JP6229592B2 - プラズマｃｖｄ装置 - Google Patents

プラズマｃｖｄ装置 Download PDF

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Publication number
JP6229592B2
JP6229592B2 JP2014104800A JP2014104800A JP6229592B2 JP 6229592 B2 JP6229592 B2 JP 6229592B2 JP 2014104800 A JP2014104800 A JP 2014104800A JP 2014104800 A JP2014104800 A JP 2014104800A JP 6229592 B2 JP6229592 B2 JP 6229592B2
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plasma cvd
anode
cvd apparatus
chamber
hole
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JP2015218381A (ja
JP2015218381A5 (enExample
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雅史 小泉
雅史 小泉
正一郎 熊本
正一郎 熊本
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Toyota Motor Corp
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Toyota Motor Corp
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JP2014104800A 2014-05-21 2014-05-21 プラズマｃｖｄ装置 Active JP6229592B2 (ja)

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JP2014104800A JP6229592B2 (ja) 2014-05-21 2014-05-21 プラズマｃｖｄ装置

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JP2014104800A JP6229592B2 (ja) 2014-05-21 2014-05-21 プラズマｃｖｄ装置

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JP2015218381A JP2015218381A (ja) 2015-12-07
JP2015218381A5 JP2015218381A5 (enExample) 2016-10-27
JP6229592B2 true JP6229592B2 (ja) 2017-11-15

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Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7215305B2 (ja) * 2019-04-04 2023-01-31 日本電産株式会社 プラズマ処理装置用の治具、および、プラズマ処理システム

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61243485A (ja) * 1985-04-19 1986-10-29 松下電器産業株式会社 平板電極の固定法
JPH0349221A (ja) * 1989-07-17 1991-03-04 Anelva Corp 真空化学反応装置
US4980196A (en) * 1990-02-14 1990-12-25 E. I. Du Pont De Nemours And Company Method of coating steel substrate using low temperature plasma processes and priming
JPH10330946A (ja) * 1997-06-05 1998-12-15 Sony Corp 薄膜形成装置および薄膜形成方法
JP3266076B2 (ja) * 1997-11-04 2002-03-18 日本電気株式会社 マイクロ波プラズマ処理装置及びその実施に使用する対向電極
JP4002958B2 (ja) * 2004-06-10 2007-11-07 株式会社昭和真空 ニュートラライザ
JP5164107B2 (ja) * 2008-07-01 2013-03-13 株式会社ユーテック プラズマｃｖｄ装置、薄膜の製造方法及び磁気記録媒体の製造方法
JP3151364U (ja) * 2009-04-09 2009-06-18 株式会社島津製作所 プラズマ化学気相堆積装置
JP2014022590A (ja) * 2012-07-19 2014-02-03 Toyota Motor Corp 車両用コンデンサ装置

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