JP6241919B2 - 光学半導体デバイス - Google Patents
光学半導体デバイス Download PDFInfo
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- JP6241919B2 JP6241919B2 JP2013205233A JP2013205233A JP6241919B2 JP 6241919 B2 JP6241919 B2 JP 6241919B2 JP 2013205233 A JP2013205233 A JP 2013205233A JP 2013205233 A JP2013205233 A JP 2013205233A JP 6241919 B2 JP6241919 B2 JP 6241919B2
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- insulating film
- heater
- region
- electrode
- thickness
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
- H01S5/0261—Non-optical elements, e.g. laser driver components, heaters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/0607—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature
- H01S5/0612—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature controlled by temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
- H01S5/06255—Controlling the frequency of the radiation
- H01S5/06256—Controlling the frequency of the radiation with DBR-structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
- H01S5/06255—Controlling the frequency of the radiation
- H01S5/06258—Controlling the frequency of the radiation with DFB-structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
- H01S5/0265—Intensity modulators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/1206—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers having a non constant or multiplicity of periods
- H01S5/1212—Chirped grating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/3434—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer comprising at least both As and P as V-compounds
Description
2 下クラッド層
4 上クラッド層
6 絶縁膜
20 ヒータ
21 電源電極
22 グランド電極
40 絶縁膜
100 半導体レーザ
Claims (2)
- 半導体層上に設けられた第1絶縁膜と、
前記第1絶縁膜上に設けられたヒータと、
前記ヒータ上に設けられる第2絶縁膜と、
前記ヒータ上に、前記ヒータと接触し、かつ前記第2絶縁膜上に延在して設けられた電極と、を備え、
前記電極が延在する部分における前記第2絶縁膜の厚さは、前記第1絶縁膜の厚さよりも大きく、
前記ヒータ上において、前記電極が延在しない部分における前記第2絶縁膜の厚さは、前記電極が延在する部分における前記第2絶縁膜の厚さより小さい光学半導体デバイス。 - 前記電極が延在しない部分における前記第2絶縁膜の上面は、空隙である、請求項1記載の光学半導体デバイス。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013205233A JP6241919B2 (ja) | 2013-09-30 | 2013-09-30 | 光学半導体デバイス |
US14/500,292 US9985413B2 (en) | 2013-09-30 | 2014-09-29 | Optical semiconductor device and method of fabricating the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013205233A JP6241919B2 (ja) | 2013-09-30 | 2013-09-30 | 光学半導体デバイス |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2015070207A JP2015070207A (ja) | 2015-04-13 |
JP2015070207A5 JP2015070207A5 (ja) | 2016-11-04 |
JP6241919B2 true JP6241919B2 (ja) | 2017-12-06 |
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JP2013205233A Active JP6241919B2 (ja) | 2013-09-30 | 2013-09-30 | 光学半導体デバイス |
Country Status (2)
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US (1) | US9985413B2 (ja) |
JP (1) | JP6241919B2 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10756507B2 (en) * | 2017-01-23 | 2020-08-25 | Sumitomo Electric Industries, Ltd. | Process of forming epitaxial substrate and semiconductor optical device |
US11374380B2 (en) * | 2017-12-15 | 2022-06-28 | Horiba, Ltd. | Semiconductor laser |
CN110376766B (zh) * | 2018-04-12 | 2021-03-30 | 海思光电子有限公司 | 一种反射装置及可调谐激光器 |
GB2589335B (en) * | 2019-11-26 | 2022-12-14 | Rockley Photonics Ltd | Integrated III-V/silicon optoelectronic device and method of manufacture thereof |
Family Cites Families (47)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52156556A (en) * | 1976-06-23 | 1977-12-27 | Hitachi Ltd | Electrode structure |
FR2575604B1 (fr) * | 1984-12-28 | 1987-01-30 | Thomson Csf | Guide d'ondes rectangulaire a moulures, muni d'une fenetre etanche |
US5323138A (en) * | 1992-09-04 | 1994-06-21 | Trw Inc. | Reliable thin film resistors for integrated circuit applications |
US5379318A (en) * | 1994-01-31 | 1995-01-03 | Telefonaktiebolaget L M Ericsson | Alternating grating tunable DBR laser |
JP3141811B2 (ja) * | 1997-02-20 | 2001-03-07 | 日本電気株式会社 | 半導体レーザ装置、その製造方法 |
US6909734B2 (en) * | 1999-09-02 | 2005-06-21 | Agility Communications, Inc. | High-power, manufacturable sampled grating distributed Bragg reflector lasers |
US6243517B1 (en) * | 1999-11-04 | 2001-06-05 | Sparkolor Corporation | Channel-switched cross-connect |
US6937638B2 (en) * | 2000-06-09 | 2005-08-30 | Agility Communications, Inc. | Manufacturable sampled grating mirrors |
JP4989834B2 (ja) * | 2000-05-04 | 2012-08-01 | ジェイディーエス ユニフェイズ コーポレイション | サンプル格子分布型ブラッグ反射レーザー用のミラー及び空洞設計の改良 |
JP2002026255A (ja) * | 2000-07-03 | 2002-01-25 | Nec Corp | 薄膜抵抗体及びその製造方法並びに電子回路装置 |
US7653093B2 (en) * | 2001-09-10 | 2010-01-26 | Imec | Widely tunable twin guide laser structure |
US7023886B2 (en) * | 2001-11-08 | 2006-04-04 | Intel Corporation | Wavelength tunable optical components |
US20030147588A1 (en) * | 2002-02-04 | 2003-08-07 | Lightwaves 2020, Inc. | Step-chirped, sampled optical waveguide gratings for WDM channel operations and method of manufacture therefor |
GB2385979B (en) * | 2002-02-28 | 2005-10-12 | Bookham Technology Plc | Control for a tunable laser |
KR100541913B1 (ko) * | 2003-05-02 | 2006-01-10 | 한국전자통신연구원 | 추출 격자 브래그 반사기와 결합된 추출 격자 분포궤환파장가변 반도체 레이저 |
JP4474887B2 (ja) * | 2003-10-01 | 2010-06-09 | 日亜化学工業株式会社 | 半導体レーザ素子 |
JP4498819B2 (ja) * | 2004-05-14 | 2010-07-07 | 株式会社デンソー | 薄膜抵抗装置及び抵抗温度特性調整方法 |
JP2006100603A (ja) * | 2004-09-29 | 2006-04-13 | Taiyo Yuden Co Ltd | 薄膜キャパシタ |
JP5108234B2 (ja) * | 2005-02-07 | 2012-12-26 | 日本特殊陶業株式会社 | マイクロヒータ及びセンサ |
EP1703603B1 (en) * | 2005-03-17 | 2015-03-18 | Fujitsu Limited | Tunable laser |
JP2006269577A (ja) * | 2005-03-23 | 2006-10-05 | Nec Electronics Corp | 半導体装置 |
JP2006278864A (ja) * | 2005-03-30 | 2006-10-12 | Renesas Technology Corp | 相変化型不揮発性メモリ及びその製造方法 |
JP4657853B2 (ja) | 2005-08-11 | 2011-03-23 | 住友電工デバイス・イノベーション株式会社 | 半導体レーザ、レーザモジュール、光学部品、レーザ装置、半導体レーザの製造方法および半導体レーザの制御方法 |
JP2007294914A (ja) * | 2006-03-30 | 2007-11-08 | Eudyna Devices Inc | 光半導体装置 |
JP2007273644A (ja) * | 2006-03-30 | 2007-10-18 | Eudyna Devices Inc | 光半導体装置、レーザチップおよびレーザモジュール |
JP2007273650A (ja) * | 2006-03-30 | 2007-10-18 | Eudyna Devices Inc | 光半導体装置 |
JP4936313B2 (ja) * | 2006-08-25 | 2012-05-23 | 日本碍子株式会社 | 光変調素子 |
EP1978612B1 (en) * | 2007-04-05 | 2017-08-16 | Sumitomo Electric Device Innovations, Inc. | Optical semiconductor device and method of controlling the same |
JP5217494B2 (ja) * | 2007-05-08 | 2013-06-19 | 旭硝子株式会社 | 人工媒質、その製造方法およびアンテナ装置 |
US7864824B2 (en) * | 2008-12-04 | 2011-01-04 | Electronics And Telecommunications Research Institute | Multiple distributed feedback laser devices |
KR20100072534A (ko) * | 2008-12-22 | 2010-07-01 | 한국전자통신연구원 | 반도체 레이저 장치 |
JP2010182999A (ja) * | 2009-02-09 | 2010-08-19 | Nec Corp | 半導体レーザ、光送信デバイス、光送受信装置、光送信デバイスの駆動方法 |
EP2489106B1 (en) * | 2009-10-13 | 2021-02-17 | Skorpios Technologies, Inc. | Method and system for hybrid integration of a tunable laser |
JP5366149B2 (ja) * | 2010-03-16 | 2013-12-11 | 独立行政法人産業技術総合研究所 | 半導体レーザー装置 |
JP5585940B2 (ja) * | 2010-04-22 | 2014-09-10 | 株式会社リコー | 面発光レーザ素子、面発光レーザアレイ、光走査装置、画像形成装置及び面発光レーザ素子の製造方法 |
JP5582868B2 (ja) * | 2010-05-14 | 2014-09-03 | シチズンホールディングス株式会社 | 光デバイス |
JP5499903B2 (ja) * | 2010-05-27 | 2014-05-21 | 住友電気工業株式会社 | 半導体レーザ |
JP5597029B2 (ja) * | 2010-05-27 | 2014-10-01 | 住友電気工業株式会社 | 波長可変半導体レーザ |
JP2012049338A (ja) * | 2010-08-27 | 2012-03-08 | Hitachi Ltd | ヒータ配線付き半導体チップ |
KR101381235B1 (ko) * | 2010-08-31 | 2014-04-04 | 한국전자통신연구원 | 이중 모드 반도체 레이저 및 이를 이용한 테라헤르츠파 장치 |
JP2013033892A (ja) * | 2011-06-29 | 2013-02-14 | Sumitomo Electric Ind Ltd | 半導体レーザおよびレーザ装置 |
US9209601B2 (en) * | 2011-08-26 | 2015-12-08 | Oclaro Technology Ltd | Monolithically integrated tunable semiconductor laser |
GB2493988B (en) * | 2011-08-26 | 2016-01-13 | Oclaro Technology Ltd | Monolithically integrated tunable semiconductor laser |
KR20130040283A (ko) * | 2011-10-14 | 2013-04-24 | 주식회사 동부하이텍 | 반도체 소자 및 그 제조방법 |
JP6107089B2 (ja) * | 2012-11-30 | 2017-04-05 | 株式会社リコー | 面発光レーザ素子及び原子発振器 |
US9134478B2 (en) * | 2013-09-16 | 2015-09-15 | Intel Corporation | Hybrid optical apparatuses including optical waveguides |
JP6308089B2 (ja) * | 2013-09-30 | 2018-04-11 | 住友電気工業株式会社 | 光半導体装置の制御方法 |
-
2013
- 2013-09-30 JP JP2013205233A patent/JP6241919B2/ja active Active
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2014
- 2014-09-29 US US14/500,292 patent/US9985413B2/en active Active
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JP2015070207A (ja) | 2015-04-13 |
US20150092799A1 (en) | 2015-04-02 |
US9985413B2 (en) | 2018-05-29 |
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