DE102012210309A1 - Positionsmesseinrichtung - Google Patents
Positionsmesseinrichtung Download PDFInfo
- Publication number
- DE102012210309A1 DE102012210309A1 DE102012210309A DE102012210309A DE102012210309A1 DE 102012210309 A1 DE102012210309 A1 DE 102012210309A1 DE 102012210309 A DE102012210309 A DE 102012210309A DE 102012210309 A DE102012210309 A DE 102012210309A DE 102012210309 A1 DE102012210309 A1 DE 102012210309A1
- Authority
- DE
- Germany
- Prior art keywords
- scanning units
- machine component
- measuring device
- measuring
- scanning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000006073 displacement reaction Methods 0.000 claims abstract description 46
- 239000000463 material Substances 0.000 claims abstract description 17
- 238000005070 sampling Methods 0.000 claims description 8
- 230000003287 optical effect Effects 0.000 abstract description 11
- 238000005259 measurement Methods 0.000 description 38
- 238000001514 detection method Methods 0.000 description 13
- 238000003754 machining Methods 0.000 description 11
- 238000004458 analytical method Methods 0.000 description 7
- 238000005452 bending Methods 0.000 description 5
- 230000008859 change Effects 0.000 description 5
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- 230000010355 oscillation Effects 0.000 description 5
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- 230000008901 benefit Effects 0.000 description 3
- 230000001419 dependent effect Effects 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 238000007689 inspection Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000013016 damping Methods 0.000 description 2
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- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000012549 training Methods 0.000 description 2
- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 1
- 238000012935 Averaging Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005094 computer simulation Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000011326 mechanical measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000003534 oscillatory effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000012731 temporal analysis Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
- G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
- G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
- G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
- G01D5/36—Forming the light into pulses
- G01D5/38—Forming the light into pulses by diffraction gratings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Measurement Of Mechanical Vibrations Or Ultrasonic Waves (AREA)
- Machine Tool Sensing Apparatuses (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102012210309A DE102012210309A1 (de) | 2012-06-19 | 2012-06-19 | Positionsmesseinrichtung |
| EP13169683.3A EP2679962B1 (de) | 2012-06-19 | 2013-05-29 | Positionsmesseinrichtung |
| US13/919,780 US8988691B2 (en) | 2012-06-19 | 2013-06-17 | Position-measuring device |
| CN201310240064.4A CN103512493B (zh) | 2012-06-19 | 2013-06-17 | 位置测量装置 |
| JP2013128269A JP6250310B2 (ja) | 2012-06-19 | 2013-06-19 | 位置測定装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102012210309A DE102012210309A1 (de) | 2012-06-19 | 2012-06-19 | Positionsmesseinrichtung |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102012210309A1 true DE102012210309A1 (de) | 2013-12-19 |
Family
ID=48534246
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102012210309A Withdrawn DE102012210309A1 (de) | 2012-06-19 | 2012-06-19 | Positionsmesseinrichtung |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8988691B2 (enExample) |
| EP (1) | EP2679962B1 (enExample) |
| JP (1) | JP6250310B2 (enExample) |
| CN (1) | CN103512493B (enExample) |
| DE (1) | DE102012210309A1 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015065395A (ja) | 2013-08-28 | 2015-04-09 | 矢崎総業株式会社 | ジャンパモジュール搭載回路基板および回路基板組立体 |
| DE102015219810A1 (de) * | 2015-10-13 | 2017-04-13 | Dr. Johannes Heidenhain Gmbh | X-Y-Tisch mit einer Positionsmesseinrichtung |
| DE102016206144A1 (de) | 2016-04-13 | 2017-10-19 | Dr. Johannes Heidenhain Gmbh | Positionsmessanordnung und Verfahren zum Betrieb einer Positionsmessanordnung |
| JP6266144B1 (ja) * | 2017-01-27 | 2018-01-24 | Dmg森精機株式会社 | 振動状態検出装置及び振動状態検出装置を備えた工作機械 |
| CN108613647B (zh) * | 2018-07-02 | 2020-02-25 | 燕山大学 | 三自由度平面并联机构动平台位姿检测装置 |
| CN115307724B (zh) * | 2022-08-15 | 2025-07-04 | 重庆医科大学 | 一种自动化测量声场方法 |
| WO2025219040A1 (en) * | 2024-04-15 | 2025-10-23 | Asml Netherlands B.V. | Positioning measurement correction |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5573581A (en) | 1995-10-10 | 1996-11-12 | Samsung Display Devices Co., Ltd. | Coating composition for treating color sensitivity of a color picture tube |
| US20070195296A1 (en) | 2006-02-22 | 2007-08-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7573581B2 (en) | 2005-09-12 | 2009-08-11 | Dr. Johannes Heidenhain Gmbh | Position-measuring device |
| US20110317142A1 (en) | 2010-06-24 | 2011-12-29 | Asml Netherlands B.V. | Measurement system, method and litographic apparatus |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3239108A1 (de) * | 1982-10-22 | 1984-04-26 | Dr. Johannes Heidenhain Gmbh, 8225 Traunreut | Positionsmessverfahren und einrichtungen zur durchfuehrung des verfahrens |
| EP0896206B1 (de) * | 1997-08-07 | 2002-12-11 | Dr. Johannes Heidenhain GmbH | Abtasteinheit für eine optische Positionsmesseinrichtung |
| US7515281B2 (en) * | 2005-04-08 | 2009-04-07 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| DE102005029917A1 (de) * | 2005-06-28 | 2007-01-04 | Dr. Johannes Heidenhain Gmbh | Positionsmesseinrichtung |
| US7542863B2 (en) * | 2005-11-09 | 2009-06-02 | Dr. Johannes Heidenhain Gmbh | Position measuring system |
| EP1983555B1 (en) * | 2006-01-19 | 2014-05-28 | Nikon Corporation | Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus and device manufacturing method |
| DE102006048628A1 (de) * | 2006-10-13 | 2008-04-17 | Siemens Ag | Messelement mit einer als Maßverkörperung fungierenden Spur und korrespondierendes, mit einem solchen Messelement ausführbares Messverfahren |
| US8237916B2 (en) * | 2007-12-28 | 2012-08-07 | Nikon Corporation | Movable body drive system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method |
| DE102008022027A1 (de) * | 2008-05-02 | 2009-11-05 | Dr. Johannes Heidenhain Gmbh | Positionsmesseinrichtung |
| US8786829B2 (en) * | 2008-05-13 | 2014-07-22 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
| US8314941B2 (en) * | 2008-12-05 | 2012-11-20 | Micronic Mydata AB | Cartesian coordinate measurement for rotating system |
| CN101566800B (zh) * | 2009-02-27 | 2011-05-11 | 上海微电子装备有限公司 | 一种用于光刻设备的对准系统和对准方法 |
| US8493547B2 (en) * | 2009-08-25 | 2013-07-23 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
| DE102010029211A1 (de) * | 2010-05-21 | 2011-11-24 | Dr. Johannes Heidenhain Gmbh | Optische Positionsmesseinrichtung |
| CN103246172B (zh) * | 2012-02-10 | 2016-12-28 | 约翰内斯﹒海德汉博士有限公司 | 具有位置测量装置的多个扫描单元的装置 |
-
2012
- 2012-06-19 DE DE102012210309A patent/DE102012210309A1/de not_active Withdrawn
-
2013
- 2013-05-29 EP EP13169683.3A patent/EP2679962B1/de active Active
- 2013-06-17 CN CN201310240064.4A patent/CN103512493B/zh active Active
- 2013-06-17 US US13/919,780 patent/US8988691B2/en active Active
- 2013-06-19 JP JP2013128269A patent/JP6250310B2/ja active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5573581A (en) | 1995-10-10 | 1996-11-12 | Samsung Display Devices Co., Ltd. | Coating composition for treating color sensitivity of a color picture tube |
| US7573581B2 (en) | 2005-09-12 | 2009-08-11 | Dr. Johannes Heidenhain Gmbh | Position-measuring device |
| US20070195296A1 (en) | 2006-02-22 | 2007-08-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US20110317142A1 (en) | 2010-06-24 | 2011-12-29 | Asml Netherlands B.V. | Measurement system, method and litographic apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6250310B2 (ja) | 2017-12-20 |
| CN103512493B (zh) | 2017-07-04 |
| CN103512493A (zh) | 2014-01-15 |
| US8988691B2 (en) | 2015-03-24 |
| US20130335750A1 (en) | 2013-12-19 |
| EP2679962A1 (de) | 2014-01-01 |
| EP2679962B1 (de) | 2016-11-23 |
| JP2014002152A (ja) | 2014-01-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R119 | Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee |