JP6194426B2 - オプトエレクトロニクス部品およびその製造方法 - Google Patents
オプトエレクトロニクス部品およびその製造方法 Download PDFInfo
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- H—ELECTRICITY
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- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/62—Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3135—Double encapsulation or coating and encapsulation
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- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
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- H—ELECTRICITY
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- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/52—Encapsulations
- H01L33/56—Materials, e.g. epoxy or silicone resin
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32245—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/48463—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
- H01L2224/48465—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
- H01L2224/85909—Post-treatment of the connector or wire bonding area
- H01L2224/8592—Applying permanent coating, e.g. protective coating
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/16—Fillings or auxiliary members in containers or encapsulations, e.g. centering rings
- H01L23/18—Fillings characterised by the material, its physical or chemical properties, or its arrangement within the complete device
- H01L23/24—Fillings characterised by the material, its physical or chemical properties, or its arrangement within the complete device solid or gel at the normal operating temperature of the device
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0033—Processes relating to semiconductor body packages
- H01L2933/005—Processes relating to semiconductor body packages relating to encapsulations
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0033—Processes relating to semiconductor body packages
- H01L2933/0066—Processes relating to semiconductor body packages relating to arrangements for conducting electric current to or from the semiconductor body
Description
200 ハウジング
201 上面
202 下面
300 リードフレーム
301 上面
302 下面
310 第1の接触部
320 第2の接触部
400 ハウジングフレーム
410 キャビティ
420 基底領域
430 壁部
500 オプトエレクトロニクス半導体チップ
501 上面
502 下面
510 第1の電気コンタクトパッド
520 第2の電気コンタクトパッド
530 電気接続部
540 ボンドワイヤ
600 ポッティング部
610 第1の層
611 厚さ
612 表面
620 第2の層
621 厚さ
630 第3の層
Claims (12)
- 導電性の第1の接触部(310)を有するハウジング(200)と、
前記第1の接触部(310)上に配置されたオプトエレクトロニクス半導体チップ(500)と、を備え、
前記オプトエレクトロニクス半導体チップ(500)および前記第1の接触部(310)は、シリコーンを含む第1の層(610)によって少なくとも部分的に被覆され、
SiO2を含む第2の層(620)が前記第1の層(610)の表面(612)に配置され、
前記第2の層(620)の厚さ(621)は、10nm〜1μmであり、
第3の層(630)が前記第2の層(620)の上方に配置され、
前記第1の層(610)の厚さ(611)は、1μm〜100μmである、
オプトエレクトロニクス部品(100)。 - 前記第1の層(610)の厚さ(611)は、5μm〜20μmである、
請求項1に記載のオプトエレクトロニクス部品(100)。 - 前記第1の接触部(310)は、銅を含む、請求項1または2に記載のオプトエレクトロニクス部品(100)。
- 前記ハウジング(200)は、ハウジングフレーム(400)を有し、
前記第1の接触部(310)は、前記ハウジングフレーム(400)内に埋め込まれている、請求項1〜3のいずれか一項に記載のオプトエレクトロニクス部品(100)。 - 前記ハウジング(200)は、キャビティ(410)を有し、
前記第1の接触部(310)は、前記キャビティ(410)の基底領域(420)内に配置されている、請求項1〜4のいずれか一項に記載のオプトエレクトロニクス部品(100)。 - 前記第2の層(620)の厚さ(621)は、50nm〜200nmである、請求項1〜5のいずれか一項に記載のオプトエレクトロニクス部品(100)。
- 前記ハウジング(200)は、前記第1の接触部(310)から電気的に絶縁された導電性の第2の接触部(320)を有し、
前記オプトエレクトロニクス半導体チップ(500)と前記第2の接触部(320)との間に電気接続部(540)が存在する、請求項1〜6のいずれか一項に記載のオプトエレクトロニクス部品(100)。 - − 導電性の第1の接触部(310)を有するハウジング(200)を設けるステップと;
− オプトエレクトロニクス半導体チップ(500)を前記第1の接触部(310)上に配置するステップと;
− シリコーンを含む第1の層(610)を前記オプトエレクトロニクス半導体チップ(500)および前記第1の接触部(310)上に少なくとも部分的に配置するステップと;
− SiO2を含む第2の層(620)を前記第1の層(610)の表面(612)に形成するステップであって、前記第2の層(620)を形成することは、前記第1の層(610)の一部を変化させることによって実行される、ステップと;
− 第3の層(630)を前記第2の層(620)の上方に配置するステップと、を含み、
前記第1の層(610)の厚さ(611)は、1μm〜100μmである、
オプトエレクトロニクス部品(100)の製造方法。 - 前記第1の層(610)の厚さ(611)は、5μm〜20μmである、
請求項8に記載のオプトエレクトロニクス部品(100)の製造方法。 - 前記第1の層(610)の前記一部を変化させることは、酸化によって実行される、請求項8または9に記載の方法。
- 前記第1の層(610)の前記一部を変化させることは、プラズマ処理によって実行される、請求項8〜10のいずれか一項に記載の方法。
- 前記第1の層(610)を配置するステップは、ポッティング法または噴射法によって実行される、請求項8〜11のいずれか一項に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102013215650.2 | 2013-08-08 | ||
DE102013215650.2A DE102013215650B4 (de) | 2013-08-08 | 2013-08-08 | Optoelektronisches Bauelement und Verfahren zu seiner Herstellung |
PCT/EP2014/066852 WO2015018843A1 (de) | 2013-08-08 | 2014-08-05 | Optoelektronisches bauelement und verfahren zu seiner herstellung |
Publications (2)
Publication Number | Publication Date |
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JP2016527729A JP2016527729A (ja) | 2016-09-08 |
JP6194426B2 true JP6194426B2 (ja) | 2017-09-06 |
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JP2016532670A Active JP6194426B2 (ja) | 2013-08-08 | 2014-08-05 | オプトエレクトロニクス部品およびその製造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US9564566B2 (ja) |
JP (1) | JP6194426B2 (ja) |
CN (1) | CN105431952B (ja) |
DE (1) | DE102013215650B4 (ja) |
WO (1) | WO2015018843A1 (ja) |
Families Citing this family (8)
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TWI575778B (zh) * | 2014-05-07 | 2017-03-21 | 新世紀光電股份有限公司 | 發光二極體封裝結構 |
US10622522B2 (en) * | 2014-09-05 | 2020-04-14 | Theodore Lowes | LED packages with chips having insulated surfaces |
DE102015107515A1 (de) | 2015-05-13 | 2016-11-17 | Osram Opto Semiconductors Gmbh | Verfahren zum Bearbeiten eines Leiterrahmens und Leiterrahmen |
WO2019042559A1 (en) * | 2017-08-31 | 2019-03-07 | Osram Opto Semiconductors Gmbh | OPTOELECTRONIC COMPONENT |
CN107731758B (zh) * | 2017-09-13 | 2019-12-06 | 厦门市三安光电科技有限公司 | 一种半导体元件的固晶方法及半导体元件 |
JP7193532B2 (ja) | 2017-10-19 | 2022-12-20 | ルミレッズ リミテッド ライアビリティ カンパニー | 発光デバイスパッケージ |
TWI648878B (zh) * | 2018-05-15 | 2019-01-21 | 東貝光電科技股份有限公司 | Led發光源、led發光源之製造方法及其直下式顯示器 |
DE102019118543B4 (de) * | 2019-07-09 | 2023-02-16 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Anordnung von elektronischen halbleiterbauelementen und verfahren zum betrieb einer anordnung von elektronischen halbleiterbauelementen |
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JPH0729897A (ja) * | 1993-06-25 | 1995-01-31 | Nec Corp | 半導体装置の製造方法 |
DE102006008308A1 (de) * | 2006-02-23 | 2007-08-30 | Clariant International Limited | Polysilazane enthaltende Beschichtungen zur Vermeidung von Zunderbildung und Korrosion |
JP4973011B2 (ja) * | 2006-05-31 | 2012-07-11 | 豊田合成株式会社 | Led装置 |
JP5233087B2 (ja) * | 2006-06-28 | 2013-07-10 | 日亜化学工業株式会社 | 発光装置およびその製造方法、パッケージ、発光素子実装用の基板 |
US7967476B2 (en) * | 2007-07-04 | 2011-06-28 | Nichia Corporation | Light emitting device including protective glass film |
JP5630948B2 (ja) * | 2007-07-04 | 2014-11-26 | 日亜化学工業株式会社 | 発光装置 |
SG153673A1 (en) | 2007-12-10 | 2009-07-29 | Tinggi Tech Private Ltd | Fabrication of semiconductor devices |
US8471283B2 (en) * | 2008-02-25 | 2013-06-25 | Kabushiki Kaisha Toshiba | White LED lamp, backlight, light emitting device, display device and illumination device |
JP2010239043A (ja) * | 2009-03-31 | 2010-10-21 | Citizen Holdings Co Ltd | Led光源及びled光源の製造方法 |
TWI374996B (en) | 2009-04-15 | 2012-10-21 | Semi Photonics Co Ltd | Light emitting device with high cri and high luminescence efficiency |
JP2011204986A (ja) * | 2010-03-26 | 2011-10-13 | Showa Denko Kk | ランプおよびランプの製造方法 |
JP2012019062A (ja) * | 2010-07-08 | 2012-01-26 | Shin Etsu Chem Co Ltd | 発光半導体装置、実装基板及びそれらの製造方法 |
JP5563440B2 (ja) | 2010-12-24 | 2014-07-30 | 株式会社朝日ラバー | 樹脂レンズ、レンズ付led装置及びレンズ付led装置の製造方法 |
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2013
- 2013-08-08 DE DE102013215650.2A patent/DE102013215650B4/de active Active
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2014
- 2014-08-05 JP JP2016532670A patent/JP6194426B2/ja active Active
- 2014-08-05 WO PCT/EP2014/066852 patent/WO2015018843A1/de active Application Filing
- 2014-08-05 CN CN201480044613.3A patent/CN105431952B/zh active Active
- 2014-08-05 US US14/909,850 patent/US9564566B2/en active Active
Also Published As
Publication number | Publication date |
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CN105431952A (zh) | 2016-03-23 |
DE102013215650A1 (de) | 2015-03-05 |
DE102013215650B4 (de) | 2021-10-28 |
WO2015018843A1 (de) | 2015-02-12 |
CN105431952B (zh) | 2018-05-18 |
US20160190410A1 (en) | 2016-06-30 |
US9564566B2 (en) | 2017-02-07 |
JP2016527729A (ja) | 2016-09-08 |
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