JP6360760B2 - 銅張積層板及び回路基板 - Google Patents
銅張積層板及び回路基板 Download PDFInfo
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- JP6360760B2 JP6360760B2 JP2014190773A JP2014190773A JP6360760B2 JP 6360760 B2 JP6360760 B2 JP 6360760B2 JP 2014190773 A JP2014190773 A JP 2014190773A JP 2014190773 A JP2014190773 A JP 2014190773A JP 6360760 B2 JP6360760 B2 JP 6360760B2
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- Prior art keywords
- copper
- clad laminate
- copper foil
- wiring
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 164
- 239000011889 copper foil Substances 0.000 claims description 99
- 229920001721 polyimide Polymers 0.000 claims description 74
- 239000004642 Polyimide Substances 0.000 claims description 70
- 229910052802 copper Inorganic materials 0.000 claims description 65
- 239000010949 copper Substances 0.000 claims description 65
- 230000008859 change Effects 0.000 claims description 51
- 238000012360 testing method Methods 0.000 claims description 40
- 238000000034 method Methods 0.000 claims description 37
- 230000001186 cumulative effect Effects 0.000 claims description 25
- 238000005530 etching Methods 0.000 claims description 22
- 238000005259 measurement Methods 0.000 claims description 22
- 230000008569 process Effects 0.000 claims description 21
- 238000005520 cutting process Methods 0.000 claims description 6
- 238000001035 drying Methods 0.000 claims description 6
- 239000002243 precursor Substances 0.000 claims description 6
- 238000009413 insulation Methods 0.000 claims description 3
- 238000010998 test method Methods 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 112
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 38
- 238000011156 evaluation Methods 0.000 description 22
- 238000005452 bending Methods 0.000 description 15
- 229920005575 poly(amic acid) Polymers 0.000 description 15
- 239000011347 resin Substances 0.000 description 14
- 229920005989 resin Polymers 0.000 description 14
- 238000004519 manufacturing process Methods 0.000 description 12
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 238000012545 processing Methods 0.000 description 8
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- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
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- -1 Methyl-4-aminopentyl Chemical group 0.000 description 5
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- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- QYIMZXITLDTULQ-UHFFFAOYSA-N 4-(4-amino-2-methylphenyl)-3-methylaniline Chemical group CC1=CC(N)=CC=C1C1=CC=C(N)C=C1C QYIMZXITLDTULQ-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
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- 238000003475 lamination Methods 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- UBGIFSWRDUBQIC-UHFFFAOYSA-N perylene-2,3,8,9-tetracarboxylic acid Chemical compound C1=CC2=C(C(O)=O)C(C(=O)O)=CC(C=3C4=C5C=C(C(C(O)=O)=C4C=CC=3)C(O)=O)=C2C5=C1 UBGIFSWRDUBQIC-UHFFFAOYSA-N 0.000 description 2
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- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- DOBFTMLCEYUAQC-UHFFFAOYSA-N naphthalene-2,3,6,7-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=C2C=C(C(O)=O)C(C(=O)O)=CC2=C1 DOBFTMLCEYUAQC-UHFFFAOYSA-N 0.000 description 1
- GOGZBMRXLADNEV-UHFFFAOYSA-N naphthalene-2,6-diamine Chemical compound C1=C(N)C=CC2=CC(N)=CC=C21 GOGZBMRXLADNEV-UHFFFAOYSA-N 0.000 description 1
- YTVNOVQHSGMMOV-UHFFFAOYSA-N naphthalenetetracarboxylic dianhydride Chemical compound C1=CC(C(=O)OC2=O)=C3C2=CC=C2C(=O)OC(=O)C1=C32 YTVNOVQHSGMMOV-UHFFFAOYSA-N 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- AVRVTTKGSFYCDX-UHFFFAOYSA-N perylene-1,2,7,8-tetracarboxylic acid Chemical compound C1=CC(C2=C(C(C(=O)O)=CC=3C2=C2C=CC=3)C(O)=O)=C3C2=C(C(O)=O)C(C(O)=O)=CC3=C1 AVRVTTKGSFYCDX-UHFFFAOYSA-N 0.000 description 1
- FVDOBFPYBSDRKH-UHFFFAOYSA-N perylene-3,4,9,10-tetracarboxylic acid Chemical compound C=12C3=CC=C(C(O)=O)C2=C(C(O)=O)C=CC=1C1=CC=C(C(O)=O)C2=C1C3=CC=C2C(=O)O FVDOBFPYBSDRKH-UHFFFAOYSA-N 0.000 description 1
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- 238000000206 photolithography Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
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- RTHVZRHBNXZKKB-UHFFFAOYSA-N pyrazine-2,3,5,6-tetracarboxylic acid Chemical compound OC(=O)C1=NC(C(O)=O)=C(C(O)=O)N=C1C(O)=O RTHVZRHBNXZKKB-UHFFFAOYSA-N 0.000 description 1
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- VHNQIURBCCNWDN-UHFFFAOYSA-N pyridine-2,6-diamine Chemical compound NC1=CC=CC(N)=N1 VHNQIURBCCNWDN-UHFFFAOYSA-N 0.000 description 1
- YKWDNEXDHDSTCU-UHFFFAOYSA-N pyrrolidine-2,3,4,5-tetracarboxylic acid Chemical compound OC(=O)C1NC(C(O)=O)C(C(O)=O)C1C(O)=O YKWDNEXDHDSTCU-UHFFFAOYSA-N 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
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Images
Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/036—Multilayers with layers of different types
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0355—Metal foils
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Laminated Bodies (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
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- Metallurgy (AREA)
- Organic Chemistry (AREA)
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JP2014190773A JP6360760B2 (ja) | 2014-09-19 | 2014-09-19 | 銅張積層板及び回路基板 |
TW104128735A TWI651988B (zh) | 2014-09-19 | 2015-09-01 | 覆銅疊層板及電路基板 |
CN201510564561.9A CN105451436B (zh) | 2014-09-19 | 2015-09-07 | 覆铜叠层板及电路基板 |
KR1020150130328A KR20160034201A (ko) | 2014-09-19 | 2015-09-15 | 구리 피복 적층판 및 회로 기판 |
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US20070023877A1 (en) * | 2003-09-10 | 2007-02-01 | Hideo Yamazaki | Chip on flex tape with dimension retention pattern |
JP2009528933A (ja) * | 2006-03-06 | 2009-08-13 | エルジー・ケム・リミテッド | 金属積層板およびその製造方法 |
KR101502653B1 (ko) * | 2008-09-26 | 2015-03-13 | 스미토모 베이클라이트 가부시키가이샤 | 적층판, 회로판 및 반도체 장치 |
JP5689277B2 (ja) * | 2009-10-22 | 2015-03-25 | 新日鉄住金化学株式会社 | フレキシブル回路基板及び多層回路基板 |
JP5313191B2 (ja) * | 2010-02-26 | 2013-10-09 | 新日鉄住金化学株式会社 | 金属張積層板及びその製造方法 |
TWI439492B (zh) * | 2011-09-14 | 2014-06-01 | Mortech Corp | 聚醯亞胺膜 |
JP2014015674A (ja) * | 2012-06-11 | 2014-01-30 | Sh Copper Products Corp | 圧延銅箔、および銅張積層板 |
TWI599277B (zh) * | 2012-09-28 | 2017-09-11 | 新日鐵住金化學股份有限公司 | 可撓性覆銅積層板 |
CN103813616A (zh) * | 2012-11-13 | 2014-05-21 | 昆山雅森电子材料科技有限公司 | 复合式叠构覆盖膜及具有该覆盖膜的电路板及其制法 |
JP6320031B2 (ja) * | 2012-12-28 | 2018-05-09 | 新日鉄住金化学株式会社 | フレキシブル銅張積層板 |
JP2014011451A (ja) * | 2013-03-11 | 2014-01-20 | Jx Nippon Mining & Metals Corp | 圧延銅箔及びその製造方法、並びに、積層板 |
JP2016015359A (ja) * | 2014-06-30 | 2016-01-28 | 新日鉄住金化学株式会社 | 金属張積層体の寸法安定性の評価方法及び回路基板の製造方法 |
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- 2015-09-01 TW TW104128735A patent/TWI651988B/zh active
- 2015-09-07 CN CN201510564561.9A patent/CN105451436B/zh active Active
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KR20160034201A (ko) | 2016-03-29 |
JP2016060138A (ja) | 2016-04-25 |
TW201613429A (en) | 2016-04-01 |
TWI651988B (zh) | 2019-02-21 |
CN105451436B (zh) | 2019-02-26 |
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