JP6302305B2 - 振動低減装置、リソグラフィ装置、および物品の製造方法 - Google Patents

振動低減装置、リソグラフィ装置、および物品の製造方法 Download PDF

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JP6302305B2
JP6302305B2 JP2014055615A JP2014055615A JP6302305B2 JP 6302305 B2 JP6302305 B2 JP 6302305B2 JP 2014055615 A JP2014055615 A JP 2014055615A JP 2014055615 A JP2014055615 A JP 2014055615A JP 6302305 B2 JP6302305 B2 JP 6302305B2
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Japan
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electrode
elastic body
unit
distance
vibration
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Japanese (ja)
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JP2015178845A5 (enExample
JP2015178845A (ja
Inventor
縄田　亮
亮 縄田
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Canon Inc
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Canon Inc
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Priority to JP2014055615A priority Critical patent/JP6302305B2/ja
Priority to US14/656,928 priority patent/US9665108B2/en
Publication of JP2015178845A publication Critical patent/JP2015178845A/ja
Publication of JP2015178845A5 publication Critical patent/JP2015178845A5/ja
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    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D19/00—Control of mechanical oscillations, e.g. of amplitude, of frequency, of phase
    • G05D19/02—Control of mechanical oscillations, e.g. of amplitude, of frequency, of phase characterised by the use of electric means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B15/00—Systems controlled by a computer
    • G05B15/02—Systems controlled by a computer electric

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Health & Medical Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Atmospheric Sciences (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Toxicology (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Vibration Prevention Devices (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
JP2014055615A 2014-03-18 2014-03-18 振動低減装置、リソグラフィ装置、および物品の製造方法 Expired - Fee Related JP6302305B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2014055615A JP6302305B2 (ja) 2014-03-18 2014-03-18 振動低減装置、リソグラフィ装置、および物品の製造方法
US14/656,928 US9665108B2 (en) 2014-03-18 2015-03-13 Vibration reduction apparatus, lithography apparatus, and method of manufacturing article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014055615A JP6302305B2 (ja) 2014-03-18 2014-03-18 振動低減装置、リソグラフィ装置、および物品の製造方法

Publications (3)

Publication Number Publication Date
JP2015178845A JP2015178845A (ja) 2015-10-08
JP2015178845A5 JP2015178845A5 (enExample) 2017-04-27
JP6302305B2 true JP6302305B2 (ja) 2018-03-28

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JP2014055615A Expired - Fee Related JP6302305B2 (ja) 2014-03-18 2014-03-18 振動低減装置、リソグラフィ装置、および物品の製造方法

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US (1) US9665108B2 (enExample)
JP (1) JP6302305B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6278676B2 (ja) * 2013-11-29 2018-02-14 キヤノン株式会社 振動低減装置、リソグラフィ装置、および物品の製造方法
US10184539B2 (en) 2014-09-30 2019-01-22 Technical Manufacturing Corporation Vibration isolation system
WO2017160999A1 (en) * 2016-03-15 2017-09-21 Technical Manufacturing Corporation User-tuned, active vibration-isolation system
DE112018004189T5 (de) 2017-08-15 2020-04-30 Technical Manufacturing Corporation Präzisions-Schwingungsisolationssystem mit Boden-Feed-Forward-Unterstützung
WO2022129865A1 (en) * 2020-12-15 2022-06-23 Bae Systems Plc Vibration control systems

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6133885A (ja) * 1984-07-25 1986-02-17 富士通株式会社 支持装置
US5660255A (en) * 1994-04-04 1997-08-26 Applied Power, Inc. Stiff actuator active vibration isolation system
JPH10112433A (ja) * 1996-10-04 1998-04-28 Nikon Corp 除振装置及び露光装置
JPH11230246A (ja) * 1998-02-18 1999-08-27 Tokkyo Kiki Kk アクティブ除振装置
US6378672B1 (en) * 1998-10-13 2002-04-30 Canon Kabushiki Kaisha Active vibration isolation device and its control method
JP2000173884A (ja) * 1998-12-02 2000-06-23 Canon Inc デバイス製造装置および方法ならびにデバイス製造装置の配線・配管実装方法
JP3631045B2 (ja) * 1999-06-16 2005-03-23 キヤノン株式会社 駆動装置、光学素子駆動装置、露光装置およびデバイス製造方法
JP2001267227A (ja) * 2000-03-21 2001-09-28 Canon Inc 除振システム、露光装置およびデバイス製造方法
JP2004100953A (ja) * 2002-08-23 2004-04-02 Nikon Corp 制振装置及び露光装置
JP5107575B2 (ja) * 2003-09-05 2012-12-26 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 慣性基準質量を有する能動型防振用アクチュエータ構成
US7571793B2 (en) * 2004-01-26 2009-08-11 Koninklijke Philips Electronics N.V. Actuator arrangement for active vibration isolation using a payload as an inertial reference mass
US7726452B2 (en) * 2005-06-02 2010-06-01 Technical Manufacturing Corporation Systems and methods for active vibration damping
WO2007054860A2 (en) * 2005-11-08 2007-05-18 Koninklijke Philips Electronics, N.V. Vibration isolation system and method
CN101346667A (zh) * 2005-12-20 2009-01-14 皇家飞利浦电子股份有限公司 混合传感器系统和方法
US20090320593A1 (en) * 2006-06-30 2009-12-31 Sony Corporation Vibration type gyro sensor
JP5036259B2 (ja) * 2006-09-14 2012-09-26 キヤノン株式会社 除振装置、露光装置及びデバイス製造方法
US20090201484A1 (en) * 2007-10-29 2009-08-13 Nikon Corporation Utilities supply member connection apparatus, stage apparatus, projection optical system support apparatus and exposure apparatus
JP4447631B2 (ja) * 2007-11-05 2010-04-07 東京エレクトロン株式会社 位置検出用治具
EP2075484A1 (en) * 2007-12-31 2009-07-01 Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO An active vibration isolation system having an inertial reference mass
NL1036568A1 (nl) * 2008-03-18 2009-09-21 Asml Netherlands Bv Actuator system, lithographic apparatus, and device manufacturing method.
JP5641878B2 (ja) * 2010-10-29 2014-12-17 キヤノン株式会社 振動制御装置、リソグラフィー装置、および、物品の製造方法
JP5578728B2 (ja) * 2011-01-31 2014-08-27 国立大学法人名古屋大学 外力検出が可能な防振装置
DE102011007917A1 (de) * 2011-04-21 2012-10-25 Asml Netherlands B.V. Anordnung zur Aktuierung eines Elementes in einer mikrolithographischen Projektionsbelichtungsanlage
JP5882798B2 (ja) * 2012-03-14 2016-03-09 キヤノン株式会社 振動抑制装置および振動抑制方法
JP6278676B2 (ja) * 2013-11-29 2018-02-14 キヤノン株式会社 振動低減装置、リソグラフィ装置、および物品の製造方法
JP6333081B2 (ja) * 2014-06-23 2018-05-30 キヤノン株式会社 振動制御装置、リソグラフィ装置、および物品の製造方法

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JP2015178845A (ja) 2015-10-08
US20150268566A1 (en) 2015-09-24
US9665108B2 (en) 2017-05-30

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