JP5774201B2 - 新規な化合物半導体及びその活用 - Google Patents
新規な化合物半導体及びその活用 Download PDFInfo
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- JP5774201B2 JP5774201B2 JP2014506350A JP2014506350A JP5774201B2 JP 5774201 B2 JP5774201 B2 JP 5774201B2 JP 2014506350 A JP2014506350 A JP 2014506350A JP 2014506350 A JP2014506350 A JP 2014506350A JP 5774201 B2 JP5774201 B2 JP 5774201B2
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- compound semiconductor
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- heat treatment
- thermoelectric conversion
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- 150000001875 compounds Chemical class 0.000 title claims description 62
- 239000004065 semiconductor Substances 0.000 title claims description 61
- 238000006243 chemical reaction Methods 0.000 claims description 32
- 238000010438 heat treatment Methods 0.000 claims description 28
- 239000000126 substance Substances 0.000 claims description 16
- 239000000203 mixture Substances 0.000 claims description 15
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 239000002994 raw material Substances 0.000 claims description 6
- 229910052787 antimony Inorganic materials 0.000 claims description 4
- 229910052738 indium Inorganic materials 0.000 claims description 4
- 239000000843 powder Substances 0.000 claims description 4
- 239000007789 gas Substances 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 229910052714 tellurium Inorganic materials 0.000 claims description 3
- 229910020599 Co 3 O 4 Inorganic materials 0.000 claims description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 239000000463 material Substances 0.000 description 19
- 230000031700 light absorption Effects 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000000872 buffer Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- 229910052711 selenium Inorganic materials 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 229910052717 sulfur Inorganic materials 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 238000010248 power generation Methods 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 238000000224 chemical solution deposition Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000004570 mortar (masonry) Substances 0.000 description 2
- 238000004549 pulsed laser deposition Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910004613 CdTe Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 1
- 230000005679 Peltier effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F11/00—Compounds containing elements of Groups 6 or 16 of the Periodic Table
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G51/00—Compounds of cobalt
- C01G51/006—Compounds containing, besides cobalt, two or more other elements, with the exception of oxygen or hydrogen
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B19/00—Selenium; Tellurium; Compounds thereof
- C01B19/002—Compounds containing, besides selenium or tellurium, more than one other element, with -O- and -OH not being considered as anions
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
- C07F15/06—Cobalt compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F3/00—Compounds containing elements of Groups 2 or 12 of the Periodic Table
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/90—Antimony compounds
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/80—Constructional details
- H10N10/85—Thermoelectric active materials
- H10N10/851—Thermoelectric active materials comprising inorganic compositions
- H10N10/853—Thermoelectric active materials comprising inorganic compositions comprising arsenic, antimony or bismuth
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/541—CuInSe2 material PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Photovoltaic Devices (AREA)
- Powder Metallurgy (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Description
試薬として、In 0.0510g、Co 0.3873g、Sb 2.2923g、Co3O4 0.0428g、Te 127.6gを用意し、これらを乳鉢(mortar)を利用してよく混合した。このように混合された材料は、石英管(silica tube)の中に入れ真空密封して650℃で36時間加熱し、昇温時間は1時間30分にして、In0.25Co4Sb10.6O0.4Te粉末を得た。
試薬として、In、Co、及びSbを用意し、これらを乳鉢を利用してよく混合してIn0.25Co4Sb12組成の混合物をペレットの形態で製作した。そして、H2(1.94%)及びN2ガスを流しながら500℃で15時間加熱し、このとき昇温時間は1時間30分にした。このように混合された材料は、石英管の中に入れ真空密封して650℃で36時間加熱し、昇温時間は1時間30分にして、In0.25Co4Sb12粉末を得た。
ここで、σは電気伝導度、Sはゼーベック係数、Tは温度、κは熱伝導度を示す。
Claims (9)
- 前記化学式1のnは、0<n≦0.4であることを特徴とする請求項1に記載の化合物半導体。
- 前記化学式1のxは、0<x≦0.25であることを特徴とする請求項1または2に記載の化合物半導体。
- 前記化学式1のn及びzは、0<n+z≦3であることを特徴とする請求項1〜3のいずれか一項に記載の化合物半導体。
- In、Co、Sb、Te及びCo 3 O 4 を含む原料を粉末形態で混合して、請求項1に記載の化学式1に対応する組成を有する混合物を形成するステップと、
真空中、または水素、Ar、He及びN 2 のうち少なくとも一つの気体を流しながら前記混合物を400℃ないし800℃の温度で加熱して熱処理するステップと、
を含む請求項1に記載の化合物半導体の製造方法。 - 前記熱処理ステップは、450℃ないし700℃で行われることを特徴とする請求項5に記載の化合物半導体の製造方法。
- 前記熱処理ステップは、2つ以上の熱処理段階を含むことを特徴とする請求項5または6に記載の化合物半導体の製造方法。
- 請求項1〜4のうちいずれか一項に記載の化合物半導体を含む熱電変換素子。
- 請求項1〜4のうちいずれか一項に記載の化合物半導体を含む太陽電池。
Applications Claiming Priority (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20110045348 | 2011-05-13 | ||
KR10-2011-0045349 | 2011-05-13 | ||
KR20110045349 | 2011-05-13 | ||
KR10-2011-0045348 | 2011-05-13 | ||
KR20110049609 | 2011-05-25 | ||
KR10-2011-0049609 | 2011-05-25 | ||
KR10-2012-0050459 | 2012-05-11 | ||
PCT/KR2012/003738 WO2012157915A1 (ko) | 2011-05-13 | 2012-05-11 | 신규한 화합물 반도체 및 그 활용 |
KR1020120050459A KR101453036B1 (ko) | 2011-05-13 | 2012-05-11 | 신규한 화합물 반도체 및 그 활용 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014519547A JP2014519547A (ja) | 2014-08-14 |
JP5774201B2 true JP5774201B2 (ja) | 2015-09-09 |
Family
ID=47177151
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014506350A Active JP5774201B2 (ja) | 2011-05-13 | 2012-05-11 | 新規な化合物半導体及びその活用 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8636925B2 (ja) |
EP (1) | EP2708503B1 (ja) |
JP (1) | JP5774201B2 (ja) |
KR (1) | KR101453036B1 (ja) |
CN (1) | CN103517872B (ja) |
TW (1) | TWI469931B (ja) |
WO (1) | WO2012157915A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2708505B1 (en) * | 2011-05-13 | 2017-08-23 | LG Chem, Ltd. | Novel compound semiconductor and usage for same |
JP5767399B2 (ja) * | 2011-05-13 | 2015-08-19 | エルジー・ケム・リミテッド | 新規な化合物半導体及びその活用 |
KR102122573B1 (ko) * | 2017-03-09 | 2020-06-12 | 주식회사 엘지화학 | 신규한 화합물 반도체 및 그 활용 |
CA3241652A1 (en) * | 2022-02-25 | 2023-08-31 | Jerald A. Trepanier | Communication system for patient support apparatuses and temperature management devices |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH01298010A (ja) * | 1988-05-26 | 1989-12-01 | Mitsubishi Metal Corp | 金属セレン化物の製造方法 |
JPH02199006A (ja) * | 1989-01-30 | 1990-08-07 | Agency Of Ind Science & Technol | 1/2/5の組成を有する多元系金属カルコゲナイド |
JP2002270907A (ja) * | 2001-03-06 | 2002-09-20 | Nec Corp | 熱電変換材料とそれを用いた素子 |
JP2007505028A (ja) * | 2003-09-12 | 2007-03-08 | ボード オブ トラスティース オペレイティング ミシガン ステイト ユニバーシティー | 銀を含有する熱電気的な合成物 |
JP2005116746A (ja) * | 2003-10-07 | 2005-04-28 | Toshiba Corp | 熱電変換材料及びこれを用いた熱電変換素子 |
US7462217B2 (en) * | 2003-12-08 | 2008-12-09 | E.I. Du Pont De Nemours And Company | Method of preparation for the high performance thermoelectric material indium-cobalt-antimony |
US7723607B2 (en) * | 2004-04-14 | 2010-05-25 | E.I. Du Pont De Nemours And Company | High performance thermoelectric materials and their method of preparation |
JP5055747B2 (ja) * | 2004-11-10 | 2012-10-24 | 大日本印刷株式会社 | 金属酸化物膜の製造方法 |
EP1938343A4 (en) * | 2005-10-17 | 2010-07-28 | Agency Science Tech & Res | NEW PHASE CHANGE MATERIAL |
EP1986804B1 (en) * | 2006-02-16 | 2011-12-28 | Brigham Young University | Preparation of uniform nanoparticles of ultra-high purity metal oxides, mixed metal oxides, metals, and metal alloys |
JP5028616B2 (ja) * | 2006-08-03 | 2012-09-19 | 国立大学法人宇都宮大学 | 金属硫化物の製造方法 |
JP5205904B2 (ja) * | 2006-09-29 | 2013-06-05 | 大日本印刷株式会社 | 金属酸化物膜の製造方法、および積層体 |
KR100910173B1 (ko) * | 2007-09-10 | 2009-07-30 | 충주대학교 산학협력단 | CoSb3 스커테루다이트계 열전재료 및 그 제조방법 |
EP2242121B1 (en) * | 2008-01-23 | 2018-10-24 | Furukawa Co., Ltd. | Thermoelectric conversion material and thermoelectric conversion module |
JP2009253301A (ja) * | 2008-04-04 | 2009-10-29 | Samsung Electronics Co Ltd | ジカルコゲナイド熱電材料 |
WO2010024500A1 (en) * | 2008-08-29 | 2010-03-04 | Lg Chem, Ltd. | New compound semiconductor and producing method thereof, and solar cell and thermoelectric conversion element using the same |
CN101397612B (zh) * | 2008-10-21 | 2011-05-25 | 同济大学 | 一种方钴矿基热电块体材料的制备方法 |
KR101042575B1 (ko) * | 2009-08-11 | 2011-06-20 | 충주대학교 산학협력단 | In-Co-Fe-Sb 계 스커테루다이트 열전재료 및 그 제조방법 |
KR101042574B1 (ko) * | 2009-08-11 | 2011-06-20 | 충주대학교 산학협력단 | In-Co-Ni-Sb 계 스커테루다이트 열전재료 및 그 제조방법 |
JP5767399B2 (ja) * | 2011-05-13 | 2015-08-19 | エルジー・ケム・リミテッド | 新規な化合物半導体及びその活用 |
-
2012
- 2012-05-11 EP EP12786280.3A patent/EP2708503B1/en active Active
- 2012-05-11 KR KR1020120050459A patent/KR101453036B1/ko active IP Right Grant
- 2012-05-11 CN CN201280022977.2A patent/CN103517872B/zh active Active
- 2012-05-11 JP JP2014506350A patent/JP5774201B2/ja active Active
- 2012-05-11 WO PCT/KR2012/003738 patent/WO2012157915A1/ko active Application Filing
- 2012-05-14 TW TW101117052A patent/TWI469931B/zh active
- 2012-09-14 US US13/616,679 patent/US8636925B2/en active Active
Also Published As
Publication number | Publication date |
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WO2012157915A1 (ko) | 2012-11-22 |
CN103517872B (zh) | 2015-08-05 |
KR101453036B1 (ko) | 2014-10-22 |
JP2014519547A (ja) | 2014-08-14 |
US20130009106A1 (en) | 2013-01-10 |
TW201305061A (zh) | 2013-02-01 |
EP2708503B1 (en) | 2017-02-15 |
TWI469931B (zh) | 2015-01-21 |
EP2708503A4 (en) | 2015-04-01 |
US8636925B2 (en) | 2014-01-28 |
CN103517872A (zh) | 2014-01-15 |
EP2708503A1 (en) | 2014-03-19 |
KR20120127321A (ko) | 2012-11-21 |
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