TWI621148B - 於一掃描型電子顯微鏡（ｓｅｍ）中用於改善樣本存取之缺口磁透鏡 - Google Patents
於一掃描型電子顯微鏡（ｓｅｍ）中用於改善樣本存取之缺口磁透鏡 Download PDFInfo
- Publication number
- TWI621148B TWI621148B TW103132837A TW103132837A TWI621148B TW I621148 B TWI621148 B TW I621148B TW 103132837 A TW103132837 A TW 103132837A TW 103132837 A TW103132837 A TW 103132837A TW I621148 B TWI621148 B TW I621148B
- Authority
- TW
- Taiwan
- Prior art keywords
- pole piece
- gap
- outer pole
- indentations
- scanning system
- Prior art date
Links
- 239000002245 particle Substances 0.000 claims abstract description 64
- 238000007654 immersion Methods 0.000 claims abstract description 49
- 238000007373 indentation Methods 0.000 claims description 47
- 230000003287 optical effect Effects 0.000 claims description 25
- 238000010894 electron beam technology Methods 0.000 claims description 19
- 230000007547 defect Effects 0.000 claims description 3
- 238000001514 detection method Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 3
- 239000011163 secondary particle Substances 0.000 description 13
- 230000006870 function Effects 0.000 description 5
- 230000005284 excitation Effects 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- 238000001493 electron microscopy Methods 0.000 description 3
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 201000009310 astigmatism Diseases 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000000190 proton-induced X-ray emission spectroscopy Methods 0.000 description 2
- 238000000682 scanning probe acoustic microscopy Methods 0.000 description 2
- 238000001350 scanning transmission electron microscopy Methods 0.000 description 2
- 238000004402 ultra-violet photoelectron spectroscopy Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 241000736305 Marsilea quadrifolia Species 0.000 description 1
- 241000219793 Trifolium Species 0.000 description 1
- 238000004125 X-ray microanalysis Methods 0.000 description 1
- 238000002083 X-ray spectrum Methods 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 230000005283 ground state Effects 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000001433 helium-ion microscopy Methods 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000004876 x-ray fluorescence Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
- H01J37/14—Lenses magnetic
- H01J37/141—Electromagnetic lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/10—Lenses
- H01J2237/14—Lenses magnetic
- H01J2237/1405—Constructional details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/10—Lenses
- H01J2237/14—Lenses magnetic
- H01J2237/1405—Constructional details
- H01J2237/1415—Bores or yokes, i.e. magnetic circuit in general
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2803—Scanning microscopes characterised by the imaging method
- H01J2237/2807—X-rays
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361881351P | 2013-09-23 | 2013-09-23 | |
| US61/881,351 | 2013-09-23 | ||
| US14/490,565 | 2014-09-18 | ||
| US14/490,565 US9082580B2 (en) | 2013-09-23 | 2014-09-18 | Notched magnetic lens for improved sample access in an SEM |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201521072A TW201521072A (zh) | 2015-06-01 |
| TWI621148B true TWI621148B (zh) | 2018-04-11 |
Family
ID=52689517
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103132837A TWI621148B (zh) | 2013-09-23 | 2014-09-23 | 於一掃描型電子顯微鏡（ｓｅｍ）中用於改善樣本存取之缺口磁透鏡 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US9082580B2 (enExample) |
| JP (1) | JP6385443B2 (enExample) |
| KR (1) | KR102142176B1 (enExample) |
| TW (1) | TWI621148B (enExample) |
| WO (1) | WO2015042545A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI768494B (zh) * | 2019-11-29 | 2022-06-21 | 日商日立全球先端科技股份有限公司 | 帶電粒子束系統，決定自動搜尋帶電粒子線裝置中的焦點位置之範圍的方法，及記錄著用來令電腦系統決定自動搜尋帶電粒子線裝置中的焦點位置之範圍的程式之非暫態性記憶媒體 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9082580B2 (en) | 2013-09-23 | 2015-07-14 | Kla-Tencor Corporation | Notched magnetic lens for improved sample access in an SEM |
| US10056224B2 (en) * | 2015-08-10 | 2018-08-21 | Kla-Tencor Corporation | Method and system for edge-of-wafer inspection and review |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4639597A (en) * | 1983-10-24 | 1987-01-27 | Anelva Corporation | Auger electron spectrometer capable of attaining a high resolution |
| US5598002A (en) * | 1993-08-26 | 1997-01-28 | Hitachi, Ltd. | Electron beam apparatus |
| TW548664B (en) * | 2000-12-11 | 2003-08-21 | Schlumberger Technologies Inc | Split magnetic lens for controlling a charged particle beam |
| TW201209877A (en) * | 2010-08-24 | 2012-03-01 | Hermes Microvision Inc | Charged particle apparatus |
| US20130153782A1 (en) * | 2011-12-20 | 2013-06-20 | Hermes Microvision, Inc. | Multi-axis Magnetic Lens for Focusing a Plurality of Charged Particle Beams |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5149435B2 (enExample) * | 1972-08-03 | 1976-12-27 | ||
| JPH04342941A (ja) * | 1991-05-21 | 1992-11-30 | Jeol Ltd | 電子顕微鏡の超伝導対物レンズ |
| JP2653967B2 (ja) * | 1993-06-15 | 1997-09-17 | 株式会社トプコン | 分析電子顕微鏡 |
| JP2588833B2 (ja) * | 1993-06-25 | 1997-03-12 | 株式会社トプコン | 分析電子顕微鏡 |
| JP3101141B2 (ja) * | 1994-02-08 | 2000-10-23 | 日本電子株式会社 | 電子ビーム装置 |
| JPH08124512A (ja) * | 1994-10-21 | 1996-05-17 | Jeol Ltd | 反射電子検出器を備えた粒子線装置 |
| JPH1154076A (ja) * | 1997-07-31 | 1999-02-26 | Seiko Instr Inc | 走査型電子顕微鏡用対物レンズ |
| GB2348048A (en) * | 1999-03-19 | 2000-09-20 | Shimadzu Research Lab | Magnetic immersion lenses |
| JP2002042713A (ja) * | 2000-07-28 | 2002-02-08 | Jeol Ltd | 対物レンズ内検出器を備えた走査電子顕微鏡 |
| FR2837931B1 (fr) * | 2002-03-29 | 2004-12-10 | Cameca | Dispositif de mesure de l'emission de rayons x produite par un objet soumis a un faisceau d'electrons |
| TW200703409A (en) * | 2005-03-03 | 2007-01-16 | Ebara Corp | Mapping projection type electron beam apparatus and defects inspection system using such apparatus |
| EP1777728A1 (en) * | 2005-10-20 | 2007-04-25 | Carl Zeiss SMS GmbH | Lithography system |
| JP2009193811A (ja) | 2008-02-14 | 2009-08-27 | Jeol Ltd | 試料ホルダ及び電子顕微鏡 |
| JP5489412B2 (ja) | 2008-03-26 | 2014-05-14 | 株式会社マーストーケンソリューション | 蛍光ｘ線分析機能付き高分解能ｘ線顕微装置 |
| JP5694317B2 (ja) | 2009-07-17 | 2015-04-01 | ケーエルエー−テンカー・コーポレーションＫｌａ−Ｔｅｎｃｏｒ Ｃｏｒｐｏｒａｔｉｏｎ | 荷電粒子エネルギー分析器装置および方法 |
| EP2651627B1 (en) * | 2010-12-16 | 2015-07-08 | Essilor International (Compagnie Générale D'Optique) | Method of dip-coating a segmented multifocal lens |
| US8752437B2 (en) | 2011-03-15 | 2014-06-17 | Kla-Tencor Corporation | Magnet strength measurement |
| US8455838B2 (en) | 2011-06-29 | 2013-06-04 | Kla-Tencor Corporation | Multiple-column electron beam apparatus and methods |
| US8633457B2 (en) | 2011-06-30 | 2014-01-21 | Kla-Tencor Corporation | Background reduction system including louver |
| US8698094B1 (en) | 2011-07-20 | 2014-04-15 | Kla-Tencor Corporation | Permanent magnet lens array |
| US8451705B2 (en) * | 2011-09-13 | 2013-05-28 | Seagate Technology Llc | Plasmonic transducer having two metal elements with a gap disposed therebetween |
| US8513619B1 (en) | 2012-05-10 | 2013-08-20 | Kla-Tencor Corporation | Non-planar extractor structure for electron source |
| US8658973B2 (en) | 2012-06-12 | 2014-02-25 | Kla-Tencor Corporation | Auger elemental identification algorithm |
| US9082580B2 (en) | 2013-09-23 | 2015-07-14 | Kla-Tencor Corporation | Notched magnetic lens for improved sample access in an SEM |
-
2014
- 2014-09-18 US US14/490,565 patent/US9082580B2/en active Active
- 2014-09-22 KR KR1020167010267A patent/KR102142176B1/ko active Active
- 2014-09-22 JP JP2016544052A patent/JP6385443B2/ja active Active
- 2014-09-22 WO PCT/US2014/056832 patent/WO2015042545A1/en not_active Ceased
- 2014-09-23 TW TW103132837A patent/TWI621148B/zh active
-
2015
- 2015-06-12 US US14/738,632 patent/US9443693B2/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4639597A (en) * | 1983-10-24 | 1987-01-27 | Anelva Corporation | Auger electron spectrometer capable of attaining a high resolution |
| US5598002A (en) * | 1993-08-26 | 1997-01-28 | Hitachi, Ltd. | Electron beam apparatus |
| TW548664B (en) * | 2000-12-11 | 2003-08-21 | Schlumberger Technologies Inc | Split magnetic lens for controlling a charged particle beam |
| TW201209877A (en) * | 2010-08-24 | 2012-03-01 | Hermes Microvision Inc | Charged particle apparatus |
| US20130153782A1 (en) * | 2011-12-20 | 2013-06-20 | Hermes Microvision, Inc. | Multi-axis Magnetic Lens for Focusing a Plurality of Charged Particle Beams |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI768494B (zh) * | 2019-11-29 | 2022-06-21 | 日商日立全球先端科技股份有限公司 | 帶電粒子束系統，決定自動搜尋帶電粒子線裝置中的焦點位置之範圍的方法，及記錄著用來令電腦系統決定自動搜尋帶電粒子線裝置中的焦點位置之範圍的程式之非暫態性記憶媒體 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR102142176B1 (ko) | 2020-08-06 |
| US20150279610A1 (en) | 2015-10-01 |
| KR20160058899A (ko) | 2016-05-25 |
| JP2016534537A (ja) | 2016-11-04 |
| JP6385443B2 (ja) | 2018-09-05 |
| TW201521072A (zh) | 2015-06-01 |
| US9082580B2 (en) | 2015-07-14 |
| WO2015042545A1 (en) | 2015-03-26 |
| US9443693B2 (en) | 2016-09-13 |
| US20150083926A1 (en) | 2015-03-26 |
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