JP6239330B2 - 透明導電性フィルムの製造方法 - Google Patents

透明導電性フィルムの製造方法 Download PDF

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Publication number
JP6239330B2
JP6239330B2 JP2013199499A JP2013199499A JP6239330B2 JP 6239330 B2 JP6239330 B2 JP 6239330B2 JP 2013199499 A JP2013199499 A JP 2013199499A JP 2013199499 A JP2013199499 A JP 2013199499A JP 6239330 B2 JP6239330 B2 JP 6239330B2
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JP
Japan
Prior art keywords
transparent conductive
film
conductive layer
sputtering
sputter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
JP2013199499A
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English (en)
Japanese (ja)
Other versions
JP2015063743A (ja
Inventor
智剛 梨木
智剛 梨木
久登 加藤
久登 加藤
浩史 別府
浩史 別府
大輔 梶原
大輔 梶原
佳史 高見
佳史 高見
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=52743344&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JP6239330(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Priority to JP2013199499A priority Critical patent/JP6239330B2/ja
Priority to KR1020167001691A priority patent/KR20160061961A/ko
Priority to PCT/JP2014/075206 priority patent/WO2015046208A1/ja
Priority to CN201480047600.1A priority patent/CN105492655A/zh
Priority to TW103133640A priority patent/TWI555869B/zh
Publication of JP2015063743A publication Critical patent/JP2015063743A/ja
Application granted granted Critical
Publication of JP6239330B2 publication Critical patent/JP6239330B2/ja
Ceased legal-status Critical Current
Anticipated expiration legal-status Critical

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
JP2013199499A 2013-09-26 2013-09-26 透明導電性フィルムの製造方法 Ceased JP6239330B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2013199499A JP6239330B2 (ja) 2013-09-26 2013-09-26 透明導電性フィルムの製造方法
KR1020167001691A KR20160061961A (ko) 2013-09-26 2014-09-24 투명 도전성 필름의 제조 방법
PCT/JP2014/075206 WO2015046208A1 (ja) 2013-09-26 2014-09-24 透明導電性フィルムの製造方法
CN201480047600.1A CN105492655A (zh) 2013-09-26 2014-09-24 透明导电性膜的制造方法
TW103133640A TWI555869B (zh) 2013-09-26 2014-09-26 Method for manufacturing transparent conductive film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013199499A JP6239330B2 (ja) 2013-09-26 2013-09-26 透明導電性フィルムの製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2017179127A Division JP6562985B2 (ja) 2017-09-19 2017-09-19 透明導電性フィルムの製造方法

Publications (2)

Publication Number Publication Date
JP2015063743A JP2015063743A (ja) 2015-04-09
JP6239330B2 true JP6239330B2 (ja) 2017-11-29

Family

ID=52743344

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013199499A Ceased JP6239330B2 (ja) 2013-09-26 2013-09-26 透明導電性フィルムの製造方法

Country Status (5)

Country Link
JP (1) JP6239330B2 (zh)
KR (1) KR20160061961A (zh)
CN (1) CN105492655A (zh)
TW (1) TWI555869B (zh)
WO (1) WO2015046208A1 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6412539B2 (ja) * 2015-11-09 2018-10-24 日東電工株式会社 光透過性導電フィルムおよび調光フィルム
TWI629693B (zh) * 2017-03-08 2018-07-11 南臺科技大學 軟性透明導電膜及其製造方法
JP7280036B2 (ja) * 2018-12-17 2023-05-23 日東電工株式会社 導電性フィルムの製造方法
CN115667573A (zh) * 2020-05-25 2023-01-31 日东电工株式会社 透光性导电性片的制造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4473852B2 (ja) * 2006-11-07 2010-06-02 株式会社大阪真空機器製作所 スパッタ装置及びスパッタ方法
JP4917897B2 (ja) * 2007-01-10 2012-04-18 日東電工株式会社 透明導電フィルムおよびその製造方法
JP4667471B2 (ja) 2007-01-18 2011-04-13 日東電工株式会社 透明導電性フィルム、その製造方法及びそれを備えたタッチパネル
JP4775728B2 (ja) * 2009-10-16 2011-09-21 東洋紡績株式会社 透明導電性フィルムの製造装置及び製造方法
CN101877372B (zh) * 2010-05-20 2012-07-25 深圳市创益科技发展有限公司 薄膜太阳能电池的背电极膜层
JP5741220B2 (ja) * 2011-05-30 2015-07-01 大日本印刷株式会社 ガスバリアフィルムの製造方法及び製造装置
JP5196001B2 (ja) * 2011-09-29 2013-05-15 東洋紡株式会社 透明導電性フィルム及びその製造方法

Also Published As

Publication number Publication date
CN105492655A (zh) 2016-04-13
JP2015063743A (ja) 2015-04-09
TW201516171A (zh) 2015-05-01
TWI555869B (zh) 2016-11-01
WO2015046208A1 (ja) 2015-04-02
KR20160061961A (ko) 2016-06-01

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