JP6360174B2 - 3次元ワイヤボンド型インダクタ - Google Patents
3次元ワイヤボンド型インダクタ Download PDFInfo
- Publication number
- JP6360174B2 JP6360174B2 JP2016539293A JP2016539293A JP6360174B2 JP 6360174 B2 JP6360174 B2 JP 6360174B2 JP 2016539293 A JP2016539293 A JP 2016539293A JP 2016539293 A JP2016539293 A JP 2016539293A JP 6360174 B2 JP6360174 B2 JP 6360174B2
- Authority
- JP
- Japan
- Prior art keywords
- inductor
- wire
- wire loop
- substrate
- loop
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Images
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
- H03H7/01—Frequency selective two-port networks
- H03H7/0115—Frequency selective two-port networks comprising only inductors and capacitors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F27/00—Details of transformers or inductances, in general
- H01F27/28—Coils; Windings; Conductive connections
- H01F27/2866—Combination of wires and sheets
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/5222—Capacitive arrangements or effects of, or between wiring layers
- H01L23/5223—Capacitor integral with wiring layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/5227—Inductive arrangements or effects of, or between, wiring layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/45144—Gold (Au) as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/4813—Connecting within a semiconductor or solid-state body, i.e. fly wire, bridge wire
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/48463—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
- H01L2224/48464—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area also being a ball bond, i.e. ball-to-ball
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Semiconductor Integrated Circuits (AREA)
- Coils Or Transformers For Communication (AREA)
- Wire Bonding (AREA)
- Manufacturing & Machinery (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361920334P | 2013-12-23 | 2013-12-23 | |
| US61/920,334 | 2013-12-23 | ||
| US14/177,620 US9692386B2 (en) | 2013-12-23 | 2014-02-11 | Three-dimensional wire bond inductor |
| US14/177,620 | 2014-02-11 | ||
| PCT/US2014/070517 WO2015100067A1 (en) | 2013-12-23 | 2014-12-16 | Three-dimensional wire bond inductor |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017501574A JP2017501574A (ja) | 2017-01-12 |
| JP2017501574A5 JP2017501574A5 (enExample) | 2017-09-28 |
| JP6360174B2 true JP6360174B2 (ja) | 2018-07-18 |
Family
ID=53401229
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016539293A Expired - Fee Related JP6360174B2 (ja) | 2013-12-23 | 2014-12-16 | 3次元ワイヤボンド型インダクタ |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9692386B2 (enExample) |
| EP (1) | EP3087600A1 (enExample) |
| JP (1) | JP6360174B2 (enExample) |
| CN (1) | CN105874594B (enExample) |
| WO (1) | WO2015100067A1 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9999121B2 (en) | 2016-04-25 | 2018-06-12 | Laird Technologies, Inc. | Board level shields with virtual grounding capability |
| EP3282304B1 (fr) * | 2016-08-08 | 2023-10-04 | Essilor International | Equipement ophtalmique; procédé d'alimentation d'un équipement ophtalmique |
| US10236852B2 (en) * | 2016-12-09 | 2019-03-19 | Nxp Usa, Inc. | Parallel LC resonator and method therefor |
| CN106876372A (zh) * | 2017-02-06 | 2017-06-20 | 无锡吉迈微电子有限公司 | 三维玻璃电感结构和制作工艺 |
| CN109037196A (zh) * | 2018-08-28 | 2018-12-18 | 湖南格兰德芯微电子有限公司 | 耦合电感结构 |
| KR102830158B1 (ko) | 2022-03-28 | 2025-07-07 | 삼성전자주식회사 | 캐패시터 와이어를 포함하는 칩 캐패시터 |
| CN119731938A (zh) * | 2023-02-17 | 2025-03-28 | 京东方科技集团股份有限公司 | 滤波器、集成无源器件、电子器件及显示装置 |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3648132A (en) * | 1970-04-20 | 1972-03-07 | Illinois Tool Works | Multilayer capacitor and process for adjusting the value thereof |
| JPS5044258U (enExample) * | 1973-08-22 | 1975-05-06 | ||
| JPS53117735A (en) * | 1978-01-23 | 1978-10-14 | Alps Electric Co Ltd | Method of making thin film lc circuit |
| US4255728A (en) * | 1978-08-24 | 1981-03-10 | Doty Archibald C Jun | Parallel resonant electric circuit |
| JPS60194508A (ja) * | 1984-03-16 | 1985-10-03 | Ricoh Co Ltd | ワイヤボンデイングにより形成されたインダクタンス |
| JPH0693589B2 (ja) * | 1989-03-23 | 1994-11-16 | 株式会社村田製作所 | Lcフィルター |
| JPH04354108A (ja) * | 1991-05-31 | 1992-12-08 | Sumitomo Electric Ind Ltd | インダクタ素子 |
| JPH05190331A (ja) * | 1992-01-16 | 1993-07-30 | Elmec Corp | 電磁遅延線用インダクタンス素子およびその製造方法 |
| JPH09106915A (ja) * | 1995-10-13 | 1997-04-22 | Matsushita Electric Ind Co Ltd | 高周波用インダクタ |
| JPH1074625A (ja) * | 1996-08-30 | 1998-03-17 | Ikeda Takeshi | インダクタ素子 |
| JPH10289921A (ja) | 1997-04-14 | 1998-10-27 | Matsushita Electric Ind Co Ltd | 半導体装置 |
| JP3970393B2 (ja) * | 1997-10-16 | 2007-09-05 | 富士通株式会社 | 等化フィルタ及び波形等化制御方法 |
| US6586309B1 (en) * | 2000-04-24 | 2003-07-01 | Chartered Semiconductor Manufacturing Ltd. | High performance RF inductors and transformers using bonding technique |
| JP2002164214A (ja) | 2000-10-27 | 2002-06-07 | Xerox Corp | ボンディングワイヤを使用する非同一面マイクロコイル及びその製造方法 |
| US6424223B1 (en) | 2001-01-19 | 2002-07-23 | Eic Corporation | MMIC power amplifier with wirebond output matching circuit |
| JP2002290186A (ja) * | 2001-03-26 | 2002-10-04 | Tama Electric Co Ltd | 低域通過フィルタ |
| KR100469248B1 (ko) * | 2001-12-24 | 2005-02-02 | 엘지전자 주식회사 | 무선통신 모듈용 마이크로 인덕터 |
| JP4255442B2 (ja) * | 2002-09-10 | 2009-04-15 | セミコンダクター・コンポーネンツ・インダストリーズ・リミテッド・ライアビリティ・カンパニー | ワイヤ・ボンド・インダクタを有する半導体装置および方法 |
| US7227240B2 (en) | 2002-09-10 | 2007-06-05 | Semiconductor Components Industries, L.L.C. | Semiconductor device with wire bond inductor and method |
| JP2005026384A (ja) * | 2003-06-30 | 2005-01-27 | Tdk Corp | インダクタ素子、それを含む電子部品及び製造方法 |
| EP1652198B1 (en) * | 2003-07-23 | 2010-10-06 | Nxp B.V. | Compact impedance transformation circuit |
| US7518463B2 (en) * | 2004-12-23 | 2009-04-14 | Agilent Technologies, Inc. | Circuit assembly with conical inductor |
| US7305223B2 (en) * | 2004-12-23 | 2007-12-04 | Freescale Semiconductor, Inc. | Radio frequency circuit with integrated on-chip radio frequency signal coupler |
| JP4591689B2 (ja) | 2005-04-28 | 2010-12-01 | Tdk株式会社 | Lc複合部品の製造方法 |
| US8058951B2 (en) * | 2005-09-30 | 2011-11-15 | Panasonic Corporation | Sheet-like composite electronic component and method for manufacturing same |
| US7524731B2 (en) | 2006-09-29 | 2009-04-28 | Freescale Semiconductor, Inc. | Process of forming an electronic device including an inductor |
| US8111521B2 (en) | 2007-08-08 | 2012-02-07 | Intel Corporation | Package-based filtering and matching solutions |
| US20090236701A1 (en) * | 2008-03-18 | 2009-09-24 | Nanyang Technological University | Chip arrangement and a method of determining an inductivity compensation structure for compensating a bond wire inductivity in a chip arrangement |
| CN101794929B (zh) | 2009-12-26 | 2013-01-02 | 华为技术有限公司 | 一种提升传输带宽的装置 |
| US20130207745A1 (en) | 2012-02-13 | 2013-08-15 | Qualcomm Incorporated | 3d rf l-c filters using through glass vias |
-
2014
- 2014-02-11 US US14/177,620 patent/US9692386B2/en not_active Expired - Fee Related
- 2014-12-16 WO PCT/US2014/070517 patent/WO2015100067A1/en not_active Ceased
- 2014-12-16 JP JP2016539293A patent/JP6360174B2/ja not_active Expired - Fee Related
- 2014-12-16 EP EP14824298.5A patent/EP3087600A1/en not_active Withdrawn
- 2014-12-16 CN CN201480070185.1A patent/CN105874594B/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US20150180437A1 (en) | 2015-06-25 |
| WO2015100067A1 (en) | 2015-07-02 |
| JP2017501574A (ja) | 2017-01-12 |
| CN105874594A (zh) | 2016-08-17 |
| EP3087600A1 (en) | 2016-11-02 |
| CN105874594B (zh) | 2019-06-04 |
| US9692386B2 (en) | 2017-06-27 |
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