JP6114002B2 - 荷電粒子線装置 - Google Patents

荷電粒子線装置 Download PDF

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Publication number
JP6114002B2
JP6114002B2 JP2012242028A JP2012242028A JP6114002B2 JP 6114002 B2 JP6114002 B2 JP 6114002B2 JP 2012242028 A JP2012242028 A JP 2012242028A JP 2012242028 A JP2012242028 A JP 2012242028A JP 6114002 B2 JP6114002 B2 JP 6114002B2
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charged particle
particle beam
vibration
information
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Japanese (ja)
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JP2014093153A (ja
JP2014093153A5 (enrdf_load_stackoverflow
Inventor
芳郎 郡司
芳郎 郡司
司 菅原
司 菅原
博紀 小川
博紀 小川
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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JP2012242028A 2012-11-01 2012-11-01 荷電粒子線装置 Expired - Fee Related JP6114002B2 (ja)

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JP2012242028A JP6114002B2 (ja) 2012-11-01 2012-11-01 荷電粒子線装置

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JP2012242028A JP6114002B2 (ja) 2012-11-01 2012-11-01 荷電粒子線装置

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JP2014093153A JP2014093153A (ja) 2014-05-19
JP2014093153A5 JP2014093153A5 (enrdf_load_stackoverflow) 2015-11-12
JP6114002B2 true JP6114002B2 (ja) 2017-04-12

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI840923B (zh) * 2021-09-16 2024-05-01 日商紐富來科技股份有限公司 多電子束檢查裝置、多極子陣列的控制方法以及多電子束檢查方法

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6700642B2 (ja) * 2016-02-22 2020-05-27 株式会社ホロン 画像振動抑制装置および画像振動抑制方法
JP2018005974A (ja) * 2016-06-27 2018-01-11 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US9793091B1 (en) 2016-06-28 2017-10-17 Ngr Inc. Image generation apparatus
US10840059B2 (en) 2016-07-28 2020-11-17 Hitachi High-Tech Corporation Charged particle radiation device
JP2025108795A (ja) * 2022-04-08 2025-07-24 株式会社日立ハイテク 荷電粒子ビームシステム

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2788139B2 (ja) * 1991-09-25 1998-08-20 株式会社日立製作所 電子線描画装置
JPH10208679A (ja) * 1997-01-27 1998-08-07 Hitachi Ltd 荷電粒子線装置
JP3767872B2 (ja) * 1997-06-02 2006-04-19 富士通株式会社 電子ビーム装置及びその調整方法
JP2004311659A (ja) * 2003-04-04 2004-11-04 Nikon Corp 荷電粒子線装置の調整方法及び荷電粒子線装置
JP5058489B2 (ja) * 2006-01-25 2012-10-24 株式会社荏原製作所 試料表面検査装置及び検査方法
JP5561968B2 (ja) * 2009-08-12 2014-07-30 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置、荷電粒子ビーム描画方法および振動成分抽出方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI840923B (zh) * 2021-09-16 2024-05-01 日商紐富來科技股份有限公司 多電子束檢查裝置、多極子陣列的控制方法以及多電子束檢查方法

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