JP6189838B2 - 平版印刷版前駆体用現像液組成物及び平版印刷版の作製方法 - Google Patents
平版印刷版前駆体用現像液組成物及び平版印刷版の作製方法 Download PDFInfo
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- JP6189838B2 JP6189838B2 JP2014522687A JP2014522687A JP6189838B2 JP 6189838 B2 JP6189838 B2 JP 6189838B2 JP 2014522687 A JP2014522687 A JP 2014522687A JP 2014522687 A JP2014522687 A JP 2014522687A JP 6189838 B2 JP6189838 B2 JP 6189838B2
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- alkali
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- 239000003513 alkali Substances 0.000 claims description 34
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- 239000003795 chemical substances by application Substances 0.000 claims description 30
- 229910052751 metal Inorganic materials 0.000 claims description 30
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- 238000004519 manufacturing process Methods 0.000 claims description 2
- 125000001453 quaternary ammonium group Chemical group 0.000 claims description 2
- 229910052712 strontium Inorganic materials 0.000 claims description 2
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- 238000002360 preparation method Methods 0.000 description 7
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- 229910052782 aluminium Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 239000000987 azo dye Substances 0.000 description 6
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- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 4
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 4
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- 239000002253 acid Substances 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 4
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- GVNVAWHJIKLAGL-UHFFFAOYSA-N 2-(cyclohexen-1-yl)cyclohexan-1-one Chemical compound O=C1CCCCC1C1=CCCCC1 GVNVAWHJIKLAGL-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 101150065749 Churc1 gene Proteins 0.000 description 3
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 229920002873 Polyethylenimine Polymers 0.000 description 3
- 102100038239 Protein Churchill Human genes 0.000 description 3
- 239000004115 Sodium Silicate Substances 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 3
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 3
- 230000035515 penetration Effects 0.000 description 3
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- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 3
- 229910052911 sodium silicate Inorganic materials 0.000 description 3
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 3
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 2
- LWMWZNOCSCPBCH-UHFFFAOYSA-N 1-[bis[2-[bis(2-hydroxypropyl)amino]ethyl]amino]propan-2-ol Chemical compound CC(O)CN(CC(C)O)CCN(CC(O)C)CCN(CC(C)O)CC(C)O LWMWZNOCSCPBCH-UHFFFAOYSA-N 0.000 description 2
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- RVSIYTLODOLVKA-UHFFFAOYSA-N 2-(2-aminoethoxy)ethanol Chemical compound NCCOCCO.NCCOCCO RVSIYTLODOLVKA-UHFFFAOYSA-N 0.000 description 2
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- 239000004375 Dextrin Substances 0.000 description 2
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- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 2
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 2
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- BJUPZVQSAAGZJL-UHFFFAOYSA-N 2-methyloxirane;propane-1,2,3-triol Chemical class CC1CO1.OCC(O)CO BJUPZVQSAAGZJL-UHFFFAOYSA-N 0.000 description 1
- CUZKCNWZBXLAJX-UHFFFAOYSA-N 2-phenylmethoxyethanol Chemical compound OCCOCC1=CC=CC=C1 CUZKCNWZBXLAJX-UHFFFAOYSA-N 0.000 description 1
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- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
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- 239000000843 powder Substances 0.000 description 1
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- 230000001737 promoting effect Effects 0.000 description 1
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- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
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- IZMJMCDDWKSTTK-UHFFFAOYSA-N quinoline yellow Chemical compound C1=CC=CC2=NC(C3C(C4=CC=CC=C4C3=O)=O)=CC=C21 IZMJMCDDWKSTTK-UHFFFAOYSA-N 0.000 description 1
- 239000001054 red pigment Substances 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical group OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
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- 229910001220 stainless steel Inorganic materials 0.000 description 1
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- 239000004575 stone Substances 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
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- 238000004381 surface treatment Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000001016 thiazine dye Substances 0.000 description 1
- JOUDBUYBGJYFFP-FOCLMDBBSA-N thioindigo Chemical compound S\1C2=CC=CC=C2C(=O)C/1=C1/C(=O)C2=CC=CC=C2S1 JOUDBUYBGJYFFP-FOCLMDBBSA-N 0.000 description 1
- 150000007944 thiolates Chemical class 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- RKBCYCFRFCNLTO-UHFFFAOYSA-N triisopropylamine Chemical compound CC(C)N(C(C)C)C(C)C RKBCYCFRFCNLTO-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
- G03F7/327—Non-aqueous alkaline compositions, e.g. anhydrous quaternary ammonium salts
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Description
親水性表面を有する基板上に、水不溶性かつアルカリ可溶性又は分散性樹脂を含む下層と、前記下層上に形成された水不溶性かつアルカリ可溶性又は分散性樹脂を含む上層とを含み、前記下層及び上層の少なくとも一方が、光熱変換物質を含むポジ型平版印刷版前駆体を、赤外線レーザーを用いて像様露光する工程、
前記露光済み平版印刷版前駆体を、上述の本発明のアルカリ現像液組成物で現像して露光部を除去し、画像部と非画像部を形成する工程
を含んで成る平版印刷版の作製方法も提供する。
下記一般式(II)
R4'は式(I)に規定したR4と同じであり、
R5'は式(I)に規定したR5と同じであり、
R6'は式(I)に規定したR6と同じであり、
R7'は式(I)に規定したR7と同じである。)
で表される置換基群から選択することができる。
平版印刷版前駆体を構成する下層は、アルカリ性水溶液に可溶性又は分散性の樹脂を含む。アルカリ性水溶液に可溶性又は分散可能であるためには、前記樹脂が少なくとも、カルボキシル基、スルホン酸基、リン酸基、ホスホン酸基、活性イミノ基、スルホンアミド基等の官能基を有することが好ましい。したがって、下層に用いる、アルカリ性水溶液に可溶性又は分散性の樹脂は、カルボキシル基、スルホン酸基、リン酸基、ホスホン酸基、活性イミノ基、スルホンアミド基及びその組合せ等の官能基を有するエチレン性不飽和モノマーを1つ以上含むモノマー混合物を重合することによって好適に生成することができる。
で表される化合物又はその混合物となることができる。
平版印刷版前駆体を構成する上層は、アルカリ可溶性又は分散性樹脂を含む。上層に用いることができるアルカリ可溶性又は分散性樹脂は、カルボン酸又は酸無水物基を有する樹脂が好ましく、不飽和カルボン酸及び不飽和カルボン酸無水物の一方、又は不飽和カルボン酸及び不飽和カルボン酸無水物の両方を含むモノマー混合物を重合して得られる共重合体、酸性水素原子を含む置換基を有するポリウレタン等が挙げられる。不飽和カルボン酸としては、アクリル酸、メタクリル酸、マレイン酸、イタコン酸等、不飽和カルボン酸無水物としては、無水マレイン酸、無水イタコン酸等を挙げることができる。共重合可能なエチレン性不飽和モノマー単位としては、前記のその他のエチレン性不飽和コモノマーを挙げることができる。
前記下層及び上層の少なくとも一方に、光熱変換物質を含む。平版印刷前駆体の下層に光熱変換物質を含有し、上層には光熱変換物質を含有しない場合は、平版印刷前駆体をレーザーで画像書き込みすると、下層の光熱変換物質が、レーザーの光を熱に変換し、その熱が上層に伝達されることにより最上部層のアルカリ可溶性又は分散性樹脂の一部の分子構造が崩壊し、又は上層に孔を生じせしめ、現像液の下層への浸透を可能にすると考えられる。
を有する染料が好ましい。
基板としては、例えば、アルミニウム、亜鉛、銅、ステンレス、鉄等の金属板;ポリエチレンテレフタレート、ポリカーボネート、ポリビニルアセタール、ポリエチレン等のプラスチックフィルム;合成樹脂を溶融塗布あるいは合成樹脂溶液を塗布した紙、プラスチックフィルムに金属層を真空蒸着、ラミネート等の技術により設けた複合材料;その他印刷版の基板として使用されている材料が挙げられる。これらのうち、特にアルミニウム及びアルミニウムが被覆された複合基板の使用が好ましい。
<ポリマー1>
ビニルホスホン酸/アクリルアミドコポリマー(モル比1:9)
攪拌器、コンデンサー、滴下装置を有する10リットルフラスコ中に、エタノール3500gを入れ70℃に加熱した。ビニルホスホン酸モノマー231.1g(2.14mol)とアクリルアミド1368.9g(19.26mol)、AIBN52gを、エタノール1000g中に溶解させ、この溶液を反応装置中に4時間かけて滴下した。モノマー溶液の滴下中、白色の沈殿が生成した。70℃に保温したまま、さらに2時間加熱攪拌を行った後、加熱を止め室温まで冷却した。沈殿した白色粉末を濾過により分離し、エタノール1000gで洗浄し乾燥した。
厚さ0.24mmのアルミニウム板を水酸化ナトリウム水溶液にて脱脂し、これを2%塩酸浴中で電解研磨処理して、中心平均粗さ(Ra)0.5μmの砂目板を得た。次いで、20%硫酸浴中、電流密度2A/dm2で陽極酸化処理して、2.7g/m2の酸化皮膜を形成し、水洗乾燥後アルミニウム基板を得た。このようにして得られた基板を、60℃に加熱したポリマー1の0.5g/L水溶液中に10秒間浸漬し、水洗乾燥した。このようにして平版印刷版前駆体用の基板を得た。
下層用塗布液の調製
以下の表1に示す、下層用塗布液を調製した。
表2に示す上層用塗布液を調製した。
上記基板作成の方法で得られた基板上に、ロールコーターを用いて、表1で調製した下層用塗布液(B−1)をコーティングし、100℃で2分間乾燥して第1の画像形成層を得た。この時の乾燥塗膜量は1.5g/m2であった。この第1の画像形成層の上に、表2で調製した上層用塗布液(T−1)を、ロールコーターを用いてコーティングし、100℃で2分間乾燥して二層型平版印刷前駆体を得た。メチルイソブチルケトンで、上層の画像形成層のみを剥離して、上層の画像形成層の乾燥塗膜量を求めた。この時の上層の画像形成層の乾燥塗膜量は0.5g/m2であった。
さらに、上記で得られた二層型平版印刷前駆体の感光層表面上に、水分含有量2.5%、材質天然パルプ紙、厚さ70μm、重さ45g/m2の保護材を供給し、樹脂製パレットの上に30枚堆積した。その後、側面および上面を特殊ポリオレフィンフィルムにて、空気が入らないように巻き、60℃、24時間のコンディショニング処理を行った。このようにして、二層型の平版印刷版前駆体Aを作製した。
以下に示す表3、4の組成に従って、種々の現像液を調製した。
現像液1は、(C)元素の周期律表の第2族に属する元素の金属塩として、塩化カルシウム2水和物、(D)カルボン酸又はその塩を有するポリマーとしてアクリル酸・マレイン酸共重合体(モル比40:60)のナトリウム塩(40%水溶液)、(B)一般式(I)で表される化合物としてアデカポリエーテルEDP−300をそれぞれ添加した。現像液2は、現像液1のアデカポリエーテルEDP−300をN,N,N’,N’’,N’’-ペンタキス(2−ヒドロキシプロピル)ジエチレントリアミンに換えた以外は、現像液1と同じ組成で作製した。現像液3は、現像液1のアデカポリエーテルEDP−300を、エポミンPP−061に換えた以外は、現像液1と同じ組成で作製した。現像液4は、現像液1のアデカポリエーテルEDP−300を、アデカポリエーテルEDP−450に換えた以外は、現像液1と同じ組成で作製した。現像液5は、現像液1のアデカポリエーテルEDP−300を、アデカポリエーテルBM−34に換えた以外は、現像液1と同じ組成で作製した。 現像液6は、(C)成分の金属イオンと(D)のカルボン酸のモル比が、1:2.3となるように、現像液成分を調整した。現像液7は、(C)成分の金属イオンと(D)のカルボン酸のモル比が、1:18.8となるように、現像液成分を調整した。
(C)の金属イオンと(D)のカルボン酸のモル比率を変えて、同様に発明例用現像液18〜19として、表8に示す組成で現像液を作製した。現像液18は、現像液6の成分と同じであるが、(C)の金属イオンと(D)のカルボン酸のモル比率が、1:1.5となるように、現像液組成を作製した。現像液19は、現像液7の成分と同じであるが、(C)の金属イオンと(D)のカルボン酸のモル比率が、1:45.1となるように、現像液組成を作製した。
作製した二層型平版印刷版前駆体Aについて、プレートセッターPT−R4300(大日本スクリーン製造株式会社製)を用いて150mJ/cm2で露光した。現像処理は自動現像機P−940X(コダック株式会社製)、および表4で得られた現像液を水で4倍希釈した現像液を用いて、30℃15秒にて行った。その後、フィニッシングガムPF2(コダック株式会社製)でガム引きを行った。さらに、2.5倍に希釈した現像液を、平版印刷版前駆体A1m2処理当たり20mlずつ補充しながら、連続で2000m2の平版印刷版前駆体Aの現像処理を行った。
得られた結果を表9に示す。
平版印刷版前駆体A、0m2処理時、500m2処理時、1000m2処理時、2000m2処理時の、平版印刷版前駆体Aの非画像部の現像性及び画像部の膜減りを観察した。
非画像部の現像性は、25倍ルーペで非画像部を観察し、画像形成層の現像残りの有無を評価した。以下の基準を用いて評価した。
○:十分に現像され、非画像部に画像記録層の残存は認められない。
△:非画像部上に若干画像記録層の残存が認められる。
×:非画像部上に現像不良が認められ、画像記録層が残存している。
○:残存率95%以上
△:残存率90%以上95%未満
×:残存率90%未満
Claims (8)
- 平版印刷版の作製方法であって、
親水性表面を有する基板上に、水不溶性かつアルカリ可溶性樹脂を含む下層と、前記下層上に形成された水不溶性かつアルカリ可溶性樹脂を含む上層とを含み、前記下層及び上層の少なくとも一方が、光熱変換物質を含むポジ型平版印刷版前駆体を、赤外線レーザーを用いて像様露光する工程、
前記露光済み平版印刷版前駆体をアルカリ現像液組成物で現像して露光部を除去し、画像部と非画像部を形成する工程
を含んで成り、前記アルカリ現像液組成物が、
(A)アルカリ剤、
(B)下記一般式(I)で表される化合物、
(C)元素の周期律表の第2族元素の金属塩、及び
(D)カルボン酸又はその塩を有するポリマー
を含んで成る、平版印刷版の作製方法。
R5、R6は各々独立に2価の連結基を表し、同一であっても異なっていてもよい。
R7は、上記R1〜R4において規定する基から選択することができ、又は
下記一般式(II)
R4'は式(I)に規定したR4と同じであり、
R5'は式(I)に規定したR5と同じであり、
R6'は式(I)に規定したR6と同じであり、
R7'は式(I)に規定したR7と同じである。)
で表される置換基群から選択することができる。
式(I)及び(II)中のnは0〜20の整数を表し、nが2以上の場合、R7、R7'は、それぞれ独立して選択することができる。] - 前記(C)元素の周期律表の第2族元素が、マグネシウム、カルシウム、ストロンチウム、バリウムから成る群より選択される請求項1に記載の方法。
- 前記(C)第2族元素の金属塩が、塩化物、炭酸塩、酢酸塩、硫酸塩、硝酸塩、リン酸塩から成る群より選択される請求項1又は2に記載の方法。
- 前記(A)アルカリ剤が、有機アミン類である請求項1〜4のいずれか1項に記載の方法。
- 前記アルカリ現像液組成物が、さらに有機溶剤を含んで成る、請求項1〜5のいずれか1項に記載の方法。
- 前記アルカリ現像液組成物が、さらに界面活性剤を含んで成る、請求項1〜6のいずれか1項に記載の方法。
- 前記アルカリ現像液組成物のpHが12以下である請求項1〜7のいずれか1項に記載の方法。
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WO2008066522A1 (en) | 2006-11-28 | 2008-06-05 | Eastman Kodak Company | Multilayer imageable elements having good solvent resistance |
JP5319097B2 (ja) | 2007-10-16 | 2013-10-16 | イーストマン コダック カンパニー | ポジ型平版印刷版原版及びその製版方法 |
JP2009251221A (ja) * | 2008-04-04 | 2009-10-29 | Konica Minolta Medical & Graphic Inc | 感光性平版印刷版材料の処理方法 |
CN101750909A (zh) * | 2008-12-16 | 2010-06-23 | 京东方科技集团股份有限公司 | 显影液组成物 |
EP2365389B1 (en) * | 2010-03-08 | 2013-01-16 | Fujifilm Corporation | Positive-working lithographic printing plate precursor for infrared laser and process for making lithographic printing plate |
US8530143B2 (en) * | 2010-11-18 | 2013-09-10 | Eastman Kodak Company | Silicate-free developer compositions |
JP5933950B2 (ja) * | 2011-09-30 | 2016-06-15 | アドバンスド テクノロジー マテリアルズ,インコーポレイテッド | 銅または銅合金用エッチング液 |
JP5554362B2 (ja) * | 2012-03-30 | 2014-07-23 | 富士フイルム株式会社 | 平版印刷版の製版方法 |
-
2013
- 2013-06-27 WO PCT/JP2013/067696 patent/WO2014003134A1/ja active Application Filing
- 2013-06-27 JP JP2014522687A patent/JP6189838B2/ja not_active Expired - Fee Related
- 2013-06-27 EP EP13808667.3A patent/EP2869123A4/en not_active Withdrawn
- 2013-06-27 CN CN201380034525.0A patent/CN104395835A/zh active Pending
- 2013-06-27 US US14/400,894 patent/US9201307B2/en not_active Expired - Fee Related
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EP2869123A4 (en) | 2016-03-09 |
JPWO2014003134A1 (ja) | 2016-06-02 |
US9201307B2 (en) | 2015-12-01 |
US20150125795A1 (en) | 2015-05-07 |
CN104395835A (zh) | 2015-03-04 |
WO2014003134A1 (ja) | 2014-01-03 |
EP2869123A1 (en) | 2015-05-06 |
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