JP6385443B2 - Ｓｅｍにおける向上した試料アクセスのためのノッチ付き磁気レンズ - Google Patents

Ｓｅｍにおける向上した試料アクセスのためのノッチ付き磁気レンズ Download PDF

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Publication number
JP6385443B2
JP6385443B2 JP2016544052A JP2016544052A JP6385443B2 JP 6385443 B2 JP6385443 B2 JP 6385443B2 JP 2016544052 A JP2016544052 A JP 2016544052A JP 2016544052 A JP2016544052 A JP 2016544052A JP 6385443 B2 JP6385443 B2 JP 6385443B2
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Japan
Prior art keywords
pole piece
gap
notches
immersion lens
outer pole
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JP2016544052A
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Japanese (ja)
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JP2016534537A (ja
JP2016534537A5 (enExample
Inventor
クリストファー エム シアーズ
クリストファー エム シアーズ
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KLA Corp
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KLA Corp
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/14—Lenses magnetic
    • H01J2237/1405—Constructional details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/14—Lenses magnetic
    • H01J2237/1405—Constructional details
    • H01J2237/1415—Bores or yokes, i.e. magnetic circuit in general
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2803—Scanning microscopes characterised by the imaging method
    • H01J2237/2807—X-rays

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2016544052A 2013-09-23 2014-09-22 Ｓｅｍにおける向上した試料アクセスのためのノッチ付き磁気レンズ Active JP6385443B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201361881351P 2013-09-23 2013-09-23
US61/881,351 2013-09-23
US14/490,565 2014-09-18
US14/490,565 US9082580B2 (en) 2013-09-23 2014-09-18 Notched magnetic lens for improved sample access in an SEM
PCT/US2014/056832 WO2015042545A1 (en) 2013-09-23 2014-09-22 Notched magnetic lens for improved sample access in an sem

Publications (3)

Publication Number Publication Date
JP2016534537A JP2016534537A (ja) 2016-11-04
JP2016534537A5 JP2016534537A5 (enExample) 2017-11-02
JP6385443B2 true JP6385443B2 (ja) 2018-09-05

Family

ID=52689517

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016544052A Active JP6385443B2 (ja) 2013-09-23 2014-09-22 Ｓｅｍにおける向上した試料アクセスのためのノッチ付き磁気レンズ

Country Status (5)

Country Link
US (2) US9082580B2 (enExample)
JP (1) JP6385443B2 (enExample)
KR (1) KR102142176B1 (enExample)
TW (1) TWI621148B (enExample)
WO (1) WO2015042545A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9082580B2 (en) 2013-09-23 2015-07-14 Kla-Tencor Corporation Notched magnetic lens for improved sample access in an SEM
US10056224B2 (en) * 2015-08-10 2018-08-21 Kla-Tencor Corporation Method and system for edge-of-wafer inspection and review
JP2021086793A (ja) * 2019-11-29 2021-06-03 株式会社日立ハイテク 荷電粒子ビームシステム、荷電粒子線装置における焦点位置を自動で探索する範囲を決定する方法、およびコンピュータシステムに、荷電粒子線装置における焦点位置を自動で探索する範囲を決定させるためのプログラムを記録した非一時的記憶媒体

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5149435B2 (enExample) * 1972-08-03 1976-12-27
JPS6091544A (ja) * 1983-10-24 1985-05-22 Anelva Corp オ−ジエ分析装置
JPH04342941A (ja) * 1991-05-21 1992-11-30 Jeol Ltd 電子顕微鏡の超伝導対物レンズ
JP2653967B2 (ja) * 1993-06-15 1997-09-17 株式会社トプコン 分析電子顕微鏡
JP2588833B2 (ja) * 1993-06-25 1997-03-12 株式会社トプコン 分析電子顕微鏡
JP2875940B2 (ja) * 1993-08-26 1999-03-31 株式会社日立製作所 試料の高さ計測手段を備えた電子ビーム装置
JP3101141B2 (ja) * 1994-02-08 2000-10-23 日本電子株式会社 電子ビーム装置
JPH08124512A (ja) * 1994-10-21 1996-05-17 Jeol Ltd 反射電子検出器を備えた粒子線装置
JPH1154076A (ja) * 1997-07-31 1999-02-26 Seiko Instr Inc 走査型電子顕微鏡用対物レンズ
GB2348048A (en) * 1999-03-19 2000-09-20 Shimadzu Research Lab Magnetic immersion lenses
JP2002042713A (ja) * 2000-07-28 2002-02-08 Jeol Ltd 対物レンズ内検出器を備えた走査電子顕微鏡
US6624426B2 (en) * 2000-12-11 2003-09-23 Schlumberger Technologies Inc. Split magnetic lens for controlling a charged particle beam
FR2837931B1 (fr) * 2002-03-29 2004-12-10 Cameca Dispositif de mesure de l'emission de rayons x produite par un objet soumis a un faisceau d'electrons
TW200703409A (en) * 2005-03-03 2007-01-16 Ebara Corp Mapping projection type electron beam apparatus and defects inspection system using such apparatus
EP1777728A1 (en) * 2005-10-20 2007-04-25 Carl Zeiss SMS GmbH Lithography system
JP2009193811A (ja) 2008-02-14 2009-08-27 Jeol Ltd 試料ホルダ及び電子顕微鏡
JP5489412B2 (ja) 2008-03-26 2014-05-14 株式会社マーストーケンソリューション 蛍光ｘ線分析機能付き高分解能ｘ線顕微装置
JP5694317B2 (ja) 2009-07-17 2015-04-01 ケーエルエー−テンカー・コーポレーションＫｌａ−Ｔｅｎｃｏｒ Ｃｏｒｐｏｒａｔｉｏｎ 荷電粒子エネルギー分析器装置および方法
US8319192B2 (en) * 2010-08-24 2012-11-27 Hermes Microvision Inc. Charged particle apparatus
EP2651627B1 (en) * 2010-12-16 2015-07-08 Essilor International (Compagnie Générale D'Optique) Method of dip-coating a segmented multifocal lens
US8752437B2 (en) 2011-03-15 2014-06-17 Kla-Tencor Corporation Magnet strength measurement
US8455838B2 (en) 2011-06-29 2013-06-04 Kla-Tencor Corporation Multiple-column electron beam apparatus and methods
US8633457B2 (en) 2011-06-30 2014-01-21 Kla-Tencor Corporation Background reduction system including louver
US8698094B1 (en) 2011-07-20 2014-04-15 Kla-Tencor Corporation Permanent magnet lens array
US8451705B2 (en) * 2011-09-13 2013-05-28 Seagate Technology Llc Plasmonic transducer having two metal elements with a gap disposed therebetween
US9000394B2 (en) * 2011-12-20 2015-04-07 Hermes Microvision, Inc. Multi-axis magnetic lens for focusing a plurality of charged particle beams
US8513619B1 (en) 2012-05-10 2013-08-20 Kla-Tencor Corporation Non-planar extractor structure for electron source
US8658973B2 (en) 2012-06-12 2014-02-25 Kla-Tencor Corporation Auger elemental identification algorithm
US9082580B2 (en) 2013-09-23 2015-07-14 Kla-Tencor Corporation Notched magnetic lens for improved sample access in an SEM

Also Published As

Publication number Publication date
KR102142176B1 (ko) 2020-08-06
US20150279610A1 (en) 2015-10-01
KR20160058899A (ko) 2016-05-25
JP2016534537A (ja) 2016-11-04
TWI621148B (zh) 2018-04-11
TW201521072A (zh) 2015-06-01
US9082580B2 (en) 2015-07-14
WO2015042545A1 (en) 2015-03-26
US9443693B2 (en) 2016-09-13
US20150083926A1 (en) 2015-03-26

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