JP6357027B2 - プロセス制御システムにおけるオンライン適応モデル予測制御 - Google Patents
プロセス制御システムにおけるオンライン適応モデル予測制御 Download PDFInfo
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- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B13/00—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
- G05B13/02—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
- G05B13/04—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators
- G05B13/048—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators using a predictor
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Description
される任意の他の所望されるユーザ入力装置に記憶され、実行されてよい。
Exec_Time=Trunc[TSS/PHmax]
ここで、
Exec_Time = 実行時間、
TSS = 定常状態までの時間、
PHmax = 最大予測層、
である。
ここでは、Truncは数学の切捨て演算である。
(つまり、図2のコントローラブロック54のブロック70、74、80、84および85のすべての中で)内部ループのすべての中で予測層として使用される。したがって、このケースでは、予測層は、新しいプロセスモデルについて決定される定常状態までの実際の時間に応じて、例えば60と120の間で変化してよい。
ここでは、DTは(プロセスモデルからの)プロセス不動作時間であり、PHは予測層であり、Gは(プロセスモデルからの)プロセス利得であり、PMは移動に対する計算されたペナルティである。一般的には、観測に基づいて発見的に決定されたこの方程式は、プロセスの不動作時間が増加するにつれて、およびそれほどではないにせよプロセス利得が増加するにつれて、移動に対するより高いペナルティにアクセスする。移動に対するペナルティのための推奨値またはデフォルト値を計算する他の方程式または方法が代わりに使用できるであろうことは言うまでもない。
制御層が1に等しいMPCコントローラの場合、(転置された)動的行列は、転置されたステップ応答ベクトルに過ぎす、以下のとおりである。
この場合、各uは移動に対する個別ペナルティであり、各yは誤差に対する個別ペナルティである。ここでは、前記を考慮すると、MPCコントローラ行列は一般的には以下のように表現できる。
したがって、1という制御層付きのシングルループMPCコントローラは、2つの係数の合計によりスケーリングされるプロセスステップ応答ベクトルに過ぎない。
とともに、
このケースでは、コントローラ利得行列Kは以下として派生される。
この方程式をさらに簡略に表現するために、以下の変数を規定することができる。
その結果、これらの変数を使用して、コントローラ利得行列Kは以下のように表現でき、
以下のように表現し直すことができる。
ここでは、k1の第1のコントローラ移動のためのMPCコントローラ利得行列(つまり
、2つの移動制御層の内の第1のコントローラのより多く)は、以下のとおりである。
この係数は、移動に対するペナルティ(u)画像化するときに減少するため、ステップ応答と係数のための個別スケーリング係数は以下のように表現できる。
最初に、mを以下として計算する。
第2に、nを以下として計算する。
第3に、lを以下として計算する。
次に以下を計算する。
その後、mでステップ応答をスケーリングし直してから、lでステップ応答をスケーリングし直し、右側にシフトする。つまりb1=0とする。次に、該2つのスケーリングし直
されたステップ応答を差し引きmB−lB(シフト済み)、1/(mn−l2)でこのス
テップから得られるベクトルをスケーリングし直し、コントローラベクトルを取得する。同様に、第2のコントローラ移動k2のMPCコントローラマトリクスまたは利得は以下
のように表現できる。
11 コントローラ
38 適応MPC制御ブロック
Claims (11)
- プロセスを制御するためのプロセスコントローラであって、
制御済み変数(CV)の現在の測定値に対応する信号を受信しかつ自装置に記憶したプロセスモデルを用いて、前記変数(CV)の予測値を示す信号を生成するように構成される制御変数予測装置(70)と、コントローラ利得行列を用いて、前記変数(CV)の予測値に対応する入力信号に基づいて、前記制御済み変数(CV)を生成するための制御信号(MV)を発生させる制御アルゴリズム(85)と、を有するモデル予測制御(MPC)コントローラ(54)と、
前記プロセスのオンライン動作中にプロセスデータを収集するために前記プロセスに結合され、前記収集されたプロセスデータから前記プロセスの動作を表現する更新されたプロセスモデルを決定するプロセスモデル推定装置(90)であって、当該更新されたプロセスモデルは、プロセス不動作時間パラメータを含む複合モデルパラメータを含む、当該プロセスモデル推定装置(90)を含むコントローラ適応装置(52)と、
を備え、
前記コントローラ適応装置(52)は、前記更新されたプロセスモデルを前記MPCコントローラ(54)の前記制御変数予測装置(70)に提供し、
前記制御変数予測装置(70)は、前記更新されたプロセスモデルに基づいて、前記変数(CV)の更新された予測値を示す信号を生成し、
前記コントローラ適応装置(52)は、前記MPCコントローラ(54)が前記プロセスを制御するため、オンラインで作動している間、前記MPCコントローラ(54)の前記制御アルゴリズム(85)を前記更新されたプロセスモデル及び前記変数(CV)の更新された予測値を使用するように適応させる
プロセスコントローラ。 - 前記MPCコントローラ(54)がシングルループコントローラである請求項1に記載のプロセスコントローラ。
- 前記MPCコントローラ(54)が1つ以上のフィードバック経路と1つ以上のフィードフォワード経路とを含む請求項2に記載のプロセスコントローラ。
- 前記制御アルゴリズムが、1走査若しくは前記MPCコントローラ(54)の1回の実行、又は2走査若しくは前記MPCコントローラ(54)の2回の実行に等しい制御層又は区間を使用する請求項3に記載のプロセスコントローラ。
- 前記プロセスモデルが、不動作時間プロセスモデルが加えられる第1の次数又はパラメータプロセスモデルである請求項1に記載のプロセスコントローラ。
- 前記コントローラ適応装置(52)が、前記プロセスモデルに基づいて、前記制御アルゴリズム(85)のための予測層又は前記MPCコントローラ(54)の実行時間の少なくとも1つを決定する請求項1に記載のプロセスコントローラ。
- 前記制御変数予測装置(70)が、制御変数のセットのための、前記制御済み変数(CV)及び前記制御済み変数(CV)の予測値を含む予測ベクトルを決定し、前記MPCコントローラ(54)は、前記制御信号(MV)を生成するように前記制御アルゴリズム(85)によって使用される予測エラーベクトルを生成するために前記予測ベクトルと設定点ベクトルとを組み合わせる予測エラー装置(84)を更に含む、
ことを特徴とする請求項1に記載のプロセスコントローラ。 - 前記制御アルゴリズム(85)は、前記制御信号(MV)を生成するように前記コントローラ利得行列と前記予測エラーベクトルとを乗算することを特徴とする請求項7に記載のプロセスコントローラ。
- 前記MPCコントローラ(54)は、前記設定点ベクトルを生成する設定点予測装置(80)を更に備えることを特徴とする請求項7に記載のプロセスコントローラ。
- 前記コントローラ適応装置(52)は、前記設定点予測装置(80)に前記更新されたプロセスモデルを提供し、
前記設定点予測装置(80)は、前記更新されたプロセスモデルに基づいて、更新された設定点ベクトルを生成し、
前記予測エラー装置(84)は、前記制御信号を生成するように前記制御アルゴリズム(85)によって使用される更新された予測エラーベクトルを生成するため前記更新された設定点ベクトルと前記予測ベクトルとを組み合わせことを特徴とする請求項9に記載のプロセスコントローラ。 - 前記制御アルゴリズム(85)は、予測層よりも少なくとも10倍短い制御層又は区間を用い、前記予測層は、前記MPCコントローラ(54)の各実行又は走査のために計算された予測の回数を示すことを特徴とする請求項1に記載のプロセスコントローラ。
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DE102006045429B4 (de) | 2018-07-19 |
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DE102006045429A1 (de) | 2007-04-26 |
US7451004B2 (en) | 2008-11-11 |
JP5558652B2 (ja) | 2014-07-23 |
HK1100045A1 (en) | 2007-08-31 |
CN1940780A (zh) | 2007-04-04 |
US20070078529A1 (en) | 2007-04-05 |
CN101807048B (zh) | 2014-12-10 |
JP6008898B2 (ja) | 2016-10-19 |
CN1940780B (zh) | 2015-05-13 |
JP2014167834A (ja) | 2014-09-11 |
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US7856281B2 (en) | 2010-12-21 |
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