JP6371904B2 - ペリクルの製造方法およびペリクル付フォトマスクの製造方法 - Google Patents
ペリクルの製造方法およびペリクル付フォトマスクの製造方法 Download PDFInfo
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- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
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Description
[ペリクル付フォトマスクの構成]
図1Aは、第1実施形態によって完成されたペリクル付フォトマスクの模式図(上面図)で、図1Bは、第1実施形態に係るペリクル付フォトマスクの図1AのA−A線における断面図である。ペリクル付フォトマスク1は、ペリクル10とフォトマスク104とを含む。ペリクル10がフォトマスク104のパターンが形成された面側に取り付けられている。ペリクル10は、ペリクル膜101、ペリクル枠102および枠体103を含む。
本実施形態に係るペリクル付フォトマスクは、例えば、図2Aから図2Eを参照し、以下のように製造することができる。なお、以下の製造工程は一例である。図2Aから図2Eは、一実施形態に係るペリクル付フォトマスクの製造工程を示す模式図である。基板105を準備し、基板105上にペリクル膜101を形成する(図2A)。基板105は、最終的には、ペリクル枠102になるものである。基板105には、例えば、シリコン基板、サファイア基板、炭化ケイ素基板等を用いることができるが、これに限定されるものではない。
図3Aは、本発明の第1実施形態に係る粘着シートの貼り付け位置の上面図で、図3Bは、図3Aのトリミングする部分を拡大した図である。一点鎖線は、反対側の面から基板105をエッチング(バックエッチング)してペリクル膜101が露出した領域を示す。図3Aは、枠状の粘着シート106の貼り付け位置を示すが、粘着シート106は枠状に限らずペリクル膜101の上面を覆ってもよい。まず、図2Cに示すトリミングを実施するときには、図3Bの破線で示した切断予定線Lをカバーするように、基板105の両面に粘着シートが貼り付けられる。すなわち、ペリクル膜101の上面には、粘着シート106が貼り付けられる。図3A及び図3Bには記載がないが、基板105の下面には、粘着シート107が貼り付けられている(図4Aから図4C参照)。粘着シート106、107は、伸縮性があり外部からの刺激があると粘着力が低下するシートである。伸縮性があるとは、好ましくは粘着シートのヤング率が100MPa〜600MPaであり、伸縮率が20〜40%の範囲において、引張強度が10MPa以上であるとよい。外部からの刺激とは、紫外光を意味する。なお、外部からの刺激であれば、紫外光に限らず、熱など他の刺激であってもよい。
第2実施形態では、基板のうちペリクル枠となる部分と基板外周部との間に開口部が予め形成され、ブリッジ部を介して互いに連結されている場合の粘着シートの貼り付け方法について説明する。この例によれば、トリミングのために切れ込みを入れる必要がある部分は、ブリッジ部のみである。
第3実施形態では、基板の構成は、第2実施形態と同じであり、粘着シートの貼り方が異なっている。
10:ペリクル
101、201、401、501、601:ペリクル膜
102、402、502、602:ペリクル枠
103:枠体
104:フォトマスク
105、405、505、605:基板
106、206、306:粘着シート
107、207、207A、307、307A、607:粘着シート
108、608:切れ込み
109、409、509、609:異物粒子
202:ペリクル枠となる部分
210:ブリッジ部
111、211:基板外周部
212:開口部
Claims (11)
- ペリクル膜およびペリクル膜の周囲を支持するペリクル枠を含むペリクルを製造する方法であって、
基板上にペリクル膜を形成し、伸縮性があり外部からの刺激を受けると粘着力が低下する粘着シートを前記基板の両面側に貼り付け、
前記粘着シートが貼り付けられた部分の前記基板の内部に切れ込みを入れ、
前記粘着シートが貼り付けられた状態を維持して、前記基板の前記切れ込みが入った部分の外側の基板外周部を分離することによってペリクル枠を形成し、
前記粘着シートに前記刺激を与えて粘着シートを剥離する
ことを含むペリクルの製造方法。 - 前記基板のペリクル膜が形成された面とは反対側の面からエッチングして前記ペリクル膜を露出することを含む、請求項1に記載のペリクルの製造方法。
- 前記基板の前記ペリクル膜が形成された面とは反対側の面からエッチングして前記ペリクル膜を露出した後、
前記ペリクル膜が露出した領域の周囲において、前記粘着シートを前記基板の両面側に貼り付ける、請求項1または請求項2に記載のペリクルの製造方法。 - 前記基板は、ペリクル枠となる部分と基板外周部との間に開口部を有し、前記ペリクル枠となる部分と前記基板外周部との間を繋ぐブリッジ部を備え、
前記基板の内部に切れ込みを入れることは、前記ブリッジ部への切れ込みを入れることである、請求項1乃至請求項3のいずれかに記載のペリクルの製造方法。 - 前記粘着シートは、前記ブリッジ部の両面および側面を覆うように貼り付けられる、請求項4に記載のペリクルの製造方法。
- 前記ブリッジ部は、前記ペリクル枠の4隅に接続されている、請求項4または請求項5に記載のペリクルの製造方法。
- 前記基板の内部に切れ込みを入れることは、ステルスダイシング法を用いる、請求項1乃至請求項6のいずれかに記載のペリクルの製造方法。
- 前記粘着シートは帯電防止性を有する、請求項1乃至請求項7のいずれかに記載のペリクルの製造方法。
- 前記基板外周部を分離して前記ペリクル枠を形成する際に、吸引装置で分離部分の気体を吸引する、請求項1乃至請求項8のいずれかに記載のペリクルの製造方法。
- 前記ペリクル膜は、膜厚が10nm以上50nm以下である、請求項1乃至請求項9のいずれかに記載のペリクルの製造方法。
- 請求項1乃至請求項10のいずれかに記載のペリクルの製造方法によって製造されたペリクルを、前記ペリクル枠に取り付けられる枠体を介して、フォトマスクに接合することを含むペリクル付フォトマスクの製造方法。
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JP6275270B2 (ja) * | 2014-09-19 | 2018-02-07 | 三井化学株式会社 | ペリクル、その製造方法及び露光方法 |
JP6367342B2 (ja) * | 2014-09-19 | 2018-08-01 | 三井化学株式会社 | ペリクル、ペリクルの製造方法及びペリクルを用いた露光方法 |
KR20180072786A (ko) * | 2015-10-22 | 2018-06-29 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치를 위한 펠리클 제조 방법, 리소그래피 장치를 위한 펠리클 장치, 리소그래피 장치, 디바이스 제조 방법, 펠리클 처리 장치, 및 펠리클 처리 방법 |
JP6844443B2 (ja) * | 2017-06-23 | 2021-03-17 | 信越化学工業株式会社 | フォトリソグラフィ用ペリクル膜、ペリクル及びフォトマスク、露光方法並びに半導体デバイス又は液晶ディスプレイの製造方法 |
KR102459119B1 (ko) * | 2018-06-12 | 2022-10-26 | 미쯔이가가꾸가부시끼가이샤 | 펠리클용 지지 프레임, 펠리클 및 펠리클용 지지 프레임의 제조 방법, 그리고 펠리클을 사용한 노광 원판 및 노광 장치 |
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EP4325290A1 (en) | 2021-04-13 | 2024-02-21 | Shin-Etsu Chemical Co., Ltd. | Pellicle frame laminate and method for manufacturing pellicle using said laminate |
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US5793836A (en) * | 1996-09-06 | 1998-08-11 | International Business Machines Corporation | X-ray mask pellicle |
US5814381A (en) * | 1997-04-04 | 1998-09-29 | Inko Industrial Corporation | Pellicle assembly having a vented frame |
JP2000292909A (ja) * | 1999-04-09 | 2000-10-20 | Shin Etsu Chem Co Ltd | ペリクルおよびペリクルの製造方法 |
US6593035B1 (en) * | 2001-01-26 | 2003-07-15 | Advanced Micro Devices, Inc. | Pellicle for use in small wavelength lithography and a method for making such a pellicle using polymer films |
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JP2011076042A (ja) | 2009-10-02 | 2011-04-14 | Shin-Etsu Chemical Co Ltd | ペリクル |
JP5152870B2 (ja) | 2009-12-07 | 2013-02-27 | 信越化学工業株式会社 | リソグラフィ用ペリクル及びその製造方法 |
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US8586267B2 (en) * | 2011-09-12 | 2013-11-19 | Samsung Austin Semiconductor, L.P. | Removable transparent membrane for a pellicle |
WO2014188710A1 (ja) * | 2013-05-24 | 2014-11-27 | 三井化学株式会社 | ペリクル、及びこれらを含むeuv露光装置 |
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