JP5767397B2 - 新規な化合物半導体及びその活用 - Google Patents
新規な化合物半導体及びその活用 Download PDFInfo
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- JP5767397B2 JP5767397B2 JP2014506346A JP2014506346A JP5767397B2 JP 5767397 B2 JP5767397 B2 JP 5767397B2 JP 2014506346 A JP2014506346 A JP 2014506346A JP 2014506346 A JP2014506346 A JP 2014506346A JP 5767397 B2 JP5767397 B2 JP 5767397B2
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- 150000001875 compounds Chemical class 0.000 title claims description 66
- 239000004065 semiconductor Substances 0.000 title claims description 65
- 238000006243 chemical reaction Methods 0.000 claims description 32
- 238000010438 heat treatment Methods 0.000 claims description 28
- 239000000126 substance Substances 0.000 claims description 25
- 239000000203 mixture Substances 0.000 claims description 23
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 229910052732 germanium Inorganic materials 0.000 claims description 7
- 229910052725 zinc Inorganic materials 0.000 claims description 7
- 229910052684 Cerium Inorganic materials 0.000 claims description 6
- 229910052692 Dysprosium Inorganic materials 0.000 claims description 6
- 229910052691 Erbium Inorganic materials 0.000 claims description 6
- 229910052693 Europium Inorganic materials 0.000 claims description 6
- 229910052688 Gadolinium Inorganic materials 0.000 claims description 6
- 229910052689 Holmium Inorganic materials 0.000 claims description 6
- 229910052765 Lutetium Inorganic materials 0.000 claims description 6
- 229910052779 Neodymium Inorganic materials 0.000 claims description 6
- 229910052777 Praseodymium Inorganic materials 0.000 claims description 6
- 229910052772 Samarium Inorganic materials 0.000 claims description 6
- 229910052771 Terbium Inorganic materials 0.000 claims description 6
- 229910052775 Thulium Inorganic materials 0.000 claims description 6
- 229910052769 Ytterbium Inorganic materials 0.000 claims description 6
- 229910052788 barium Inorganic materials 0.000 claims description 6
- 229910052793 cadmium Inorganic materials 0.000 claims description 6
- 229910052804 chromium Inorganic materials 0.000 claims description 6
- 229910052802 copper Inorganic materials 0.000 claims description 6
- 229910052733 gallium Inorganic materials 0.000 claims description 6
- 229910052741 iridium Inorganic materials 0.000 claims description 6
- 229910052742 iron Inorganic materials 0.000 claims description 6
- 229910052746 lanthanum Inorganic materials 0.000 claims description 6
- 229910052748 manganese Inorganic materials 0.000 claims description 6
- 229910052759 nickel Inorganic materials 0.000 claims description 6
- 229910052763 palladium Inorganic materials 0.000 claims description 6
- 229910052697 platinum Inorganic materials 0.000 claims description 6
- 239000002994 raw material Substances 0.000 claims description 6
- 229910052703 rhodium Inorganic materials 0.000 claims description 6
- 229910052707 ruthenium Inorganic materials 0.000 claims description 6
- 229910052706 scandium Inorganic materials 0.000 claims description 6
- 229910052709 silver Inorganic materials 0.000 claims description 6
- 229910052712 strontium Inorganic materials 0.000 claims description 6
- 229910052718 tin Inorganic materials 0.000 claims description 6
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- 229910052720 vanadium Inorganic materials 0.000 claims description 6
- 229910052727 yttrium Inorganic materials 0.000 claims description 6
- 229910052791 calcium Inorganic materials 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 5
- 229910052787 antimony Inorganic materials 0.000 claims description 4
- 229910052738 indium Inorganic materials 0.000 claims description 4
- 239000000463 material Substances 0.000 description 19
- 230000031700 light absorption Effects 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000000872 buffer Substances 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 229910052789 astatine Inorganic materials 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000010248 power generation Methods 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 238000000224 chemical solution deposition Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000004570 mortar (masonry) Substances 0.000 description 2
- 238000004549 pulsed laser deposition Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910052714 tellurium Inorganic materials 0.000 description 2
- 229910004613 CdTe Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 1
- 230000005679 Peltier effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B19/00—Selenium; Tellurium; Compounds thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G51/00—Compounds of cobalt
- C01G51/006—Compounds containing, besides cobalt, two or more other elements, with the exception of oxygen or hydrogen
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B19/00—Selenium; Tellurium; Compounds thereof
- C01B19/002—Compounds containing, besides selenium or tellurium, more than one other element, with -O- and -OH not being considered as anions
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G15/00—Compounds of gallium, indium or thallium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G30/00—Compounds of antimony
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G51/00—Compounds of cobalt
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G55/00—Compounds of ruthenium, rhodium, palladium, osmium, iridium, or platinum
- C01G55/002—Compounds containing, besides ruthenium, rhodium, palladium, osmium, iridium, or platinum, two or more other elements, with the exception of oxygen or hydrogen
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/032—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/80—Constructional details
- H10N10/85—Thermoelectric active materials
- H10N10/851—Thermoelectric active materials comprising inorganic compositions
- H10N10/852—Thermoelectric active materials comprising inorganic compositions comprising tellurium, selenium or sulfur
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/54—Particles characterised by their aspect ratio, i.e. the ratio of sizes in the longest to the shortest dimension
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/40—Electric properties
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photovoltaic Devices (AREA)
- Silicon Compounds (AREA)
Description
試薬として、In 0.0494g、Zn 0.0112g、Co 0.3648g、Rh 0.0531g、Sb 2.2612g、Sn 0.0408g、Te 0.2194gを用意し、これらを乳鉢(mortar)を利用してよく混合した。このように混合された材料は、石英管(silica tube)の中に入れ真空密封して650℃で36時間加熱し、昇温時間は1時間30分にして、In0.25Zn0.1Co3.6Rh0.3Sb10.8Sn0.2Te粉末を得た。
試薬として、In、Co、及びSbを用意し、これらを乳鉢を利用してよく混合してIn0.25Co4Sb12組成の混合物をペレットの形態で製作した。そして、H2(1.94%)及びN2ガスを流しながら500℃で15時間加熱し、このとき昇温時間は1時間30分にした。
ここで、σは電気伝導度、Sはゼーベック係数、Tは温度、κは熱伝導度を示す。
Claims (13)
- 前記化学式1のxは、0<x≦0.25であることを特徴とする請求項1に記載の化合物半導体。
- 前記化学式1のmは、0≦m≦0.5であることを特徴とする請求項1または2に記載の化合物半導体。
- 前記化学式1のaは、0<a≦0.5であることを特徴とする請求項1〜3のいずれか一項に記載の化合物半導体。
- 前記化学式1のx及びyは、0<x+y≦1であることを特徴とする請求項1〜4のいずれか一項に記載の化合物半導体。
- 前記化学式1のn及びzは、0<n+z<9であることを特徴とする請求項1〜5のいずれか一項に記載の化合物半導体。
- In、Co、Sb、及びTeと、Ca、Sr、Ba、Ti、V、Cr、Mn、Cu、Zn、Ag、Cd、Sc、Y、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu及びそれらの酸化物からなる群より選択された少なくとも一つとを含む原料を混合して、請求項1に記載の化学式1に対応する組成を有する混合物を形成するステップと、
前記混合物を熱処理するステップと、
を含む請求項1に記載の化合物半導体の製造方法。 - 前記混合物は、Fe、Ni、Ru、Rh、Pd、Ir、Pt及びそれらの酸化物からなる群より選択された少なくとも一つをさらに含むことを特徴とする請求項7に記載の化合物半導体の製造方法。
- 前記混合物は、Si、Ga、Ge、Sn及びそれらの酸化物からなる群より選択された少なくとも一つをさらに含むことを特徴とする請求項7または8に記載の化合物半導体の製造方法。
- 前記熱処理ステップは、400℃ないし800℃で行われることを特徴とする請求項7〜9のいずれか一項に記載の化合物半導体の製造方法。
- 前記熱処理ステップは、2つ以上の熱処理段階を含むことを特徴とする請求項7〜10のいずれか一項に記載の化合物半導体の製造方法。
- 請求項1〜6のうちいずれか一項に記載の化合物半導体を含む熱電変換素子。
- 請求項1〜6のうちいずれか一項に記載の化合物半導体を含む太陽電池。
Applications Claiming Priority (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20110045348 | 2011-05-13 | ||
KR20110045349 | 2011-05-13 | ||
KR10-2011-0045348 | 2011-05-13 | ||
KR10-2011-0045349 | 2011-05-13 | ||
KR10-2011-0049609 | 2011-05-25 | ||
KR20110049609 | 2011-05-25 | ||
KR1020120050257A KR101380944B1 (ko) | 2011-05-13 | 2012-05-11 | 신규한 화합물 반도체 및 그 활용 |
PCT/KR2012/003729 WO2012157907A1 (ko) | 2011-05-13 | 2012-05-11 | 신규한 화합물 반도체 및 그 활용 |
KR10-2012-0050257 | 2012-05-11 |
Publications (2)
Publication Number | Publication Date |
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JP2014520202A JP2014520202A (ja) | 2014-08-21 |
JP5767397B2 true JP5767397B2 (ja) | 2015-08-19 |
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JP2014506346A Active JP5767397B2 (ja) | 2011-05-13 | 2012-05-11 | 新規な化合物半導体及びその活用 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8658064B2 (ja) |
EP (1) | EP2708501B1 (ja) |
JP (1) | JP5767397B2 (ja) |
KR (1) | KR101380944B1 (ja) |
CN (1) | CN103517870B (ja) |
TW (1) | TWI467788B (ja) |
WO (1) | WO2012157907A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103562127B (zh) * | 2011-05-13 | 2016-07-13 | Lg化学株式会社 | 新的化合物半导体及其用途 |
CN106601837B (zh) * | 2016-11-23 | 2018-06-22 | 中山大学 | 一种超宽光谱光敏材料和应用该光敏材料的光电探测器 |
CN113165873A (zh) | 2018-12-04 | 2021-07-23 | 住友化学株式会社 | 化合物和热电转换材料 |
CN113226981B (zh) * | 2018-12-04 | 2024-03-05 | 住友化学株式会社 | 化合物和热电转换材料 |
Family Cites Families (11)
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JPH02199006A (ja) * | 1989-01-30 | 1990-08-07 | Agency Of Ind Science & Technol | 1/2/5の組成を有する多元系金属カルコゲナイド |
JP2007505028A (ja) * | 2003-09-12 | 2007-03-08 | ボード オブ トラスティース オペレイティング ミシガン ステイト ユニバーシティー | 銀を含有する熱電気的な合成物 |
US7462217B2 (en) * | 2003-12-08 | 2008-12-09 | E.I. Du Pont De Nemours And Company | Method of preparation for the high performance thermoelectric material indium-cobalt-antimony |
KR20070015543A (ko) * | 2004-04-14 | 2007-02-05 | 이 아이 듀폰 디 네모아 앤드 캄파니 | 고성능 열전 물질 및 그의 제조 방법 |
EP1938343A4 (en) * | 2005-10-17 | 2010-07-28 | Agency Science Tech & Res | NEW PHASE CHANGE MATERIAL |
KR100910173B1 (ko) * | 2007-09-10 | 2009-07-30 | 충주대학교 산학협력단 | CoSb3 스커테루다이트계 열전재료 및 그 제조방법 |
WO2009093455A1 (ja) * | 2008-01-23 | 2009-07-30 | Furukawa Co., Ltd. | 熱電変換材料および熱電変換モジュール |
US8518287B2 (en) * | 2008-04-04 | 2013-08-27 | Samsung Electronics Co., Ltd. | Dichalcogenide thermoelectric material |
CN101397612B (zh) * | 2008-10-21 | 2011-05-25 | 同济大学 | 一种方钴矿基热电块体材料的制备方法 |
KR101042574B1 (ko) * | 2009-08-11 | 2011-06-20 | 충주대학교 산학협력단 | In-Co-Ni-Sb 계 스커테루다이트 열전재료 및 그 제조방법 |
KR101042575B1 (ko) * | 2009-08-11 | 2011-06-20 | 충주대학교 산학협력단 | In-Co-Fe-Sb 계 스커테루다이트 열전재료 및 그 제조방법 |
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2012
- 2012-05-11 JP JP2014506346A patent/JP5767397B2/ja active Active
- 2012-05-11 EP EP12786037.7A patent/EP2708501B1/en active Active
- 2012-05-11 WO PCT/KR2012/003729 patent/WO2012157907A1/ko active Application Filing
- 2012-05-11 KR KR1020120050257A patent/KR101380944B1/ko active IP Right Grant
- 2012-05-11 CN CN201280022498.0A patent/CN103517870B/zh active Active
- 2012-05-14 TW TW101117058A patent/TWI467788B/zh active
- 2012-09-14 US US13/617,814 patent/US8658064B2/en active Active
Also Published As
Publication number | Publication date |
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EP2708501B1 (en) | 2017-08-23 |
US20130009114A1 (en) | 2013-01-10 |
TW201308646A (zh) | 2013-02-16 |
US8658064B2 (en) | 2014-02-25 |
KR101380944B1 (ko) | 2014-04-01 |
CN103517870B (zh) | 2016-02-03 |
WO2012157907A1 (ko) | 2012-11-22 |
JP2014520202A (ja) | 2014-08-21 |
EP2708501A1 (en) | 2014-03-19 |
CN103517870A (zh) | 2014-01-15 |
KR20120127300A (ko) | 2012-11-21 |
EP2708501A4 (en) | 2015-03-25 |
TWI467788B (zh) | 2015-01-01 |
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