JP6119622B2 - 水酸化インジウム粉の製造方法及び陰極 - Google Patents
水酸化インジウム粉の製造方法及び陰極 Download PDFInfo
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- JP6119622B2 JP6119622B2 JP2014014405A JP2014014405A JP6119622B2 JP 6119622 B2 JP6119622 B2 JP 6119622B2 JP 2014014405 A JP2014014405 A JP 2014014405A JP 2014014405 A JP2014014405 A JP 2014014405A JP 6119622 B2 JP6119622 B2 JP 6119622B2
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- Prior art keywords
- cathode
- hydroxide powder
- indium hydroxide
- electrodes
- particle size
- Prior art date
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- IGUXCTSQIGAGSV-UHFFFAOYSA-K indium(iii) hydroxide Chemical compound [OH-].[OH-].[OH-].[In+3] IGUXCTSQIGAGSV-UHFFFAOYSA-K 0.000 title claims description 68
- 239000000843 powder Substances 0.000 title claims description 65
- 238000004519 manufacturing process Methods 0.000 title claims description 27
- 239000007788 liquid Substances 0.000 claims description 35
- 239000008151 electrolyte solution Substances 0.000 claims description 32
- 238000005868 electrolysis reaction Methods 0.000 claims description 19
- 239000003792 electrolyte Substances 0.000 claims description 17
- 238000006243 chemical reaction Methods 0.000 claims description 16
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 8
- 229910052738 indium Inorganic materials 0.000 claims description 7
- 238000004080 punching Methods 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 5
- 235000021384 green leafy vegetables Nutrition 0.000 claims 1
- 239000002245 particle Substances 0.000 description 63
- 238000009826 distribution Methods 0.000 description 26
- 230000000052 comparative effect Effects 0.000 description 13
- 230000007704 transition Effects 0.000 description 8
- PAWQVTBBRAZDMG-UHFFFAOYSA-N 2-(3-bromo-2-fluorophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC(Br)=C1F PAWQVTBBRAZDMG-UHFFFAOYSA-N 0.000 description 6
- 229910003437 indium oxide Inorganic materials 0.000 description 6
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 6
- 239000010936 titanium Substances 0.000 description 6
- 238000002425 crystallisation Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 230000008025 crystallization Effects 0.000 description 4
- 230000001186 cumulative effect Effects 0.000 description 4
- 238000001354 calcination Methods 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 230000006911 nucleation Effects 0.000 description 3
- 238000010899 nucleation Methods 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 239000011164 primary particle Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- 229910002651 NO3 Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000013522 chelant Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- -1 nitrate ions Chemical class 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 238000005477 sputtering target Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- QNRATNLHPGXHMA-XZHTYLCXSA-N (r)-(6-ethoxyquinolin-4-yl)-[(2s,4s,5r)-5-ethyl-1-azabicyclo[2.2.2]octan-2-yl]methanol;hydrochloride Chemical compound Cl.C([C@H]([C@H](C1)CC)C2)CN1[C@@H]2[C@H](O)C1=CC=NC2=CC=C(OCC)C=C21 QNRATNLHPGXHMA-XZHTYLCXSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 150000003841 chloride salts Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 229910001449 indium ion Inorganic materials 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 150000002830 nitrogen compounds Chemical class 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000011163 secondary particle Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/02—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form
- C25B11/03—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form perforated or foraminous
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G15/00—Compounds of gallium, indium or thallium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G15/00—Compounds of gallium, indium or thallium
- C01G15/003—Preparation involving a liquid-liquid extraction, an adsorption or an ion-exchange
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/14—Alkali metal compounds
- C25B1/16—Hydroxides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/51—Particles with a specific particle size distribution
- C01P2004/52—Particles with a specific particle size distribution highly monodisperse size distribution
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014014405A JP6119622B2 (ja) | 2014-01-29 | 2014-01-29 | 水酸化インジウム粉の製造方法及び陰極 |
PCT/JP2014/077193 WO2015114886A1 (ja) | 2014-01-29 | 2014-10-10 | 水酸化インジウム粉の製造方法及び陰極 |
CN201480058844.XA CN105683416B (zh) | 2014-01-29 | 2014-10-10 | 氢氧化铟粉的制造方法及阴极 |
KR1020167007052A KR102300880B1 (ko) | 2014-01-29 | 2014-10-10 | 수산화인듐 분말의 제조 방법 및 음극 |
TW103136445A TW201529479A (zh) | 2014-01-29 | 2014-10-22 | 氫氧化銦粉之製造方法及陰極 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014014405A JP6119622B2 (ja) | 2014-01-29 | 2014-01-29 | 水酸化インジウム粉の製造方法及び陰極 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015140282A JP2015140282A (ja) | 2015-08-03 |
JP6119622B2 true JP6119622B2 (ja) | 2017-04-26 |
Family
ID=53756486
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2014014405A Expired - Fee Related JP6119622B2 (ja) | 2014-01-29 | 2014-01-29 | 水酸化インジウム粉の製造方法及び陰極 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP6119622B2 (zh) |
KR (1) | KR102300880B1 (zh) |
CN (1) | CN105683416B (zh) |
TW (1) | TW201529479A (zh) |
WO (1) | WO2015114886A1 (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110644013B (zh) * | 2019-10-30 | 2022-05-03 | 广东先导稀材股份有限公司 | 一种氧化铟及其前驱体的制备方法 |
CN112323084A (zh) * | 2020-09-15 | 2021-02-05 | 先导薄膜材料(广东)有限公司 | 一种纳米氧化铟的制备方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4615784A (en) * | 1982-06-10 | 1986-10-07 | Eltech Systems Corporation | Narrow gap reticulate electrode electrolysis cell |
JP2829556B2 (ja) | 1992-12-09 | 1998-11-25 | 株式会社ジャパンエナジー | 酸化インジウム粉末の製造方法 |
KR970006076Y1 (ko) * | 1994-07-26 | 1997-06-19 | 박병근 | 넥타이 걸이구 |
JPH0841673A (ja) * | 1994-08-02 | 1996-02-13 | Mitsubishi Materials Corp | 電気泳動法の電極 |
JPH1095615A (ja) * | 1996-06-20 | 1998-04-14 | Mitsubishi Materials Corp | 高密度焼結体用酸化インジウム粉末 |
JPH10204669A (ja) * | 1997-01-16 | 1998-08-04 | Mitsubishi Materials Corp | 酸化インジウム粉末の製造方法 |
DE10030093C1 (de) * | 2000-06-19 | 2002-02-21 | Starck H C Gmbh | Verfahren und Vorrichtung zur Herstellung von Metallhydroxiden oder basischen Metallcarbonaten |
JP4593038B2 (ja) * | 2001-09-21 | 2010-12-08 | 古河機械金属株式会社 | 硫酸コバルト溶液の製造方法 |
CN101967652A (zh) * | 2010-11-11 | 2011-02-09 | 利尔化学股份有限公司 | 电解反应装置 |
JP5632340B2 (ja) * | 2011-08-05 | 2014-11-26 | Jx日鉱日石金属株式会社 | 水酸化インジウム及び水酸化インジウムを含む化合物の電解製造装置及び製造方法 |
WO2013179553A1 (ja) * | 2012-05-31 | 2013-12-05 | 株式会社アルバック | 金属水酸化物の製造方法及びitoスパッタリングターゲットの製造方法 |
-
2014
- 2014-01-29 JP JP2014014405A patent/JP6119622B2/ja not_active Expired - Fee Related
- 2014-10-10 CN CN201480058844.XA patent/CN105683416B/zh not_active Expired - Fee Related
- 2014-10-10 WO PCT/JP2014/077193 patent/WO2015114886A1/ja active Application Filing
- 2014-10-10 KR KR1020167007052A patent/KR102300880B1/ko active IP Right Grant
- 2014-10-22 TW TW103136445A patent/TW201529479A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
KR102300880B1 (ko) | 2021-09-13 |
JP2015140282A (ja) | 2015-08-03 |
WO2015114886A1 (ja) | 2015-08-06 |
CN105683416B (zh) | 2017-12-15 |
TW201529479A (zh) | 2015-08-01 |
KR20160114034A (ko) | 2016-10-04 |
CN105683416A (zh) | 2016-06-15 |
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