JP2014002152A5 - - Google Patents

Download PDF

Info

Publication number
JP2014002152A5
JP2014002152A5 JP2013128269A JP2013128269A JP2014002152A5 JP 2014002152 A5 JP2014002152 A5 JP 2014002152A5 JP 2013128269 A JP2013128269 A JP 2013128269A JP 2013128269 A JP2013128269 A JP 2013128269A JP 2014002152 A5 JP2014002152 A5 JP 2014002152A5
Authority
JP
Japan
Prior art keywords
measuring device
position measuring
scanning detection
detection units
quadrants
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2013128269A
Other languages
English (en)
Japanese (ja)
Other versions
JP6250310B2 (ja
JP2014002152A (ja
Filing date
Publication date
Priority claimed from DE102012210309A external-priority patent/DE102012210309A1/de
Application filed filed Critical
Publication of JP2014002152A publication Critical patent/JP2014002152A/ja
Publication of JP2014002152A5 publication Critical patent/JP2014002152A5/ja
Application granted granted Critical
Publication of JP6250310B2 publication Critical patent/JP6250310B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2013128269A 2012-06-19 2013-06-19 位置測定装置 Active JP6250310B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102012210309A DE102012210309A1 (de) 2012-06-19 2012-06-19 Positionsmesseinrichtung
DE102012210309.0 2012-06-19

Publications (3)

Publication Number Publication Date
JP2014002152A JP2014002152A (ja) 2014-01-09
JP2014002152A5 true JP2014002152A5 (enExample) 2016-07-21
JP6250310B2 JP6250310B2 (ja) 2017-12-20

Family

ID=48534246

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013128269A Active JP6250310B2 (ja) 2012-06-19 2013-06-19 位置測定装置

Country Status (5)

Country Link
US (1) US8988691B2 (enExample)
EP (1) EP2679962B1 (enExample)
JP (1) JP6250310B2 (enExample)
CN (1) CN103512493B (enExample)
DE (1) DE102012210309A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015065395A (ja) 2013-08-28 2015-04-09 矢崎総業株式会社 ジャンパモジュール搭載回路基板および回路基板組立体
DE102015219810A1 (de) * 2015-10-13 2017-04-13 Dr. Johannes Heidenhain Gmbh X-Y-Tisch mit einer Positionsmesseinrichtung
DE102016206144A1 (de) 2016-04-13 2017-10-19 Dr. Johannes Heidenhain Gmbh Positionsmessanordnung und Verfahren zum Betrieb einer Positionsmessanordnung
JP6266144B1 (ja) * 2017-01-27 2018-01-24 Dmg森精機株式会社 振動状態検出装置及び振動状態検出装置を備えた工作機械
CN108613647B (zh) * 2018-07-02 2020-02-25 燕山大学 三自由度平面并联机构动平台位姿检测装置
CN115307724B (zh) * 2022-08-15 2025-07-04 重庆医科大学 一种自动化测量声场方法
WO2025219040A1 (en) * 2024-04-15 2025-10-23 Asml Netherlands B.V. Positioning measurement correction

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3239108A1 (de) * 1982-10-22 1984-04-26 Dr. Johannes Heidenhain Gmbh, 8225 Traunreut Positionsmessverfahren und einrichtungen zur durchfuehrung des verfahrens
KR0170581B1 (ko) 1995-10-10 1999-02-01 윤종용 칼라 브라운관 색감 처리용 코팅 조성물
EP0896206B1 (de) * 1997-08-07 2002-12-11 Dr. Johannes Heidenhain GmbH Abtasteinheit für eine optische Positionsmesseinrichtung
US7515281B2 (en) * 2005-04-08 2009-04-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102005029917A1 (de) * 2005-06-28 2007-01-04 Dr. Johannes Heidenhain Gmbh Positionsmesseinrichtung
DE102005043569A1 (de) 2005-09-12 2007-03-22 Dr. Johannes Heidenhain Gmbh Positionsmesseinrichtung
US7542863B2 (en) * 2005-11-09 2009-06-02 Dr. Johannes Heidenhain Gmbh Position measuring system
EP1983555B1 (en) * 2006-01-19 2014-05-28 Nikon Corporation Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus and device manufacturing method
US7602489B2 (en) 2006-02-22 2009-10-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102006048628A1 (de) * 2006-10-13 2008-04-17 Siemens Ag Messelement mit einer als Maßverkörperung fungierenden Spur und korrespondierendes, mit einem solchen Messelement ausführbares Messverfahren
US8237916B2 (en) * 2007-12-28 2012-08-07 Nikon Corporation Movable body drive system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method
DE102008022027A1 (de) * 2008-05-02 2009-11-05 Dr. Johannes Heidenhain Gmbh Positionsmesseinrichtung
US8786829B2 (en) * 2008-05-13 2014-07-22 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8314941B2 (en) * 2008-12-05 2012-11-20 Micronic Mydata AB Cartesian coordinate measurement for rotating system
CN101566800B (zh) * 2009-02-27 2011-05-11 上海微电子装备有限公司 一种用于光刻设备的对准系统和对准方法
US8493547B2 (en) * 2009-08-25 2013-07-23 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
DE102010029211A1 (de) * 2010-05-21 2011-11-24 Dr. Johannes Heidenhain Gmbh Optische Positionsmesseinrichtung
NL2006804A (en) 2010-06-24 2011-12-28 Asml Netherlands Bv Measurement system, method and lithographic apparatus.
CN103246172B (zh) * 2012-02-10 2016-12-28 约翰内斯﹒海德汉博士有限公司 具有位置测量装置的多个扫描单元的装置

Similar Documents

Publication Publication Date Title
JP2014002152A5 (enExample)
JP5812262B2 (ja) 磁気角度センサ
CN106017839B (zh) 基于柔性铰接板弯曲和扭转振动检测控制装置及方法
US20150268027A1 (en) Electric field sensing and e field visualization
JP2012531757A5 (enExample)
TW201305884A (zh) 觸控裝置及使用該觸控裝置的滑鼠
CN103808256A (zh) 一种非接触式物体平面运动测量装置及实现方法
JP2018155531A5 (enExample)
US20200117283A1 (en) Magnetic Arrangement for Detecting Relative Movements or Relative Positions
JP2017528737A (ja) 磁気センサベースの表面形状分析のための装置および方法
JP2017519203A5 (enExample)
CN107110919B (zh) 用于基于磁传感器的表面形状分析空间定位的装置和方法
JP2013017818A5 (enExample)
KR870002441A (ko) 물체의 3차원 측정방법 및 장치
CN105444722B (zh) 检测平台姿态变化的方法
JP2014202533A (ja) 開先形状計測方法及び装置
CN107588715B (zh) 一种基于磁效应的空间位置检测装置及测量方法
JP4890188B2 (ja) 運動誤差測定基準体及び運動誤差測定装置
JP6745495B2 (ja) 形状推定装置、スキャニング装置、動作検出装置、形状推定方法、スキャニング方法、動作検出方法、プログラム
JP2017106876A5 (enExample)
JP2011049318A5 (ja) 基板重ね合わせ装置、基板重ね合わせ方法、及びデバイスの製造方法
CN110726368B (zh) 产品中心的机械坐标的获取方法
JP6848168B2 (ja) 表面形状測定機の校正装置
JP6420041B2 (ja) 画像処理を利用した絶対角度誤差算出
KR101394634B1 (ko) 스테레오 비전과 회전각을 이용한 대형 구조물의 길이 측정 방법 및 그 장치