JP6238149B2 - 新規な化合物半導体及びその活用 - Google Patents
新規な化合物半導体及びその活用 Download PDFInfo
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- 150000001875 compounds Chemical class 0.000 title claims description 136
- 239000004065 semiconductor Substances 0.000 title claims description 120
- 238000006243 chemical reaction Methods 0.000 claims description 56
- 239000000463 material Substances 0.000 claims description 42
- 229910052723 transition metal Inorganic materials 0.000 claims description 33
- 239000000203 mixture Substances 0.000 claims description 31
- 239000000126 substance Substances 0.000 claims description 28
- 238000004519 manufacturing process Methods 0.000 claims description 27
- 239000002245 particle Substances 0.000 claims description 27
- 229910052709 silver Inorganic materials 0.000 claims description 25
- 238000000034 method Methods 0.000 claims description 20
- 239000000843 powder Substances 0.000 claims description 17
- 238000005245 sintering Methods 0.000 claims description 17
- 229910052787 antimony Inorganic materials 0.000 claims description 16
- 229910052785 arsenic Inorganic materials 0.000 claims description 16
- 229910002531 CuTe Inorganic materials 0.000 claims description 13
- 230000003796 beauty Effects 0.000 claims description 13
- 229910052763 palladium Inorganic materials 0.000 claims description 13
- 229910052697 platinum Inorganic materials 0.000 claims description 13
- 229910052711 selenium Inorganic materials 0.000 claims description 13
- 238000002156 mixing Methods 0.000 claims description 11
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 claims description 8
- 229910052788 barium Inorganic materials 0.000 claims description 8
- 229910052792 caesium Inorganic materials 0.000 claims description 8
- 229910052791 calcium Inorganic materials 0.000 claims description 8
- 229910052733 gallium Inorganic materials 0.000 claims description 8
- 229910052738 indium Inorganic materials 0.000 claims description 8
- 229910052745 lead Inorganic materials 0.000 claims description 8
- 229910052749 magnesium Inorganic materials 0.000 claims description 8
- 229910052748 manganese Inorganic materials 0.000 claims description 8
- 229910052700 potassium Inorganic materials 0.000 claims description 8
- 229910052712 strontium Inorganic materials 0.000 claims description 8
- 229910052717 sulfur Inorganic materials 0.000 claims description 8
- 229910052716 thallium Inorganic materials 0.000 claims description 8
- 229910052802 copper Inorganic materials 0.000 claims description 7
- 229910021476 group 6 element Inorganic materials 0.000 claims description 7
- 229910052797 bismuth Inorganic materials 0.000 claims description 5
- 229910052714 tellurium Inorganic materials 0.000 claims description 5
- 230000015572 biosynthetic process Effects 0.000 claims description 4
- 229940126062 Compound A Drugs 0.000 claims 1
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 claims 1
- 238000002360 preparation method Methods 0.000 claims 1
- 230000000052 comparative effect Effects 0.000 description 25
- 230000008859 change Effects 0.000 description 12
- 239000011159 matrix material Substances 0.000 description 11
- 150000003624 transition metals Chemical class 0.000 description 11
- 230000031700 light absorption Effects 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 239000004570 mortar (masonry) Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 238000000498 ball milling Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000010248 power generation Methods 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- 238000000224 chemical solution deposition Methods 0.000 description 2
- 238000004549 pulsed laser deposition Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000002490 spark plasma sintering Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910004613 CdTe Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 1
- 230000005679 Peltier effect Effects 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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Description
<化1>
[Bi1−xMxCuu−wTwOa−yQ1yTebSez]Ac
<化1>
[Bi1−xMxCuu−wTwOa−yQ1yTebSez]Ac
[BiCuu−wTwOaTeb]Ac
[BiCuOTe]Ac
[Bi1−xMxCuuOaSe]Ac
[Bi1−xMxCuOSe]Ac
BiCuOTeの合成のために、Bi2O3(Aldrich、99.9%、10μm)21.7g、Bi(5N+、99.999%、shot)9.7g、Cu(Aldrich、99.7%、3μm)8.9g、Te(5N+、99.999%、shot)17.8gをめのう乳鉢(agate mortar)を用いてよく混合した。混合された材料は、シリカチューブ(silica tube)に入れて真空密封し、500℃で12時間の加熱を行うことでBiCuOTe粉末を得た。熱処理された試料のx線回折パターンを分析した結果、本比較例1によって得られた物質がBiCuOTeであることが確認された。
Bi0.95Pb0.05CuOSeの合成のために、Bi2O3(Aldrich、99.9%、10μm)2.589g、Bi(5N+、99.999%、shot)0.987g、Pb(Alfa Aesar、99.9%、200mesh)0.173g、Cu(Aldrich、99.7%、3μm)1.059g、Se(5N+、99.999%、shot)1.316gをめのう乳鉢を用いてよく混合した。混合された材料は、シリカチューブに入れて真空密封し、600℃で12時間の加熱を行うことでBi0.95Pb0.05CuOSe粉末を得た。
比較例1と同一の方法で、BiCuOTeを合成した。それから、[BiCuOTe][Ag0.01]の組成に合わせてそれぞれの粉末を秤量し、12時間の湿式ZrO2ボールミリングを行うことで混合物を製造した。用いられたAg粒子の粒度は100nmである。
比較例2と同様の方法で、Bi0.95Pb0.05CuOSeを合成した。それから、[Bi0.95Pb0.05CuOSe][Ag0.02]の組成に合わせてそれぞれの粉末を秤量して12時間の湿式ZrO2ボールミリングを行うことで混合物を製造した。実施例2及び実施例3は、組成は同一であるが、それぞれ20nmと45μmとの異なる粒度を有するAgを用いた。
比較例2と同様の方法で、Bi0.95Pb0.05CuOSeを合成した。それから、[Bi0.95Pb0.05CuOSe][Co0.03]の組成に合わせてそれぞれの粉末を秤量し、12時間の湿式ZrO2ボールミリングを行うことで混合物を製造した。この際、用いられたCo粒子の粒度は30μmである。
Claims (18)
- 下記の化学式1で表される化合物半導体:
<化1>
[Bi1−xMxCuu−wTwOa−yQ1yTebSez]Ac
前記化学式1において、Mが、Ba、Sr、Ca、Mg、Cs、K、Na、Cd、Hg、Sn、Pb、Mn、Ga、In、Tl、As及びSbからなる群より選択されたいずれか一種またはこれらの二種以上の元素であり、Q1が、S、Se、As及びSbからなる群より選択されたいずれか一種またはこれらの二種以上の元素であり、Tが、遷移金属元素より選択されたいずれか一種または二種以上の元素であり、Aが、遷移金属元素及び遷移金属元素と6族元素との化合物からなる群より選択されたいずれか一種またはこれらの二種以上であり、0≦x<1、0.5≦u≦1.5、0≦w≦1、0.2<a<1.5、0≦y<1.5、0≦b<1.5、0≦z<1.5及び0<c<0.2である。 - 前記化学式1のcが、0<c<0.05であることを特徴とする、請求項1に記載の化合物半導体。
- 前記Aが、Ag、Co、Ni、Au、Pd、Pt、Ag2Te、CuTe、Cu2Se及びCuAgSeからなる群より選択されたいずれか一種またはこれらの二種以上であることを特徴とする、請求項1に記載の化合物半導体。
- 前記化学式1のx、y及びzが、それぞれx=0、y=0及びz=0であることを特徴とする、請求項1に記載の化合物半導体。
- 前記化学式1のw、y、b及びzが、それぞれw=0、y=0、b=0及びz=1であることを特徴とする、請求項1に記載の化合物半導体。
- 前記化学式1が、[Bi1−xMxCuOSe]Acで表されることを特徴とする、請求項1に記載の化合物半導体。
- Bi1−xMxCuu−wTwOa−yQ1yTebSezで表される化合物にA粒子が不規則的に分布された化合物半導体:
ここで、Mが、Ba、Sr、Ca、Mg、Cs、K、Na、Cd、Hg、Sn、Pb、Mn、Ga、In、Tl、As及びSbからなる群より選択されたいずれか一種またはこれらの二種以上の元素であり、Q1が、S、Se、As及びSbからなる群より選択されたいずれか一種またはこれらの二種以上の元素であり、Tが、遷移金属元素より選択されたいずれか一種または二種以上の元素であり、Aが、遷移金属元素及び遷移金属元素と6族元素との化合物からなる群より選択されたいずれか一種またはこれらの二種以上であり、0≦x<1、0.5≦u≦1.5、0≦w≦1、0.2<a<1.5、0≦y<1.5、0≦b<1.5及び0≦z<1.5である。 - Bi1−xMxCuu−wTwOa−yQ1yTebSezで表される材料を準備する段階と、
前記準備された材料に、Aを添加して混合物を形成する段階と、
前記混合物を焼結する段階と、を含む請求項1の化合物半導体の製造方法。 - 前記Bi1−xMxCuu−wTwOa−yQ1yTebSezで表される材料準備の段階が、Bi2O3、Bi、Cu及びTの各粉末を混合し、選択的にM、Q1、Te及びSeのうち一種以上の粉末をさらに混合した後、熱処理することで行われることを特徴とする、請求項8に記載の化合物半導体の製造方法。
- 前記混合物の形成段階が、AをBi1−xMxCuu−wTwOa−yQ1yTebSezに対し20mol%以下で添加することを特徴とする、請求項8に記載の化合物半導体の製造方法。
- 前記混合物の形成段階が、AをBi1−xMxCuu−wTwOa−yQ1yTebSezに対し5mol%以下で添加することを特徴とする、請求項8に記載の化合物半導体の製造方法。
- 前記混合物の形成段階が、粒度が5nm〜100μmであるAを添加することを特徴とする、請求項8に記載の化合物半導体の製造方法。
- 前記混合物の焼結段階が、加圧焼結方式によって行われることを特徴とする、請求項8に記載の化合物半導体の製造方法。
- Bi2O3、Bi、Cu、T及びAの各粉末を混合し、選択的にM、Q1、Te及びSeのうち一種以上の粉末をさらに混合する段階と、
前記混合物を焼結する段階と、を含む請求項1に記載の化合物半導体の製造方法。 - 請求項1〜7のうちいずれか一項に記載の化合物半導体を含む熱電変換素子。
- 請求項1〜7のうちいずいれか一項に記載の化合物半導体をpタイプ熱電変換材料として含むことを特徴とする、請求項15に記載の熱電変換素子。
- 請求項1〜7のいずれか一項に記載の化合物半導体を含む太陽電池。
- 請求項1〜7のいずれか一項に記載の化合物半導体を含むバルク熱電材料。
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