JP6104804B2 - スチレン系(メタ)アクリル系オリゴマー - Google Patents
スチレン系(メタ)アクリル系オリゴマー Download PDFInfo
- Publication number
- JP6104804B2 JP6104804B2 JP2013531929A JP2013531929A JP6104804B2 JP 6104804 B2 JP6104804 B2 JP 6104804B2 JP 2013531929 A JP2013531929 A JP 2013531929A JP 2013531929 A JP2013531929 A JP 2013531929A JP 6104804 B2 JP6104804 B2 JP 6104804B2
- Authority
- JP
- Japan
- Prior art keywords
- meth
- acrylate
- acrylic
- oligomer
- styrene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 title claims description 148
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 title claims description 134
- 239000000178 monomer Substances 0.000 claims description 106
- 238000000034 method Methods 0.000 claims description 51
- 239000000203 mixture Substances 0.000 claims description 48
- -1 azo compound Chemical class 0.000 claims description 34
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 29
- 229920002554 vinyl polymer Polymers 0.000 claims description 29
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 28
- 238000004519 manufacturing process Methods 0.000 claims description 17
- 238000010521 absorption reaction Methods 0.000 claims description 16
- 239000003505 polymerization initiator Substances 0.000 claims description 15
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims description 14
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims description 9
- 239000007810 chemical reaction solvent Substances 0.000 claims description 7
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical group CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 claims description 6
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 claims description 6
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 claims description 6
- 238000005160 1H NMR spectroscopy Methods 0.000 claims description 5
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 5
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 claims description 5
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 150000002978 peroxides Chemical class 0.000 claims description 2
- 229920005989 resin Polymers 0.000 description 33
- 239000011347 resin Substances 0.000 description 33
- 229920000642 polymer Polymers 0.000 description 32
- 238000005984 hydrogenation reaction Methods 0.000 description 30
- 238000006116 polymerization reaction Methods 0.000 description 25
- 238000012360 testing method Methods 0.000 description 22
- 150000003440 styrenes Chemical class 0.000 description 19
- 239000000047 product Substances 0.000 description 18
- 239000002904 solvent Substances 0.000 description 18
- 239000003054 catalyst Substances 0.000 description 17
- 239000004626 polylactic acid Substances 0.000 description 17
- 239000004970 Chain extender Substances 0.000 description 14
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 14
- 229920000747 poly(lactic acid) Polymers 0.000 description 14
- 239000011248 coating agent Substances 0.000 description 13
- 238000000576 coating method Methods 0.000 description 13
- 229920000139 polyethylene terephthalate Polymers 0.000 description 13
- 239000005020 polyethylene terephthalate Substances 0.000 description 13
- 230000008569 process Effects 0.000 description 13
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 11
- 238000002411 thermogravimetry Methods 0.000 description 11
- 238000001035 drying Methods 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 9
- 125000000524 functional group Chemical group 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- 238000012662 bulk polymerization Methods 0.000 description 8
- 230000008859 change Effects 0.000 description 8
- 238000013329 compounding Methods 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 8
- 239000003973 paint Substances 0.000 description 8
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 8
- JJRDRFZYKKFYMO-UHFFFAOYSA-N 2-methyl-2-(2-methylbutan-2-ylperoxy)butane Chemical compound CCC(C)(C)OOC(C)(C)CC JJRDRFZYKKFYMO-UHFFFAOYSA-N 0.000 description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 7
- 239000004594 Masterbatch (MB) Substances 0.000 description 7
- 125000003118 aryl group Chemical group 0.000 description 7
- 238000000465 moulding Methods 0.000 description 7
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 7
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- 239000004593 Epoxy Chemical group 0.000 description 6
- 238000005481 NMR spectroscopy Methods 0.000 description 6
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000002270 dispersing agent Substances 0.000 description 6
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- 239000003999 initiator Substances 0.000 description 6
- 229920003023 plastic Polymers 0.000 description 6
- 239000004033 plastic Substances 0.000 description 6
- 239000008096 xylene Substances 0.000 description 6
- 238000004383 yellowing Methods 0.000 description 6
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 5
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 5
- 229920000877 Melamine resin Polymers 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 5
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 5
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 5
- 239000006185 dispersion Substances 0.000 description 5
- 230000014509 gene expression Effects 0.000 description 5
- 239000000976 ink Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000011541 reaction mixture Substances 0.000 description 5
- 229920001909 styrene-acrylic polymer Polymers 0.000 description 5
- LGJCFVYMIJLQJO-UHFFFAOYSA-N 1-dodecylperoxydodecane Chemical compound CCCCCCCCCCCCOOCCCCCCCCCCCC LGJCFVYMIJLQJO-UHFFFAOYSA-N 0.000 description 4
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 4
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 4
- 239000004971 Cross linker Substances 0.000 description 4
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 4
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 4
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 4
- 229920000331 Polyhydroxybutyrate Polymers 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 239000003431 cross linking reagent Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000009472 formulation Methods 0.000 description 4
- 239000005015 poly(hydroxybutyrate) Substances 0.000 description 4
- 239000002952 polymeric resin Substances 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 229920005792 styrene-acrylic resin Polymers 0.000 description 4
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 3
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 3
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 3
- 239000004809 Teflon Substances 0.000 description 3
- 229920006362 Teflon® Polymers 0.000 description 3
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 125000005907 alkyl ester group Chemical group 0.000 description 3
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 239000012975 dibutyltin dilaurate Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- IVJISJACKSSFGE-UHFFFAOYSA-N formaldehyde;1,3,5-triazine-2,4,6-triamine Chemical compound O=C.NC1=NC(N)=NC(N)=N1 IVJISJACKSSFGE-UHFFFAOYSA-N 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 150000002513 isocyanates Chemical class 0.000 description 3
- 229940043265 methyl isobutyl ketone Drugs 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- ANISOHQJBAQUQP-UHFFFAOYSA-N octyl prop-2-enoate Chemical compound CCCCCCCCOC(=O)C=C ANISOHQJBAQUQP-UHFFFAOYSA-N 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
- 239000008188 pellet Substances 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 229920005862 polyol Polymers 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 3
- 239000000376 reactant Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- GJBRNHKUVLOCEB-UHFFFAOYSA-N tert-butyl benzenecarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1=CC=CC=C1 GJBRNHKUVLOCEB-UHFFFAOYSA-N 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- CXOOGGOQFGCERQ-UHFFFAOYSA-N (2-methyl-2-nitropropyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(C)(C)[N+]([O-])=O CXOOGGOQFGCERQ-UHFFFAOYSA-N 0.000 description 2
- FDPPXZRLXIPXJB-UHFFFAOYSA-N (2-methyl-2-nitropropyl) prop-2-enoate Chemical compound [O-][N+](=O)C(C)(C)COC(=O)C=C FDPPXZRLXIPXJB-UHFFFAOYSA-N 0.000 description 2
- FMQPBWHSNCRVQJ-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropan-2-yl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C(F)(F)F)C(F)(F)F FMQPBWHSNCRVQJ-UHFFFAOYSA-N 0.000 description 2
- MNSWITGNWZSAMC-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropan-2-yl prop-2-enoate Chemical compound FC(F)(F)C(C(F)(F)F)OC(=O)C=C MNSWITGNWZSAMC-UHFFFAOYSA-N 0.000 description 2
- LMAUULKNZLEMGN-UHFFFAOYSA-N 1-ethyl-3,5-dimethylbenzene Chemical compound CCC1=CC(C)=CC(C)=C1 LMAUULKNZLEMGN-UHFFFAOYSA-N 0.000 description 2
- QTKPMCIBUROOGY-UHFFFAOYSA-N 2,2,2-trifluoroethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(F)(F)F QTKPMCIBUROOGY-UHFFFAOYSA-N 0.000 description 2
- VBHXIMACZBQHPX-UHFFFAOYSA-N 2,2,2-trifluoroethyl prop-2-enoate Chemical compound FC(F)(F)COC(=O)C=C VBHXIMACZBQHPX-UHFFFAOYSA-N 0.000 description 2
- PRAMZQXXPOLCIY-UHFFFAOYSA-N 2-(2-methylprop-2-enoyloxy)ethanesulfonic acid Chemical compound CC(=C)C(=O)OCCS(O)(=O)=O PRAMZQXXPOLCIY-UHFFFAOYSA-N 0.000 description 2
- SJIXRGNQPBQWMK-UHFFFAOYSA-N 2-(diethylamino)ethyl 2-methylprop-2-enoate Chemical compound CCN(CC)CCOC(=O)C(C)=C SJIXRGNQPBQWMK-UHFFFAOYSA-N 0.000 description 2
- DPBJAVGHACCNRL-UHFFFAOYSA-N 2-(dimethylamino)ethyl prop-2-enoate Chemical compound CN(C)CCOC(=O)C=C DPBJAVGHACCNRL-UHFFFAOYSA-N 0.000 description 2
- BEWCNXNIQCLWHP-UHFFFAOYSA-N 2-(tert-butylamino)ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCNC(C)(C)C BEWCNXNIQCLWHP-UHFFFAOYSA-N 0.000 description 2
- KDAKDBASXBEFFK-UHFFFAOYSA-N 2-(tert-butylamino)ethyl prop-2-enoate Chemical compound CC(C)(C)NCCOC(=O)C=C KDAKDBASXBEFFK-UHFFFAOYSA-N 0.000 description 2
- WYGWHHGCAGTUCH-UHFFFAOYSA-N 2-[(2-cyano-4-methylpentan-2-yl)diazenyl]-2,4-dimethylpentanenitrile Chemical compound CC(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)C WYGWHHGCAGTUCH-UHFFFAOYSA-N 0.000 description 2
- GPOGMJLHWQHEGF-UHFFFAOYSA-N 2-chloroethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCl GPOGMJLHWQHEGF-UHFFFAOYSA-N 0.000 description 2
- WHBAYNMEIXUTJV-UHFFFAOYSA-N 2-chloroethyl prop-2-enoate Chemical compound ClCCOC(=O)C=C WHBAYNMEIXUTJV-UHFFFAOYSA-N 0.000 description 2
- ISRGONDNXBCDBM-UHFFFAOYSA-N 2-chlorostyrene Chemical compound ClC1=CC=CC=C1C=C ISRGONDNXBCDBM-UHFFFAOYSA-N 0.000 description 2
- FWWXYLGCHHIKNY-UHFFFAOYSA-N 2-ethoxyethyl prop-2-enoate Chemical compound CCOCCOC(=O)C=C FWWXYLGCHHIKNY-UHFFFAOYSA-N 0.000 description 2
- CHNGPLVDGWOPMD-UHFFFAOYSA-N 2-ethylbutyl 2-methylprop-2-enoate Chemical compound CCC(CC)COC(=O)C(C)=C CHNGPLVDGWOPMD-UHFFFAOYSA-N 0.000 description 2
- JGRXEBOFWPLEAV-UHFFFAOYSA-N 2-ethylbutyl prop-2-enoate Chemical compound CCC(CC)COC(=O)C=C JGRXEBOFWPLEAV-UHFFFAOYSA-N 0.000 description 2
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 2
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 2
- VWJAVBOLCVPIAK-UHFFFAOYSA-N 2-methoxybutyl 2-methylprop-2-enoate Chemical compound CCC(OC)COC(=O)C(C)=C VWJAVBOLCVPIAK-UHFFFAOYSA-N 0.000 description 2
- FURRSXHPLKQVIR-UHFFFAOYSA-N 2-methoxybutyl prop-2-enoate Chemical compound CCC(OC)COC(=O)C=C FURRSXHPLKQVIR-UHFFFAOYSA-N 0.000 description 2
- IXPWKHNDQICVPZ-UHFFFAOYSA-N 2-methylhex-1-en-3-yne Chemical compound CCC#CC(C)=C IXPWKHNDQICVPZ-UHFFFAOYSA-N 0.000 description 2
- HVVPYFQMCGANJX-UHFFFAOYSA-N 2-methylprop-2-enyl prop-2-enoate Chemical compound CC(=C)COC(=O)C=C HVVPYFQMCGANJX-UHFFFAOYSA-N 0.000 description 2
- RUMACXVDVNRZJZ-UHFFFAOYSA-N 2-methylpropyl 2-methylprop-2-enoate Chemical compound CC(C)COC(=O)C(C)=C RUMACXVDVNRZJZ-UHFFFAOYSA-N 0.000 description 2
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 2
- CEXQWAAGPPNOQF-UHFFFAOYSA-N 2-phenoxyethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOC1=CC=CC=C1 CEXQWAAGPPNOQF-UHFFFAOYSA-N 0.000 description 2
- RZVINYQDSSQUKO-UHFFFAOYSA-N 2-phenoxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC1=CC=CC=C1 RZVINYQDSSQUKO-UHFFFAOYSA-N 0.000 description 2
- HPSGLFKWHYAKSF-UHFFFAOYSA-N 2-phenylethyl prop-2-enoate Chemical compound C=CC(=O)OCCC1=CC=CC=C1 HPSGLFKWHYAKSF-UHFFFAOYSA-N 0.000 description 2
- GQTFHSAAODFMHB-UHFFFAOYSA-N 2-prop-2-enoyloxyethanesulfonic acid Chemical compound OS(=O)(=O)CCOC(=O)C=C GQTFHSAAODFMHB-UHFFFAOYSA-N 0.000 description 2
- DXIJHCSGLOHNES-UHFFFAOYSA-N 3,3-dimethylbut-1-enylbenzene Chemical compound CC(C)(C)C=CC1=CC=CC=C1 DXIJHCSGLOHNES-UHFFFAOYSA-N 0.000 description 2
- NWKKCUWIMOZYOO-UHFFFAOYSA-N 3-methoxybutyl 2-methylprop-2-enoate Chemical compound COC(C)CCOC(=O)C(C)=C NWKKCUWIMOZYOO-UHFFFAOYSA-N 0.000 description 2
- NPYMXLXNEYZTMQ-UHFFFAOYSA-N 3-methoxybutyl prop-2-enoate Chemical compound COC(C)CCOC(=O)C=C NPYMXLXNEYZTMQ-UHFFFAOYSA-N 0.000 description 2
- ULYIFEQRRINMJQ-UHFFFAOYSA-N 3-methylbutyl 2-methylprop-2-enoate Chemical compound CC(C)CCOC(=O)C(C)=C ULYIFEQRRINMJQ-UHFFFAOYSA-N 0.000 description 2
- ZVYGIPWYVVJFRW-UHFFFAOYSA-N 3-methylbutyl prop-2-enoate Chemical compound CC(C)CCOC(=O)C=C ZVYGIPWYVVJFRW-UHFFFAOYSA-N 0.000 description 2
- MKTOIPPVFPJEQO-UHFFFAOYSA-N 4-(3-carboxypropanoylperoxy)-4-oxobutanoic acid Chemical compound OC(=O)CCC(=O)OOC(=O)CCC(O)=O MKTOIPPVFPJEQO-UHFFFAOYSA-N 0.000 description 2
- YGQURMQHUGDYAO-UHFFFAOYSA-N 4-[2-[2-(4-nitrophenyl)imidazo[2,1-b][1,3]benzothiazol-6-yl]oxyethyl]morpholine Chemical compound C1=CC([N+](=O)[O-])=CC=C1C1=CN2C3=CC=C(OCCN4CCOCC4)C=C3SC2=N1 YGQURMQHUGDYAO-UHFFFAOYSA-N 0.000 description 2
- NUXLDNTZFXDNBA-UHFFFAOYSA-N 6-bromo-2-methyl-4h-1,4-benzoxazin-3-one Chemical compound C1=C(Br)C=C2NC(=O)C(C)OC2=C1 NUXLDNTZFXDNBA-UHFFFAOYSA-N 0.000 description 2
- OCIFJWVZZUDMRL-UHFFFAOYSA-N 6-hydroxyhexyl prop-2-enoate Chemical compound OCCCCCCOC(=O)C=C OCIFJWVZZUDMRL-UHFFFAOYSA-N 0.000 description 2
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- Paints Or Removers (AREA)
Description
本明細書中において、「(メタ)アクリルモノマー」は、アクリル酸またはメタクリル酸、アクリル酸またはメタクリル酸のエステル、アクリル酸またはメタクリル酸の塩やアミド、他の適当な誘導体、またはこれらの混合物をさす。適当なアクリルモノマーの例としては、特に限定されずに、以下のメタクリレートエステル、即ち、メチルメタクリレートやエチルメタクリレート、n−プロピルメタクリレート、n−ブチルメタクリレート(BMA)、イソプロピルメタクリレート、イソブチルメタクリレート、n−アミルメタクリレート、n−ヘキシルメタクリレート、イソアミルメタクリレート、2−ヒドロキシエチルメタクリレート、2−ヒドロキシプロピルメタクリレート、N,N−ジメチルアミノエチルメタクリレート、N,N−ジエチルアミノエチルメタクリレート、t−ブチルアミノエチルメタクリレート、2−スルホエチルメタクリレート、トリフルオロエチルメタクリレート、グリシジルメタクリレート(GMA)、ベンジルメタクリレート、アリルメタクリレート、2−n−ブトキシエチルメタクリレート、2−クロロエチルメタクリレート、sec−n−ブチルメタクリレート、tert−n−ブチルメタクリレート、2−エチルブチルメタクリレート、シンナミルメタクリレート、クロチルメタクリレート、シクロヘキシルメタクリレート、シクロペンチルメタクリレート、2−エトキシエチルメタクリレート、フルフリルメタクリレート、ヘキサフルオロイソプロピルメタクリレート、メタリルメタクリレート、3−メトキシブチルメタクリレート、2−メトキシブチルメタクリレート、2−ニトロ−2−メチルプロピルメタクリレート、n−オクチルメタクリレート、2−エチルヘキシルメタクリレート、2−フェノキシエチルメタクリレート、2−フェニルエチルメタクリレート、フェニルメタクリレート、プロパルギルメタクリレート、テトラヒドロフルフリルメタクリレート、テトラヒドロピラニルメタクリレートが含まれる。好適なアクリレートエステルの例には、特に限定されずに、アクリル酸メチルやエチルアクリレート、n−プロピルアクリレート、イソプロピルアクリレート、n−ブチルアクリレート(BA)、n−デシルアクリレート、イソブチルアクリレート、n−アミルアクリレート、n−ヘキシルアクリレート、イソアミルアクリレート、2−ヒドロキシエチルアクリレート、2−ヒドロキシプロピルアクリレート、N,N−ジメチルアミノエチルアクリレート、N,N−ジエチルアミノエチルアクリレート、t−ブチルアミノエチルアクリレート、2−スルホエチルアクリレート、トリフルオロエチルアクリレート、グリシジルアクリレート、ベンジルアクリレート、アリルアクリレート、2−n−ブトキシエチルアクリレート、2−クロロエチルアクリレート、sec−ブチルアクリレート、tert−ブチルアクリレート、2−エチルブチルアクリレート、シンナミルアクリレート、クロチルアクリレート、シクロヘキシルアクリレート、シクロペンチルアクリレート、2−エトキシエチルアクリレート、フルフリルアクリレート、ヘキサフルオロイソプロピルアクリレート、メタリルアクリレート、3−メトキシブチルアクリレート、2−メトキシブチルアクリレート、2−ニトロ−2−メチルプロピルアクリレート、n−オクチルアクリレート、2−エチルヘキシルアクリレート、2−フェノキシエチルアクリレート、2−フェニルエチルアクリレート、フェニルアクリレート、プロパルギルアクリレート、テトラヒドロフルフリルアクリレート、テトラヒドロピラニルアクリレートが含まれる。
ある側面では、オリゴマーが低温条件下で製造される。本明細書中において、「低温」は、重合を実施するのにかなりの高温を用いる従来の高温での製造方法と比較の上で用いられる相対的な用語である。このような方法には、限定されずに、例えば、連続的なバルク重合法や、バッチ式及び半バッチ式の重合法が含まれる。これらの方法では、(メタ)アクリルモノマーとスチレン系モノマー、またはこれらビニルモノマーのいずれか2つ以上の混合物を含むビニルモノマーを、連続的に反応器中に投入することができる。
もう一つの側面では、水素化スチレン系(メタ)アクリル系オリゴマーの製造方法が提供される。このようなオリゴマーは、従来法で、即ち高温法で生産でき、製造されたオリゴマーを水素化法にかけて、低オレフィン性のスチレン系(メタ)アクリル系オリゴマーを得ることができる。例えば、このスチレン系(メタ)アクリル系オリゴマーを、上述のような低温法で製造するオリゴマー用の、ビニルモノマーと重合開始剤とを含む混合物を、反応器に投入する連続重合法により製造してもよい。次いで、この反応器を175℃〜300℃の温度で、モノマーをオリゴマーに変換するのに十分な時間維持する。次いでオレフィン性不飽和結合を含むスチレン系(メタ)アクリル系オリゴマーを分離して、水素化して、実質的にオレフィン性不飽和結合を含まないスチレン系(メタ)アクリル系オリゴマーを形成する。いくつかの実施様態においては、この水素化が、スチレン系(メタ)アクリル系オリゴマーを水素と水素化触媒に接触させて行われる。
本技術のオリゴマーはその改善された熱安定性に特徴を持つことがある。この熱安定性を、図3と5を参照しながらさらに、しかし簡単に説明する。オレフィン性不飽和結合をもたないあるいは最低量のオレフィン性を示すオリゴマーは、従来製造されているオリゴマーよりはるかに熱的に安定である。図3と5から明らかなように、この水素化スチレン系(メタ)アクリル系オリゴマー、言い換えればオレフィン性を示さないスチレン系(メタ)アクリル系オリゴマーは、従来の非水素化スチレン系(メタ)アクリル系オリゴマーより高い熱劣化挙動を示す。理論に拘泥するわけではないが、これらの水素化スチレン系(メタ)アクリル系オリゴマーと低温生産されたオリゴマーは、相当する非水素化スチレン系(メタ)アクリル系オリゴマーより少ない数の末端またはビニル炭素−炭素二重結合を含んでいる。末端炭素−炭素二重結合を含むポリマーは、加熱により解重合し、最終的に分解することがある。その結果、これらの水素化スチレン−アクリル系オリゴマーや低温オリゴマーは加熱で解重合しにくく、相当する非水素化スチレン系(メタ)アクリル系オリゴマーより熱的に安定である。
GPCによるポリマー分子量の測定
以下に述べる実施例のポリマーの分子量を測定するために、この高分子樹脂を先ずテトラヒドロフラン(THF)溶媒の溶液に溶解し、次いでゲルパーミエーションクロマトグラム(ウォーターズ2410屈折率検出器を備えたウォーターズ2695装置)に注入した。ガードカラムを備えた一対のPLゲル混合Bカラムを用い、ポリマーの数平均分子量(Mn)と重量平均分子量(Mw)、平均分子量(Mz)を決定するのに、ミレニウムのソフトウェアを使用した。
樹脂試料を適当な重水素化溶媒、例えばCDCl3または(CD3)S(O)CD3に約2質量%で溶解した。ブルカー300MHz−NMRを使用して、プロトンNMRスペクトルを記録した。
Q50装置(TAインスツルメント)を用いて、以下の方法でポリマーの熱重量分析(TGA)を行った。通常10〜15mgの量の試料を、重量既知のPtるつぼに入れた。温度を20℃/分の速度で室温から最終的に約550℃の温度にまで上げた。重量対温度の一次導関数曲線を記録した。
HP8453UV−Vis分光光度計を用いて、イソシアヌレートで硬化させたアクリルポリオールフィルムのUVスペクトル特性を記録した。このアクリルポリオールの水素化前後の吸収曲線を比較した。
ポール・N・ガードナー社のガードナー乾燥時間記録計(Quadcycle cat DT−5040及びMulticycle cat DT−5020)を用いて乾燥時間を測定した。新たに塗布した試料を装置の下に置き、テフロンボールをもつ触針を下ろして表面に接触させる。この触針を経時的に回転させて塗膜の表面を検査する。オペレータにより、接触時間とタックフリー時間、乾燥硬化時間、完全乾燥時間を記録する。
ケーニッヒ硬度は、ケーニッヒ・ペンジュラム硬さ試験機、Byk−Gardner Pendulum Konig型、カタログ番号5856を用いて測定した。停止までに必要なスイングの回数を測定する試験を3回行い、その平均を用いた。
UV暴露試験は、Q−Lab社の装置を用いて行った。QUV−A試験は、UVA340ランプを用いて、60℃で放射照度が0.8で4時間、次いで光照射なしに50℃で4時間行った。QUV−B試験は、UVB313ランプを用いて、70℃で放射照度が0.48で8時間、次いで次いで光照射なしに50℃で4時間行った。
J−2527サイクルで運転されているアトラスCI4000ウェザロメーター中でパネルを加速風化させた。サイクル条件を以下に示す。
表1に示す組成物を、連続攪拌槽反応器に連続的に投入し、同時に生成物を抜き出した。この生成物を、加熱エバボレータに連続的に投入して、残留モノマーと溶媒を可能な限り除いた。表1に製造した試料を示す。
この実施例では、低反応温度での連続法によるスチレン−アクリル樹脂の製造を述べる。各試験で、モノマーを、溶媒と開始剤に混合し、次いで連続攪拌槽反応器に連続的に投入し、同時に生成物を引き抜いた。この生成物を加熱エバボレータに投入し、残留モノマーと溶媒を可能な限り除いた。表2に製造した試料を示す。
本実施例では、樹脂試料1〜5を水素化してC−C不飽和結合を除いた。水素化は、試験室スケールで次のように行った。樹脂を先ずキシレン溶媒におよそ50質量%固体の濃度で溶解した。この樹脂/溶媒溶液を1リットル容器に入れ、表3に示す水素化触媒を加えた。全ての試験に用いた触媒はPd/Cであった。この容器を加熱し、約1500RPMの高速攪拌下、加圧下で連続的に水素を添加した。いろいろな時間後にこの反応を停止させ、内容物を濾過して触媒を除いた。このキシレン溶媒を、もう一つの加工工程で、標準的なビュッヒ・ラボ・ロータリーエバボレータを用いて加熱真空下で除いた。
水素化前後に製造した樹脂の性質を測定した。試験した性能は、GPCによる分子量と、NMRによる骨格二重結合含量などの構造、TGA(熱重量分析)による熱安定性であった。図1に示すように、GPC線を重ねて、試料3の保持時間とその水素化類縁体である試料21の保持時間を比較する。水素化の結果として樹脂分子量に実質的に変化がないことが明らかである。水素化試料のクロマトグラム中の約21分にある最も大きなピークは、水素化のために樹脂を溶解するのに用いた溶媒(キシレン)である。
キシレンとn−酢酸ブチル中で、試料5または試料23をヘキサメチレンジ−イソシアネート3量体(HDI−3)とOH:NCO官能基モル比が1:1で混合し、固体含量が約60質量%の溶液を形成し、塗料を製造調合物を製造した。これらの調合物に、100部(pHR)に対して0.01部の触媒ジブチル錫ジラウレート(DBTDL)を添加し、均一に混合した。この塗料調合物を、ゲル化点に達する直前で、テフロンシート上に塗布し、24時間空気を当て、最後に100℃の炉中で90分間焼成した。これらのフィルムをテフロン(登録商標)から取り外し、34ドライミクロンで測定し、次いでUV−Vis分光光度計中に入れ、水素化前後の光吸収性能を比較した。図4から、水素化試料23の樹脂と比較すると、試料5の樹脂中でUV吸収率がかなり高いことがわかる。また吸収開始波長が、299nmから279nmと高エネルギー側に移動した。これ以外では、これらの二つの樹脂が同様に振る舞い、同一のゲル化時間とOH含量、最終フィルム硬度を持っているという点に注目することが重要である。
試料1と9と19の温度に対する重量減少曲線と一次導関数曲線を図5に示す。試料9と試料19の両方の方法が、高温生産された試料1の樹脂と較べてより熱的に安定なスチレン系−(メタ)アクリレート組成物を与えることが容易に認められる。図6には、DTAP開始剤を用いて低温で製造したポリマー(試料18)と高温で製造した同じポリマー(試料2)の比較を示すが、これからも熱安定性の改善が見られる。
比較用樹脂と対応する水素化類似体の3組を、樹脂負荷量を1.0質量%としてPLA(インジオ4042D、ネイチャーワークス)で混合した。乾燥下でこれらの材料を混合し、液状で供給して、ブラベンダー・コニカル二軸押出機を用いてペレット状に押し出した。上のPLAの場合は、ピーク加工温度が230℃であり、滞留時間が約90秒間であった。材料を少し抜き出し(第一のパス)、残りを押出機を通して第二のパスに返送した。
二つの異なる試験で、3種の水素化樹脂(試料19と20と24)を、また3種の「低温」樹脂(実施例9と11と17)を、PET(9921、イーストマン社)と樹脂負荷量が0.5質量%で混合した。いずれの場合も、比較用樹脂(試料2)も混合した。典型的なPET鎖延長条件を真似るように条件を選択した。これらの材料を乾燥状態で混合して供給し、ブラベンダーコニカル二軸押出機を用いてペレット状に押し出した。最高加工温度を280℃であり、滞留時間は約90秒間であった。少量の材料を抜き出し(第一パス)、残りを返送し押出機を通して第二パスとした。第1パス及び第2パスの両方を通した後の試料中のスチレンモノマー(単位:PPM)の結果を図11に示す。
本実施例では、実施例1と2の試料から、先ず、これらの樹脂をMAKまたは酢酸ブチルに溶解して溶剤中に約60%の固体を含む「画分」を調合した。この「画分」に、さらにMAK溶媒とレベリング剤、触媒、イソシアネートを添加した。調合物を表5に示す。
用いた触媒(Cat)は、1質量%のジブチルスズジラウレートを含むMAK溶液
用いたイソシアネート(Iso)はバソナートHI100である。
用いたレベリング(Lev)添加剤はビック361Nである。
GRD1=ガードナー乾燥時間(不粘着)
GRD2=ガードナー乾燥時間(完全乾燥)
次いで、上記の塗液を、44ミクロンの無ワイヤ棒をもつアルミニウムQパネル(A−363003H14Al)上に塗布した。これらの塗液の塗布前に、これらのパネルを白色の基礎塗液で塗布して製造した。この白色の基礎塗液は、100部のグラスリットL−55ホワイトと10部のグラスリット355−55活性化剤と40部のグラスリット352−50還元剤とを混合し、44ミクロンの無ワイヤ棒を持つQパネル上に塗布し、乾燥させて製造した。塗布後のパネルを耐侯性試験室に入れ、経時的に色変化(Δb*)と黄変度(ΔYI)を分析した。三つ試験室を用いた。一つの試験室では、パネルをUV−A光に暴露し、もう一つの試験室ではUV−B光に暴露した。第三の試験室では、ウェザロメーターを用いた。表6は、b*と黄変度の経時変化の結果を示す。表6に示す数値は、CIE1976色空間(L*とa*、b*;「Lab」色空間)値によるものである。Lab色空間中では、b*値が青色−黄色座標を示し、Δb*は、青色−黄色座標における経時変化(例えば、時間0と時間tでのb*の差)の測定値である。Δb*の正の変化は、暴露/老化による塗膜黄変の増加に相当する。表6中に示すYI(またはΔYI値)は、透明または白色の試験試料の黄変度の経時的変化を示す。これらの値は、ASTM−E313の方法により分光光度データから計算される。
特記しない限り、あるいは明らかに異常ではないなら、要素(特に以下の請求項中の要素)の記述に当り単数で表示されたものは、単数と複数の両方を含むものとする。特記しない場合、「有する」や「含む」などの用語は、無制限の用語(即ち、「特に限定されずに含む」ことを意味する)であるとする。また、本明細書中で使用される用語や発現は、説明のために使用されるものであり、制限のために使用されるのではない。これらの用語や表現を使用する際に、表示・記載された形体のいずれの等価物もあるいはその一部を排除する意図はなく、本発明の請求範囲内でいろいろな変更が可能である。また、「実質的に...からなる」という表現は、具体的にあげられた要素と請求の発明の基本的で新規な特徴に実質的に悪影響を与えない他の要素とを含むことを意味する。「からなる」という表現は、具体的に特定されていないいずれの要素も含まない。
本出願は、米国仮出願特許61/388,930(2010年10月1日出願)の優先権を主張する。なお、この文書の開示の全てを、あらゆる目的で引用として本明細書に組み込む。
Claims (5)
- 反応器中に、スチレン系モノマー、及び(メタ)アクリル系モノマーを含む20質量%〜80質量%のビニルモノマーと、
0.25質量%〜5質量%の重合開始剤と、
20質量%〜80質量%の反応溶媒を含む混合物を連続的に投入し;
前記反応器を120℃〜165℃の温度に維持して前記ビニルモノマーからオリゴマーを製造し;
該オリゴマーを単離する各工程を含むオリゴマーの製造方法であって、
前記オリゴマーは微量のオレフィン性不飽和結合を含み、前記オリゴマーの前記反応器における滞留時間が15分間〜60分間であり、
前記微量のオレフィン性不飽和結合は、前記オリゴマーが、1645cm−1〜1610cm−1の範囲にIR吸収を示さず、及び1H−NMRにおいてテトラメチルシランを標準として4.5〜5.5ppmの範囲に共鳴を示さないことで特徴付けられ、及び
前記オリゴマーは、食品と接触する用途のために使用される、ことを特徴とする方法。 - 前記重合開始剤が、アゾ化合物、過酸化物、またはこれらのいずれか2つ以上の混合物である請求項1に記載の方法。
- 前記(メタ)アクリル系モノマーが、エチルアクリレート、メチル(メタ)アクリレート、ブチル(メタ)アクリレート、2−エチルヘキシル(メタ)アクリレート、ヒドロキシエチル(メタ)アクリレート、グリシジル(メタ)アクリレート、アクリル酸、(メタ)アクリル酸、ヒドロキシプロピル(メタ)アクリレート、またはヒドロキシブチル(メタ)アクリレートを含む請求項2に記載の方法。
- 前記(メタ)アクリル系モノマーがグリシジル(メタ)アクリレートを含む請求項2に記載の方法。
- 前記スチレン系モノマーがスチレンまたはα−メチルスチレンを含む請求項2に記載の方法。
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US38893010P | 2010-10-01 | 2010-10-01 | |
US61/388,930 | 2010-10-01 | ||
PCT/US2011/054307 WO2012044981A2 (en) | 2010-10-01 | 2011-09-30 | Styrenic (meth)acrylic oligomers |
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JP2013544908A JP2013544908A (ja) | 2013-12-19 |
JP2013544908A5 JP2013544908A5 (ja) | 2014-11-13 |
JP6104804B2 true JP6104804B2 (ja) | 2017-03-29 |
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JP2013531929A Expired - Fee Related JP6104804B2 (ja) | 2010-10-01 | 2011-09-30 | スチレン系(メタ)アクリル系オリゴマー |
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US (2) | US8785548B2 (ja) |
EP (1) | EP2621884B1 (ja) |
JP (1) | JP6104804B2 (ja) |
KR (5) | KR20180114237A (ja) |
CN (1) | CN103209952B (ja) |
BR (1) | BR112013007587A2 (ja) |
CA (1) | CA2813042A1 (ja) |
CL (1) | CL2013000875A1 (ja) |
MX (2) | MX345474B (ja) |
WO (1) | WO2012044981A2 (ja) |
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US8785548B2 (en) | 2010-10-01 | 2014-07-22 | Basf Se | Styrenic (meth)acrylic oligomers |
MY154045A (en) * | 2012-05-25 | 2015-04-27 | Daicel Corp | Curable resin composition and cured product thereof, encapsulating agent, and optical semiconductor device |
WO2014131701A1 (de) | 2013-02-27 | 2014-09-04 | Basf Se | Additive zur hydrolysestabilisierung von polymeren |
WO2018009683A1 (en) * | 2016-07-06 | 2018-01-11 | Eastman Chemical Company | (meth)acrylic oligomers |
JP6762209B2 (ja) * | 2016-11-29 | 2020-09-30 | ビーエーエスエフ コーティングス ゲゼルシャフト ミット ベシュレンクテル ハフツングBASF Coatings GmbH | アクリル樹脂及びメラミン樹脂を主体樹脂とするトップコート用塗料組成物 |
CN107383594B (zh) * | 2017-07-16 | 2019-07-26 | 常州大学 | 一种纳米无机粒子共混改性聚丙烯微孔膜的制备方法 |
CN111133043A (zh) | 2017-07-20 | 2020-05-08 | 伊士曼化工公司 | 包含结晶聚合物和稳定剂组合物的聚合物组合物 |
EP3655476A1 (en) * | 2017-07-20 | 2020-05-27 | Eastman Chemical Company | Polymer compositions having improved properties of thermal stability, color, and/or flow |
US20210206960A1 (en) | 2017-10-27 | 2021-07-08 | Basf Se | Aqueous binder formulation |
CN111886258A (zh) | 2018-03-15 | 2020-11-03 | 巴斯夫欧洲公司 | 水性粘合剂 |
WO2019212865A1 (en) * | 2018-04-30 | 2019-11-07 | Basf Se | High molar mass polymers from a continuous process |
KR101995250B1 (ko) * | 2018-12-05 | 2019-07-02 | 이응기 | 공압출 발포 공법으로 제조되는 다층구조의 폴리락트산 수지 발포 성형품 및 그 제조방법 |
PL3924424T3 (pl) | 2019-02-14 | 2023-03-13 | Basf Se | Możliwa do przędzenia kompozycja (sc) i wytwarzane z niej włókna poliestrowe |
CN115094533B (zh) * | 2022-08-26 | 2022-11-29 | 汕头市超越织造有限公司 | 一种纳米改性高强度聚丙烯纤维长丝及其制备方法和应用 |
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DE2239356A1 (de) | 1972-08-10 | 1974-02-21 | Basf Ag | Styrolpolymerisate mit verbesserter fliessfaehigkeit |
CA1054161A (en) * | 1975-08-22 | 1979-05-08 | Herbert Naarmann | Manufacture of heat-stable brominated oligomers of monovinyl-aromatic compounds |
US4414370A (en) | 1981-01-09 | 1983-11-08 | S. C. Johnson & Son, Inc. | Process for continuous bulk copolymerization of vinyl monomers |
US4529787A (en) | 1982-06-15 | 1985-07-16 | S. C. Johnson & Son, Inc. | Bulk polymerization process for preparing high solids and uniform copolymers |
US4546160A (en) * | 1984-02-29 | 1985-10-08 | S. C. Johnson & Son, Inc. | Bulk polymerization process for preparing high solids and uniform copolymers |
JP3319484B2 (ja) * | 1994-01-07 | 2002-09-03 | 三菱瓦斯化学株式会社 | 耐熱分解性を有するメタクリル樹脂の製造方法 |
US6433098B1 (en) * | 1994-06-13 | 2002-08-13 | Rohm And Haas Company | Process of preparing curable compositions and compositions therefrom |
US6566549B1 (en) * | 1994-06-13 | 2003-05-20 | Rohm And Haas Company | Continuous polymerization process and products therefrom |
US6362301B1 (en) * | 1994-06-13 | 2002-03-26 | Rohm And Haas Company | Curable composition |
MXPA04007399A (es) * | 2002-02-01 | 2006-02-24 | Johnson Polymer Llc | Extensores de cadena oligomericos para procesamiento, post-procesamiento y reciclaje de polimeros de condensacion, sintesis, composiciones y aplicaciones. |
JP2007297548A (ja) * | 2006-05-02 | 2007-11-15 | Mitsubishi Rayon Co Ltd | 酸無水物基含有ビニル系重合体及びその製造方法 |
MX2009013178A (es) * | 2007-06-07 | 2010-02-17 | Albemarle Corp | Aductos, aductos y oligomeros o aductos, oligomeros y polimeros de bajo peso molecular asi como su preparacion. |
US8785548B2 (en) | 2010-10-01 | 2014-07-22 | Basf Se | Styrenic (meth)acrylic oligomers |
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EP2621884A4 (en) | 2014-05-14 |
WO2012044981A2 (en) | 2012-04-05 |
CA2813042A1 (en) | 2012-05-04 |
WO2012044981A3 (en) | 2012-06-14 |
US9238699B2 (en) | 2016-01-19 |
US20140329960A1 (en) | 2014-11-06 |
MX345474B (es) | 2017-02-01 |
CL2013000875A1 (es) | 2013-09-06 |
EP2621884A2 (en) | 2013-08-07 |
JP2013544908A (ja) | 2013-12-19 |
CN103209952B (zh) | 2015-07-08 |
KR101908028B1 (ko) | 2018-10-16 |
MX2013003571A (es) | 2013-08-29 |
BR112013007587A2 (pt) | 2020-08-04 |
KR20210060652A (ko) | 2021-05-26 |
KR20180114237A (ko) | 2018-10-17 |
US8785548B2 (en) | 2014-07-22 |
KR20130137176A (ko) | 2013-12-16 |
CN103209952A (zh) | 2013-07-17 |
KR20220070553A (ko) | 2022-05-31 |
KR20190062614A (ko) | 2019-06-05 |
EP2621884B1 (en) | 2017-03-01 |
US20120083572A1 (en) | 2012-04-05 |
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