JP6351540B2 - ガス分析装置およびガス分析方法 - Google Patents
ガス分析装置およびガス分析方法 Download PDFInfo
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- JP6351540B2 JP6351540B2 JP2015095974A JP2015095974A JP6351540B2 JP 6351540 B2 JP6351540 B2 JP 6351540B2 JP 2015095974 A JP2015095974 A JP 2015095974A JP 2015095974 A JP2015095974 A JP 2015095974A JP 6351540 B2 JP6351540 B2 JP 6351540B2
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- YQDFNPLVPNTCGT-UHFFFAOYSA-N CC1NCC1C(C1)S11C2C1C2 Chemical compound CC1NCC1C(C1)S11C2C1C2 YQDFNPLVPNTCGT-UHFFFAOYSA-N 0.000 description 1
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW104128775A TWI567778B (zh) | 2014-10-14 | 2015-09-01 | 氣體分析裝置及氣體分析方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014209988 | 2014-10-14 | ||
| JP2014209988 | 2014-10-14 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016080679A JP2016080679A (ja) | 2016-05-16 |
| JP2016080679A5 JP2016080679A5 (cg-RX-API-DMAC7.html) | 2017-11-09 |
| JP6351540B2 true JP6351540B2 (ja) | 2018-07-04 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015095974A Expired - Fee Related JP6351540B2 (ja) | 2014-10-14 | 2015-05-08 | ガス分析装置およびガス分析方法 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP6351540B2 (cg-RX-API-DMAC7.html) |
| TW (1) | TWI567778B (cg-RX-API-DMAC7.html) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6934239B2 (ja) * | 2017-02-27 | 2021-09-15 | 国立大学法人東京工業大学 | 高感度昇温脱離ガス分析装置 |
| JP6919630B2 (ja) * | 2018-07-30 | 2021-08-18 | 三菱電機株式会社 | ガス分析装置およびガス分析方法 |
| CN114981943A (zh) * | 2020-01-17 | 2022-08-30 | Atik株式会社 | 传感器进气流稳定系统 |
| US12469751B2 (en) | 2021-06-03 | 2025-11-11 | Applied Materials, Inc. | Apparatus to detect and quantify radical concentration in semiconductor processing systems |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60147645A (ja) * | 1984-01-13 | 1985-08-03 | Mitsubishi Electric Corp | 封入ガス分析装置 |
| JP3772751B2 (ja) * | 2002-01-29 | 2006-05-10 | ウシオ電機株式会社 | ランプ封入ガス分析装置 |
| JP2006322899A (ja) * | 2005-05-20 | 2006-11-30 | Hitachi Ltd | ガスモニタリング装置 |
| JP4798007B2 (ja) * | 2007-01-24 | 2011-10-19 | 三菱電機株式会社 | ガス分析方法 |
| JP5645771B2 (ja) * | 2011-08-04 | 2014-12-24 | 株式会社日立ハイテクノロジーズ | 質量分析装置 |
| DE102011081287A1 (de) * | 2011-08-19 | 2013-02-21 | Bayer Technology Services Gmbh | Mikro-Probenentnahmesystem für kleine Mengen an Fluidproben zur Analyse in der Dampfphase |
| CN103196785A (zh) * | 2013-04-26 | 2013-07-10 | 张金川 | 气体快速测量分析仪及其测量方法 |
-
2015
- 2015-05-08 JP JP2015095974A patent/JP6351540B2/ja not_active Expired - Fee Related
- 2015-09-01 TW TW104128775A patent/TWI567778B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| TW201614712A (en) | 2016-04-16 |
| TWI567778B (zh) | 2017-01-21 |
| JP2016080679A (ja) | 2016-05-16 |
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