |
JPWO2021124724A1 (ko) | 2019-12-20 | 2021-06-24 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005093503A (ja) | 2003-09-12 | 2005-04-07 | Hitachi Cable Ltd | ダイシング方法 |
TWI384046B (zh) * | 2005-10-20 | 2013-02-01 | Shinetsu Chemical Co | An adhesive composition and a sheet having an adhesive layer made of an adhesive |
US20110212328A1 (en) * | 2007-08-27 | 2011-09-01 | Lintec Corporation | Releasable adhesive sheet and method for protecting incompletely cured coating film |
JP5718005B2 (ja) * | 2010-09-14 | 2015-05-13 | 日東電工株式会社 | 半導体装置製造用耐熱性粘着テープ及びそのテープを用いた半導体装置の製造方法。 |
JP2012119395A (ja) * | 2010-11-29 | 2012-06-21 | Furukawa Electric Co Ltd:The | 半導体デバイスダイシング用粘着テープ及び半導体デバイスチップの製造方法 |
JP2012151761A (ja) * | 2011-01-20 | 2012-08-09 | Nitto Denko Corp | 固体撮像デバイス用表面保護用粘着テープ |
JP2012169573A (ja) * | 2011-02-17 | 2012-09-06 | Furukawa Electric Co Ltd:The | ダイシングダイボンドシートおよびled用サファイヤ基板の加工方法 |
JP2013038408A (ja) | 2011-07-14 | 2013-02-21 | Nitto Denko Corp | 半導体ウェハ固定用粘着テープ、半導体チップの製造方法及び接着フィルム付き粘着テープ |
JP6150415B2 (ja) * | 2011-09-27 | 2017-06-21 | 日本化薬株式会社 | 硬化性樹脂組成物およびその硬化物 |
CN103421433A (zh) * | 2012-05-14 | 2013-12-04 | 日立麦克赛尔株式会社 | 塑料透镜成型用粘着带及塑料透镜成型方法 |
JP6236277B2 (ja) * | 2012-11-30 | 2017-11-22 | マクセルホールディングス株式会社 | プラスチックレンズ成型用粘着テープおよびプラスチックレンズ成型品の成型方法 |
JP6222941B2 (ja) * | 2013-02-21 | 2017-11-01 | 日東電工株式会社 | アンダーフィルシート、裏面研削用テープ一体型アンダーフィルシート、ダイシングテープ一体型アンダーフィルシート及び半導体装置の製造方法 |
JP6168553B2 (ja) * | 2013-08-30 | 2017-07-26 | 日立マクセル株式会社 | ダイシング用粘着テープおよび半導体チップの製造方法 |
-
2014
- 2014-12-25 JP JP2014263574A patent/JP6395597B2/ja active Active
-
2015
- 2015-11-25 TW TW104139182A patent/TWI655682B/zh active
- 2015-12-23 KR KR1020150184810A patent/KR102440961B1/ko active IP Right Grant
- 2015-12-23 CN CN201510977427.1A patent/CN105733462A/zh not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
KR102440961B1 (ko) | 2022-09-07 |
TWI655682B (zh) | 2019-04-01 |
TW201635356A (zh) | 2016-10-01 |
KR20160078908A (ko) | 2016-07-05 |
JP2016122812A (ja) | 2016-07-07 |
CN105733462A (zh) | 2016-07-06 |
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