JP6250310B2 - 位置測定装置 - Google Patents

位置測定装置 Download PDF

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Publication number
JP6250310B2
JP6250310B2 JP2013128269A JP2013128269A JP6250310B2 JP 6250310 B2 JP6250310 B2 JP 6250310B2 JP 2013128269 A JP2013128269 A JP 2013128269A JP 2013128269 A JP2013128269 A JP 2013128269A JP 6250310 B2 JP6250310 B2 JP 6250310B2
Authority
JP
Japan
Prior art keywords
scanning detection
measuring device
position measuring
detection units
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2013128269A
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English (en)
Japanese (ja)
Other versions
JP2014002152A5 (enExample
JP2014002152A (ja
Inventor
ラルフ・ビール
イェルク・ドレシャー
ヴォルフガング・ホルツアップフェル
マルクス・マイスナー
ベルンハルト・ミュッシュ
ベルンハルト・プレトシャヘール
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dr Johannes Heidenhain GmbH
Original Assignee
Dr Johannes Heidenhain GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dr Johannes Heidenhain GmbH filed Critical Dr Johannes Heidenhain GmbH
Publication of JP2014002152A publication Critical patent/JP2014002152A/ja
Publication of JP2014002152A5 publication Critical patent/JP2014002152A5/ja
Application granted granted Critical
Publication of JP6250310B2 publication Critical patent/JP6250310B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
    • G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
    • G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
    • G01D5/36—Forming the light into pulses
    • G01D5/38—Forming the light into pulses by diffraction gratings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Measurement Of Mechanical Vibrations Or Ultrasonic Waves (AREA)
  • Machine Tool Sensing Apparatuses (AREA)
JP2013128269A 2012-06-19 2013-06-19 位置測定装置 Active JP6250310B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102012210309A DE102012210309A1 (de) 2012-06-19 2012-06-19 Positionsmesseinrichtung
DE102012210309.0 2012-06-19

Publications (3)

Publication Number Publication Date
JP2014002152A JP2014002152A (ja) 2014-01-09
JP2014002152A5 JP2014002152A5 (enExample) 2016-07-21
JP6250310B2 true JP6250310B2 (ja) 2017-12-20

Family

ID=48534246

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013128269A Active JP6250310B2 (ja) 2012-06-19 2013-06-19 位置測定装置

Country Status (5)

Country Link
US (1) US8988691B2 (enExample)
EP (1) EP2679962B1 (enExample)
JP (1) JP6250310B2 (enExample)
CN (1) CN103512493B (enExample)
DE (1) DE102012210309A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015065395A (ja) 2013-08-28 2015-04-09 矢崎総業株式会社 ジャンパモジュール搭載回路基板および回路基板組立体
DE102015219810A1 (de) * 2015-10-13 2017-04-13 Dr. Johannes Heidenhain Gmbh X-Y-Tisch mit einer Positionsmesseinrichtung
DE102016206144A1 (de) 2016-04-13 2017-10-19 Dr. Johannes Heidenhain Gmbh Positionsmessanordnung und Verfahren zum Betrieb einer Positionsmessanordnung
JP6266144B1 (ja) * 2017-01-27 2018-01-24 Dmg森精機株式会社 振動状態検出装置及び振動状態検出装置を備えた工作機械
CN108613647B (zh) * 2018-07-02 2020-02-25 燕山大学 三自由度平面并联机构动平台位姿检测装置
CN115307724B (zh) * 2022-08-15 2025-07-04 重庆医科大学 一种自动化测量声场方法
WO2025219040A1 (en) * 2024-04-15 2025-10-23 Asml Netherlands B.V. Positioning measurement correction

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3239108A1 (de) * 1982-10-22 1984-04-26 Dr. Johannes Heidenhain Gmbh, 8225 Traunreut Positionsmessverfahren und einrichtungen zur durchfuehrung des verfahrens
KR0170581B1 (ko) 1995-10-10 1999-02-01 윤종용 칼라 브라운관 색감 처리용 코팅 조성물
EP0896206B1 (de) * 1997-08-07 2002-12-11 Dr. Johannes Heidenhain GmbH Abtasteinheit für eine optische Positionsmesseinrichtung
US7515281B2 (en) * 2005-04-08 2009-04-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102005029917A1 (de) * 2005-06-28 2007-01-04 Dr. Johannes Heidenhain Gmbh Positionsmesseinrichtung
DE102005043569A1 (de) 2005-09-12 2007-03-22 Dr. Johannes Heidenhain Gmbh Positionsmesseinrichtung
US7542863B2 (en) * 2005-11-09 2009-06-02 Dr. Johannes Heidenhain Gmbh Position measuring system
EP1983555B1 (en) * 2006-01-19 2014-05-28 Nikon Corporation Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus and device manufacturing method
US7602489B2 (en) 2006-02-22 2009-10-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102006048628A1 (de) * 2006-10-13 2008-04-17 Siemens Ag Messelement mit einer als Maßverkörperung fungierenden Spur und korrespondierendes, mit einem solchen Messelement ausführbares Messverfahren
US8237916B2 (en) * 2007-12-28 2012-08-07 Nikon Corporation Movable body drive system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method
DE102008022027A1 (de) * 2008-05-02 2009-11-05 Dr. Johannes Heidenhain Gmbh Positionsmesseinrichtung
US8786829B2 (en) * 2008-05-13 2014-07-22 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8314941B2 (en) * 2008-12-05 2012-11-20 Micronic Mydata AB Cartesian coordinate measurement for rotating system
CN101566800B (zh) * 2009-02-27 2011-05-11 上海微电子装备有限公司 一种用于光刻设备的对准系统和对准方法
US8493547B2 (en) * 2009-08-25 2013-07-23 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
DE102010029211A1 (de) * 2010-05-21 2011-11-24 Dr. Johannes Heidenhain Gmbh Optische Positionsmesseinrichtung
NL2006804A (en) 2010-06-24 2011-12-28 Asml Netherlands Bv Measurement system, method and lithographic apparatus.
CN103246172B (zh) * 2012-02-10 2016-12-28 约翰内斯﹒海德汉博士有限公司 具有位置测量装置的多个扫描单元的装置

Also Published As

Publication number Publication date
CN103512493B (zh) 2017-07-04
CN103512493A (zh) 2014-01-15
US8988691B2 (en) 2015-03-24
DE102012210309A1 (de) 2013-12-19
US20130335750A1 (en) 2013-12-19
EP2679962A1 (de) 2014-01-01
EP2679962B1 (de) 2016-11-23
JP2014002152A (ja) 2014-01-09

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