JP5443060B2 - 平版印刷版前駆体 - Google Patents
平版印刷版前駆体 Download PDFInfo
- Publication number
- JP5443060B2 JP5443060B2 JP2009133358A JP2009133358A JP5443060B2 JP 5443060 B2 JP5443060 B2 JP 5443060B2 JP 2009133358 A JP2009133358 A JP 2009133358A JP 2009133358 A JP2009133358 A JP 2009133358A JP 5443060 B2 JP5443060 B2 JP 5443060B2
- Authority
- JP
- Japan
- Prior art keywords
- acid
- group
- printing plate
- lithographic printing
- plate precursor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000007639 printing Methods 0.000 title claims description 106
- 239000002243 precursor Substances 0.000 title claims description 36
- 239000000178 monomer Substances 0.000 claims description 50
- 229920001577 copolymer Polymers 0.000 claims description 36
- 239000000758 substrate Substances 0.000 claims description 35
- ZTWTYVWXUKTLCP-UHFFFAOYSA-N vinylphosphonic acid Chemical compound OP(O)(=O)C=C ZTWTYVWXUKTLCP-UHFFFAOYSA-N 0.000 claims description 22
- 239000000463 material Substances 0.000 claims description 18
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 16
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 claims description 12
- 238000006243 chemical reaction Methods 0.000 claims description 12
- 125000001424 substituent group Chemical group 0.000 claims description 12
- 229910052782 aluminium Inorganic materials 0.000 claims description 11
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 11
- 125000003118 aryl group Chemical group 0.000 claims description 10
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 8
- 125000000542 sulfonic acid group Chemical group 0.000 claims description 6
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims description 5
- 125000003545 alkoxy group Chemical group 0.000 claims description 5
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 5
- 125000006165 cyclic alkyl group Chemical group 0.000 claims description 5
- 125000004122 cyclic group Chemical group 0.000 claims description 5
- 125000004185 ester group Chemical group 0.000 claims description 5
- 125000005843 halogen group Chemical group 0.000 claims description 5
- 125000000468 ketone group Chemical group 0.000 claims description 5
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 claims description 5
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 5
- 125000003107 substituted aryl group Chemical group 0.000 claims description 5
- 238000007788 roughening Methods 0.000 claims description 4
- SEILKFZTLVMHRR-UHFFFAOYSA-N 2-phosphonooxyethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOP(O)(O)=O SEILKFZTLVMHRR-UHFFFAOYSA-N 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 92
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- -1 polyethylene terephthalate Polymers 0.000 description 57
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- 239000000243 solution Substances 0.000 description 41
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- 239000002244 precipitate Substances 0.000 description 21
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- 230000015572 biosynthetic process Effects 0.000 description 15
- 238000011161 development Methods 0.000 description 15
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- 239000007864 aqueous solution Substances 0.000 description 14
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 13
- OZAIFHULBGXAKX-VAWYXSNFSA-N AIBN Substances N#CC(C)(C)\N=N\C(C)(C)C#N OZAIFHULBGXAKX-VAWYXSNFSA-N 0.000 description 13
- 230000002378 acidificating effect Effects 0.000 description 13
- 235000014113 dietary fatty acids Nutrition 0.000 description 13
- 239000000194 fatty acid Substances 0.000 description 13
- 229930195729 fatty acid Natural products 0.000 description 13
- 239000000126 substance Substances 0.000 description 13
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 12
- 238000003786 synthesis reaction Methods 0.000 description 12
- 238000003828 vacuum filtration Methods 0.000 description 12
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 11
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 11
- 239000013078 crystal Substances 0.000 description 11
- 238000011156 evaluation Methods 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 11
- 239000003960 organic solvent Substances 0.000 description 11
- 229920000642 polymer Polymers 0.000 description 11
- 238000001291 vacuum drying Methods 0.000 description 11
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 10
- 239000004814 polyurethane Substances 0.000 description 10
- 229920002635 polyurethane Polymers 0.000 description 10
- 239000004094 surface-active agent Substances 0.000 description 10
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 9
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 9
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 9
- 125000005442 diisocyanate group Chemical group 0.000 description 9
- 150000002009 diols Chemical class 0.000 description 9
- 238000001035 drying Methods 0.000 description 8
- 238000005516 engineering process Methods 0.000 description 8
- 150000002148 esters Chemical class 0.000 description 8
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 8
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 7
- 229920006322 acrylamide copolymer Polymers 0.000 description 7
- 239000006229 carbon black Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 150000003839 salts Chemical class 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 6
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 6
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerol Natural products OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000000987 azo dye Substances 0.000 description 6
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 230000036961 partial effect Effects 0.000 description 6
- 238000005498 polishing Methods 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 5
- 229910019142 PO4 Inorganic materials 0.000 description 5
- 239000002202 Polyethylene glycol Substances 0.000 description 5
- 239000003513 alkali Substances 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 239000006185 dispersion Substances 0.000 description 5
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 5
- 239000011976 maleic acid Substances 0.000 description 5
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 5
- 150000007524 organic acids Chemical class 0.000 description 5
- 239000010452 phosphate Substances 0.000 description 5
- 229920001223 polyethylene glycol Polymers 0.000 description 5
- 229920001451 polypropylene glycol Polymers 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 4
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 239000004375 Dextrin Substances 0.000 description 4
- 229920001353 Dextrin Polymers 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 4
- 229920002472 Starch Polymers 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 4
- 150000001298 alcohols Chemical class 0.000 description 4
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 4
- QUKGYYKBILRGFE-UHFFFAOYSA-N benzyl acetate Chemical compound CC(=O)OCC1=CC=CC=C1 QUKGYYKBILRGFE-UHFFFAOYSA-N 0.000 description 4
- 235000019425 dextrin Nutrition 0.000 description 4
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 4
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 4
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 4
- 150000004665 fatty acids Chemical class 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- 239000008107 starch Substances 0.000 description 4
- 235000019698 starch Nutrition 0.000 description 4
- 238000004381 surface treatment Methods 0.000 description 4
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 4
- 229920002554 vinyl polymer Polymers 0.000 description 4
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 3
- ZPVFWPFBNIEHGJ-UHFFFAOYSA-N 2-octanone Chemical compound CCCCCCC(C)=O ZPVFWPFBNIEHGJ-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- 241000894006 Bacteria Species 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 3
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
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- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
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- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
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- 239000000654 additive Substances 0.000 description 3
- 125000005037 alkyl phenyl group Chemical group 0.000 description 3
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- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 3
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- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 239000001530 fumaric acid Substances 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
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- 229940093915 gynecological organic acid Drugs 0.000 description 3
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 3
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- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 2
- FKTHNVSLHLHISI-UHFFFAOYSA-N 1,2-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC=C1CN=C=O FKTHNVSLHLHISI-UHFFFAOYSA-N 0.000 description 2
- GDXHBFHOEYVPED-UHFFFAOYSA-N 1-(2-butoxyethoxy)butane Chemical compound CCCCOCCOCCCC GDXHBFHOEYVPED-UHFFFAOYSA-N 0.000 description 2
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- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 2
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 2
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- 150000003923 2,5-pyrrolediones Chemical class 0.000 description 2
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- RWLALWYNXFYRGW-UHFFFAOYSA-N 2-Ethyl-1,3-hexanediol Chemical compound CCCC(O)C(CC)CO RWLALWYNXFYRGW-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
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- CETWDUZRCINIHU-UHFFFAOYSA-N 2-heptanol Chemical compound CCCCCC(C)O CETWDUZRCINIHU-UHFFFAOYSA-N 0.000 description 2
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- IZXGMKHVTNJFAA-UHFFFAOYSA-N n-methyl-n-phenylprop-2-enamide Chemical compound C=CC(=O)N(C)C1=CC=CC=C1 IZXGMKHVTNJFAA-UHFFFAOYSA-N 0.000 description 1
- SEEYREPSKCQBBF-UHFFFAOYSA-N n-methylmaleimide Chemical compound CN1C(=O)C=CC1=O SEEYREPSKCQBBF-UHFFFAOYSA-N 0.000 description 1
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- AWGZKFQMWZYCHF-UHFFFAOYSA-N n-octylprop-2-enamide Chemical compound CCCCCCCCNC(=O)C=C AWGZKFQMWZYCHF-UHFFFAOYSA-N 0.000 description 1
- BPCNEKWROYSOLT-UHFFFAOYSA-N n-phenylprop-2-enamide Chemical compound C=CC(=O)NC1=CC=CC=C1 BPCNEKWROYSOLT-UHFFFAOYSA-N 0.000 description 1
- WDFKEEALECCKTJ-UHFFFAOYSA-N n-propylprop-2-enamide Chemical compound CCCNC(=O)C=C WDFKEEALECCKTJ-UHFFFAOYSA-N 0.000 description 1
- QQZXAODFGRZKJT-UHFFFAOYSA-N n-tert-butyl-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NC(C)(C)C QQZXAODFGRZKJT-UHFFFAOYSA-N 0.000 description 1
- HVYCQBKSRWZZGX-UHFFFAOYSA-N naphthalen-1-yl 2-methylprop-2-enoate Chemical compound C1=CC=C2C(OC(=O)C(=C)C)=CC=CC2=C1 HVYCQBKSRWZZGX-UHFFFAOYSA-N 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
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- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- 239000001005 nitro dye Substances 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 125000000018 nitroso group Chemical group N(=O)* 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- RCALDWJXTVCBAZ-UHFFFAOYSA-N oct-1-enylbenzene Chemical compound CCCCCCC=CC1=CC=CC=C1 RCALDWJXTVCBAZ-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- OEIJHBUUFURJLI-UHFFFAOYSA-N octane-1,8-diol Chemical compound OCCCCCCCCO OEIJHBUUFURJLI-UHFFFAOYSA-N 0.000 description 1
- NZIDBRBFGPQCRY-UHFFFAOYSA-N octyl 2-methylprop-2-enoate Chemical compound CCCCCCCCOC(=O)C(C)=C NZIDBRBFGPQCRY-UHFFFAOYSA-N 0.000 description 1
- 229940065472 octyl acrylate Drugs 0.000 description 1
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- 239000001053 orange pigment Substances 0.000 description 1
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- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- 125000006353 oxyethylene group Chemical group 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 238000010979 pH adjustment Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- HVAMZGADVCBITI-UHFFFAOYSA-M pent-4-enoate Chemical compound [O-]C(=O)CCC=C HVAMZGADVCBITI-UHFFFAOYSA-M 0.000 description 1
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- GXOHBWLPQHTYPF-UHFFFAOYSA-N pentyl 2-hydroxypropanoate Chemical compound CCCCCOC(=O)C(C)O GXOHBWLPQHTYPF-UHFFFAOYSA-N 0.000 description 1
- ULDDEWDFUNBUCM-UHFFFAOYSA-N pentyl prop-2-enoate Chemical compound CCCCCOC(=O)C=C ULDDEWDFUNBUCM-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- DGBWPZSGHAXYGK-UHFFFAOYSA-N perinone Chemical compound C12=NC3=CC=CC=C3N2C(=O)C2=CC=C3C4=C2C1=CC=C4C(=O)N1C2=CC=CC=C2N=C13 DGBWPZSGHAXYGK-UHFFFAOYSA-N 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- CMPQUABWPXYYSH-UHFFFAOYSA-N phenyl phosphate Chemical compound OP(O)(=O)OC1=CC=CC=C1 CMPQUABWPXYYSH-UHFFFAOYSA-N 0.000 description 1
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- MLCHBQKMVKNBOV-UHFFFAOYSA-N phenylphosphinic acid Chemical compound OP(=O)C1=CC=CC=C1 MLCHBQKMVKNBOV-UHFFFAOYSA-N 0.000 description 1
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 1
- 150000003009 phosphonic acids Chemical class 0.000 description 1
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- 239000000467 phytic acid Substances 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001610 polycaprolactone Polymers 0.000 description 1
- 239000004632 polycaprolactone Substances 0.000 description 1
- 229920005906 polyester polyol Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920002503 polyoxyethylene-polyoxypropylene Polymers 0.000 description 1
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- 239000001205 polyphosphate Substances 0.000 description 1
- 235000011176 polyphosphates Nutrition 0.000 description 1
- 229920001282 polysaccharide Polymers 0.000 description 1
- 239000005017 polysaccharide Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920000909 polytetrahydrofuran Polymers 0.000 description 1
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 1
- 235000019252 potassium sulphite Nutrition 0.000 description 1
- 230000003389 potentiating effect Effects 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- UIIIBRHUICCMAI-UHFFFAOYSA-N prop-2-ene-1-sulfonic acid Chemical compound OS(=O)(=O)CC=C UIIIBRHUICCMAI-UHFFFAOYSA-N 0.000 description 1
- CYFIHPJVHCCGTF-UHFFFAOYSA-N prop-2-enyl 2-hydroxypropanoate Chemical compound CC(O)C(=O)OCC=C CYFIHPJVHCCGTF-UHFFFAOYSA-N 0.000 description 1
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 1
- AXLMPTNTPOWPLT-UHFFFAOYSA-N prop-2-enyl 3-oxobutanoate Chemical compound CC(=O)CC(=O)OCC=C AXLMPTNTPOWPLT-UHFFFAOYSA-N 0.000 description 1
- ZQMAPKVSTSACQB-UHFFFAOYSA-N prop-2-enyl dodecanoate Chemical compound CCCCCCCCCCCC(=O)OCC=C ZQMAPKVSTSACQB-UHFFFAOYSA-N 0.000 description 1
- HAFZJTKIBGEQKT-UHFFFAOYSA-N prop-2-enyl hexadecanoate Chemical compound CCCCCCCCCCCCCCCC(=O)OCC=C HAFZJTKIBGEQKT-UHFFFAOYSA-N 0.000 description 1
- HPCIWDZYMSZAEZ-UHFFFAOYSA-N prop-2-enyl octadecanoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC=C HPCIWDZYMSZAEZ-UHFFFAOYSA-N 0.000 description 1
- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 239000001057 purple pigment Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
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- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical class C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- IZMJMCDDWKSTTK-UHFFFAOYSA-N quinoline yellow Chemical compound C1=CC=CC2=NC(C3C(C4=CC=CC=C4C3=O)=O)=CC=C21 IZMJMCDDWKSTTK-UHFFFAOYSA-N 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000001054 red pigment Substances 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 229940043267 rhodamine b Drugs 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
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- 239000010703 silicon Substances 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000019259 sodium dehydroacetate Nutrition 0.000 description 1
- 229940079839 sodium dehydroacetate Drugs 0.000 description 1
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical group [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- DSOWAKKSGYUMTF-GZOLSCHFSA-M sodium;(1e)-1-(6-methyl-2,4-dioxopyran-3-ylidene)ethanolate Chemical compound [Na+].C\C([O-])=C1/C(=O)OC(C)=CC1=O DSOWAKKSGYUMTF-GZOLSCHFSA-M 0.000 description 1
- FGXAXWOAJVOILP-UHFFFAOYSA-M sodium;2-[methyl(pentadecyl)amino]acetate Chemical compound [Na+].CCCCCCCCCCCCCCCN(C)CC([O-])=O FGXAXWOAJVOILP-UHFFFAOYSA-M 0.000 description 1
- FGDMJJQHQDFUCP-UHFFFAOYSA-M sodium;2-propan-2-ylnaphthalene-1-sulfonate Chemical compound [Na+].C1=CC=CC2=C(S([O-])(=O)=O)C(C(C)C)=CC=C21 FGDMJJQHQDFUCP-UHFFFAOYSA-M 0.000 description 1
- 238000005063 solubilization Methods 0.000 description 1
- 230000007928 solubilization Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
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- 238000003860 storage Methods 0.000 description 1
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- 229940014800 succinic anhydride Drugs 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- SEEPANYCNGTZFQ-UHFFFAOYSA-N sulfadiazine Chemical compound C1=CC(N)=CC=C1S(=O)(=O)NC1=NC=CC=N1 SEEPANYCNGTZFQ-UHFFFAOYSA-N 0.000 description 1
- 150000003455 sulfinic acids Chemical class 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 229940042055 systemic antimycotics triazole derivative Drugs 0.000 description 1
- 239000003760 tallow Substances 0.000 description 1
- 235000015523 tannic acid Nutrition 0.000 description 1
- 229920002258 tannic acid Polymers 0.000 description 1
- 229940033123 tannic acid Drugs 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- AUHHYELHRWCWEZ-UHFFFAOYSA-N tetrachlorophthalic anhydride Chemical compound ClC1=C(Cl)C(Cl)=C2C(=O)OC(=O)C2=C1Cl AUHHYELHRWCWEZ-UHFFFAOYSA-N 0.000 description 1
- ZPKUAUXTKVANIS-UHFFFAOYSA-N tetradec-1-enylbenzene Chemical compound CCCCCCCCCCCCC=CC1=CC=CC=C1 ZPKUAUXTKVANIS-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- BSYVTEYKTMYBMK-UHFFFAOYSA-N tetrahydrofurfuryl alcohol Chemical compound OCC1CCCO1 BSYVTEYKTMYBMK-UHFFFAOYSA-N 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 239000001016 thiazine dye Substances 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- JOUDBUYBGJYFFP-FOCLMDBBSA-N thioindigo Chemical compound S\1C2=CC=CC=C2C(=O)C/1=C1/C(=O)C2=CC=CC=C2S1 JOUDBUYBGJYFFP-FOCLMDBBSA-N 0.000 description 1
- 150000007944 thiolates Chemical class 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 150000003623 transition metal compounds Chemical class 0.000 description 1
- 229960002622 triacetin Drugs 0.000 description 1
- 125000005270 trialkylamine group Chemical group 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- RRHXZLALVWBDKH-UHFFFAOYSA-M trimethyl-[2-(2-methylprop-2-enoyloxy)ethyl]azanium;chloride Chemical compound [Cl-].CC(=C)C(=O)OCC[N+](C)(C)C RRHXZLALVWBDKH-UHFFFAOYSA-M 0.000 description 1
- OEIXGLMQZVLOQX-UHFFFAOYSA-N trimethyl-[3-(prop-2-enoylamino)propyl]azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CCCNC(=O)C=C OEIXGLMQZVLOQX-UHFFFAOYSA-N 0.000 description 1
- HQUQLFOMPYWACS-UHFFFAOYSA-N tris(2-chloroethyl) phosphate Chemical compound ClCCOP(=O)(OCCCl)OCCCl HQUQLFOMPYWACS-UHFFFAOYSA-N 0.000 description 1
- KJIOQYGWTQBHNH-UHFFFAOYSA-N undecanol Chemical compound CCCCCCCCCCCO KJIOQYGWTQBHNH-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- JEVGKYBUANQAKG-UHFFFAOYSA-N victoria blue R Chemical compound [Cl-].C12=CC=CC=C2C(=[NH+]CC)C=CC1=C(C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 JEVGKYBUANQAKG-UHFFFAOYSA-N 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 239000001018 xanthene dye Substances 0.000 description 1
- 239000001052 yellow pigment Substances 0.000 description 1
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/04—Intermediate layers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/14—Multiple imaging layers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
- B41C2210/266—Polyurethanes; Polyureas
Description
前記K単位が次式I:
R1は、水素原子、C1-22の直鎖状、分枝状又は環状アルキル基、C1-22の直鎖状、分枝状、又は環状置換アルキル基、C6-24のアリール基又は置換アリール基であって、置換基はC1-4アルキル基、アリール基、ハロゲン原子、ケト基、エステル基、アルコキシ基、又はシアノ基から選択され、
Y1は、単結合、或いは、C1-22の直鎖状、分枝状又は環状アルキレンである)
のモノマー、または
CH2=CHPO(OH)2
から誘導され
前記L単位が次式II:
CH2=CRCONH2 (II)
(上式中、Rは、H、またはCH3である)
のモノマーから誘導され、
前記コポリマー中、前記K単位が3モル%超且つ40モル%未満、前記L単位が60モル%超且つ97モル%未満であることを特徴とする平版印刷版前駆体である。
本明細書で用いる、「リスタートトーニング」とは、印刷を休止した後の、印刷再開時の汚れをいう。印刷現場では、平版印刷版を印刷機に取り付けて印刷を開始した後、昼休み等の作業途中の休憩により、印刷が一時中断し、印刷版が印刷機に取り付けられたままで、その後、印刷を再開することが、通常行われている。この再開時に、画線の周りにインクが滲んで出てくるという現象が見られる。これを、一般的に「リスタートトーニング」という。
基板としては、感光性平版印刷版前駆体に用いることができるいずれの基板も用いることができる。例えば、アルミニウム、亜鉛、銅、ステンレス、鉄等の金属板;ポリエチレンテレフタレート、ポリカーボネート、ポリビニルアセタール、ポリエチレン等のプラスチックフィルム;合成樹脂を溶融塗布あるいは合成樹脂溶液を塗布した紙、プラスチックフィルムに金属層を真空蒸着、ラミネート等の技術により設けた複合材料;その他印刷版の基板として使用されている材料が挙げられる。本発明の基板としては、これらのうち、特にアルミニウム及びアルミニウムが被覆された複合基板が好ましい。
基板と画像形成層との間にある中間層は、K単位およびL単位からなるコポリマーを含む。
R1は、水素原子、C1-22の直鎖状、分枝状又は環状アルキル基、C1-22の直鎖状、分枝状、又は環状置換アルキル基、C6-24のアリール基又は置換アリール基であって、置換基はC1-4アルキル基、アリール基、ハロゲン原子、ケト基、エステル基、アルコキシ基、又はシアノ基から選択され、
Y1は、単結合、或いは、C1-22の直鎖状、分枝状又は環状アルキレンである)
またはCH2=CHPO(OH)2から誘導される。
これらのモノマーは、「ホスマー(Phosmer)」という商品名で入手可能であり、下記の構造を有する。
CH2=CRCONH2 (II)
(上式中、Rは、H、またはCH3である)
本発明の平版印刷版前駆体の中間層の上に設けられる画像形成層は、単一の層となることができる。また画像形成層は、第1の画像形成層およびその上にある第2の画像形成層からなる二層式となることもできる。
(a)キノンジアジドとノボラック樹脂とを含有してなる従来から用いられているコンベンショナルポジ型感光性組成物。
(b)水不溶性かつアルカリ性水溶液に可溶性又は分散性の樹脂および光熱変換剤を含み、熱の作用によりアルカリ性水溶液に対する溶解性が増大する赤外線ポジ型感光性組成物。
(c)熱分解性スルホン酸エステルポリマーもしくは酸分解性カルボン酸エステルポリマーと赤外線吸収剤とを含有してなる赤外線ポジ型感光性組成物。
(d)酸分解性基で保護されたアルカリ可溶性化合物と酸発生剤との組み合わせを含有してなる化学増幅型ポジ型感光性組成物。
(g)光架橋性基を有するポリマー、アジド化合物を含有してなるネガ型感光性組成物。
(h)ジアゾ化合物を含有してなるネガ型感光性組成物。
(i)光もしくは熱重合開始剤、付加重合性不飽和化合物、アルカリ可溶性高分子化合物を含有してなる光もしくは熱重合性ネガ型感光性組成物。
(j)アルカリ可溶性高分子化合物、酸発生剤、酸架橋性化合物を含有してなるネガ型感光性組成物。
(k)熱可塑性疎水性重合体の微粒子を分散させた機上現像型のネガ型画像形成層組成物。
(l)親水性セグメントと疎水性セグメントを有するグラフトポリマー、重合性化合物、光熱変換剤を含有する機上現像型のネガ型画像形成層組成物。
<第1の画像形成層>
平版印刷版前駆体を構成する第1の画像形成層は、アルカリ性水溶液に可溶性又は分散性の樹脂を含む。
アルカリ性水溶液に可溶性溶解または分散可能であるために、前記樹脂は少なくとも、水酸基、カルボキシル基、スルホン酸基、リン酸基、イミド基、アミド基等の官能基を有することが好ましい。したがって、アルカリ性水溶液に可溶性又は分散性の樹脂は、水酸基、カルボキシル基、スルホン酸基、リン酸基、イミド基、アミド基およびその組合せ等の官能基を有するエチレン性不飽和モノマーを1つ以上含むモノマー混合物を重合することによって好適に生成することができる。
N−フェニルアクリルアミド、N−トリルアクリルアミド、N−ニトロフェニルアクリルアミド、N−ナフチルアクリルアミド、N−ヒドロキシフェニルアクリルアミドのようなN−アリールアクリルアミド類;
本発明の平版印刷版前駆体を構成する第2の画像形成層は、アルカリ可溶性樹脂を含む。第2の画像形成層に用いることができるアルカリ可溶性樹脂は、カルボン酸基又は酸無水物基を有する樹脂が好ましく、不飽和カルボン酸、及び/又は、不飽和カルボン酸無水物を含むモノマー混合物を重合して得られる共重合体、酸性水素原子を含む置換基を有するポリウレタン等が挙げられる。不飽和カルボン酸、及び/又は、不飽和カルボン酸無水物としては、アクリル酸、メタクリル酸、マレイン酸、無水マレイン酸、イタコン酸、無水イタコン酸等を挙げることができる。共重合可能なエチレン性不飽和モノマー単位としては、前記のその他のエチレン性不飽和コモノマーを挙げることができる。
また、酸性水素原子を含む置換基を有するポリウレタンとしては、その酸性水素原子は、カルボキシル基、−SO2NHCOO−基、−CONHSO2−基、−CONHSO2NH−基、−NHCONHSO2−基等の酸性官能基に属することができるが、特にカルボキシル基に由来する酸性水素原子が好ましい。
酸性水素原子を持つ置換基を有するポリウレタンの質量平均分子量は、2,000〜100,000の範囲が好ましい。ポリウレタンの質量平均分子量が2,000未満では、画像形成して得られる画像部が弱く、耐刷性に劣る傾向にある。一方、ポリウレタンの質量平均分子量が100,000を超えると、感度が劣る傾向にある。
前記画像形成層は、光熱変換材料を含有することができる。光熱変換材料とは電磁波を熱エネルギーに変換することのできる任意の物質を意味しており、最大吸収波長が近赤外線から赤外線領域にある物質、具体的には最大吸収波長が760nm〜1200nmの領域にある物質である。このような物質としては、例えば、種々の顔料または染料が挙げられる。
本発明の平版印刷版前駆体の画像形成層には、必要に応じて、公知の添加剤、例えば、着色材(染料、顔料)、界面活性剤、可塑剤、安定性向上剤、現像促進剤、現像抑制剤、滑剤(シリコンパウダー等)を加えることができる。
本発明の赤外線感受性又は感熱性の平版印刷版前駆体は、好ましくは、コンピュータ等からのデジタル画像情報を基に、レーザーを使用して直接版上に画像書き込みができる、いわゆるコンピュータ・トゥ・プレート(CTP)版である。
合成例1 ビニルホスホン酸/アクリルアミドコポリマー(モル比1:9)(I−1)
攪拌器、コンデンサー、滴下装置を有する10リットルフラスコ中に、エタノール3500gを入れ70℃に加熱した。ビニルホスホン酸モノマー231.1g(2.14mol)とアクリルアミド1368.9g(19.26mol)、AIBN52gを、エタノール1000g中に溶解させ、この溶液を反応装置中に4時間かけて滴下した。モノマー溶液の滴下中、白色の沈殿が生成した。70℃に保温したまま、さらに2時間加熱攪拌を行った後、加熱を止め室温まで冷却した。生じた沈殿を減圧濾過により収集し、エタノール1000gで洗浄した。40℃で24時間真空乾燥し、白色微結晶を得た。収量1550g
攪拌器、コンデンサー、滴下装置を有する10リットルフラスコ中に、エタノール3500gを入れ70℃に加熱した。ビニルホスホン酸モノマー440.5g(4.08mol)とアクリルアミド1159.5g(16.31mol)、AIBN52gを、エタノール1000g中に溶解させ、この溶液を反応装置中に4時間かけて滴下した。モノマー溶液の滴下中、白色の沈殿が生成した。70℃に保温したまま、さらに2時間加熱攪拌を行った後、加熱を止め室温まで冷却した。生じた沈殿を減圧濾過により収集し、エタノール1000gで洗浄した。40℃で24時間真空乾燥し、白色微結晶を得た。収量1550g
攪拌器、コンデンサー、滴下装置を有する10リットルフラスコ中に、エタノール3500gを入れ70℃に加熱した。ビニルホスホン酸モノマー720g(6.67mol)とアクリルアミド880g(12.38mol)、AIBN52gを、エタノール1000g中に溶解させ、この溶液を反応装置中に4時間かけて滴下した。モノマー溶液の滴下中、白色の沈殿が生成した。70℃に保温したまま、さらに2時間加熱攪拌を行った後、加熱を止め室温まで冷却した。生じた沈殿を減圧濾過により収集し、エタノール1000gで洗浄した。40℃で24時間真空乾燥し、白色微結晶を得た。収量1550g
攪拌器、コンデンサー、滴下装置を有する10リットルフラスコ中に、エタノール3500gを入れ70℃に加熱した。ホスマーM 679.7g(3.23mol)とアクリルアミド920.3g(12.95mol)、AIBN52gを、エタノール1000g中に溶解させ、この溶液を反応装置中に4時間かけて滴下した。モノマー溶液の滴下中、白色の沈殿が生成した。70℃に保温したまま、さらに2時間加熱攪拌を行った後、加熱を止め室温まで冷却した。生じた沈殿を減圧濾過により収集し、エタノール1000gで洗浄した。40℃で24時間真空乾燥し、白色微結晶を得た。収量1550g
攪拌器、コンデンサー、滴下装置を有する10リットルフラスコ中に、エタノール3500gを入れ70℃に加熱した。ビニルホスホン酸モノマー118.5g(1.10mol)とアクリルアミド1481.5g(20.84mol)、AIBN52gを、エタノール1000g中に溶解させ、この溶液を反応装置中に4時間かけて滴下した。モノマー溶液の滴下中、白色の沈殿が生成した。70℃に保温したまま、さらに2時間加熱攪拌を行った後、加熱を止め室温まで冷却した。生じた沈殿を減圧濾過により収集し、エタノール1000gで洗浄した。40℃で24時間真空乾燥し、白色微結晶を得た。収量1550g
攪拌器、コンデンサー、滴下装置を有する10リットルフラスコ中に、エタノール3500gを入れ70℃に加熱した。ビニルホスホン酸モノマー1374g(12.72mol)とアクリルアミド226g(3.18mol)、AIBN52gを、エタノール1000g中に溶解させ、この溶液を反応装置中に4時間かけて滴下した。モノマー溶液の滴下中、白色の沈殿が生成した。70℃に保温したまま、さらに2時間加熱攪拌を行った後、加熱を止め室温まで冷却した。生じた沈殿を減圧濾過により収集し、エタノール1000gで洗浄した。40℃で24時間真空乾燥し、白色微結晶を得た。収量1550g
攪拌器、コンデンサー、滴下装置を有する10リットルフラスコ中に、酢酸エチル3500gを入れ70℃に加熱した。ビニルホスホン酸モノマー1950g(18.05mol)、AIBN52gを、酢酸エチル1000g中に溶解させ、この溶液を反応装置中に4時間かけて滴下した。モノマー溶液の滴下中、白色の沈殿が生成した。70℃に保温したまま、さらに2時間加熱攪拌を行った後、加熱を止め室温まで冷却した。生じた沈殿を減圧濾過により収集し、酢酸エチル1000gで洗浄した。40℃で24時間真空乾燥し、白色微結晶を得た。収量1850g
攪拌器、コンデンサー、滴下装置を有する10リットルフラスコ中に、酢酸エチル3500gを入れ70℃に加熱した。ビニルホスホン酸モノマー390g(3.61mol)とメタクリル酸1243g(14.44mol)、AIBN52gを、酢酸エチル1000g中に溶解させ、この溶液を反応装置中に4時間かけて滴下した。モノマー溶液の滴下中、白色の沈殿が生成した。70℃に保温したまま、さらに2時間加熱攪拌を行った後、加熱を止め室温まで冷却した。生じた沈殿を減圧濾過により収集し、酢酸エチル1000gで洗浄した。40℃で24時間真空乾燥し、白色微結晶を得た。収量1550g。
攪拌器、コンデンサー、滴下装置を有する10リットルフラスコ中に、エタノール3500gを入れ70℃に加熱した。ビニルホスホン酸モノマー886.7g(8.21mol)とアクリルアミド713.3g(10.03mol)、AIBN52gを、エタノール1000g中に溶解させ、この溶液を反応装置中に4時間かけて滴下した。モノマー溶液の滴下中、白色の沈殿が生成した。70℃に保温したまま、さらに2時間加熱攪拌を行った後、加熱を止め室温まで冷却した。生じた沈殿を減圧濾過により収集し、エタノール1000gで洗浄した。40℃で24時間真空乾燥し、白色微結晶を得た。収量1550g
攪拌器、コンデンサー、滴下装置を有する10リットルフラスコ中に、エタノール3500gを入れ70℃に加熱した。アクリルアミド1600g(22.51mol)、AIBN52gを、エタノール1000g中に溶解させ、この溶液を反応装置中に4時間かけて滴下した。モノマー溶液の滴下中、白色の沈殿が生成した。70℃に保温したまま、さらに2時間加熱攪拌を行った後、加熱を止め室温まで冷却した。生じた沈殿を減圧濾過により収集し、エタノール1000gで洗浄した。40℃で24時間真空乾燥し、白色微結晶を得た。収量1550g
厚さ0.24mmのアルミニウム板を水酸化ナトリウム水溶液にて脱脂し、これを20%塩酸浴中で電解研磨処理して、中心平均粗さ(Ra)0.5μmの砂目板を得た。次いで、20%塩酸浴中、電流密度2A/dm2で陽極酸化処理して、2.7g/m2の酸化皮膜を形成し、水洗乾燥後アルミニウム基板を得た。このようにして得られた基板を、60℃に加熱した表1で調製した中間層塗布用溶液1〜4および比較1〜3に、それぞれ10秒間浸漬し水洗乾燥した。このようにして表2に示す平版印刷版前駆体用の基板を得た。
樹脂1の合成
攪拌器、コンデンサー、滴下装置を有する10リットルフラスコ中に、ジメチルアセトアミド2990gを入れ、90℃に加熱した。フェニルマレイミド740.5g、メタクリルアミド1001g、メタクリル酸368g、アクリロニトリル643g、ホスマーM(ユニケミカル製)203.6g、スチレン222.5g、AIBN10.6g、n−ドデシルメルカプタン16gをジメチルアセトアミド2670g中に溶解させ、この溶液を2時間かけて反応装置中に滴下した。滴下終了後、AIBNを5.3g入れ、温度を100℃まで上昇させて、更に4時間攪拌した。その間、1時間おきにAIBN5.3gを加えて反応させた。
反応終了後、加熱を止め、室温まで冷却した。反応溶液を50リットルの水中に落とし、生じた沈殿を減圧濾過により収集し、1回水洗により洗浄した後、再度減圧濾過により収集した。50℃24時間真空乾燥し、樹脂1を得た。収量は、2873g(収率90%)だった。
表2に示す中間層塗布用溶液が塗布された各基板上に、ロールコーターを用いて表3で調製した下層感光性組成物の塗布液を塗布し、100℃で2分間乾燥した。この時の乾燥塗膜量は1.5g/m2であった。次いで、それぞれの下層の上に、表4で調製した上層組成物の塗工液を、ロールコーターを用いて塗布し、100℃で2分間乾燥した。この時の上層の乾燥塗膜量は0.5g/m2であった。
上記の様にして得られた二層式平版印刷版前駆体について、PTR4300セッター(大日本スクリーン社製)を用いて150mJ/cm2で露光し、現像は自動現像機(P−940X、コダックグラフィックコミュニケーション社製)、および表5で得られた現像液を水で5倍希釈した現像液を用いて、30℃15秒にて現像処理を行った後、フィニッシングガムPF2(コダックグラフィックコミュニケーションズ社製)でガム引きを行い、平版印刷版を得た。
作製した平版印刷版を、印刷機(R−201:マン・ローランド社製)で、コート紙、印刷インキ(スペースカラー・フュージョンG紅:DIC社製)及び湿し水(NA−108W濃度1%:大日本インキ化学工業社製、IPA1%)を用いて印刷を行った。下記に示す方法でクリーンアップ(汚れ戻り)特性、リスタートトーンニング(印刷停止汚れ)特性を評価した。
上記印刷条件にて、1000枚印刷を行った後、インキ着けローラーを版面に接触させ、版面全体にインキを付着させた。そのまま30分放置してから、印刷をスタートし非画像部の汚れを完全に除去するまで印刷した。汚れが完全に戻りきったところを汚れ戻りの枚数とした。印刷枚数が少ないほどクリーンアップ特性が良好であることを示す。このようにして評価した結果を表6に示す。比較例5の平版印刷版は、印刷開始直後から汚れが発生し、評価の対象とならなかった。実施例1〜5の平版印刷版は、比較例1〜5と比較して、優れた汚れ戻り性能を示した。
作製した平版印刷版を、印刷機(ローランド201印刷機:マン・ローランド社製)で、コート紙、印刷インキ(スペースカラー・フュージョンG紅:DIC社製)及び湿し水(NA−108W濃度1%:DIC社製、IPA1%)を用いて印刷を行った。下記の方法でリスタートトーンニングを評価した。
作製した平版印刷版を、印刷機(R−201:マン・ローランド社製)で、合成紙FGS80(ユポコーポレーション製)、印刷インキ(POP−K紅:DIC社製)及び湿し水(NA−108W濃度1%:DIC社製、IPA1%)を用いて印刷を行った。下記に示す方法で合成紙に対するクリーンアップ特性を評価した。
Claims (5)
- 基板上に、順に、K単位およびL単位からなるコポリマーを含む中間層、ならびにポジ型画像形成層を有して成る平版印刷版前駆体であって、
前記K単位が次式I:
R1は、水素原子、C1-22の直鎖状、分枝状又は環状アルキル基、C1-22の直鎖状、分枝状、又は環状置換アルキル基、C6-24のアリール基又は置換アリール基であって、置換基はC1-4アルキル基、アリール基、ハロゲン原子、ケト基、エステル基、アルコキシ基、又はシアノ基から選択され、
Y1は、単結合、或いは、C1-22の直鎖状、分枝状又は環状アルキレンである)
のモノマー、または
CH2=CHPO(OH)2
から誘導され
前記L単位が次式II:
CH2=CRCONH2 (II)
(上式中、Rは、H、またはCH3である)
のモノマーから誘導され、
前記コポリマー中、前記K単位が3モル%超且つ40モル%未満、前記L単位が60モル%超且つ97モル%未満であることを特徴とする平版印刷版前駆体。 - 前記コポリマーが、更にコモノマーとして、オニウム基を有するモノマー単位、又はスルホン酸基を有するモノマー単位をさらに含んで成ることを特徴とする請求項1に記載の平版印刷版前駆体。
- 前記基板が、粗面化処理後、硫酸中で陽極酸化処理されたアルミニウム基板である請求項1又は2に記載の平版印刷版前駆体。
- 前記K単位が、ビニルホスホン酸、エチレングリコールメタクリレートホスフェート、から成る群より選ばれるモノマーから誘導され、前記L単位が、アクリルアミド、メタクリルアミドから成る群より選ばれるモノマーから誘導される請求項1〜3のいずれか一項に記載の平版印刷版前駆体。
- 前記画像形成層が、光熱変換材料を含有する請求項1〜4のいずれか一項に記載の平版印刷版前駆体。
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CN2010800252252A CN102804068A (zh) | 2009-06-02 | 2010-05-31 | 平版印刷版前驱体 |
EP10783479.8A EP2439591B1 (en) | 2009-06-02 | 2010-05-31 | Lithographic printing plate precursor |
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US8936899B2 (en) * | 2012-09-04 | 2015-01-20 | Eastman Kodak Company | Positive-working lithographic printing plate precursors and use |
US8993213B2 (en) | 2009-10-27 | 2015-03-31 | Eastman Kodak Company | Positive-working lithographic printing plate |
JP5624003B2 (ja) * | 2011-09-13 | 2014-11-12 | 富士フイルム株式会社 | 平版印刷版の製造方法及び平版印刷版 |
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US11964466B2 (en) | 2020-10-21 | 2024-04-23 | Eastman Kodak Company | Lithographic printing plate precursors and method of use |
EP4263231A1 (en) | 2020-12-17 | 2023-10-25 | Eastman Kodak Company | Lithographic printing plate precursors and method of use |
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DE1447955C3 (de) * | 1965-01-02 | 1978-10-05 | Hoechst Ag, 6000 Frankfurt | Verfahren zur Herstellung einer vorsensibilisierten Druckplatte |
JPS5280022A (en) | 1975-12-26 | 1977-07-05 | Fuji Photo Film Co Ltd | Light solubilizable composition |
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US5368974A (en) | 1993-05-25 | 1994-11-29 | Eastman Kodak Company | Lithographic printing plates having a hydrophilic barrier layer comprised of a copolymer of vinylphosphonic acid and acrylamide overlying an aluminum support |
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US6548222B2 (en) * | 2000-09-06 | 2003-04-15 | Gary Ganghui Teng | On-press developable thermosensitive lithographic printing plates |
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US7674571B2 (en) | 2006-01-21 | 2010-03-09 | Gary Ganghui Teng | Laser sensitive lithographic printing plate comprising specific acrylate monomer and initiator |
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