JP6098984B2 - アンチモンフリーガラス、アンチモンフリーフリット、およびそのフリットで気密封止されるガラスパッケージ - Google Patents
アンチモンフリーガラス、アンチモンフリーフリット、およびそのフリットで気密封止されるガラスパッケージ Download PDFInfo
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- JP6098984B2 JP6098984B2 JP2015529924A JP2015529924A JP6098984B2 JP 6098984 B2 JP6098984 B2 JP 6098984B2 JP 2015529924 A JP2015529924 A JP 2015529924A JP 2015529924 A JP2015529924 A JP 2015529924A JP 6098984 B2 JP6098984 B2 JP 6098984B2
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- 239000011521 glass Substances 0.000 title claims description 141
- -1 antimony-free frit Substances 0.000 title 1
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 49
- 239000000203 mixture Substances 0.000 claims description 32
- 239000000945 filler Substances 0.000 claims description 15
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 claims description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 34
- 239000000758 substrate Substances 0.000 description 31
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 22
- 229910052787 antimony Inorganic materials 0.000 description 21
- 238000007789 sealing Methods 0.000 description 19
- 238000012360 testing method Methods 0.000 description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 12
- 229910000174 eucryptite Inorganic materials 0.000 description 9
- 239000000523 sample Substances 0.000 description 9
- 239000012002 vanadium phosphate Substances 0.000 description 8
- 229910000500 β-quartz Inorganic materials 0.000 description 8
- 230000000694 effects Effects 0.000 description 6
- GLMOMDXKLRBTDY-UHFFFAOYSA-A [V+5].[V+5].[V+5].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O Chemical compound [V+5].[V+5].[V+5].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O GLMOMDXKLRBTDY-UHFFFAOYSA-A 0.000 description 5
- 239000011575 calcium Substances 0.000 description 5
- 239000000155 melt Substances 0.000 description 5
- 230000002829 reductive effect Effects 0.000 description 5
- 230000003247 decreasing effect Effects 0.000 description 4
- 230000007613 environmental effect Effects 0.000 description 4
- 230000009477 glass transition Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 238000006467 substitution reaction Methods 0.000 description 4
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 4
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 3
- 101000993059 Homo sapiens Hereditary hemochromatosis protein Proteins 0.000 description 3
- 229910000410 antimony oxide Inorganic materials 0.000 description 3
- 239000006121 base glass Substances 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 229910052791 calcium Inorganic materials 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000004031 devitrification Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000012044 organic layer Substances 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 239000006228 supernatant Substances 0.000 description 3
- 231100000701 toxic element Toxicity 0.000 description 3
- 229910052720 vanadium Inorganic materials 0.000 description 3
- 238000002835 absorbance Methods 0.000 description 2
- 238000003491 array Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 239000013068 control sample Substances 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000000113 differential scanning calorimetry Methods 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 239000005350 fused silica glass Substances 0.000 description 2
- 239000000156 glass melt Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 230000000670 limiting effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000012216 screening Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- 229910017910 Sb—Zn Inorganic materials 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- RJAAXVMENUVEAN-UHFFFAOYSA-N antimony vanadium Chemical compound [V].[Sb] RJAAXVMENUVEAN-UHFFFAOYSA-N 0.000 description 1
- GHPGOEFPKIHBNM-UHFFFAOYSA-N antimony(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Sb+3].[Sb+3] GHPGOEFPKIHBNM-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000001938 differential scanning calorimetry curve Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000007496 glass forming Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 229910001392 phosphorus oxide Inorganic materials 0.000 description 1
- LFGREXWGYUGZLY-UHFFFAOYSA-N phosphoryl Chemical class [P]=O LFGREXWGYUGZLY-UHFFFAOYSA-N 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000008707 rearrangement Effects 0.000 description 1
- 239000005394 sealing glass Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 230000003685 thermal hair damage Effects 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/16—Silica-free oxide glass compositions containing phosphorus
- C03C3/21—Silica-free oxide glass compositions containing phosphorus containing titanium, zirconium, vanadium, tungsten or molybdenum
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/24—Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/842—Containers
- H10K50/8426—Peripheral sealing arrangements, e.g. adhesives, sealants
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/871—Self-supporting sealing arrangements
- H10K59/8722—Peripheral sealing arrangements, e.g. adhesives, sealants
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/841—Self-supporting sealing arrangements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/871—Self-supporting sealing arrangements
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- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Glass Compositions (AREA)
- Electroluminescent Light Sources (AREA)
- Joining Of Glass To Other Materials (AREA)
Description
V2O5(≧30モル%かつ≦60モル%);
P2O5(≧5モル%かつ≦20モル%);
ZnO(0〜10モル%);
Bi2O3(0〜5モル%);
Fe2O3(≧10モル%かつ≦25モル%);
TiO2(≧5モル%かつ≦20モル%);
TeO2(≧5モル%かつ≦20モル%)を含み;
TiO2+Fe2O3が20モル%〜35モル%の範囲内、たとえば約20モル%〜約30モル%の範囲内、約25モル%〜約35モル%の範囲内、および約25モル%〜約30モル%の範囲内であるアンチモンフリーガラスが開示される。
V2O5(40モル%);
P2O5(10モル%);
ZnO(5モル%);
Fe2O3(15モル%);
TiO2(15モル%);および
TeO2(15モル%)
の組成を有することができる。
V2O5(≧30モル%かつ≦60モル%);
P2O5(≧5モル%かつ≦20モル%);
ZnO(≧0モル%かつ≦10モル%);
Bi2O3(≧0モル%かつ≦5モル%);
Fe2O3(≧10モル%かつ≦25モル%);
TiO2(≧5モル%かつ≦20モル%);
TeO2(≧5モル%かつ≦20モル%)を含み;
TiO2+Fe2O3が20モル%〜35モル%の範囲内、たとえば約20モル%〜約30モル%の範囲内、約25モル%〜約35モル%の範囲内、および約25モル%〜約30モル%の範囲内であるアンチモンフリーガラスを含む、ガラスパッケージが記載される。
V2O5(≧30モル%かつ≦60モル%);
P2O5(≧5モル%かつ≦20モル%);
ZnO(≧0モル%かつ≦10モル%);
Bi2O3(≧0モル%かつ≦5モル%);
Fe2O3(≧10モル%かつ≦25モル%);
TiO2(≧5モル%かつ≦20モル%);
TeO2(≧5モル%かつ≦20モル%)を含み;
TiO2+Fe2O3が20モル%〜35モル%の範囲内、たとえば約20モル%〜約30モル%の範囲内、約25モル%〜約35モル%の範囲内、および約25モル%〜約30モル%の範囲内であるアンチモンフリーガラスを含むフリットが開示される。
V2O5(≧30モル%かつ≦60モル%);
P2O5(≧5モル%かつ≦20モル%);
ZnO(0〜10モル%);
Bi2O3(0〜5モル%);
Fe2O3(≧10モル%かつ≦25モル%);
TiO2(≧5モル%かつ≦20モル%);
TeO2(≧5モル%かつ≦20モル%)を含み;
TiO2+Fe2O3が、20モル%〜35モル%の範囲内、たとえば約20モル%〜約30モル%の範囲内、約25モル%〜約35モル%の範囲内、および約25モル%〜約30モル%の範囲内であるアンチモンフリーガラスを含む、製造方法が開示される。
V2O5(40モル%);
P2O5(10モル%);
ZnO(5モル%);
Fe2O3(15モル%);
TiO2(15モル%);および
TeO2(15モル%)
の組成を有することができる。
Claims (13)
- V2O5を≧30モル%かつ≦60モル%;
P2O5を≧5モル%かつ≦20モル%;
ZnOを≧0モル%かつ≦10モル%;
Bi2O3を≧0モル%かつ≦5モル%;
Fe2O3を>10モル%かつ≦25モル%;
TiO2を≧5モル%かつ≦20モル%;
TeO2を≧5モル%かつ≦20モル%;
を含み;
TiO2+Fe2O3が20モル%〜35モル%の範囲内であることを特徴とするアンチモンフリーガラス。 - V2O5が≧30モル%かつ≦40モル%であり;
P2O5が≧5モル%かつ≦15モル%である
ことを特徴とする請求項1に記載のアンチモンフリーガラス。 - V2O5が≧35モル%かつ≦40モル%であり;
P2O5が≧8モル%かつ≦10モル%であり;
ZnOが≧3モル%かつ≦7モル%である
ことを特徴とする請求項1に記載のアンチモンフリーガラス。 - 前記ガラスが:
V2O5を40モル%;
P2O5を10モル%;
ZnOを5モル%;
Fe2O3を15モル%;
TiO2を15モル%;および
TeO2を15モル%
の組成を有することを特徴とする請求項1に記載のアンチモンフリーガラス。 - 前記アンチモンフリーガラスがTg≦350℃であることを特徴とする請求項1〜4のいずれか一項に記載のアンチモンフリーガラス。
- ガラスパッケージであって:
第1のガラス板と;
第2のガラス板と;
前記第1のガラス板を前記第2のガラス板に結合させて、それらの間の気密シールを形成するフリットと;
を含み、前記フリットが:
V2O5を≧30モル%かつ≦60モル%;
P2O5を≧5モル%かつ≦20モル%;
ZnOを≧0モル%かつ≦10モル%;
Bi2O3を≧0モル%かつ≦5モル%;
Fe2O3を>10モル%かつ≦25モル%;
TiO2を≧5モル%かつ≦20モル%;
TeO2を≧5モル%かつ≦20モル%;
含み;
TiO2+Fe2O3が20モル%〜35モル%の範囲内であるアンチモンフリーガラスを含むことを特徴とするガラスパッケージ。 - V2O5が≧30モル%かつ≦40モル%であり;
P2O5が≧5モル%かつ≦15モル%である
ことを特徴とする請求項6に記載のガラスパッケージ。 - V2O5が≧35モル%かつ≦40モル%であり;
P2O5が≧8モル%かつ≦10モル%であり;
ZnOが≧3モル%かつ≦7モル%である
ことを特徴とする請求項6に記載のガラスパッケージ。 - 前記アンチモンフリーガラスがTg≦350℃であることを特徴とする請求項6に記載のガラスパッケージ。
- アンチモンフリーガラスであって、
V2O5を≧30モル%かつ≦60モル%;
P2O5を≧5モル%かつ≦20モル%;
ZnOを≧0モル%かつ≦10モル%;
Bi2O3を≧0モル%かつ≦5モル%;
Fe2O3を>10モル%かつ≦25モル%;
TiO2を≧5モル%かつ≦20モル%;
TeO2を≧5モル%かつ≦20モル%;
を含むアンチモンフリーガラスと、
CTE低下充填剤と、
を含み、
TiO2+Fe2O3が20モル%〜35モル%の範囲内であることを特徴とするフリット。 - Fe 2 O 3 が≧15モル%かつ≦25モル%であることを特徴とする請求項1に記載のアンチモンフリーガラス。
- Fe 2 O 3 が≧15モル%かつ≦25モル%であることを特徴とする請求項6に記載のガラスパッケージ。
- Fe 2 O 3 が≧15モル%かつ≦25モル%であることを特徴とする請求項10に記載のフリット。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201261695033P | 2012-08-30 | 2012-08-30 | |
US61/695,033 | 2012-08-30 | ||
PCT/US2013/056780 WO2014035954A2 (en) | 2012-08-30 | 2013-08-27 | Antimony-free glass, antimony-free frit and a glass package that is hermetically sealed with the frit |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2015532634A JP2015532634A (ja) | 2015-11-12 |
JP2015532634A5 JP2015532634A5 (ja) | 2016-09-23 |
JP6098984B2 true JP6098984B2 (ja) | 2017-03-22 |
Family
ID=49118819
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2015529924A Expired - Fee Related JP6098984B2 (ja) | 2012-08-30 | 2013-08-27 | アンチモンフリーガラス、アンチモンフリーフリット、およびそのフリットで気密封止されるガラスパッケージ |
Country Status (7)
Country | Link |
---|---|
US (1) | US8823163B2 (ja) |
EP (1) | EP2890653B1 (ja) |
JP (1) | JP6098984B2 (ja) |
KR (1) | KR20150050575A (ja) |
CN (1) | CN104936917B (ja) |
TW (1) | TWI586624B (ja) |
WO (1) | WO2014035954A2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019164059A1 (ko) * | 2018-02-23 | 2019-08-29 | 엘지전자 주식회사 | 무연계 저온 소성 글라스 프릿, 페이스트 및 이를 이용한 진공 유리 조립체 |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9573840B2 (en) | 2013-08-27 | 2017-02-21 | Corning Incorporated | Antimony-free glass, antimony-free frit and a glass package that is hermetically sealed with the frit |
CN104150778B (zh) * | 2014-08-11 | 2016-07-06 | 海南中航特玻材料有限公司 | 一种无铅低熔点封接玻璃 |
TWI677483B (zh) * | 2015-01-28 | 2019-11-21 | 美商康寧公司 | 無銻玻璃、玻璃料、玻璃料糊及玻璃組件 |
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Cited By (2)
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WO2019164059A1 (ko) * | 2018-02-23 | 2019-08-29 | 엘지전자 주식회사 | 무연계 저온 소성 글라스 프릿, 페이스트 및 이를 이용한 진공 유리 조립체 |
US11958772B2 (en) | 2018-02-23 | 2024-04-16 | Lg Electronics Inc. | Low-temperature fired, lead-free glass frit, paste, and vacuum glass assembly using same |
Also Published As
Publication number | Publication date |
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WO2014035954A2 (en) | 2014-03-06 |
CN104936917B (zh) | 2016-10-26 |
EP2890653B1 (en) | 2016-08-24 |
KR20150050575A (ko) | 2015-05-08 |
CN104936917A (zh) | 2015-09-23 |
JP2015532634A (ja) | 2015-11-12 |
US8823163B2 (en) | 2014-09-02 |
TWI586624B (zh) | 2017-06-11 |
US20140061623A1 (en) | 2014-03-06 |
EP2890653A2 (en) | 2015-07-08 |
WO2014035954A3 (en) | 2014-04-24 |
TW201414692A (zh) | 2014-04-16 |
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