CN103512493B - 位置测量装置 - Google Patents
位置测量装置 Download PDFInfo
- Publication number
- CN103512493B CN103512493B CN201310240064.4A CN201310240064A CN103512493B CN 103512493 B CN103512493 B CN 103512493B CN 201310240064 A CN201310240064 A CN 201310240064A CN 103512493 B CN103512493 B CN 103512493B
- Authority
- CN
- China
- Prior art keywords
- scanning element
- measurement
- motion
- plane
- machine component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000005259 measurement Methods 0.000 title claims abstract description 169
- 230000033001 locomotion Effects 0.000 claims abstract description 63
- 238000001514 detection method Methods 0.000 claims description 14
- 230000003287 optical effect Effects 0.000 claims description 11
- 238000004458 analytical method Methods 0.000 description 12
- 238000003754 machining Methods 0.000 description 12
- 238000005452 bending Methods 0.000 description 10
- 230000008859 change Effects 0.000 description 9
- 238000000034 method Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 4
- 238000007689 inspection Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000036651 mood Effects 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 230000000284 resting effect Effects 0.000 description 2
- 230000011664 signaling Effects 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- 206010044565 Tremor Diseases 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000005094 computer simulation Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000011326 mechanical measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000012731 temporal analysis Methods 0.000 description 1
- 238000000700 time series analysis Methods 0.000 description 1
- 238000007514 turning Methods 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
- G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
- G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
- G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
- G01D5/36—Forming the light into pulses
- G01D5/38—Forming the light into pulses by diffraction gratings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Measurement Of Mechanical Vibrations Or Ultrasonic Waves (AREA)
- Machine Tool Sensing Apparatuses (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102012210309A DE102012210309A1 (de) | 2012-06-19 | 2012-06-19 | Positionsmesseinrichtung |
| DE102012210309.0 | 2012-06-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103512493A CN103512493A (zh) | 2014-01-15 |
| CN103512493B true CN103512493B (zh) | 2017-07-04 |
Family
ID=48534246
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310240064.4A Active CN103512493B (zh) | 2012-06-19 | 2013-06-17 | 位置测量装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8988691B2 (enExample) |
| EP (1) | EP2679962B1 (enExample) |
| JP (1) | JP6250310B2 (enExample) |
| CN (1) | CN103512493B (enExample) |
| DE (1) | DE102012210309A1 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015065395A (ja) | 2013-08-28 | 2015-04-09 | 矢崎総業株式会社 | ジャンパモジュール搭載回路基板および回路基板組立体 |
| DE102015219810A1 (de) * | 2015-10-13 | 2017-04-13 | Dr. Johannes Heidenhain Gmbh | X-Y-Tisch mit einer Positionsmesseinrichtung |
| DE102016206144A1 (de) | 2016-04-13 | 2017-10-19 | Dr. Johannes Heidenhain Gmbh | Positionsmessanordnung und Verfahren zum Betrieb einer Positionsmessanordnung |
| JP6266144B1 (ja) * | 2017-01-27 | 2018-01-24 | Dmg森精機株式会社 | 振動状態検出装置及び振動状態検出装置を備えた工作機械 |
| CN108613647B (zh) * | 2018-07-02 | 2020-02-25 | 燕山大学 | 三自由度平面并联机构动平台位姿检测装置 |
| CN115307724B (zh) * | 2022-08-15 | 2025-07-04 | 重庆医科大学 | 一种自动化测量声场方法 |
| WO2025219040A1 (en) * | 2024-04-15 | 2025-10-23 | Asml Netherlands B.V. | Positioning measurement correction |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6392224B1 (en) * | 1997-08-07 | 2002-05-21 | Dr. Johannes Heidenhain Gmbh | Scanning unit for an optical position measuring device |
| CN1892173A (zh) * | 2005-06-28 | 2007-01-10 | 约翰尼斯海登海恩博士股份有限公司 | 位置测量装置 |
| CN101566800A (zh) * | 2009-02-27 | 2009-10-28 | 上海微电子装备有限公司 | 一种用于光刻设备的对准系统和对准方法 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3239108A1 (de) * | 1982-10-22 | 1984-04-26 | Dr. Johannes Heidenhain Gmbh, 8225 Traunreut | Positionsmessverfahren und einrichtungen zur durchfuehrung des verfahrens |
| KR0170581B1 (ko) | 1995-10-10 | 1999-02-01 | 윤종용 | 칼라 브라운관 색감 처리용 코팅 조성물 |
| US7515281B2 (en) * | 2005-04-08 | 2009-04-07 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| DE102005043569A1 (de) * | 2005-09-12 | 2007-03-22 | Dr. Johannes Heidenhain Gmbh | Positionsmesseinrichtung |
| US7542863B2 (en) * | 2005-11-09 | 2009-06-02 | Dr. Johannes Heidenhain Gmbh | Position measuring system |
| TWI393171B (zh) * | 2006-01-19 | 2013-04-11 | 尼康股份有限公司 | A moving body driving method and a moving body driving system, a pattern forming method and a pattern forming apparatus, an exposure method and an exposure apparatus, and an element manufacturing method |
| US7602489B2 (en) * | 2006-02-22 | 2009-10-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| DE102006048628A1 (de) * | 2006-10-13 | 2008-04-17 | Siemens Ag | Messelement mit einer als Maßverkörperung fungierenden Spur und korrespondierendes, mit einem solchen Messelement ausführbares Messverfahren |
| US8237916B2 (en) * | 2007-12-28 | 2012-08-07 | Nikon Corporation | Movable body drive system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method |
| DE102008022027A1 (de) * | 2008-05-02 | 2009-11-05 | Dr. Johannes Heidenhain Gmbh | Positionsmesseinrichtung |
| US8786829B2 (en) * | 2008-05-13 | 2014-07-22 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
| US8314941B2 (en) * | 2008-12-05 | 2012-11-20 | Micronic Mydata AB | Cartesian coordinate measurement for rotating system |
| US8493547B2 (en) * | 2009-08-25 | 2013-07-23 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
| DE102010029211A1 (de) * | 2010-05-21 | 2011-11-24 | Dr. Johannes Heidenhain Gmbh | Optische Positionsmesseinrichtung |
| NL2006804A (en) | 2010-06-24 | 2011-12-28 | Asml Netherlands Bv | Measurement system, method and lithographic apparatus. |
| CN103246172B (zh) * | 2012-02-10 | 2016-12-28 | 约翰内斯﹒海德汉博士有限公司 | 具有位置测量装置的多个扫描单元的装置 |
-
2012
- 2012-06-19 DE DE102012210309A patent/DE102012210309A1/de not_active Withdrawn
-
2013
- 2013-05-29 EP EP13169683.3A patent/EP2679962B1/de active Active
- 2013-06-17 US US13/919,780 patent/US8988691B2/en active Active
- 2013-06-17 CN CN201310240064.4A patent/CN103512493B/zh active Active
- 2013-06-19 JP JP2013128269A patent/JP6250310B2/ja active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6392224B1 (en) * | 1997-08-07 | 2002-05-21 | Dr. Johannes Heidenhain Gmbh | Scanning unit for an optical position measuring device |
| CN1892173A (zh) * | 2005-06-28 | 2007-01-10 | 约翰尼斯海登海恩博士股份有限公司 | 位置测量装置 |
| CN101566800A (zh) * | 2009-02-27 | 2009-10-28 | 上海微电子装备有限公司 | 一种用于光刻设备的对准系统和对准方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2014002152A (ja) | 2014-01-09 |
| US20130335750A1 (en) | 2013-12-19 |
| JP6250310B2 (ja) | 2017-12-20 |
| US8988691B2 (en) | 2015-03-24 |
| CN103512493A (zh) | 2014-01-15 |
| EP2679962A1 (de) | 2014-01-01 |
| DE102012210309A1 (de) | 2013-12-19 |
| EP2679962B1 (de) | 2016-11-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C53 | Correction of patent of invention or patent application | ||
| CB02 | Change of applicant information |
Address after: German Te Rauen Rohit Applicant after: John Nei Si Heidenhain doctor company limited Address before: German Te Rauen Rohit Applicant before: Dr. Johannes Heidenhain GmbH |
|
| COR | Change of bibliographic data |
Free format text: CORRECT: APPLICANT; FROM: DR. JOHANNES HEIDENHAIN GMBH TO: HEIDENHAIN GMBH. DOCTOR JOHANNES |
|
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |