JP6261747B2 - 薄膜トランジスタ配列基板の製造方法 - Google Patents
薄膜トランジスタ配列基板の製造方法 Download PDFInfo
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- JP6261747B2 JP6261747B2 JP2016543288A JP2016543288A JP6261747B2 JP 6261747 B2 JP6261747 B2 JP 6261747B2 JP 2016543288 A JP2016543288 A JP 2016543288A JP 2016543288 A JP2016543288 A JP 2016543288A JP 6261747 B2 JP6261747 B2 JP 6261747B2
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- 239000000758 substrate Substances 0.000 title claims description 128
- 239000010409 thin film Substances 0.000 title claims description 112
- 238000004519 manufacturing process Methods 0.000 title claims description 76
- 238000000034 method Methods 0.000 title claims description 46
- 239000010410 layer Substances 0.000 claims description 137
- 229910052751 metal Inorganic materials 0.000 claims description 60
- 239000002184 metal Substances 0.000 claims description 60
- 239000011241 protective layer Substances 0.000 claims description 33
- 239000004065 semiconductor Substances 0.000 claims description 32
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 30
- 238000005530 etching Methods 0.000 claims description 23
- 230000008569 process Effects 0.000 claims description 21
- 238000011161 development Methods 0.000 claims description 16
- 235000012239 silicon dioxide Nutrition 0.000 claims description 15
- 239000000377 silicon dioxide Substances 0.000 claims description 15
- 238000001312 dry etching Methods 0.000 claims description 10
- 239000011521 glass Substances 0.000 claims description 8
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 5
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 5
- 238000001039 wet etching Methods 0.000 claims description 5
- 238000010030 laminating Methods 0.000 claims description 2
- 238000000137 annealing Methods 0.000 claims 2
- 239000012528 membrane Substances 0.000 claims 1
- 230000001681 protective effect Effects 0.000 claims 1
- 239000004973 liquid crystal related substance Substances 0.000 description 17
- 230000018109 developmental process Effects 0.000 description 10
- 230000004044 response Effects 0.000 description 7
- 229910021417 amorphous silicon Inorganic materials 0.000 description 4
- 238000000059 patterning Methods 0.000 description 4
- 230000006872 improvement Effects 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 229920005591 polysilicon Polymers 0.000 description 3
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
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- H01L29/7869—Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
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- H01L27/1225—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer with semiconductor materials not belonging to the group IV of the periodic table, e.g. InGaZnO
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Description
2 工程2
3 工程3
4 工程4
5 工程5
6 工程6
7 工程7
8 工程8
9 工程9
21 基板
22 緩衝層
23 酸化物半導体薄膜
24 第一金属層
25 第一レジストパターン
26 第一部分
27 第二部分(図3)
27 ソース(図6・図7)
28 ドレイン
31 絶縁層
32 第二金属層
33 ゲート
34 保護層
35 第二レジストパターン
36 第三部分
37 第四部分
41 接触孔
42 透明導電層
Claims (12)
- 薄膜トランジスタ配列基板の製造方法であって、
前記薄膜トランジスタ配列基板はトップゲート型であり、
前記薄膜トランジスタ配列基板の製造方法は、以下の工程を含み、
工程1では、基板を用意し、
工程2では、前記基板上に順に緩衝層・酸化物半導体薄膜・第一金属層を積層して形成し、
工程3では、前記第一金属層上に第一レジスト層を形成するとともに、前記第一レジスト層をパターン化して所定の位置に第一レジストパターンを形成し、
前記第一レジストパターンは、酸化物半導体薄膜のチャネルエリアと対応する第一部分、及び第二部分からなるとともに、前記第一レジストパターンにおける第二部分の厚さは、第一部分の厚さよりも厚く、
工程4では、第一レジストパターンに覆われていない領域の第一金属層及び酸化物半導体薄膜をエッチングするとともに、第一レジストパターンの第一部分を除去することで第一金属層を露出させ、且つ第一レジストパターンの第二部分をマスクとして第一金属層をエッチングすることで酸化物半導体薄膜を露出させた後、第一レジストパターンを剥離して、第一金属層にソース及びドレインを形成し、
工程5では、基板上に、順に絶縁層及び第二金属層を積層するとともに、第二金属層をパターン化してゲートを形成し、
さらに、
前記工程5の後の工程6では、前記基板上に保護層を積層するとともに、前記保護層上に第二レジスト層を形成して、前記第二レジスト層をパターン化することで所定の位置に第二レジストパターンを形成し、
前記第二レジストパターンは、ドレインの一側及び一部のドレイン上方に位置する第三部分と、ドレインの他側及び一部のドレイン上方に位置する第四部分とからなり、
前記第三部分はグレースケール露光を受け、かつ、前記第四部分は露光を受けないことにより、前記第三部分が前記第四部分よりも薄くなっているものであり、
かつ、前記第三部分と前記第四部分との間に当該第二レジストパターンが存在しない凹部が設けられ、
前記工程6の後の工程7では、ドライエッチングにより、前記第二レジストパターンに覆われていない保護層及びこの部分の保護層に対応する絶縁層をエッチングしてドレインを露出させることで、接触孔を形成し、且つ前記第二レジストパターンの前記第三部分を除去し、
前記工程7の後の工程8では、前記基板上に透明導電層を積層するとともに、レジスト剥離を通して第二レジストパターンの第四部分及びその上の透明導電層を剥離する
ことを特徴とする薄膜トランジスタ配列基板の製造方法。 - 請求項1に記載の薄膜トランジスタ配列基板の製造方法において、
更に、前記薄膜トランジスタ配列基板の製造方法は、工程8の後の工程9を含み、
前記工程9では、前記基板に対してアニール処理を行って、薄膜トランジスタ配列基板の製造を完了する
ことを特徴とする薄膜トランジスタ配列基板の製造方法。 - 請求項1に記載の薄膜トランジスタ配列基板の製造方法において、
更に、前記基板は、ガラス基板であり、
前記緩衝層は、二酸化ケイ素の積層によって形成され、
前記酸化物半導体薄膜は、IGZO(イグゾー)薄膜である
ことを特徴とする薄膜トランジスタ配列基板の製造方法。 - 請求項1に記載の薄膜トランジスタ配列基板の製造方法において、
更に、前記工程3において、第一レジストパターンは、グレースケール・マスク・露光・現像を通して形成される
ことを特徴とする薄膜トランジスタ配列基板の製造方法。 - 請求項1に記載の薄膜トランジスタ配列基板の製造方法において、
更に、前記工程4では、ドライエッチング方式を用いるとともに第一レジストパターンの第二部分をマスクとして第一金属層をエッチングし、
且つ、前記工程4における第一レジストパターンの剥離は、第一レジストパターンの第二部分の剥離である
ことを特徴とする薄膜トランジスタ配列基板の製造方法。 - 請求項1に記載の薄膜トランジスタ配列基板の製造方法において、
更に、前記工程5において、絶縁層は、二酸化ケイ素の積層によって形成され、
また、工程5において、第二金属層には、露光・現像・エッチング・レジスト剥離の工程を通してゲートが形成される
ことを特徴とする薄膜トランジスタ配列基板の製造方法。 - 請求項6に記載の薄膜トランジスタ配列基板の製造方法において、
更に、前記第二金属層に対する前記エッチングは、ウエットエッチングである
ことを特徴とする薄膜トランジスタ配列基板の製造方法。 - 請求項1に記載の薄膜トランジスタ配列基板の製造方法において、
更に、前記工程6において、保護層は、二酸化ケイ素或は窒化ケイ素の積層によって形成され、
前記第二レジストパターンは、グレースケール・マスク・露光・現像を通して形成される
ことを特徴とする薄膜トランジスタ配列基板の製造方法。 - 薄膜トランジスタ配列基板の製造方法であって、
前記薄膜トランジスタ配列基板はトップゲート型であり、
前記薄膜トランジスタ配列基板の製造方法は、以下の工程を含み、
工程1では、基板を用意し、
工程2では、前記基板上に順に緩衝層・酸化物半導体薄膜・第一金属層を積層して形成し、
工程3では、前記第一金属層上に第一レジスト層を形成するとともに、前記第一レジスト層をパターン化して所定の位置に第一レジストパターンを形成し、
前記第一レジストパターンは、酸化物半導体薄膜のチャネルエリアと対応する第一部分、及び第二部分からなるとともに、前記第一レジストパターンにおける第二部分の厚さは、第一部分の厚さよりも厚く、
工程4では、第一レジストパターンに覆われていない領域の第一金属層及び酸化物半導体薄膜をエッチングするとともに、第一レジストパターンの第一部分を除去することで第一金属層を露出させ、且つ第一レジストパターンの第二部分をマスクとして第一金属層をエッチングすることで酸化物半導体薄膜を露出させた後、第一レジストパターンを剥離して、第一金属層にソース及びドレインを形成し、
工程5では、基板上に、順に絶縁層及び第二金属層を積層するとともに、第二金属層をパターン化してゲートを形成し、
さらに、
前記工程5の後の工程6では、前記基板上に保護層を積層するとともに、前記保護層上に第二レジスト層を形成して、前記第二レジスト層をパターン化することで所定の位置に第二レジストパターンを形成し、
前記第二レジストパターンは、ドレインの一側及び一部のドレイン上方に位置する第三部分と、ドレインの他側及び一部のドレイン上方に位置する第四部分とからなり、
前記第三部分はグレースケール露光を受け、かつ、前記第四部分は露光を受けないことにより、前記第三部分が前記第四部分よりも薄くなっているものであり、
かつ、前記第三部分と前記第四部分との間に当該第二レジストパターンが存在しない凹部が設けられ、
前記工程6の後の工程7では、ドライエッチングにより、前記第二レジストパターンに覆われていない保護層及び前記部分の保護層と対応する絶縁層をエッチングしてドレインを露出させることで、接触孔を形成し、且つ前記第二レジストパターンの前記第三部分を除去し、
前記工程7の後の工程8では、前記基板上に透明導電層を積層するとともに、レジスト剥離を通して第二レジストパターンの第四部分及びその上の透明導電層を剥離し、
前記工程8の後の工程9では、前記基板に対してアニール処理を行って、薄膜トランジスタ配列基板の製造を完了し、
このうち、
更に、前記基板は、ガラス基板であり、
前記緩衝層は、二酸化ケイ素の積層によって形成され、
前記酸化物半導体薄膜は、IGZO(イグゾー)薄膜であり、
更に、前記工程3において、第一レジストパターンは、グレースケール・マスク・露光・現像を通して形成され、
更に、前記工程4では、ドライエッチング方式を用いるとともに第一レジストパターンの第二部分をマスクとして第一金属層をエッチングし、
且つ、前記工程4における第一レジストパターンの剥離は、第一レジストパターンの第二部分の剥離である
ことを特徴とする薄膜トランジスタ配列基板の製造方法。 - 請求項9に記載の薄膜トランジスタ配列基板の製造方法において、
更に、前記工程5において、絶縁層は、二酸化ケイ素の積層によって形成され、
また、工程5において、第二金属層には、露光・現像・エッチング・レジスト剥離の工程を通してゲートが形成される
ことを特徴とする薄膜トランジスタ配列基板の製造方法。 - 請求項10に記載の薄膜トランジスタ配列基板の製造方法において、
更に、前記第二金属層に対する前記エッチングは、ウエットエッチングである
ことを特徴とする薄膜トランジスタ配列基板の製造方法。 - 請求項9に記載の薄膜トランジスタ配列基板の製造方法において、
更に、前記工程6において、保護層は、二酸化ケイ素或は窒化ケイ素の積層によって形成され、
前記第二レジストパターンは、グレースケール・マスク・露光・現像を通して形成される
ことを特徴とする薄膜トランジスタ配列基板の製造方法。
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