JP6129827B2 - 誘電体で遮断されたガス放電のための電極アセンブリ - Google Patents
誘電体で遮断されたガス放電のための電極アセンブリ Download PDFInfo
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- JP6129827B2 JP6129827B2 JP2014516194A JP2014516194A JP6129827B2 JP 6129827 B2 JP6129827 B2 JP 6129827B2 JP 2014516194 A JP2014516194 A JP 2014516194A JP 2014516194 A JP2014516194 A JP 2014516194A JP 6129827 B2 JP6129827 B2 JP 6129827B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32541—Shape
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
- A61N1/00—Electrotherapy; Circuits therefor
- A61N1/40—Applying electric fields by inductive or capacitive coupling ; Applying radio-frequency signals
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61M—DEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
- A61M1/00—Suction or pumping devices for medical purposes; Devices for carrying-off, for treatment of, or for carrying-over, body-liquids; Drainage systems
- A61M1/84—Drainage tubes; Aspiration tips
- A61M1/87—Details of the aspiration tip, not otherwise provided for
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61M—DEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
- A61M1/00—Suction or pumping devices for medical purposes; Devices for carrying-off, for treatment of, or for carrying-over, body-liquids; Drainage systems
- A61M1/90—Negative pressure wound therapy devices, i.e. devices for applying suction to a wound to promote healing, e.g. including a vacuum dressing
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61M—DEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
- A61M1/00—Suction or pumping devices for medical purposes; Devices for carrying-off, for treatment of, or for carrying-over, body-liquids; Drainage systems
- A61M1/90—Negative pressure wound therapy devices, i.e. devices for applying suction to a wound to promote healing, e.g. including a vacuum dressing
- A61M1/91—Suction aspects of the dressing
- A61M1/915—Constructional details of the pressure distribution manifold
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2418—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being embedded in the dielectric
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49204—Contact or terminal manufacturing
Description
図6は、操作を容易にするために、ホルダ18の上面には、複数の平行なリブ27が形成されているのみならず、ロックスライダ19の上面にも、複数の平行なリブ28が形成されていることを示す。
図8は、ストリップ1の内部に延びている導線11との接触が、今や、以下のことによって、すなわち、回動可能なホルダ18が、自らの上面への圧力によって、圧縮ばね25の力に抗して下方へ回動され、従って、圧接接点26が、上面10からストリップ1の材料部分に食い込んで、金属製の導線11と、金属性の、すなわち導電性の接触が形成されることによって、なされることを明示する。ホルダ18への圧力を保ちつつ、図9に示すように、ロックスライダ19が長手方向に移動される。それ故に、ロックスライダは、今や、ホルダ18に被さるように突き出ている。それ故に、ホルダは、圧縮ばね23の復帰力に抗して、接触位置にロックされている。当然ながら、接触要素17のホルダ18、ロックスライダ19、ハウジング20等は、非導電性の材料、例えばプラスチックからなる。それ故に、四方の確実な絶縁が保証されており、かつ、電極14の部分の接触によって生じる高電圧の非遮断誘導の危険性が生じない。
3 中央領域
6 接触面
10 上面
13 端面
14 電極
Claims (7)
- 誘電体で遮断されたガス放電のための、可撓性の、平坦な電極アセンブリであって、中
央領域(3)および縁部領域と、高電圧電位を伝導する平坦な電極(14)とを具備し、
該電極は、上面(10)および接触面(6)を有する平坦な誘電体の中に埋め込まれて
いる、電極アセンブリにおいて、
前記平坦な誘電体は、少なくとも前記縁部領域の所で、螺旋状に巻かれた平坦なスト
リップ(1)を形成し、
前記電極(14)は、前記ストリップ(1)の長手方向に延びており、かつ前記ストリップ(1)の端面(13)に端部が露出しており、前記端面の領域で、接触要素(17)の、誘電体の中に食い込むように駆動される導電性の接点(26)に電気的に接続される少なくとも1つの電気伝導体によって形成されており、
前記接点(26)は、高電圧電源(12)に接続されることを特徴する電極アセンブリ。 - 前記少なくとも1つの電気伝導体は、前記ストリップ(1)の前記端面(13)から前記中央領域(3)へと延び、又、中央領域から前記端面(13)へ戻るように延びている電気伝導体であることを特徴とする請求項1に記載の電極アセンブリ。
- 前記少なくとも1つの電気伝導体は、円形か楕円形の断面を有する導線(11)であることを特徴とする請求項1または2に記載の電極アセンブリ。
- 前記接触要素(17)は、一側が開いているハウジング(20)を有し、前記ストリッ
プ(1)の前記端面(13)は、前記ハウジング(20)が、前記ストリップ(1)の前記端面(13)と、前記上面(10)と、前記端面(13)に隣り合った側面とに電気的に絶縁するようにして、前記ハウジングに挿入され、そして、前記接触要素(17)の接点(26)は、ハウジングに対して移動可能設けられていることを特徴とする請求項1ないし3のいずれか1項に記載の電極アセンブリ。 - 前記ストリップ(1)は、自らの接触面(6)に形成されかつ当接面(15)を定める複数の突出部(7)を有し、該突出部間の中間空間(8)は、プラズマを形成するためのガス空間を規定していることを特徴とする請求項1ないし4のいずれか1項に記載の電極アセンブリ。
- 前記ストリップ(1)は、前記誘電体を前記接触面(6)から前記上面(10)へ貫通
し、かつ流体を吸引するための貫通孔(9)を有することを特徴とする請求項1ないし5
のいずれか1項に記載の電極アセンブリ。 - 前記ストリップ(1)と、このストリップの中に埋め込まれている前記電極(14)とは、前記接触面(6)を所定の大きさにするように、一緒に切断可能であり、ストリップのこの切断された面が前記端面を形成することを特徴とする請求項1ないし6のいずれか1項に記載の電極アセンブリ。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102011105713.0 | 2011-06-23 | ||
DE102011105713.0A DE102011105713B4 (de) | 2011-06-23 | 2011-06-23 | Elektrodenanordnung für eine dielektrisch behinderte Gasentladung |
PCT/DE2012/000602 WO2012175066A1 (de) | 2011-06-23 | 2012-06-06 | Elektrodenanordnung für eine dielektrisch behinderte gasentladung |
Publications (2)
Publication Number | Publication Date |
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JP2014523771A JP2014523771A (ja) | 2014-09-18 |
JP6129827B2 true JP6129827B2 (ja) | 2017-05-17 |
Family
ID=46581676
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014516194A Active JP6129827B2 (ja) | 2011-06-23 | 2012-06-06 | 誘電体で遮断されたガス放電のための電極アセンブリ |
Country Status (9)
Country | Link |
---|---|
US (1) | US9330890B2 (ja) |
EP (1) | EP2723447B1 (ja) |
JP (1) | JP6129827B2 (ja) |
CN (1) | CN103648584B (ja) |
AR (1) | AR086942A1 (ja) |
BR (1) | BR112013031939B1 (ja) |
DE (1) | DE102011105713B4 (ja) |
MX (1) | MX346478B (ja) |
WO (1) | WO2012175066A1 (ja) |
Families Citing this family (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102012015483B3 (de) * | 2012-08-07 | 2014-01-16 | Otto Bock Healthcare Gmbh | Elektrodenanordnung für eine Plasmabehandlung und Vorrichtung zur Herstellung einer transkutanen Verbindung |
US9849202B2 (en) * | 2012-09-14 | 2017-12-26 | The Board Of Regents For Oklahoma State University | Plasma pouch |
DE102013000440B4 (de) * | 2013-01-15 | 2014-07-24 | Cinogy Gmbh | Plasma-Behandlungsgerät mit einer drehbar in einem Griffgehäuse gelagerten Rolle |
TWI489517B (zh) * | 2013-05-07 | 2015-06-21 | Univ Nat Taiwan | 表面處理裝置及方法 |
DE102013019057B4 (de) * | 2013-11-15 | 2018-02-15 | Cinogy Gmbh | Gerät zur Behandlung einer Körperoberfläche eines lebenden Körpers |
DE102013019058B4 (de) | 2013-11-15 | 2016-03-24 | Cinogy Gmbh | Gerät zur Behandlung einer Fläche mit einem Plasma |
DE102014013716B4 (de) * | 2014-09-11 | 2022-04-07 | Cinogy Gmbh | Elektrodenanordnung zur Ausbildung einer dielektrisch behinderten Plasmaentladung |
DE102014220488A1 (de) * | 2014-10-09 | 2016-04-14 | Inp Greifswald E.V. | Vorrichtung zum Erzeugen eines kalten Atmosphärenplasmas |
DE102015101391B4 (de) * | 2015-01-30 | 2016-10-20 | Leibniz-Institut für Plasmaforschung und Technologie e.V. (INP Greifswald) | Plasmaerzeugungseinrichtung, Plasmaerzeugungssystem, Verfahren zur Erzeugung von Plasma und Verfahren zur Desinfektion von Oberflächen |
US10714803B2 (en) | 2015-05-14 | 2020-07-14 | At&T Intellectual Property I, L.P. | Transmission medium and methods for use therewith |
US9748626B2 (en) | 2015-05-14 | 2017-08-29 | At&T Intellectual Property I, L.P. | Plurality of cables having different cross-sectional shapes which are bundled together to form a transmission medium |
US9490869B1 (en) | 2015-05-14 | 2016-11-08 | At&T Intellectual Property I, L.P. | Transmission medium having multiple cores and methods for use therewith |
US10276907B2 (en) * | 2015-05-14 | 2019-04-30 | At&T Intellectual Property I, L.P. | Transmission medium and methods for use therewith |
US11490947B2 (en) | 2015-05-15 | 2022-11-08 | Clear Intradermal Technologies, Inc. | Tattoo removal using a liquid-gas mixture with plasma gas bubbles |
WO2016187132A1 (en) | 2015-05-15 | 2016-11-24 | ClearIt, LLC | Systems and methods for tattoo removal using cold plasma |
DE102015112200A1 (de) * | 2015-07-27 | 2017-02-02 | Hochschule Für Angewandte Wissenschaft Und Kunst Hildesheim/Holzminden/Göttingen | Elektrodenanordnung und Plasmabehandlungsvorrichtung für eine Oberflächenbehandlung eines Körpers |
DE102015117715A1 (de) | 2015-10-19 | 2017-04-20 | Cinogy Gmbh | Elektrodenanordnung für eine dielektrisch behinderte Plasmabehandlung |
EP3171676B1 (de) * | 2015-11-17 | 2020-06-24 | Leibniz-Institut für Plasmaforschung und Technologie e.V. | Plasmaerzeugungsvorrichtung, plasmaerzeugungssystem und verfahren zur erzeugung von plasma |
CN105536141B (zh) * | 2016-01-21 | 2019-01-04 | 常州瑞神安医疗器械有限公司 | 一种植入式神经刺激器电极导线触点结构 |
DE102017106482A1 (de) * | 2016-03-30 | 2017-10-05 | Leibniz-Institut für Plasmaforschung und Technologie e.V. | System und Verfahren zur Behandlung von Oberflächen von Körpern, insbesondere zur Wundbehandlung |
DE102016108450B4 (de) | 2016-05-06 | 2020-01-02 | Cinogy Gmbh | Behandlungsanordnung und Verfahren zur Herstellung einer Behandlungsanordnung |
WO2017197071A1 (en) | 2016-05-12 | 2017-11-16 | EP Technologies LLC | Methods and systems for trans-tissue substance delivery using plasmaporation |
KR101795944B1 (ko) * | 2016-07-05 | 2017-11-08 | 광운대학교 산학협력단 | 플라즈마 패드 |
KR101847281B1 (ko) | 2016-08-17 | 2018-04-10 | 광운대학교 산학협력단 | 고효율 플라즈마 박판 소스 |
WO2018089577A1 (en) | 2016-11-10 | 2018-05-17 | EP Technologies LLC | Methods and systems for generating plasma activated liquid |
NL2017822B1 (en) * | 2016-11-18 | 2018-05-25 | Plasmacure B V | Non-Thermal Plasma Device with electromagnetic compatibility control |
DE102017100161B4 (de) * | 2017-01-05 | 2022-08-04 | Cinogy Gmbh | Flächiges flexibles Auflagestück für eine dielektrisch behinderte Plasmabehandlung |
DE102017100192A1 (de) * | 2017-01-06 | 2018-07-12 | Cinogy Gmbh | Permanente Wundauflage mit Plasmaelektrode |
DE102017104852A1 (de) * | 2017-03-08 | 2018-09-13 | Cinogy Gmbh | Flächige flexible Elektrodenanordnung für eine dielektrisch behinderte Plasmaentladung |
DE102017106570A1 (de) * | 2017-03-28 | 2018-10-04 | Cinogy Gmbh | Flächige flexible Auflageanordnung |
DE102017111902B4 (de) * | 2017-05-31 | 2020-12-31 | Cinogy Gmbh | Flächige Auflageanordnung |
CN107949137A (zh) * | 2017-11-02 | 2018-04-20 | 大连民族大学 | 一种自适应柔性放电等离子体装置 |
JP7019276B2 (ja) * | 2018-06-25 | 2022-02-15 | 東芝三菱電機産業システム株式会社 | 活性ガス生成装置及び成膜処理装置 |
AU2019402973A1 (en) | 2018-12-19 | 2021-07-01 | Clear Intradermal Technologies, Inc. | Systems and methods for tattoo removal using an applied electric field |
DE102019101063B4 (de) | 2019-01-16 | 2021-02-25 | Cinogy Gmbh | Plasma-Behandlungsanordnung und Verfahren zur Anpassung der Größe einer Auflagefläche der Plasma-Behandlungsanordnung an die Größe der zu behandelnden Oberfläche |
JP6844937B2 (ja) * | 2019-02-13 | 2021-03-17 | 東芝三菱電機産業システム株式会社 | 活性ガス生成装置 |
DE102019109940B4 (de) * | 2019-04-15 | 2020-12-10 | Cinogy Gmbh | Behandlungsanordnung für die Behandlung einer Oberfläche eines Körpers mit einem dielektrisch behinderten Plasma |
WO2021133734A2 (en) * | 2019-12-27 | 2021-07-01 | L'oreal | Cold plasma generating device with positional control and cold plasma generating array |
CN111729106B (zh) * | 2020-06-30 | 2021-08-13 | 北京航空航天大学 | 一种柔性低温等离子体灭菌装置 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5944797A (ja) * | 1982-09-07 | 1984-03-13 | 増田 閃一 | 物体の静電的処理装置 |
JPS61230405A (ja) * | 1985-04-03 | 1986-10-14 | Toyo Commun Equip Co Ltd | ピツクアツプ用アンテナコイル |
WO1994006263A1 (en) * | 1992-09-01 | 1994-03-17 | The University Of North Carolina At Chapel Hill | High pressure magnetically assisted inductively coupled plasma |
DE19532105C2 (de) * | 1994-08-30 | 2002-11-14 | Fraunhofer Ges Forschung | Verfahren und Vorrichtung zur Behandlung von dreidimensionalen Werkstücken mit einer direkten Barrierenentladung sowie Verfahren zur Herstellung einer mit einer Barriere versehenen Elektrode für diese Barrierenentladung |
US5909086A (en) * | 1996-09-24 | 1999-06-01 | Jump Technologies Limited | Plasma generator for generating unipolar plasma |
DE19717698A1 (de) * | 1997-04-26 | 1998-10-29 | Fraunhofer Ges Forschung | Verfahren und Vorrichtung zur Reinigung von Aktivierung von elektrischen Leiterbahnen und Platinenoberflächen |
US6178920B1 (en) * | 1997-06-05 | 2001-01-30 | Applied Materials, Inc. | Plasma reactor with internal inductive antenna capable of generating helicon wave |
DE19931366A1 (de) * | 1999-07-07 | 2001-02-01 | T E M Gmbh | Flache Baugruppe zur elektrischen Erzeugung eines Plasmas in Luft |
DE10047688B4 (de) * | 2000-09-24 | 2004-10-28 | Roentdek-Handels Gmbh | Ionenquelle |
US20090159309A1 (en) * | 2005-08-22 | 2009-06-25 | Hidehiro Kanada | Flat cable and plasma display device |
DE102007030915A1 (de) * | 2007-07-03 | 2009-01-22 | Cinogy Gmbh | Vorrichtung zur Behandlung von Oberflächen mit einem mittels einer Elektrode über ein Feststoff-Dielektrikum durch eine dielektrische behinderte Gasentladung erzeugten Plasma |
DE102008006256A1 (de) * | 2008-01-25 | 2009-07-30 | Innovative Sensor Technology Ist Ag | Baugruppe zur Erzeugung von Ozon |
EP2170022A1 (en) * | 2008-09-25 | 2010-03-31 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. | Plasma applicator and corresponding method |
DE202009011521U1 (de) * | 2009-08-25 | 2010-12-30 | INP Greifswald Leibniz-Institut für Plasmaforschung und Technologie e. V. | Plasma-Manschette |
WO2011144344A2 (en) * | 2010-05-19 | 2011-11-24 | Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V. | Appliance for at least partially sterilizing a contaminated surface |
-
2011
- 2011-06-23 DE DE102011105713.0A patent/DE102011105713B4/de not_active Expired - Fee Related
-
2012
- 2012-06-06 EP EP12740039.8A patent/EP2723447B1/de active Active
- 2012-06-06 US US14/127,316 patent/US9330890B2/en active Active
- 2012-06-06 CN CN201280030856.2A patent/CN103648584B/zh active Active
- 2012-06-06 JP JP2014516194A patent/JP6129827B2/ja active Active
- 2012-06-06 BR BR112013031939-9A patent/BR112013031939B1/pt active IP Right Grant
- 2012-06-06 WO PCT/DE2012/000602 patent/WO2012175066A1/de active Application Filing
- 2012-06-06 MX MX2013014541A patent/MX346478B/es active IP Right Grant
- 2012-06-15 AR ARP120102122A patent/AR086942A1/es active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
BR112013031939B1 (pt) | 2022-02-22 |
MX2013014541A (es) | 2014-07-09 |
DE102011105713B4 (de) | 2014-06-05 |
EP2723447B1 (de) | 2015-09-23 |
CN103648584B (zh) | 2016-01-20 |
CN103648584A (zh) | 2014-03-19 |
US20140182879A1 (en) | 2014-07-03 |
EP2723447A1 (de) | 2014-04-30 |
AR086942A1 (es) | 2014-02-05 |
US9330890B2 (en) | 2016-05-03 |
DE102011105713A1 (de) | 2012-12-27 |
MX346478B (es) | 2017-03-22 |
JP2014523771A (ja) | 2014-09-18 |
BR112013031939A2 (pt) | 2016-12-20 |
WO2012175066A1 (de) | 2012-12-27 |
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