JP2014002152A5 - - Google Patents

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Publication number
JP2014002152A5
JP2014002152A5 JP2013128269A JP2013128269A JP2014002152A5 JP 2014002152 A5 JP2014002152 A5 JP 2014002152A5 JP 2013128269 A JP2013128269 A JP 2013128269A JP 2013128269 A JP2013128269 A JP 2013128269A JP 2014002152 A5 JP2014002152 A5 JP 2014002152A5
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JP
Japan
Prior art keywords
measuring device
position measuring
scanning detection
detection units
quadrants
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Application number
JP2013128269A
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English (en)
Japanese (ja)
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JP2014002152A (ja
JP6250310B2 (ja
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Priority claimed from DE102012210309A external-priority patent/DE102012210309A1/de
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Publication of JP2014002152A publication Critical patent/JP2014002152A/ja
Publication of JP2014002152A5 publication Critical patent/JP2014002152A5/ja
Application granted granted Critical
Publication of JP6250310B2 publication Critical patent/JP6250310B2/ja
Active legal-status Critical Current
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JP2013128269A 2012-06-19 2013-06-19 位置測定装置 Active JP6250310B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102012210309.0 2012-06-19
DE102012210309A DE102012210309A1 (de) 2012-06-19 2012-06-19 Positionsmesseinrichtung

Publications (3)

Publication Number Publication Date
JP2014002152A JP2014002152A (ja) 2014-01-09
JP2014002152A5 true JP2014002152A5 (enExample) 2016-07-21
JP6250310B2 JP6250310B2 (ja) 2017-12-20

Family

ID=48534246

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013128269A Active JP6250310B2 (ja) 2012-06-19 2013-06-19 位置測定装置

Country Status (5)

Country Link
US (1) US8988691B2 (enExample)
EP (1) EP2679962B1 (enExample)
JP (1) JP6250310B2 (enExample)
CN (1) CN103512493B (enExample)
DE (1) DE102012210309A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015065395A (ja) 2013-08-28 2015-04-09 矢崎総業株式会社 ジャンパモジュール搭載回路基板および回路基板組立体
DE102015219810A1 (de) * 2015-10-13 2017-04-13 Dr. Johannes Heidenhain Gmbh X-Y-Tisch mit einer Positionsmesseinrichtung
DE102016206144A1 (de) 2016-04-13 2017-10-19 Dr. Johannes Heidenhain Gmbh Positionsmessanordnung und Verfahren zum Betrieb einer Positionsmessanordnung
JP6266144B1 (ja) 2017-01-27 2018-01-24 Dmg森精機株式会社 振動状態検出装置及び振動状態検出装置を備えた工作機械
CN108613647B (zh) * 2018-07-02 2020-02-25 燕山大学 三自由度平面并联机构动平台位姿检测装置
CN115307724B (zh) * 2022-08-15 2025-07-04 重庆医科大学 一种自动化测量声场方法
WO2025219040A1 (en) * 2024-04-15 2025-10-23 Asml Netherlands B.V. Positioning measurement correction

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3239108A1 (de) * 1982-10-22 1984-04-26 Dr. Johannes Heidenhain Gmbh, 8225 Traunreut Positionsmessverfahren und einrichtungen zur durchfuehrung des verfahrens
KR0170581B1 (ko) 1995-10-10 1999-02-01 윤종용 칼라 브라운관 색감 처리용 코팅 조성물
DE19830925A1 (de) * 1997-08-07 1999-02-11 Heidenhain Gmbh Dr Johannes Abtasteinheit für eine optische Positionsmeßeinrichtung
US7515281B2 (en) * 2005-04-08 2009-04-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102005029917A1 (de) * 2005-06-28 2007-01-04 Dr. Johannes Heidenhain Gmbh Positionsmesseinrichtung
DE102005043569A1 (de) 2005-09-12 2007-03-22 Dr. Johannes Heidenhain Gmbh Positionsmesseinrichtung
US7542863B2 (en) * 2005-11-09 2009-06-02 Dr. Johannes Heidenhain Gmbh Position measuring system
SG10201510758QA (en) * 2006-01-19 2016-01-28 Nikon Corp Movable Body Drive Method, Movable Body Drive System, Pattern Formation Method, Pattern Forming Apparatus, Exposure Method, Exposure Apparatus, and Device Manufacturing Method
US7602489B2 (en) 2006-02-22 2009-10-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102006048628A1 (de) * 2006-10-13 2008-04-17 Siemens Ag Messelement mit einer als Maßverkörperung fungierenden Spur und korrespondierendes, mit einem solchen Messelement ausführbares Messverfahren
US8237916B2 (en) * 2007-12-28 2012-08-07 Nikon Corporation Movable body drive system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method
DE102008022027A1 (de) * 2008-05-02 2009-11-05 Dr. Johannes Heidenhain Gmbh Positionsmesseinrichtung
US8786829B2 (en) * 2008-05-13 2014-07-22 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
EP2366091B1 (en) * 2008-12-05 2018-08-01 Mycronic AB Cartesian coordinate measurement for a rotating system
CN101566800B (zh) * 2009-02-27 2011-05-11 上海微电子装备有限公司 一种用于光刻设备的对准系统和对准方法
US8493547B2 (en) * 2009-08-25 2013-07-23 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
DE102010029211A1 (de) * 2010-05-21 2011-11-24 Dr. Johannes Heidenhain Gmbh Optische Positionsmesseinrichtung
NL2006804A (en) 2010-06-24 2011-12-28 Asml Netherlands Bv Measurement system, method and lithographic apparatus.
CN103246172B (zh) * 2012-02-10 2016-12-28 约翰内斯﹒海德汉博士有限公司 具有位置测量装置的多个扫描单元的装置

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