TW201614712A - Gas analysis apparatus and gas analysis method - Google Patents

Gas analysis apparatus and gas analysis method

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Publication number
TW201614712A
TW201614712A TW104128775A TW104128775A TW201614712A TW 201614712 A TW201614712 A TW 201614712A TW 104128775 A TW104128775 A TW 104128775A TW 104128775 A TW104128775 A TW 104128775A TW 201614712 A TW201614712 A TW 201614712A
Authority
TW
Taiwan
Prior art keywords
gas analysis
gas
orifice
mass spectrometer
room
Prior art date
Application number
TW104128775A
Other languages
Chinese (zh)
Other versions
TWI567778B (en
Inventor
Masaru Kinugawa
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Publication of TW201614712A publication Critical patent/TW201614712A/en
Application granted granted Critical
Publication of TWI567778B publication Critical patent/TWI567778B/en

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  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Sampling And Sample Adjustment (AREA)

Abstract

A gas analysis apparatus (100) includes: a sample room (1), an analyzing room (11), a gas discharging device (E2), a first orifice (O1), a second orifice (O2) and a mass spectrometer (21). The sample room (1), the mass spectrometer (21) and the gas discharging device (E2) are connected to the analyzing room (11). When a conductance of the first orifice (O1) is set to C1, a measurement period of the mass spectrometer (21) is set to T and a volume of the sample room (1) is set to V1, C1 = n,V1/T and n is 0.01 or more and 1 or less. When a conductance of the second orifice (O2) is set to C2, an amount of the gas that is sealed in a simple (3) is set to Q and a measurement upper pressure of the mass spectrometer (21) is set to Pmax, C2=m,Q,C1/V1/Pmax and m is 0.01 or more and 1 or less. C1 and C2 are constant at least during the analysis of the gas.
TW104128775A 2014-10-14 2015-09-01 Gas analysis apparatus and gas analysis method TWI567778B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014209988 2014-10-14
JP2015095974A JP6351540B2 (en) 2014-10-14 2015-05-08 Gas analyzer and gas analysis method

Publications (2)

Publication Number Publication Date
TW201614712A true TW201614712A (en) 2016-04-16
TWI567778B TWI567778B (en) 2017-01-21

Family

ID=55956158

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104128775A TWI567778B (en) 2014-10-14 2015-09-01 Gas analysis apparatus and gas analysis method

Country Status (2)

Country Link
JP (1) JP6351540B2 (en)
TW (1) TWI567778B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6919630B2 (en) * 2018-07-30 2021-08-18 三菱電機株式会社 Gas analyzer and gas analysis method
US20220392812A1 (en) * 2021-06-03 2022-12-08 Applied Materials, Inc. Apparatus to detect and quantify radical concentration in semiconductor processing systems

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60147645A (en) * 1984-01-13 1985-08-03 Mitsubishi Electric Corp Analytical equipment for sealing gas
JP3772751B2 (en) * 2002-01-29 2006-05-10 ウシオ電機株式会社 Lamp filled gas analyzer
JP2006322899A (en) * 2005-05-20 2006-11-30 Hitachi Ltd Gas-monitoring apparatus
JP4798007B2 (en) * 2007-01-24 2011-10-19 三菱電機株式会社 Gas analysis method
JP5645771B2 (en) * 2011-08-04 2014-12-24 株式会社日立ハイテクノロジーズ Mass spectrometer
DE102011081287A1 (en) * 2011-08-19 2013-02-21 Bayer Technology Services Gmbh Micro-sampling system for small quantities of fluid samples for analysis in the vapor phase
CN103196785A (en) * 2013-04-26 2013-07-10 张金川 Gas rapid measuring analysis mete and measuring method thereof

Also Published As

Publication number Publication date
JP2016080679A (en) 2016-05-16
JP6351540B2 (en) 2018-07-04
TWI567778B (en) 2017-01-21

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