JP6328253B2 - 膜厚モニタおよび膜厚測定方法 - Google Patents
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Description
上記測定部は、上記水晶振動子の共振周波数付近を電気的に掃引することでコンダクタンスの最大値の1/2を与える半値周波数F1,F2(F1<F2)と、上記半値周波数F1,F2から算出される半値半幅Fw(Fw=(F1−F2)/2)の時間変化ΔFwを取得する。
上記演算部は、測定された上記半値半幅の時間変化ΔFwが所定値以下の場合は、上記水晶振動子の共振周波数変化ΔFs(ΔFs=fq−fc)を式(1)で算出し、測定された上記半値半幅の時間変化ΔFwが上記所定値を超える場合は、上記水晶振動子の共振周波数変化ΔFsを式(2)で算出する。
測定された上記半値半幅の時間変化ΔFwが所定値以下の場合は、上記水晶振動子の共振周波数変化ΔFs(ΔFs=fq−fc)は、式(1)で算出される。
一方、測定された上記半値半幅の時間変化ΔFwが上記所定値を超える場合は、上記水晶振動子の共振周波数変化ΔFsは、式(2)で算出される。
図2は、膜厚モニタ100の一構成例を示す概略ブロック図である。膜厚モニタ100は、膜厚センサ14と測定ユニット17とを有する。測定ユニット17は、測定部21と、コントローラ22とを有する。
測定回路212は、水晶振動子20の出力信号や、信号供給回路211から出力される入力信号に基づいて、水晶振動子20の共振周波数や位相等の電気的特性を測定して、コントローラ22へ出力するように構成される。
ΔFs=−519470Hz、ΔR1=3454Ω、ΔFw=4163Hz
G’=8.458E+8、G”=9.987+E6
G’とG”の値を変えたときの5MHzの水晶振動子での膜厚と共振周波数は図4のようになる。一方、図5は、式(1)において、音響インピーダンス比(Z)の値を変えたときの膜厚と共振周波数との関係を示す一実験結果である。
図4に示したように、複素弾性率G(G=G’+iG”)を変えたときの膜厚と共振周波数との関係は、図5に示したように音響インピーダンス比Zを変えたときの膜厚と共振周波数との関係と似たようなカーブを描くことから、弾性率を複素数として扱うことで、半値半幅の増加(ΔFw)を説明することができることになる。
11・・・真空チャンバ
12・・・蒸着源
14・・・膜厚センサ
17・・・測定ユニット
20・・・水晶振動子
21・・・測定部
22・・・コントローラ
211・・・信号供給回路
212・・・測定回路
Claims (2)
- 蒸着源を有する成膜装置に設置された水晶振動子の共振周波数変化に基づいて蒸着膜の膜厚を測定する膜厚モニタであって、
前記水晶振動子の共振周波数付近を電気的に掃引することでコンダクタンスの最大値の1/2を与える半値周波数F1,F2(F1<F2)と、前記半値周波数F1,F2から算出される半値半幅Fw(Fw=(F1−F2)/2)の時間変化ΔFwを取得する測定部と、
測定された前記半値半幅の時間変化ΔFwが所定値以下の場合は、前記水晶振動子の共振周波数変化ΔFs(ΔFs=fq−fc)を式(1)で算出し、測定された前記半値半幅の時間変化ΔFwが前記所定値を超える場合は、前記水晶振動子の共振周波数変化ΔFsを式(2)で算出する演算部と
を具備する膜厚モニタ。
- 蒸着源を有する成膜装置に設置された水晶振動子の共振周波数変化に基づいて蒸着膜の膜厚を測定する膜厚測定方法であって、
前記水晶振動子の共振周波数付近を電気的に掃引することでコンダクタンスの最大値の1/2を与える半値周波数F1,F2(F1<F2)と、前記半値周波数F1,F2から算出される半値半幅Fw(Fw=(F1−F2)/2)の時間変化ΔFwを取得し、
測定された前記半値半幅の時間変化ΔFwが所定値以下の場合は、前記水晶振動子の共振周波数変化ΔFs(ΔFs=fq−fc)を式(1)で算出し、
測定された前記半値半幅の時間変化ΔFwが前記所定値を超える場合は、前記水晶振動子の共振周波数変化ΔFsを式(2)で算出する
膜厚測定方法。
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JP7022419B2 (ja) | 2016-09-30 | 2022-02-18 | 株式会社昭和真空 | 膜厚監視装置、成膜装置及び膜厚監視方法 |
CN107385408A (zh) | 2017-07-24 | 2017-11-24 | 京东方科技集团股份有限公司 | 膜厚测试装置及方法、蒸镀设备 |
KR101870581B1 (ko) * | 2017-09-29 | 2018-06-22 | 캐논 톡키 가부시키가이샤 | 수정진동자의 수명 판정방법, 막두께 측정장치, 성막방법, 성막장치, 및 전자 디바이스 제조방법 |
CN108977764B (zh) * | 2018-09-18 | 2020-06-05 | 合肥鑫晟光电科技有限公司 | 蒸镀膜层记录装置及其方法、掩模板组件和蒸镀设备 |
CN110257775A (zh) * | 2019-06-17 | 2019-09-20 | 深圳市华星光电技术有限公司 | 蒸镀装置及蒸镀方法 |
TWI701641B (zh) * | 2019-10-01 | 2020-08-11 | 龍翩真空科技股份有限公司 | 無線傳輸薄膜厚度監控裝置 |
CN113811634B (zh) * | 2019-12-17 | 2023-04-04 | 株式会社爱发科 | 测定异常检测装置及测定异常检测方法 |
JP7036864B2 (ja) * | 2020-05-26 | 2022-03-15 | 株式会社アルバック | 測定異常検出装置、および、測定異常検出方法 |
JP7102588B1 (ja) * | 2021-07-01 | 2022-07-19 | 株式会社アルバック | センサ装置 |
CN116592803A (zh) * | 2023-07-18 | 2023-08-15 | 西安精谐科技有限责任公司 | 半球谐振子曲面镀膜厚度测量方法及应用 |
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